Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
권호 표지

The Surface Image Properties of BST Thin Film by Depositing Conditions

코팅 조건에 따른 BST 박막의 표면 이미지 특성

  • 홍경진 (광주대학교 컴퓨터전자통신공학부) ;
  • 기현철 (전남대학교 전기공학과) ;
  • 오수홍 (광주기능대학) ;
  • 조재철 (초당대학교 전자공학과)
  • Published : 2002.05.17
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Abstract

The optical memory devices of BST thin films to composite $(Ba_{0.7}\;Sr_{0.3})TiO_{3}$ using sol-gel method were fabricated by changing of the depositing layer number on $Pt/Ti/SiO_{2}/Si$ substrate. The structural properties of optical memory devices to be ferroelectric was investigated by fractal analysis and 3-dimension image processing. The thickness of BST thin films at each coating numbers 3, 4 and 5 times was $2500[\AA]$, $3500[\AA]$ and $3800[\AA]$. BST thin films exhibited the most pronounced grain growth. The surface morphology image was roughness with coating numbers. The thin films increasing with coating numbers shows a more textured and complex configuration.

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