• Title/Summary/Keyword: $SrTiO_3$films

Search Result 477, Processing Time 0.033 seconds

Growth and Characterization of $ACu_3Ti_4O_{12}$(A=Ca, Sr) Single Crystals

  • Yoo, Sang-Im;Sangdon Yang;Geomyung Shin;Wee, Seong-Hun;Park, Hyun-Min
    • Proceedings of the Korea Crystallographic Association Conference
    • /
    • 2003.05a
    • /
    • pp.19-19
    • /
    • 2003
  • A cubic perovskite-type CaCu₃Ti₄O/sub 12/ compound has recently drawn a great attention because of an extraordinary high permittivity (~10⁴ at 1 kHz) at room temperature and its near temperature-independence over a wide temperature region, and thus numerous literature have been reported on CCTO polycrytalline ceramics and thin films. However, only a few literature have been reported on the CCTO single due to the lack of information about the CCTO primary phase field. On the basis of our recent experimental determination of the CCTO primary phase field, we could grow ACu₃Ti₄O/sub 12/(A=Ca, Sr) single crystals using both top-seeded solution growth and flux growth methods. This presentation will include three major parts. In part I, the thermal decomposition reaction of CCTO and its primary phase field in the CaO-CuO-TiO₂ ternary system will be presented. Detailed growth conditions of ACu₃Ti₄O/sub 12/(A=Ca, Sr) single crystals and characteristics of as-grown crystals will be followed in Part II. Part III will be comprised of dielectric properties of as-grown ACu₃Ti₄O/sub 12/(A=Ca, Sr) single crystals. Our experimental results will be compared with those of previous reports for discussion.

  • PDF

Top Electrodes Properties of SCT Thin Films (SCT 박막의 상부전극 특성)

  • 조춘남;김진사;전장배;유영각;김충혁
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 1999.11a
    • /
    • pp.240-243
    • /
    • 1999
  • (Sr$\sub$0.85/Ca$\sub$0.15/)TiO$_3$thin films were deposited on Pt-coated TiO$_2$/SiO$_2$/Si wafer by the rf sputtering method. Experiments were conducted to investigate the electrical properties of SCT thin films with various top electrode. C-F and C-V measurements show that SCT thin films annnealed at 600$^{\circ}C$ have a larger capacitance than SCT thin films deposited at 400$^{\circ}C$ , and there is nearly no difference between top electrodes. I-V measurement show that Pt top electrode have a good leakage current density of < 10nA/$\textrm{cm}^2$,. making them suitable for DRAM application.

  • PDF

Crystalline structures and electrical properties of $Pb[(Zr,Sn)Ti]NbO_3$ Thin Films deposited using RF Magnetron Sputtering Method (RF 마그네트론 스퍼터링 방법으로 제작된 $Pb[(Zr,Sn)Ti]NbO_3$ 박막의 결정구조와 전기적 특성)

  • Choi, Woo-Chang;Choi, Yong-Jung;Choi, Hyek-Hwan;Lee, Myoung-Kyo;Kwon, Tae-Ha
    • Journal of Sensor Science and Technology
    • /
    • v.9 no.3
    • /
    • pp.242-247
    • /
    • 2000
  • $Pb_{0.99}[(Zr_{0.6}Sn_{0.4})_{0.9}Ti_{0.1}]_{0.98}Nb_{0.02}O_3(PNZST)$ thin films were deposited by RF magnetron sputtering on $(La_{0.5}Sr_{0.5})CoO_3(LSCO)/Pt/Ti/SiO_2/Si$ substrate using a PNZST target with excess PbO of 10 mole%. The thin films deposited at substrate temperature of $500^{\circ}C$, and at RF power of 80W were crystallized to a perovskite phase after rapid thermal annealing(RTA). The thin films annealed at $650^{\circ}C$ for 10 seconds in air exhibited the good structures and electrical properties. The fabricated PNZST capacitor had a remanent polarization value of about $20\;{\mu}C/cm^2$ and coercive field of about 50 kV/cm. The reduction of the polarization after $2.2{\times}10^9$ switching cycles was less than 10%.

  • PDF

The Structure and Dielectric Properties of BST Thin Films Using Fractal Process (프렉탈 처리를 이용한 BST 박막의 구조 및 유전적특성)

  • 기현철;박지순;이우기;민용기;김태성
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2000.07a
    • /
    • pp.43-46
    • /
    • 2000
  • In this study, (Ba, Sr)$TiO_3$ (BST) ceramics thin films were prepared by Sol-Gel method. BST solution was made and spin-coated on Pt/$TiO_2$/Si substrate at 4000 [rpm] for 10 seconds. Coated specimens were dried at 150[$^{\circ}C$] for 5 minutes. Coating process was repeated 3 times and then sintered at 750[$^{\circ}C$] for 30 minutes. Structure and electrical characteristics of specimen was analyzed by Fractal Process. Thickness of BST ceramics thin films are about 2800[$\AA$]. Dielectric constant and loss of thin films was little decreased at 1[kHz]~1[MHz]. Dielectric constant and loss to frequency were 250 and 0.02 in BST3. The property of leakage current as the relation between the current and the voltage was that change of the leakage current was stable when the applied voltage was 0~3[V].

  • PDF

Electrical Properties of Pt/SCT/Pt Thin Film Structure (Pt/SCT/Pt 박막 구조의 전기적인 특성)

  • Kim, Jin-Sa;Shin, Cheol-Gi
    • The Transactions of The Korean Institute of Electrical Engineers
    • /
    • v.56 no.10
    • /
    • pp.1786-1790
    • /
    • 2007
  • The $(SrCa)TiO_3(SCT)$ thin films are deposited on Pt-coated electrode ($Pt/TiN/SiO_2/Si$) using RF sputtering method at various deposition temperature. The dielectric constant of SCT thin films were increased with the increase of deposition temperature, and changed almost linearly in temperature ranges of $-80{\sim}+90[^{\circ}C]$. Also, SCT thin films was observed the phenomena of dielectric relaxation with the increase of frequency, and the relaxation frequency was observed above 200[kHz]. V-I characteristics of SCT thin films show the increasing leakage current with the increases of deposition temperature. The conduction mechanism of the SCT thin films observed in the temperature range of $25{\sim}100[^{\circ}C]$ can be divided into three characteristic regions with different mechanism by the increasing current. The region 1 below 0.8[MV/cm] shows the ohmic conduction. The region 2 can be explained by the Child's law, and the region 3 is dominated by the tunneling effect.

Oxygen Vacancy Effects of Two-Dimensional Electron Gas in SrTiO3/KNbO3 Hetero Structure

  • Choi, Woo-Sung;Kang, Min-Gyu;Do, Young-Ho;Jung, Woo-Suk;Ju, Byeong-Kwon;Yoon, Seok-Jin;Yoo, Kwang-Soo;Kang, Chong-Yun
    • Journal of Sensor Science and Technology
    • /
    • v.22 no.4
    • /
    • pp.244-248
    • /
    • 2013
  • The discovery of a two-dimensional electron gas (2DEG) in $LaAlO_3$ (LAO)/$SrTiO_3$ (STO) heterostructure has stimulated intense research activity. We suggest a new structure model based on $KNbO_3$ (KNO) material. The KNO thin films were grown on $TiO_2$-terminated STO substrates as a p-type structure ($NbO_2/KO/TiO_2$) to form a two-dimensional hole gas (2DHG). The STO thin films were grown on KNO/$TiO_2$-terminated STO substrates as an n-type structure to form a 2DEG. Oxygen pressure during the deposition of the KNO and STO thin films was changed so as to determine the effect of oxygen vacancies on 2DEGs. Our results showed conducting behavior in the n-type structure and insulating properties in the p-type structure. When both the KNO and STO thin films were deposited on a $TiO_2$-terminated STO substrate at a low oxygen pressure, the conductivity was found to be higher than that at higher oxygen pressures. Furthermore, the heterostructure formed at various oxygen pressures resulted in structures with different current values. An STO/KNO heterostructure was also grown on the STO substrate, without using the buffered oxide etchant (BOE) treatment, so as to confirm the effects of the polar catastrophe mechanism. An STO/KNO heterostructure grown on an STO substrate without BOE treatment did not exhibit conductivity. Therefore, we expect that the mechanics of 2DEGs in the STO/KNO heterostructures are governed by the oxygen vacancy mechanism and the polar catastrophe mechanism.

Characterization of BST Thin Films using MgO(100) Buffer Layer for Tunable Device

  • Lee Cheol-In;Kim Kyoung-Tae;Kim Chang-Il
    • Transactions on Electrical and Electronic Materials
    • /
    • v.7 no.2
    • /
    • pp.67-71
    • /
    • 2006
  • In this paper, we have investigated the structure and dielectric properties of the $(Ba_{0.6}Sr_{0.4})TiO_3$ (BST) thin films fabricated on MgO(100)/Si substrate by an alkoxide-based sol-gel method. Both the structure and morphology of those films were analyzed by x-ray diffraction (XRD) and atomic force microscope (AFM). For the MgO(100)/Si substrate, the BST thin films exhibited highly (100) orientation. The highly (100)-oriented BST thin films showed high dielectric constant, tunability, and figure of merit (FOM). The dielectric constant, dielectric loss and tunability of the BST thin films annealed at $700^{\circ}C$ deposited on the MgO(100)/Si substrate measured at 10 kHz were 515.9, 0.0082, and 54.3%, respectively.