• Title/Summary/Keyword: $SF_6$/N2 Mixture

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The Dependence on the Gas Pressure in SF6 Molecular Gas (SF6분자가스의 압력 의존도)

  • Jeon, Byung-Hoon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.20 no.9
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    • pp.816-820
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    • 2007
  • We measured the electron drift velocity, W, in 0.5% $SF_6-Ar$ mixture over the E/N range from 30 Td to 300 Td and gas pressure range from 0.1 to 0.5 Torr by the double shutter drift tube with a variable drift distance, and calculated over the same E/N and gas pressure range by using the two-term approximation of the Boltzmann equation. The measured and calculated values at different gas pressure at each E/N was appreciable dependence in the results on the gas pressure.

Study on the Gas Separation of Carbon Molecular Sieve (CMS) Membrane for Recovering the Perfluorocompound Gases from the Electronics Industry (전자산업 배출 불화가스 회수를 위한 탄소분자체 분리막의 기체분리 연구)

  • Jeong, Su Jung;Lim, Joo Hwan;Han, Sang Hoon;Koh, Hyung Chul;Ha, Seong Yong
    • Membrane Journal
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    • v.26 no.3
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    • pp.220-228
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    • 2016
  • Carbon molecular sieve (CMS) hollow fiber membranes were prepared by carbonizing a polyimide precursor manufactured by non-solvent induced phase separation process. Gas separation performance of CMS hollow fiber membrane was investigated on the effect of three carbonization conditions. CMS membrane with the highest gas separation performance was obtained at the pyrolysis temperature of $250-450^{\circ}C$: $N_2$, $SF_6$, and $CF_4$ permeance were 20, 0.32, 0.48 GPU, respectively, and $N_2/SF_6$ and $N_2/CF_4$ selectivities were 62 and 42, respectively. In the $SF_6/CF_4/N_2$ mixture gas test, when the stage cut was 0.2, the recovery ratio of $SF_6$ and $CF_4$ was over 99% and 98%. $SF_6$ concentration ratio was 4.5 times higher than the $SF_6$ concentration at the feed side. From the results, it was concluded that CMS membrane was one of the promising membranes for recovery Perfluorocompound gases process.

The Study of the insulation Charateristic in $SF_6$+$N_2$ mixture gas ($SF_6$+$N_2$ 혼합기체의 절연특성에 관한 연구)

  • 박명진;전병훈;하성철
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.592-595
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    • 2000
  • The electron transport coefficients in $SF_6$+$N_2$ gas is analyzed in range of E/P values from 70~240(V/cm $Torr^{-1}$) at 2$0^{\circ}C$ by Boltzmann method that using set of electron collision cross sections determined by authors. The result of this Boltzmann simulation such as ionisation coefficient, attachment coefficient, effective ionisation coefficient and breakdown voltage are in nearly agreement with the respective experimental and theoretical for a range of E/P.

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Development of Synthetic Zeolites from Scoria for Pesticides Removal in the Golf Course (송이로부터 골프장 농약 제거를 위한 합성 제올라이트의 개발)

  • 감상규;안병준;주창식;이민규
    • Journal of Environmental Science International
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    • v.10 no.6
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    • pp.451-459
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    • 2001
  • Adsorption characteristics of triadimefon and diniconazole(pesticide) by natural zeolite($CLI_N$) and several synthetic zeolites were Investigated. The synthetic zeolites used En this study were as follows: Faujasite synthesized from coal fly ash($FAU_F$); Zeolite synthesized from the mixture of FAU and Na-Pl synthesized from the ratio of Cheju scoria 6 to coal fly ash 4 by weight($(FAU + Na-Pl)_{SF}$); waste fluid catalytic cracking catalyst($FCC_W$). The distribution coefficient, $K_D$ and Freundlich constant, $K_F$ decreased in the fellowing sequence : $FCC_W > FAU_F > (FAU + Na-Pl)_{SF} >CLI_N$ among the zeolites. The distribution coefficient and the adsorption capacity of $(FAU + Na-Pl)_{SF}$ for pesticides were 4.4 and 2.6 times higher for triamefon, and 2.0 and 2.4 times higher for diniconazole than those of $CLI_N$, respectively.

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Surface Flashover Characteristics on Poor Contact in N2/O2 Mixture Gas under Non-Uniform Field (불평등 전계 중 불량 접촉갭에 관한 N2/O2 혼합가스의 연면플래쉬오버특성)

  • Lim, Dong-Young;Choi, Eun-Hyeok;Choi, Sang-Tae;Choi, Byoung-Ju;Lee, Kwang-Sik;Bae, Sungwoo
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.29 no.8
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    • pp.63-69
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    • 2015
  • This paper presents the surface flashover characteristics to simulate the poor contact between an anode and a solid dielectric in a $N_2/O_2$ mixture gas (8/2) under a non-uniform field. The surface flashover voltage of the $N_2/O_2$ mixture gas revealed the irregular tendency that was not in accordance with the Paschen's law with an increasing gap of the poor contact. In addition, the insulation performance of the $N_2/O_2$ mixture gas at 0.6MPa was comparable to that of $SF_6$ gas of 0.1MPa based on the insulation performance on the poor contact. These results are able to apply the insulation design of eco-friendly gas insulation switchgear considering the internal faults.

Surface Discharge Characteristics in Different Media (이종절연재의 연면절연특성)

  • Shin, Sung-Ha
    • Journal of the Korean Society of Industry Convergence
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    • v.15 no.2
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    • pp.49-54
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    • 2012
  • With the improvement of industrial society, the high quality electrical energy, simplification of operation and maintenance, ensuring reliability and safety are being required. This paper reviews a basic data of the surface discharge characteristics for teflon resin in not only pure $N_2$, $N_2:O_2$ mixture gas and Dry-Air as being focused on environmentally friendly insulating Gas also $SF_6$. Used electrodes are Knife to Knife. With the changing distance of electrodes and pressure, we can find it, surface discharge voltages and surface dielectric strengths, respectively. Surface discharge Voltages of $N_2:O_2=80:20$ mixture gas are more higher than the $N_2:O_2$ Mixture gases.

SLI, AC Breakdown Voltage Characteristics of $SF_6/CF_4$ Mixtures Gas in Nonuniform Field (불평등전계에서 $SF_6/CF_4$ 혼합 가스의 SLI, AC 절연내력 특성)

  • Hwang, Cheong-Ho;Sung, Heo-Gyung;Huh, Chang-Su
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.57 no.2
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    • pp.245-251
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    • 2008
  • Although many studies have been carried out about binary gas mixtures with $SF_6$, few studies were presented about breakdown characteristics of $SF_6/CF_4$ mixtures. At present study the breakdown characteristics of $SF_6/CF_4$ mixtures in non-uniform field was performed. The experiments were carried out under AC voltage and standard lightning impulse(SLI) voltage. Breakdown characteristics were investigated for $SF_6/CF_4$ mixtures when AC voltages and standard lighting impulse voltage was applied in a needle-plane. The needle-plane electrode whose gap distance was 3 mm were used in a test chamber. $SF_6/CF_4$ mixtures contained from 0 to 100% $SF_6$ and the experimental gas pressure ranged from 0.1 to 0.5 MPa. The breakdown characteristics of $SF_6/CF_4$ mixtures in non-uniform field may be influenced by defects like needle-shaped protrusions. In case of slowly rising SLI voltage and AC voltage it is enhanced by corona-stabilization. This phenomena caused by the ion drift during streamer development and the resulting space-charge is investigated. In non-uniform field under negative SLI voltage the breakdown voltage was increase linearly but under positive SLI voltage the breakdown voltage increase non-linearly. The breakdown voltage in needle-plane electrode displayed N shape characteristics for increasing the content of $SF_6$ at AC voltage. $SF_6/CF_4$ mixture has good dielectric strength and arc-extinguishing properties than pure SF6. This paper presents experimental results on breakdown characteristics for various mixtures of $SF_6/CF_4$ at practical pressures. We could make an environment friendly gas insulation material with maintaining dielectric strength by combing $SF_6\;and\;CF_4$ which generates a lower lever of the global warming effect.

Analysis of Insulating Characteristics of Cl2-He Mixture Gases in Gas Discharges

  • Tuan, Do Anh
    • Journal of Electrical Engineering and Technology
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    • v.10 no.4
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    • pp.1734-1737
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    • 2015
  • Insulating characteristics of Cl2-He mixture gases in gas discharges were analysed to evaluate ability of these gases for using in medium voltage and many industries. These are electron transport coefficients, which are the electron drift velocity, density-normalized longitudinal diffusion coefficient, and density-normalized effective ionization coefficient, in Cl2-He mixtures. A two-term approximation of the Boltzmann equation was used to calculate the electron transport coefficients for the first time over a wide range of E/N (ratio of the electric field E to the neutral number density N). The limiting field strength values of E/N, (E/N)lim, for these binary gas mixtures were also derived and compared with those of the pure SF6 gas.

Surface Discharge Characteristics of Solid Dielectrics in N2/O2 Mixture Gas for Eco-Friendly Insulation Design (친환경 절연설계를 위한 N2/O2 혼합가스 중 고체유전체 종류에 따른 연면방전특성)

  • Lim, Dong-Young;Park, He-Rie;Choi, Eun-Hyeok;Choi, Sang-Tae;Lee, Kwang-Sik
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.26 no.3
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    • pp.9-15
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    • 2012
  • In this paper, we deal with a surface discharge that caused an aggravation of the dielectric strength in the $N_2/O_2$ mixture gas, When composit dielectrics were formed from the use of a solid dielectric. It was found from this study that the surface discharge voltage was deeply involved in the mixture ratio of $O_2$, the electrical property of the solid dielectric, kind of the solid dielectric, an electric field at the triple junction and a medium effect. These results expect basic data that will be used to transmission and distribution power system equipment using the $N_2/O_2$ mixture gas.

ICP ETCHING OF TUNGSTEN FOR X-RAY MASKS

  • Jeong, C.;Song, K.;Park, C.;Jeon, Y.;Lee, D.;Ahn, J.
    • Journal of the Korean institute of surface engineering
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    • v.29 no.6
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    • pp.869-875
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    • 1996
  • In this article the effects of process parameters of inductively coupled plasma etching with $SF_6$ /$N_2$/Ar mixture gas and mask materials on the etched profile of W were investigated. While the etched profile was improved by $N_2$-addition, low working presure, and reduced $SF_6$ flow rate, the etching selectity (W against SAL resist) was decreased. Due to the difficulty of W etching with single layer resist, sputter deposited $Al_2O_3$ film was used as a hardmask. Reduction of required EB resist thickness through $Al_2O_3$ mask application could reduce proximity effect during e-beam patterning, but the etch anisotropy was degraded by decreased sidewall passiviation effect.

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