• 한국연소학회지
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• 제18권4호
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• pp.12-20
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• 2013

The ignition delay time is an important factor to understand the combustion characteristics of internal combustion engine. In this study, ignition delay times of cool and thermal flame were observed separately in homogeneous charge compression ignition(HCCI) engine. This study presents numerical investigation of ignition delay time of n-heptane and alcohol(ethanol and n-butanol) binary fuel. The $O_2$ concentration in the mixture was set 9-10% to simulate high exhaust gas recirculation(EGR) rate condition. The numerical study on the ignition delay time was performed using CHEMKIN codes with various blending ratios and EGR rates. The results revealed that the ignition delay time increased with increasing the alcohol fraction in the mixture due to a decrease of oxidation of n-heptane at the low temperature. From the numerical analysis, ethanol needed more radical and higher temperature than n-butanol for oxidation. In addition, thermal ignition delay time is sharply increasing with decreasing $O_2$ fraction, but cool flame ignition delay time changes negligibly for both binary fuels. Also, in high temperature regime, the ignition delay time showed similar tendency with both blends regardless of blending ratio and EGR rate.

• 에너지공학
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• 제6권2호
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• pp.203-211
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• 1997

본 연구에서는 지구 온난화 연소폐가스를 모델로 한 $CO_2$-$N_2$혼합 기체의 화학흡수법에 의한 기체 분리 실험을 행하였다. 반회분식 기포부상 반응 장치를 이용하여 최적흡수액의 조건을 탐색하였고, 충진 흡수탑을 이용하여 흡수 속도를 측정, 실험 결과를 이론적 예측값과 비교.분석하여 흡수현상에 대한 적절한 해석을 하고자 하였다. 본 실험에 사용한 흡수제는 Monoethanolamine(MEA)이었고, 대상 기체는 화력발전소의 연소배가스의 주요성분이 $N_2$79%, $CO_2$15%, $O_2$4%인바, $N_2$: $CO_2$가 몰비 85:15의 비율인 모델가스를 혼합기체로 사용하였다. 실험조건하에서 $CO_2$loading과 $CO_2$제거율을 측정하였고, 흡수속도를 구하기 위하여 Enhancement factor를 도입하고 Film 모델과 Higbie 모델을 적용하였다. 흡수액의 최적농도는 4-5 M인 것으로 나타났으며. Higbie model에 의한 흡수속도 예측은 실측치와 잘 일치하여 연소폐가스 중의 고농도 $CO_2$가스의 흡수에 적용이 가능한 것으로 나타났다.

• Transactions on Electrical and Electronic Materials
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• 제12권4호
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• pp.169-173
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• 2011

In this study, Al-N codoped p-type zinc oxide (ZnO) thin films were deposited on Si and homo-buffer layer templates in a mixture of $N_2$ and $O_2$ gas with ceramic ZnO:(2 wt% $Al_2O_3$) as a sputtering target using DC- magnetron sputtering. X-ray diffraction spectra of two-theta diffraction showed that all films have a predominant (002) peak of ZnO Wurtzite structure. As the $N_2$ fraction in the mixed $N_2$ and $O_2$ gases increased, field emission secondary electron microscopy revealed that the surface appearance of codoped films on Si varied from smooth to textured structure. The p-type ZnO thin films showed carrier concentration in the range of $1.5{\times}10^{15}-2.93{\times}10^{17}\;cm^{-3}$, resistivity in the range of 131.2-2.864 ${\Omega}cm$, and mobility in the range of $3.99-31.6\;cm^2V^{-1}s^{-1}$ respectively.

• Transactions on Electrical and Electronic Materials
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• 제13권6호
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• pp.287-291
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• 2012

We investigated the etching characteristics of TaN thin films in an $O_2/BCl_3/Cl_2/Ar$ gas using a high density plasma (HDP) system. A maximum etch rate of the TaN thin films and the selectivity of TaN to $SiO_2$ were obtained as 172.7 nm/min and 6.27 in the $O_2/BCl_3/Cl_2/Ar$ (3:2:18:10 sccm) gas mixture, respectively. At the same time, the etch rate was measured as a function of the etching parameters, such as the RF power, DC-bias voltage, and process pressure. The chemical states on the surface of the etched TaN thin films were investigated using X-ray photoelectron spectroscopy. Auger electron spectroscopy was used for elemental analysis on the surface of the etched TaN thin films. These surface analyses confirm that the surface of the etched TaN thin film is formed with the nonvolatile by-product.

• 한국재료학회지
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• 제30권4호
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• pp.169-175
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• 2020

Silicon nitride thin films are deposited by RF (13.57 MHz) magnetron sputtering process using a Si (99.999 %) target and with different ratios of Ar/N₂ sputtering gas mixture. Corning G type glass is used as substrate. The vacuum atmosphere, RF source power, deposit time and temperature of substrate of the sputtering process are maintained consistently at 2 ~ 3 × 10^-3 torr, 30 sccm, 100 watt, 20 min. and room temperature, respectively. Cross sectional views and surface morphology of the deposited thin films are observed by field emission scanning electron microscope, atomic force microscope and X-ray photoelectron spectroscopy. The hardness values are determined by nano-indentation measurement. The thickness of the deposited films is approximately within the range of 88 nm ~ 200 nm. As the amount of N₂ gas in the Ar:N₂ gas mixture increases, the thickness of the films decreases. AFM observation reveals that film deposited at high Ar:N₂ gas ratio and large amount of N₂ gas has a very irregular surface morphology, even though it has a low RMS value. The hardness value of the deposited films made with ratio of Ar:N₂=9:1 display the highest value. The XPS spectrum indicates that the deposited film is assigned to non-stoichiometric silicon nitride and the transmittance of the glass with deposited SiO₂-Si_xN_y thin film is satisfactory at 97 %.

• 한국연소학회:학술대회논문집
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• 한국연소학회 2014년도 제49회 KOSCO SYMPOSIUM 초록집
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• pp.195-198
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• 2014

$Fuel/N_2$ and fuel/air mixtures were treated with non-thermal DBD plasma and the changes in characteristics of laminar diffusion flame have been observed. Flame of $Fuel/N_2$ mixture generated more soot under plasma condition while less amount of soot was formed from fuel/air mixture flame. Luminescence spectrum and gas chromatography results confirmed that plasma energy converts a fraction of fuel molecules into radicals, which then form $C_2$, $C_3$, $C_4$ and higher hydrocarbon under no oxygen condition or turn into CO, $CO_2$ and $H_2O$ when oxygen is present.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2009년도 제40회 하계학술대회
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• pp.1400_1401
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• 2009

In this paper describes the comparisons of the surface flashover characteristics according to the change of the insulation media by experimental GIS(Gas Insulated Switchgear) chamber in accordance with change of pressure(P) and electrode distance(d). The using insulation medias are $SF_6$, Dry-Air, I-Air(Imitation Air, $N_2$ : $O_2$ = 79[%] : 21[%]), $N_2:O_2$ mixture gas and pure $N_2$. In this study, in order to compare the properties $SF_6$ and order insulation gas, we investigated the properties of the various insulation media with a knife to knife electrode under ac high voltage application. The gas pressure was changed from 1 to 5[atm]. as a result, it was found that dielectric strength is $SF_6$ > I-Air > Dry-Air and the best environmental preservation gas is Dry-Air.

• 한국세라믹학회지
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• 제43권10호
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• pp.595-600
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• 2006

The preparation of $\beta$-SiAlON powder by SHS in the system of $Si-Al-SiO_2-NH_4F(\beta-Si_3N_4)$ was investigated in this study. In the preparation of SiAlON powder, the effect of gas pressure, compositions such as Si, $NH_4F$, \beta-Si_3N_4$ and additive in mixture on the reactivity were investigated. At 50 atm of the initial inert gas pressure in reactor, the optimum composition for the preparation of pure $\beta$-SiAlON was $3Si+Al+2SiO_2+NH_4F$. The $\beta$-SiAlON powder synthesized in this condition was a single phase $\beta$-SiAlON with a rod like morphology.

• Journal of Mechanical Science and Technology
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• 제15권6호
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• pp.752-763
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• 2001

Although there are many different solution schemes proposed for multidimensional radiative transfer, reference solutions to benchmark these methods are very rare in the literature. In this paper we produced some accurate solutions for purely absorbing gray and nongray gases including H$_2$O and CO$_2$by using the discrete transfer method with sufficiently accurate T(sub)95 quadrature set. The spectral transmittances of the mixtures of H$_2$O and CO$_2$are estimated by using the narrow band model. The gray gas solutions are obtained for different absorption coefficients, and the nongray real gas solutions are obtained for different mixture fractions of H$_2$O and CO$_2$. The numerical solutions presented in this paper are proved to be sufficiently accurate as compared to the available exact solutions and they may be used as reference solutions in evaluating various solution schemes.

• 한국가스학회지
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• 제4권2호
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• pp.1-6
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• 2000

가스중에 포함되어 있는 NOx를 안전하게 처리하기 위하여 침상전극을 취부한 플라즈마 반응기를 제작하여 장치의 특성을 실험적으로 조사하여 유효성을 검정하였다. 반응가스는 $NO/N_2$ 혼합가스와 $N_2/O_2$ 혼합가스를 이용하여 초기 NO농도를 설정하고, 유속을 2${\iota}$/min으로 공급하였다. NOx의 반응특성은 방전주입전력이 높을때는 NO의 농도가 감소하였으며, 산소의 농도 증가시에 NO의 분해가 용이하고 NO의 분해에너지 효율이 높았다. 또한 NO의 농도가 증가할 수록 NO의 분해에너지 효율은 높으나 분해율은 낮았다. 오존의 특성은 방전주입전력이 높을수록 오존의 생성이 증가하고, $NO/N_2$의 농도가 증가할 수록 오존의 생성량이 감소하였다.