• Title/Summary/Keyword: $In_xGa_{1-x}N$/GaN

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0.25 μm AlGaN/GaN HEMT Devices and 9 GHz Power Amplifier (0.25 μm AlGaN/GaN HEMT 소자 및 9 GHz 대역 전력증폭기)

  • Kang, Dong-Min;Min, Byoung-Gue;Lee, Jong-Min;Yoon, Hyung-Sup;Kim, Sung-Il;Ahn, Ho-Kyun;Kim, Dong-Young;Kim, Hae-Cheon;Lim, Jong-Won;Nam, Eun-Soo
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.27 no.1
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    • pp.76-79
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    • 2016
  • This paper describes the successful development and the performance of X-band 50 W pulsed power amplifier using a 50 W GaN-on-SiC high electron mobility transistor. The GaN HEMT with a gate length of $0.25{\mu}m$ and a total gate width of 12 mm were fabricated. The X-band pulsed power amplifier exhibited an output power of 50 W with a power gain of 6 dB in a frequency range of 9.2~9.5 GHz. It also shows a maximum output power density of 4.16 W/mm. This 50 W GaN HEMT and X-band 50 W pulsed power amplifier are suitable for the radar systems and related applications in X-band.

Influences of the Composition on Spectroscopic Characteristics of AlxGa1-xN Thin Films (AlxGa1-xN 박막의 조성이 분광학적 특성에 미치는 영향)

  • Kim, Dae Jung;Kim, Bong Jin;Kim, Duk Hyeon;Lee, Jong Won
    • New Physics: Sae Mulli
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    • v.68 no.12
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    • pp.1281-1287
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    • 2018
  • In this study, $Al_xGa_{1-x}N$ films were grown on (0001) sapphire substrates by using metal-organic chemical vapor deposition (MOCVD). The crystallinity of the grown films was examined with X-ray diffraction (XRD) patterns. The surfaces and the chemical properties of the $Al_xGa_{1-x}N$ films were investigated using atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS), respectively. The optical properties of the $Al_xGa_{1-x}N$ film were studied in a wide photon energy range between 2.0 ~ 8.7 eV by using spectroscopic ellipsometry (SE) at room temperature. The data obtained by using SE were analyzed to find the critical points of the pseudodielectric function spectra, $<{\varepsilon}(E)>=<{\varepsilon}_1(E)>+i<{\varepsilon}_2(E)>$. In addition, the second derivative spectra, $d^2<{\varepsilon}(E)>/dE^2$, of the pseudodielectric function for the $Al_xGa_{1-x}N$ films were numerically calculated to determine the critical points (CPs), such as the $E_0$, $E_1$, and $E_2$ structure. For the four samples (x = 0.18, 0.21, 0.25, 0.29) between a composition of x = 0.18 and x = 0.29, changes in the critical points (blue-shifts) with increasing Al composition at 300 K for the $Al_xGa_{1-x}N$ film were observed via ellipsometric measurements for the first time.

Effects of Ga Substitution in LaFe1-xGaxO3 (χ= 0, 0.1, 0.3, 0.5, and 0.7)

  • Yoon, Sung-Hyun;Park, Seung-Jin;Cha, Deok-Joon;Min, Byung-Ki;Kim, Chul-Sung
    • Journal of Magnetics
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    • v.7 no.2
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    • pp.40-44
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    • 2002
  • Crystallographic and magnetic properties of ;$LaFe_{1-x}Ga_xO_3$($\chi$= 0, 0.1, 0.3, 0.5, and 0.7) were studied using XRD and Mossbauer spectroscopy. The crystal structures were found to be orthorhombic and the lattice parameters $\alpha$, b, and c were found to decrease with increasing Ga substitution. M$\ddot{o}$ssbauer spectra were obtained at various absorber temperatures ranging from 20 K to 750 K. The M$\ddot{o}$ssbauer spectra were all sextets below $T_N$ and were all singlets above $T_N$. Asymmetric broadening of the M$\ddot{o}$ssbauer spectral lines at 20 K was explained by the multitude of possible environments for an iron nucleus. As the temperature increases to $T_N$, a systematic line broadening in M$\ddot{o}$ssbauer spectra was observed and interpreted to originate from different temperature dependencies of the magnetic hyperfine fields at various iron sites.

Growth features and nucleation mechanism of Ga1-x-yInxAlyN material system on GaN substrate

  • Simonyan, Arpine K.;Gambaryan, Karen M.;Aroutiounian, Vladimir M.
    • Advances in nano research
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    • v.5 no.4
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    • pp.303-311
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    • 2017
  • The continuum elasticity model is applied to investigate quantitatively the growth features and nucleation mechanism of quantum dots, nanopits, and joint QDs-nanopits structures in GaInAlN quasyternary systems. We have shown that for GaInAlN material system at the critical strain of ${\varepsilon}^*=0.039$ the sign of critical energy and volume is changed. We assume that at ${\varepsilon}={\varepsilon}^*$ the mechanism of the nucleation is changed from the growth of quantum dots to the nucleation of nanopits. Obviously, at small misfit (${\varepsilon}$ < ${\varepsilon}^*$), the bulk nucleation mechanism dominates. However, at ${\varepsilon}$ > ${\varepsilon}^*$, when the energy barrier becomes negative as well as a larger misfit provides a low-barrier path for the formation of dislocations, the nucleation of pits becomes energetically preferable. The free energy of mixing for $Ga_{1-x-y}In_xAl_yN$ quasiternary system was calculated and studied and its 3D sketch was plotted.

Quantitative Ga-67 Scintigraphy in patients with Silicosis: Comparison with Chest X-ray and Pulmonary Function (규폐증에서 Gallium-67 신티그라피의 정량적인 분석: 흉부 X-선과 폐기능검사와의 비교)

  • Shin, Kwang-Hyun;Sohn, Hyung-Sun;Chung, Yong-An
    • The Korean Journal of Nuclear Medicine
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    • v.33 no.4
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    • pp.381-387
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    • 1999
  • Purpose: The International Labor Organization (ILO) has established an international standard for chest X-ray diagnosis of pneumoconiosis since 1980. However, there is a need for improved diagnosis and staging in occupational disease. We evaluated Ga-67 citrate scintigraphy quantitatively and correlated the scintigraphic findings with pulmonary function tests and chest X-ray results. Materials and Methods: Twenty-five patients underwent whole body scintigraphy with additional chest and abdomen images 48 hrs after intravenous injection of 185 MBq of Ga-67 citrate. Ten normal controls were also studied. Regions of interest (ROI) were drawn on the posterior image to measure counts from the liver and lungs (Lung/Liver Ratio). Results: L/L ratio according to the stages of chest X-ray classification were as follows; stage 0 (normal, n=10): $0.3948{\pm}0.0692$, stage 1 (n=10): $0.5763{\pm}0.1537$, stage 2 (n=11), $0.6849{\pm}0.1459$, stage 3 (n=4) $0.9913{\pm}0.0712$. There was a significant correlation between the scintigraphic L/L ratio and the X-ray stage (r=0.618, p<0.05). However, no significant correlation between L/L ratio and pulmonary function tests were observed (p>0.05). Conclusion: Quantitative Ga-67 scintigraphy can be a useful method for staging of silicosis. However, it is not a method to assess pulmonary functional impairment.

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A 20 W GaN-based Power Amplifier MMIC for X-band Radar Applications

  • Lee, Bok-Hyung;Park, Byung-Jun;Choi, Sun-Youl;Lim, Byeong-Ok;Go, Joo-Seoc;Kim, Sung-Chan
    • Journal of IKEEE
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    • v.23 no.1
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    • pp.181-187
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    • 2019
  • In this paper, we demonstrated a power amplifier monolithic microwave integrated circuit (MMIC) for X-band radar applications. It utilizes commercial $0.25{\mu}m$ GaN-based high electron mobility transistor (HEMT) technology and delivers more than 20 W of output power. The developed GaN-based power amplifier MMIC has small signal gain of over 22 dB and saturated output power of over 43.3 dBm (21.38 W) in a pulse operation mode with pulse width of $200{\mu}s$ and duty cycle of 4% over the entire band of 9 to 10 GHz. The chip dimensions are $3.5mm{\times}2.3mm$, generating the output power density of $2.71W/mm^2$. Its power added efficiency (PAE) is 42.6-50.7% in the frequency bandwidth from 9 to 10 GHz. The developed GaN-based power amplifier MMIC is expected to be applied in a variety of X-band radar applications.

Growth and Characterization of I $n_{x}$G $a_{1-x}$N Epitaxial Layer for Blue Light Emitter (청색발광소자를 위한 I $n_{x}$G $a_{1-x}$N 결정성장 및 특성평가)

  • 이숙헌;이제승;허정수;이병규;이승하;함성호;이용현;이정희
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.35D no.8
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    • pp.15-23
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    • 1998
  • Single crystalline I $n_{x}$G $a_{1-x}$ N thin film was grwon by MOCVD on (001) sapphire substrate for the blue light emitting devices. A good quality of I $n_{0.13}$G $a_{0.87}$N/GaN heterostructure grwon above 700.deg. C was confiremed by various characterization techniques of AFM, RHEED and DC-XRD. Through PL measurement at room temperautre for the Si-Zn co-doped I $n_{x}$G $a_{a-x}$N/GaN structure grwon at 800.deg. C to obtain blue wavelength emission, 460-470 nm and 425 nm emission peak were observed, which are believed to be from donor-to-acceptor pair transition and band edge emission of In/x/G $a_{1-x}$ N, respectively. The result of PL measurement of the undoped MQW I $n_{x}$G $a_{1-x}$ N layer at low temperature confirmed that the strong MQW peak was resulted by exciton from the GAN barrier and carrier of DA pair confined into the well layer.ll layer.yer.r.

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non-polar a-plane GaN growth on r-plane sapphire substrate by MOCVD

  • Son, Ji-Su;Baek, Kwang-Hyun;Kim, Ji-Hoon;Song, Hoo-Young;Kim, Tae-Geun;Hwang, Sung-Min
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.229-229
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    • 2010
  • We report a high crystalline nonpolar a-plane (11-20) GaN on r-plane (1-102) sapphire substrates with $+0.15^{\circ}$, $-0.15^{\circ}$, $+0.2^{\circ}$, $-0.2^{\circ}$ and $+0.4^{\circ}$ misoriented by metalorganic chemical-vapor deposition (MOCVD). The multi-quantum wells (MQWs) active region is consists of 5 periods the nonpolar a-plane InGaN/GaN (a-InGaN/GaN) on a high quality a-plane GaN (a-GaN) template grown by using the multibuffer layer technique. The full widths at half maximum (FWHMs) of x-ray rocking curve (XRC) obtained from phiscan of the specimen that was grown up to nonpolar a-plane GaN layers with double crystal x-ray diffraction. The FWHM values of $+0.4^{\circ}$ misoriented sapphire substrate were decreased down to 426 arc sec for $0^{\circ}$ and 531 arc sec for $-90^{\circ}$, respectively. Also, the samples were characterized by photoluminescence (PL).

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Single-phase Gallium Nitride on Sapphire with buffering AlN layer by Laser-induced CVD

  • Hwang Jin-Soo;Lee Sun-Sook;Chong Paul-Joe
    • Bulletin of the Korean Chemical Society
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    • v.15 no.1
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    • pp.28-33
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    • 1994
  • The laser-assisted chemical vapor deposition (LCVD) is described, by which the growth of single-phase GaN epitaxy is achieved at lower temperatures. Trimethylgallium (TMG) and ammonia are used as source gases to deposit the epitaxial films of GaN under the irradiation of ArF excimer laser (193 nm). The as-grown deposits are obtained on c-face sapphire surface near 700$^{\circ}$C, which is substantially reduced, relative to the temperatures in conventional thermolytic processes. To overcome the lattice mismatch between c-face sapphire and GaN ad-layer, aluminum nitride(AlN) is predeposited as buffer layer prior to the deposition of GaN. The gas phase interaction is monitored by means of quadrupole mass analyzer (QMA). The stoichiometric deposition is ascertained by X-ray photoelectron spectroscopy (XPS). The GaN deposits thus obtained are characterized by X-ray diffractometer (XRD), scanning electron microscopy (SEM) and van der Pauw method.

The properties of AlGaN epi layer grown by HVPE (HVPE에 의해 성장된 AlGaN epi layer의 특성)

  • Jung, Se-Gyo;Jeon, Hun-Soo;Lee, Gang-Seok;Bae, Seon-Min;Yun, Wi-Il;Kim, Kyoung-Hwa;Yi, Sam-Nyung;Yang, Min;Ahn, Hyung-Soo;Kim, Suck-Whan;Yu, Young-Moon;Cheon, Seong-Hak;Ha, Hong-Ju
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.22 no.1
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    • pp.11-14
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    • 2012
  • The AlGaN layer has direct wide bandgaps ranging from 3.4 to 6.2 eV. Nowadays, it is becoming more important to fabricate optical devices in an UV region for the many applications. The high quality AlGaN layer is necessary to establish the UV optical devices. However, the growth of AlGaN layer on GaN layer is difficult due to the lattice mismatch and difference thermal expansion coefficient between GaN layer and AlGaN layer. In this paper, we attempted to grow the LED structure on GaN template by mixed-source HVPE method with multi-sliding boat system. We tried to find the optical and lattice transition of active layer by control the Al content in mixed-source. For the growth of epi layer, the HCl and $NH_3$ gas were flowed over the mixed-source and the carrier gas was $N_2$. The temperature of source zone and growth zone was stabled at 900 and $1090^{\circ}C$, respectively. After the growth, we performed the x-ray diffraction (XRD) and electro luminescence (EL) measurement.