• 한국표면공학회지
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• 제51권6호
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• pp.344-353
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• 2018

Plasma electrolytic oxidation of Ti-25Ta-xHf alloy in electrolyte containing Ca and P for dental implants was investigated using various experimental techniques. Ti-25Ta-xHf (x=0 and 15 wt.%) alloys were manufactured in an arc-melting vacuum furnace. Micropores were formed in PEO films on Ti-25Ta-xHf alloys in 0.15 M calcium acetate monohydrate + 0.02 M calcium glycerophosphate at 240 V, 270 V and 300 V for 3 min, respectively. The microstructure of Ti-25Ta-xHf alloys changed from (${\alpha}^{\prime}+{\alpha}^{{\prime}{\prime}}$) phase to (${\alpha}^{{\prime}{\prime}}+{\beta}$) phase by addition of Hf. As the applied potential increased, the number of pore and the area ratio of occupied by micro-pore decreased, whereas the pore size increased. The anatase phase increase as the applied potential increased. Also, the crystallite size of anatase-$TiO_2$ can be controlled by applied voltage.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2007년도 제38회 하계학술대회
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• pp.1351-1352
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• 2007

$ZrO_2$ 와 $HfO_2$ 박막에 이온 주입을 거친 후 열처리 과정을 통해 Ge 나노입자를 형성시켜 MOS 커패시터를 제작하였다. C-V 곡선에서는 반시계 방향의 hysteresis가 관찰되었으며, $ZrO_2$ MOS 커패시터에서는 -9 V에서 9 V까지 전압변화를 주었을 때 3 V 정도의 메모리 윈도우가 나타남을 확인 할 수 있었다. 또한, $HfO_2$ MOS 커패시터에서는 -10 V에서 10 V까지 전압변화를 주었을 때 3.45 V의 메모리 윈도우를 관찰 할 수 있었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.378-378
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• 2010

We report the electronic structure of CoFeO-R (R=Hf, La, Nb) thin films studied by x-ray absorption spectroscopy (XAS). These ferrites thin films were prepared by pulsed laser deposition method and characterized by XAS measurements at O K-, Co and Fe L-edges. The O K-edge spectra suggest that there is a strong hybridization between O 2p and 3d electrons of transition metal cations and Fe $L_{3,2}$-edge spectra indicate that Fe-ions exist in $Fe^{2+}$ with tetrahedral site of the spinel structure. Divalent Co ions is also distributed in tetrahedral site with rare earth ions goes to octahedral sites of spinel structure. X-ray magnetic circular dichroism (XMCD) is also used to explain the symmetry and magnetic nature dependence on rare-earth ions.

• 한국재료학회지
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• 제16권4호
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• pp.248-252
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• 2006

An investigation is reported on the coating of ZnS:Cu,Cl phosphors by $HfO_2$ using atomic layer deposition method. Hafnium oxide films were prepared at the chamber temperature of $280^{\circ}C$ using $Hf[N(CH_3)_2]_4\;and\;O_2$ as precursors and reactant gas, respectively. XPS and ICP-MS analysis showed the surface composition of coated phosphor powder was hafnium oxide. In FE-SEM analysis, the surface morphology of uncoated phosphors became smoother and clearer as the number of ALD cycle increased from 900 to 1800. The photoluminescence intensity for coated phosphors showed $7.3{\sim}13.4%$ higher than that of uncoated. The effect means that the reactive surface is uniformly coated with stable hafnium oxide to reduce the dead surface layer without change of bulk properties and also its absorptance is almost negligible due to ultrathin(nano-scaled) films. The growth rate is about $1.1{\AA}/cycle$.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제36회 동계학술대회 초록집
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• pp.269.1-269.1
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• 2009

• 한국정보통신학회논문지
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• 제19권12호
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• pp.2899-2904
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• 2015

3차원 순차적 집적회로에서 열에 의한 손상으로 생성되는 계면 포획 전하가 트랜지스터의 드레인 전류-게이트 전압 특성에 미치는 영향을 소개한다. 2차원 소자 시뮬레이터를 이용해서 산화막 층에 계면 포획 전자 분포를 추출한 결과를 설명한다. 이 계면 포획 전자분포를 고려한 3차원 순차적 집적회로에서 Inter Layer Dielectric (ILD)의 길이에 따른 하층 트랜지스터의 게이트 전압의 변화에 따라서 상층 트랜지스터의 문턱전압 $V_{th}$의 변화량에 대해서 소개한다. 상대적으로 더 늦은 공정인 상층 $HfO_2$층 보다 하층 $HfO_2$층과 양쪽 $SiO_2$층이 열에 의한 영향을 더 많이 받았다. 계면 포획 전하 밀도 분포를 사용하지 않았을 때 보다 사용 했을 때 $V_{th}$ 변화량이 더 적게 변하는 것을 확인 했다. 3차원 순차적 인버터에서 ILD의 길이가 50nm이하로 짧아질수록 점점 더 $V_{th}$ 변화량이 급격히 증가하였다.

• 한국전기전자재료학회논문지
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• 제14권2호
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• pp.117-122
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• 2001

In this paper, we report on photoelectrochemical etching process of 6H-SiC semiconductor wafer. The etching was performed in two-step process; anodization of SiC surface to form a deep porous layer and thermal oxidation followed by an HF dip. Etch rate of about 615${\AA}$/min was obtained during the anodization using a dilute HF(1.4wt% in H$_2$O) electrolyte with the etching potential of 3.0V. The etching rate was increased with the bias voltage. It was also found out that the adition of appropriate portion of H$_2$O$_2$ into the HF solution improves the etching rate. The etching process resulted in a higherly anisotropic etching characteristics and showed to have a potential for the fabrication of SiC devices with a novel design.

• Nuclear Engineering and Technology
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• 제54권9호
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• pp.3516-3525
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• 2022

The high capture cross-section (𝜎_c) of Gadolinium (Gd-155 and Gd-157) causes reactivity penalty and swing at the initial stage of fuel burnup in Pressurized Water Reactor (PWR). The present study is concerned with the feasibility of the combination of mixed burnable poison with both low and high 𝜎_c as an approach to minimize these effects. Two considered reference designs are fuel assemblies with 24 IBA rods of Gd₂O₃ and Er₂O₃ respectively. Models comprise nuclear fuel with a homogeneous mixture of Er₂O₃, AmO₂, SmO₂, and HfO₂ with Gd₂O₃ as well as the coating of PaO₂ and ZrB₂ on the Gd₂O₃ pellet's outer surface. The infinite multiplication factor was determined and reactivity was calculated considering 3% neutron leakage rate. All models except Er₂O₃ and SmO₂ showed expected results namely higher values of these parameters than the reference design of Gd₂O₃ at the early burnup period. The highest value was found for the model of PaO₂ and Gd₂O₃ followed by ZrB₂ and HfO₂. The cycle burnup, discharge burnup, and cycle length for three batch refueling were calculated using Linear Reactivity Model (LRM). The pin power distribution, energy-dependent neutron flux and Fuel Temperature Coefficient (FTC) were also studied. An optimization of model 1 was carried out to investigate effects of different isotopic compositions of Gd₂O₃ and absorber coating thickness.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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• pp.60-60
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• 2000

The adhesion interface formation between copper and poly(ethylene terephthalate)(PET), poly(methyl methacrylate)(PMMA) and Polyimide films was treated using Ion assisted reaction system to sequential sputter deposition by High-Frequency ion source. The ion beam modification system used a new type of low power HF ion thruster for space application as new low thruster electric propulsion system. Low power HF ion thruster with diameter 100mm gives the opportunity to obtain beams of Ar+ with currents 20~150 mA (current density 0.5~3.5 mA/cm2) and energy 200~2500eV at HF power level 10~150 W. Using Ar as a working gas it is possible to obtain thrust within 3~8 mN. Contact angles for untreated films were over 95$^{\circ}$ and 80 for Pet, 10o for PMMA and 12o for PI samples as a condition of ion assisted reaction at the ion dose of 10$\times$1016 ions/cm2, the ion beam potential of 1.2 keV and 4 ml/min for environmental gas flow rate. 900o peel tests yielded values of 15 to 35 for PET, 18 to 40 and 12 to 36 g/min. respectively. High resolution X-ray photoelectron spectrocopy is the Cls region for Cu metal on these polymer substrates showed increases in C=O-O groups for polymide, whereas PET and PMMA treated samples showed only C=O groups with increase the ion dose. Finally, unstable polymer surface can be changed from hydrophobic to hydrophilic formation such as C-O and C=O that were confirmed by the XPS analysis, conclusionally, the ion assisted reaction is very effective tools to attach reactive ion species to form functional groups on C-C bond chains of PET, PMMA and PI.

• 한국전기전자재료학회논문지
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• 제22권6호
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• pp.466-468
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• 2009

The metal-insulator-silicon (MIS) capacitors with $SiO_2$ and high-k dielectrics ($HfO_2$, $Al_2O_3$) were fabricated, and the current-voltage characteristics were investigated. Especially, an effective barrier height between metal gate and dielectric was extracted by using Fowler-Nordheim (FN) plot and Direct Tunneling (DT) plot of quantum mechanical(QM) modeling. The calculated barrier heights of thermal $SiO_2$, ALD $SiO_2$, $HfO_2$ and $Al_2O_3$ are 3.35 eV, 0.6 eV, 1.75 eV, and 2.65 eV, respectively. Therefore, the performance of non-volatile memory devices can be improved by using engineered tunnel barrier which is considered effective barrier height of high-k materials.