Browse > Article
http://dx.doi.org/10.3740/MRSK.2006.16.4.248

Effect of Ultrathin Film HfO2 by Atomic Layer Deposition on the Propreties of ZnS:Cu,Cl Phosphors  

Kim, Min-Wan (School of Advanced Materials and Systems Engineering, Kumoh National Institute of Technology)
Han, Sand-Do (Sensors and Advanced Materials Lab., Korea Institute of Energy Research)
Kim, Hyung-Su (School of Advanced Materials and Systems Engineering, Kumoh National Institute of Technology)
Kim, Hyug-Jong (School of Advanced Materials and Systems Engineering, Kumoh National Institute of Technology)
Kim, Hyu-Suk (School of Advanced Materials and Systems Engineering, Kumoh National Institute of Technology)
Kim, Suk-Whan (School of Advanced Materials and Systems Engineering, Kumoh National Institute of Technology)
Lee, Sang-Woo (School of Advanced Materials and Systems Engineering, Kumoh National Institute of Technology)
Choi, Byung-Ho (School of Advanced Materials and Systems Engineering, Kumoh National Institute of Technology)
Publication Information
Korean Journal of Materials Research / v.16, no.4, 2006 , pp. 248-252 More about this Journal
Abstract
An investigation is reported on the coating of ZnS:Cu,Cl phosphors by $HfO_2$ using atomic layer deposition method. Hafnium oxide films were prepared at the chamber temperature of $280^{\circ}C$ using $Hf[N(CH_3)_2]_4\;and\;O_2$ as precursors and reactant gas, respectively. XPS and ICP-MS analysis showed the surface composition of coated phosphor powder was hafnium oxide. In FE-SEM analysis, the surface morphology of uncoated phosphors became smoother and clearer as the number of ALD cycle increased from 900 to 1800. The photoluminescence intensity for coated phosphors showed $7.3{\sim}13.4%$ higher than that of uncoated. The effect means that the reactive surface is uniformly coated with stable hafnium oxide to reduce the dead surface layer without change of bulk properties and also its absorptance is almost negligible due to ultrathin(nano-scaled) films. The growth rate is about $1.1{\AA}/cycle$.
Keywords
Atomic layer deposition; ZnS phosphor; Oxide coating; Photoluminescence; Electroluminescence;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
연도 인용수 순위
1 S. D, Han, I. Singh, M. Chang and D. Shin, Proc. of Int. Conf. on the Sci. and Tech. of Emissive Displays and Lighting, Sep. 20-23, Toronto, Canada, 298 (2004)
2 C. Guo, B. Chu, M. Wu, Q. SU and J. Lumin, 105, 121 (2003)   DOI   ScienceOn
3 H. Kominami, T. Nakamura, K, Sowa, Y. Nakanishi, Y. Hatanaka and G. Shinmaoka, Appl. Surf, Sci., 113/114, 519 (1997)
4 V. Dimitrova and J. Tate, Thin Soild Films 365, 134 (2000)   DOI   ScienceOn
5 Y. H. Lee, J. C. Kwak, B. S. Gang, H. C. Kim, B. H. Choi, B. K. Jeong, S. H. Park and K. H. Lee, J. of Electrochem. Soc., 151, C52 (2004)   DOI   ScienceOn
6 Ofer Sneh, Robert B, Clark-Phelps, Ana R and T. E. Seidel, Thin Solid Films, 402, 248 (2002)   DOI   ScienceOn
7 H. C. Kim, M. W. Kim, H. S. Kim, H. J. Kim, W. K. Sohn, B. K. Jeong, S. H. Kim, S. W. Lee and B. H. Choi, Korean J. of Mater, Research, 15(4), 275 (2005)(in Korean)   DOI   ScienceOn
8 J. Sundqvist, A. Barash, J. Aarik, K. Kukli and A. Aidla, Thin Soild Films, 417, 147 (2003)   DOI   ScienceOn
9 H. Ibegazene, S. Alperine and C. Diot, J. Mater, Sci., 30, 938 (1995)   DOI
10 W. Park, K. Yasuda, B. K. Wagner and H. G. Yang, Us Patent No. 0119247, (2002)