Thermal behavior of Flow Pattern Defect and Large Pit in Czochralski Silicon Crystals and Their Effects on Device Yield. (Czochralski 법으로 제조된 실리콘 단결정 내의 Flow Pattern Defect와 Large Pit의 열적 거동 및 소자 수율에의 영향)
-
- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
- /
- 1998.11a
- /
- pp.17-20
- /
- 1998