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Structural Analysis of a Carriage Shuttle System : A Material Supply Device for Small-Scale Machine Tools (소규모 공작기계용 소재공급장치의 이송 셔틀 시스템에 관한 구조해석)

  • Kang, Dae-Sung;Jung, Eun Ik;Kim, Kyung-Heui;Baek, Il-Cheon;Yi, Chung-Seob
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.18 no.4
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    • pp.62-68
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    • 2019
  • The aim of this study was to interpret the structure and dynamics of a transfer shuttle system as a material supply device for small machine tools. The following conclusions were obtained by performing a structural interpretation of the material supply equipment with respect to workload and the dynamical interpretation of a flexible multibody carriage shuttle. When a 1,000-kg workload was applied to a fork lift, the safety factor was approximately 1.86. To conservatively assess the integrity of the structure, a 1,000-kg workload would be proper. In the case of a deflection of the fork system, the width increased with increasing time. The greatest deflection occurred at 5.5 s, which was the largest increase in the time point of the fork system.

Fabrication of Nb SQUID on an Ultra-sensitive Cantilever (Nb SQUID가 탑재된 초고감도 캔티레버 제작)

  • Kim, Yun-Won;Lee, Soon-Gul;Choi, Jae-Hyuk
    • Progress in Superconductivity
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    • v.11 no.1
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    • pp.36-41
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    • 2009
  • Superconducting quantum phenomena are getting attention from the field of metrology area. Following its first successful application of Josephson effect to voltage standard, piconewton force standard was suggested as a candidate for the next application of superconducting quantum effects in metrology. It is predicted that a micron-sized superconducting Nb ring in a strong magnetic field gradient generates a quantized force of the order of sub-piconewtons. In this work, we studied the design and fabrication of Nb superconducting quantum interference device (SQUID) on an ultra-thin silicon cantilever. The Nb SQUID and electrodes were structured on a silicon-on-insulator (SOI) wafer by dc magnetron sputtering and lift-off lithography. Using the resulting SOI wafer, we fabricated V-shaped and parallel-beam cantilevers, each with a $30-{\mu}m$-wide paddle; the length, width, and thickness of each cantilever arm were typically $440{\mu}m,\;4.5{\mu}m$, and $0.34{\mu}m$, respectively. However, the cantilevers underwent bending, a technical difficulty commonly encountered during the fabrication of electrical circuits on ultra-soft mechanical substrates. In order to circumvent this difficulty, we controlled the Ar pressure during Nb sputtering to minimize the intrinsic stress in the Nb film and studied the effect of residual stress on the resultant device.

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Simulation and Fabrication Studies of Semi-superjunction Trench Power MOSFETs by RSO Process with Silicon Nitride Layer

  • Na, Kyoung Il;Kim, Sang Gi;Koo, Jin Gun;Kim, Jong Dae;Yang, Yil Suk;Lee, Jin Ho
    • ETRI Journal
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    • v.34 no.6
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    • pp.962-965
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    • 2012
  • In this letter, we propose a new RESURF stepped oxide (RSO) process to make a semi-superjunction (semi-SJ) trench double-diffused MOSFET (TDMOS). In this new process, the thick single insulation layer ($SiO_2$) of a conventional device is replaced by a multilayered insulator ($SiO_2/SiN_x/TEOS$) to improve the process and electrical properties. To compare the electrical properties of the conventional RSO TDMOS to those of the proposed TDMOS, that is, the nitride_RSO TDMOS, simulation studies are performed using a TCAD simulator. The nitride_RSO TDMOS has superior properties compared to those of the RSO TDMOS, in terms of drain current and on-resistance, owing to a high nitride permittivity. Moreover, variations in the electrical properties of the nitride_RSO TDMOS are investigated using various devices, pitch sizes, and thicknesses of the insulator. Along with an increase of the device pitch size and the thickness of the insulator, the breakdown voltage slowly improves due to a vertical field plate effect; however, the drain current and on-resistance degenerate, owing to a shrinking of the drift width. The nitride_RSO TDMOS is successfully fabricated, and the blocking voltage and specific on-resistance are 108 V and $1.1m{\Omega}cm^2$, respectively.

Design and Implementation of an FPGA-based Real-time Simulator for a Dual Three-Phase Induction Motor Drive

  • Gregor, Raul;Valenzano, Guido;Rodas, Jorge;Rodriguez-Pineiro, Jose;Gregor, Derlis
    • Journal of Power Electronics
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    • v.16 no.2
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    • pp.553-563
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    • 2016
  • This paper presents a digital hardware implementation of a real-time simulator for a multiphase drive using a field-programmable gate array (FPGA) device. The simulator was developed with a modular and hierarchical design using very high-speed integrated circuit hardware description language (VHDL). Hence, this simulator is flexible and portable. A state-space representation model suitable for FPGA implementations was proposed for a dual three-phase induction machine (DTPIM). The simulator also models a two-level 12-pulse insulated-gate bipolar transistor (IGBT)-based voltage-source converter (VSC), a pulse-width modulation scheme, and a measurement system. Real-time simulation outputs (stator currents and rotor speed) were validated under steady-state and transient conditions using as reference an experimental test bench based on a DTPIM with 15 kW-rated power. The accuracy of the proposed digital hardware implementation was evaluated according to the simulation and experimental results. Finally, statistical performance parameters were provided to analyze the efficiency of the proposed DTPIM hardware implementation method.

Electromagnetic design study of a 7 T 320 mm high-temperature superconducting MRI magnet with multi-width technique incorporated

  • Jang, Won Seok;Kim, Geonyoung;Choi, Kibum;Park, Jeonghwan;Bang, Jeseok;Hahn, Seungyong
    • Progress in Superconductivity and Cryogenics
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    • v.23 no.4
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    • pp.30-34
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    • 2021
  • Superconducting magnets have paved the way for opening new horizons in designing an electromagnet of a high field magnetic resonance imaging (MRI) device. In the first phase of the superconducting MRI magnet era, low-temperature superconductor (LTS) has played a key role in constructing the main magnet of an MRI device. The highest magnetic resonance (MR) field of 11.7 T was indeed reached using LTS, which is generated by the well-known Iseult project. However, as the limit of current carrying capacity and mechanical robustness under a high field environment is revealed, it is widely believed that commercial LTS wires would be challenging to manufacture a high field (>10 T) MRI magnet. As a result, high-temperature superconductor together with the conducting cooling approach has been spotlighted as a promising alternative to the conventional LTS. In 2020, the Korean government launched a national project to develop an HTS magnet for a high field MRI magnet as an extent of this interest. We have performed a design study of a 7 T 320 mm winding bore HTS MRI magnet, which may be the ultimate goal of this project. Thus, in this paper, design study results are provided. Electromagnetic design and analysis were performed considering the requirements of central magnetic field and spatial field uniformity.

Characteristics of Circular β-Ga2O3 MOSFETs with High Breakdown Voltage (>1,000 V) (높은 항복전압(>1,000 V)을 가지는 Circular β-Ga2O3 MOSFETs의 특성)

  • Cho, Kyu Jun;Mun, Jae-Kyong;Chang, Woojin;Jung, Hyun-Wook
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.33 no.1
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    • pp.78-82
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    • 2020
  • In this study, MOSFETs fabricated on Si-doped, MBE-grown β-Ga2O3 are demonstrated. A Si-doped Ga2O3 epitaxial layer was grown on a Fe-doped, semi-insulating 1.5 cm × 1 cm Ga2O3 substrate using molecular beam epitaxy (MBE). The fabricated devices are circular type MOSFETs with a gate length of 3 ㎛, a source-drain spacing of 20 ㎛, and a gate width of 523 ㎛. The device exhibited a good pinch-off characteristic, a high on-off drain current ratio of approximately 2.7×109, and a high breakdown voltage of 1,080 V, which demonstrates the potential of Ga2O3 for power device applications including electric vehicles, railways, and renewable energy.

Development of a Velocity Ellipse Navigation Algorithm in Virtual Environments Using Force Feedback (힘 반향을 이용한 속도타원 가상환경 네비게이션 알고리즘 개발)

  • Yoon I.B.;Chai Y.H.
    • Korean Journal of Computational Design and Engineering
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    • v.9 no.4
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    • pp.277-285
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    • 2004
  • In this paper, a 2 DOF haptic yawing joystick for use as the navigation input device in virtual environments is introduced. The haptic yawing joystick has 360° range for yawing motion and ±100° for pitching motion. The device can support weights of up to 26N for χ axis and 10N for axis with 10kHz of sampling rate. The size of the haptic yawing joystick is so small that it can be assembled on armrest of an arm chair and has relatively larger work space than other conventional 2 DOF joysticks. For the haptic yawing joystick, an ellipse navigation algorithm using the user's velocity in the virtual navigation is proposed. The ellipse represents the velocity of the user. According to the velocity of the navigator, the ellipse size is supposed to be changed. Since the path width of navigation environments is limited, the ellipse size is also limited. The ellipse navigation algorithm is tested in 2 dimensional virtual environments. The test results show that the average velocity of the navigation with the algorithm is faster than the average navigation velocity without the algorithm.

Fabrication and Electro-Mechanical Characteristic Analysis of Piezoelectric Micro-transformers (마이크로 압전변압기 제작 및 전기-기계적 특성 분석)

  • Kim, Seong-Kon;Seo, Young-Ho;Whang, Kyung-Hyun;Choi, Doo-Sun
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.32 no.3
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    • pp.231-234
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    • 2008
  • For the applications which need a micro-power supply such as thin and flat displays, micro-robot, and micro-system, it is especially necessary to integrate the passive components because they typically need more than 2/3 of the space of the conventional circuit. Therefore, we have designed and fabricated a novel piezoelectric micro transformer using the PZT thin film and MEMS technologies for application to the energy supply device of the micro-systems. The dimensions of the micro-transformer is $1000{\mu}m\;{\times}\;400{\mu}m\;{\times}\;4.8{\mu}m$ $(length{\times}width{\times}thickness)$. The dynamic displacement of around $9.2{\pm}0.064{\mu}m$ was observed at 10 V. The dynamic displacement varied almost linearly with applied voltage. The average voltage gain (step-up ratio) was approximately 2.13 at the resonant frequency $(F_r=8.006KHz)$ and load resistance $(R_L)$ of 1 $M{\Omega}$.

Stack-Structured Phase Change Memory Cell for Multi-State Storage (멀티비트 정보저장을 위한 적층 구조 상변화 메모리에 대한 연구)

  • Lee, Dong-Keun;Kim, Seung-Ju;Ryu, Sang-Ouk
    • Journal of the Semiconductor & Display Technology
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    • v.8 no.1
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    • pp.13-17
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    • 2009
  • In PRAM applications, the devices can be made for both binary and multi-state storage. The ability to attain intermediate stages comes either from the fact that some chalcogenide materials can exist in configurations that range from completely amorphous to completely crystalline or from designing device structure such a way that mimics multiple phase chase phenomena in single cell. We have designed stack-structured phase change memory cell which operates as multi-state storage. Amorphous $Ge_xTe_{100-x}$ chalcogenide materials were stacked and a diffusion barrier was chosen for each stack layers. The device is operated by crystallizing each chalcogenide material as sequential manner from the bottom layer to the top layer. The amplitude of current pulse and the duration of pulse width was fixed and number of pulses were controlled to change overall resistance of the phase change memory cell. To optimize operational performance the thickness of each chalcogenide was controlled based on simulation results.

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A study on Improvement of $30{\AA}$ Ultra Thin Gate Oxide Quality (얇은 게이트 산화막 $30{\AA}$에 대한 박막특성 개선 연구)

  • Eom, Gum-Yong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07a
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    • pp.421-424
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    • 2004
  • As the deep sub-micron devices are recently integrated high package density, novel process method for sub $0.1{\mu}m$ devices is required to get the superior thin gate oxide characteristics and reliability. However, few have reported on the electrical quality and reliability on the thin gate oxide. In this paper I will recommand a novel shallow trench isolation structure for thin gate oxide $30{\AA}$ of deep sub-micron devices. Different from using normal LOCOS technology, novel shallow trench isolation have a unique 'inverse narrow channel effects' when the channel width of the devices is scaled down shallow trench isolation has less encroachment into the active device area. Based on the research, I could confirm the successful fabrication of shallow trench isolation(STI) structure by the SEM, in addition to thermally stable silicide process was achiever. I also obtained the decrease threshold voltage value of the channel edge and the contact resistance of $13.2[\Omega/cont.]$ at $0.3{\times}0.3{\mu}m^2$. The reliability was measured from dielectric breakdown time, shallow trench isolation structure had tile stable value of $25[%]{\sim}90[%]$ more than 55[sec].

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