• Title/Summary/Keyword: wet chemical method

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Preparation of High Permeability Mn-Zn Ferrites by the Wet Method (습식법에 의한 고투자율 Mn-Zn Ferrite의 제조에 관한 연구)

  • 이경희;이병하;허원도;황우연
    • Journal of the Korean Ceramic Society
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    • v.31 no.1
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    • pp.55-61
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    • 1994
  • Mn-Zn ferrite powder was obtained by wet method that was to be coprecipitated the metal ions of Fe2+, Mn2+ and Zn2+ with alkali solution. The target composition of the ferrite powder was 52 mol% Fe2O3, 24 mol% MnO, and 24 mol% ZnO, that was based on the region of high permeability. And the other ferrite powder was prepared by the dry method that was to be mixed the metal oxides as the above chemical composition. The wet method was compared with dry method for the powder properties and the electromagnetic characteristics of sintered cores. The synthesized powder by wet method was smaller particle size, narrower particle distribution, and higher purity than that of dry method. The initial permeability of sintered sample prepared by the wet method was 14000~28000, on the other side, 9000~15500 in case of the dry method.

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Investigation of Wet Chemical Etching for Surface Texturing of Multi-crystalline Silicon Wafers (다결정 실리콘 웨이퍼의 표면 텍스쳐링을 위한 습식 화학 식각에 대한 연구)

  • Kim, Bum-Ho;Lee, Hyun-Woo;Lee, Eun-Joo;Lee, Soo-Hong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.11a
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    • pp.19-20
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    • 2006
  • Two methods that can reduce reflectance in solar cells are surface texturing and anti-reflection coating. Wet chemical etching is a typical method that surface texturing of multi-crystalline silicon. Wet chemical etching methods are the acid texturization of saw damage on the surface of multi-crystalline silicon or double-step chemical etching after KOH saw damage removal too. These methods of surface texturing are realized by chemical etching in acid solutions HF-$HNO_3$-$H_2O$. In this solutions we can reduce reflectance spectra by simple process etching of multi-crystalline silicon surface. We have obtained reflectance of 27.19% m 400~1100nm from acidic chemical etching after KOH saw damage removal. This result is about 7% less than just saw damage removal substrate. The surface morphology observed by microscope and scanning electron microscopy (SEM).

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An Effective Process for Removing Organic Compounds from Oily Sludge

  • Jing, Guolin;Luan, Mingming;Chen, Tingting;Han, Chunjie
    • Journal of the Korean Chemical Society
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    • v.55 no.5
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    • pp.842-845
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    • 2011
  • Wet air oxidation (WAO) of oily sludge was carried out using $Fe^{3+}$ as catalyst, placed in a 0.5 L batch autoclave in the temperature range of $250-330^{\circ}C$. Experiments were conducted to investigate the effects of temperature, the initial COD, reaction time, concentration of catalyst and $O_2$ excess (OE) on the oxidation of the oily sludge. The results showed that in the WAO 88.4% COD was achieved after 9 min reaction at temperature of $330^{\circ}C$, OE of 0.8 and the initial COD of 20000 mg/L. Temperature was found to have a significant impact on the oxidation of oily sludge. Adding a catalyst significantly improved the COD removal. Homogenous catalyst, $Fe^{3+}$, showed effective removal for pollutants. COD removal was 99.7% in the catalytic wet air oxidation (CWAO) over $Fe^{3+}$ catalyst. The results proved that the CWAO was an effective pretreatment method for the oily sludge.

Evaluation of BR Blending Methods for ESBR/silica Wet Masterbatch Compounds

  • Kim, Woong;Ahn, Byungkyu;Mun, Hyunsung;Yu, Eunho;Hwang, Kiwon;Kim, Wonho
    • Elastomers and Composites
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    • v.52 no.4
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    • pp.242-248
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    • 2017
  • Wet masterbatch (WMB) technology is studied to develop high-content and highly disperse silica-filled compounds. This technology refers to the solidification of surface-modified silica with a rubber solution or latex. Until now, researchs based on styrene butadiene rubber (SBR)/silica WMB has been mainly performed. However, the blending of SBR/silica WMB and BR is not known and is currently under research and development. Therefore, in this study, the BR blending method suitable for emulsion (ESBR)/silica WMB is investigated by measuring their cure characteristics and the mechanical and dynamic viscoelastic properties. As a result, it was confirmed that the blending of ESBR/silica WMB and BR/silica dry masterbatch is most appropriate. However, it showed a disadvantage compared with the conventional mixing method, which was due to the surfactant remained and the sulfuric acid used as the coagulant.

Adsorption Kinetics for Polymeric Additives in Papermaking Aqueous Fibrous Media by UV Spectroscopic Analysis

  • Yoon, Sung-Hoon;Chai, Xin-Sheng
    • Bulletin of the Korean Chemical Society
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    • v.27 no.11
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    • pp.1819-1824
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    • 2006
  • The general objective of the present study was to investigate the potential application of the UV spectroscopic method for determination of the polymeric additives present in papermaking fibrous stock solutions. The study also intended to establish the surface-chemical retention model associated with the adsorption kinetics of additives on fiber surfaces. Polyamide epichlorohydrin (PAE) wet strength resin and imidazolinium quaternary (IZQ) softening agents were selected to evaluate the analytical method. Concentrations of PAE and IZQ in solution were proportional to the UV absorption at 314 and 400 nm, respectively. The time-dependent behavior of polymeric additives obeyed a mono-molecular layer adsorption as characterized in Langmuir-type expression. The kinetic modeling for polymeric adsorption on fiber surfaces was based on a concept that polymeric adsorption on fiber surfaces has two distinguishable stages including initial dynamic adsorption phase and the final near-equilibrium state. The simulation model predicted not only the real-time additive adsorption behavior for polymeric additives at high accuracy once the kinetic parameters were determined, but showed a good agreement with the experimental data. The spectroscopic method examined on the PAE and IZQ adsorption study could potentially be considered as an effective tool for the wet-end retention control as applied to the paper industry.

Operating Condition of RDA for The Simultaneous Analysis of Retention, Drainage and Uniformity of Various Kinds of Papers (보류, 탈수, 지합의 종합분석을 위한 지종별 RDA 초지 조건)

  • Yoon, Won-Ho;Ryu, Jeong-Yong
    • Proceedings of the Korea Technical Association of the Pulp and Paper Industry Conference
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    • 2008.05a
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    • pp.87-122
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    • 2008
  • In order to manage the papermaking procedure in an effective way, it is inevitably required to measure and estimate the various changing parameters of wet-end process control. This content is devoted to the explanation of lab scale new investigating method regarding wet-end process of paper machine by using RDA.

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Studies on chemical wet etching of GaN (GaN계 질화합물 반도체의 습식식각 연구)

  • 윤관기;이성대;이일형;최용석;유순재;이진구
    • Proceedings of the IEEK Conference
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    • 1998.06a
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    • pp.398-400
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    • 1998
  • In this paper, the etching studies for n-GaN were carried out using the wet chemical, the photo-enhanced-chemical, and the electro-chemical etching methods. The experimental results show that n-GaN is etched in diluted NaOH solution at room temperture and the etched thickness of NaOH and electron concentrations. Te etching rate of n-GaN samples with n.simeq.1*10$^{19}$ cm$^{-3}$ were used to compare the photo-enhanced-chemical etching with the electrochemical etching methods. The removed thickness was 680.angs./25min by the electrochemical etching methods. The removed thickness was 680 .angs./25min by the electrochemical etching method ad 784.angs./25min by the photoenhanced-chemical etching method. The patterns are 100.mu.m*100.mu.m rectangulars covered with SiO$_{2}$film. It is shown that the profile of etched side-wall of the pattern is vertical without dependance of the n-GaN orientations.

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Preparation of Ag Powder from AgNO3 by Wet Chemical Reduction Method1. The Establishment of Optimum Reaction System for the Preparation of Spherical Ag Powder (습식 화학적 환원법에 의한 AgNO3로부터 Ag 분말의 제조 1. 균일한 구형 Ag 분말의 제조를 위한 최적 반응계 확립)

  • Yuna, Ki-Seok;Park, Young-Chul;Yang, Beom-Seok;MIn, Hyun-Hong;Won, Chang-Whan
    • Journal of Powder Materials
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    • v.12 no.1
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    • pp.56-63
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    • 2005
  • Ag powder was prepared from $AgNO_3$ by wet chemical reduction method using various reduction agent system involving $AgNO_3$, $AgNO_2$(AgCl) and Ag complex ion aqueous solution. The pure Ag powder could be prepared regardless of reaction system but the particle shape and distribution were affected very much according to the kind of reduction agents and reaction systems. The optimum reaction system for the preparation of the silver powder having the uniform particle shape and size distribution was Ag complex ion aqueous solution-reduction agent system and in particular, $H_2O_2$ and $C_6H_8O_6$as a reduction agent leaded the more uniform particle shape and size distribution.

Fabrication of Size- and Shape- Controlled Gold Particles using Wet Chemical Process (환원 석출법을 이용한 모양과 크기가 제어된 금 입자의 제조)

  • Hong, So-Ya;Lee, Chang-Hwan;Kim, Joo-Yong
    • Textile Coloration and Finishing
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    • v.22 no.2
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    • pp.123-131
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    • 2010
  • Shape and size controlled synthesis of gold particles has been studied by using wet-chemical method. When ${AuCl_4}^-$ in aqueous $HAuCl_4$ precursor was reduced using $Na_2SO_3$ as a reducing agent, mixtures of spherical, triangular and hexagonal particles were prepared in a few minutes. It was found that the shape selective oxidative etching by ${AuCl_4}^-\;+\;Cl^-$ anions and crystal growth took place simultaneously. As the ${AuCl_4}^-$ and $Cl^-$ concentration increased, yields of large triangular and hexagonal plate type particles increased, while the spherical particles decreased in most cases. Possible etching and growth mechanisms are discussed.

Electrochemical Properties of Sub-micron Size Si Anode Materials Distributed by Wet Sedimentation Method (습식 분급으로 입도 조절된 서브 마이크론 크기의 Si 음극활물질의 전기화학적 특성 분석)

  • Jin-Seong Seo;Hyun-Su Kim;Byung-Ki Na
    • Korean Chemical Engineering Research
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    • v.61 no.1
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    • pp.39-44
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    • 2023
  • In this study, the particle size of Si polycrystals was controlled through wet-sedimentation method, and changes in the capacity and cyclic characteristics of the Si anode material according to the particle size were observed. After wet-sedimentation of Si particles pulverized by a vibration mill, the non-uniform particle distribution of Si was uniformly controlled. The d50 of a sample in which Si was sedimented for 24 hours decreased to 0.50 ㎛. As a result of the electrochemical characteristic analysis, the Rct value representing the resistance in the electrode was significantly reduced due to the decrease in particle size. The unclassified Si sample exhibited a discharge capacity of 2,869 mAh/g in the first cycle, and decreased to 85.7 mAh/g after 100 cycles. The sample in which Si was classified for 24 hours showed a capacity of 3,394 mAh/g initially, and maintained a capacity of 1,726 mAh/g after 100 cycles. As the size of the Si particles decreased, the discharge capacity increased and the cycle life was also increased.