• Journal of the Microelectronics and Packaging Society
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• v.20 no.2
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• pp.1-9
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• 2013

Recently flexible electronic devices have attracted a great deal of attention because of new application possibilities including flexible display, flexible memory, flexible solar cell and flexible sensor. In particular, development of flexible memory is essential to complete the flexible integrated systems such as flexible smart phone and wearable computer. Research of flexible memory has primarily focused on organic-based materials. However, organic flexible memory has still several disadvantages, including lower electrical performance and long-term reliability. Therefore, emerging research in flexible electronics seeks to develop flexible and stretchable technologies that offer the high performance of conventional wafer-based devices as well as superior flexibility. Development of flexible memory with inorganic silicon materials is based on the design principle that any material, in sufficiently thin form, is flexible and bendable since the bending strain is directly proportional to thickness. This article reviews progress in recent technologies for flexible memory and flexible electronics with inorganic silicon materials, including transfer printing technology, wavy or serpentine interconnection structure for reducing strain, and wafer thinning technology.

• Particle and aerosol research
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• v.20 no.3
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• pp.103-114
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• 2024

Liquid-spray cleaning has recently been considered an eco-friendly cleaning method in the semiconductor industry because it efficiently cleans contaminated wafers without using any chemicals, relying instead on direct momentum transfer through dropwise impaction. Previous researches are mainly divided into two groups, such as modelling studies predicting the cleaning effect of single-droplet impact and experimental works for measuring particle removal efficiency (PRE) that essentially accompanies multiple droplet impacts. Here, we developed a Monte Carlo model to connect the single-droplet based model to the ensemble effect of multiple droplet impacts in real cleaning experiments, and thereby predict the PREs from the impaction conditions of droplets and the diameters of target particles. Additionally, we developed a two-fluid supersonic nozzle system, capable of spraying 10-60 ㎛ droplets under control of impact velocity, with aims to validate the model predictions of PREs for 15-130 nm contaminant particles on a Si wafer. We confirmed that the model predictions are in agreement with the experimental data within 7% and the cleaning time needs to be controlled for ensuring the efficient removal of particles.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.34 no.12
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• pp.1857-1863
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• 2010

We present the fabrication and characterization of transparent carbon nanotube film (CNF) piezoresistors. CNFs were fabricated by vacuum filtration methods with 65?92% transmittance and patterned on Au-deposited silicon wafer by photolithography and dry etching. The patterned CNFs were transferred onto poly-dimethysiloxane (PDMS) using the weak adhesion property between the silicon wafer and the Au layer. The transferred CNFs were confirmed to be piezoresistors using the equation of concentrated-force-derived resistance change. The gauge factor of the CNFs was measured to range from 10 to 20 as the resistance of the CNFs increased with applied pressure. In polymer microelectromechanical systems, CNF piezoresistors are the promising materials because of their high sensitivity and low-temperature process.

• Korean Journal of Materials Research
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• v.30 no.3
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• pp.142-148
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• 2020

Graphene has attracted the interest of many researchers due to various its advantages such as high mobility, high transparency, and strong mechanical strength. However, large-area graphene is grown at high temperatures of about 1,000 ℃ and must be transferred to various substrates for various applications. As a result, transferred graphene shows many defects such as wrinkles/ripples and cracks that happen during the transfer process. In this study, we address transfer-free, large-scale, and high-quality monolayer graphene. Monolayer graphene was grown at low temperatures on Ti (10nm)-buffered Si (001) and PET substrates via plasma-assisted thermal chemical vapor deposition (PATCVD). The graphene area is small at low mTorr range of operating pressure, while 4 × 4 ㎠ scale graphene is grown at high working pressures from 1.5 to 1.8 Torr. Four-inch wafer scale graphene growth is achieved at growth conditions of 1.8 Torr working pressure and 150 ℃ growth temperature. The monolayer graphene that is grown directly on the Ti-buffer layer reveals a transparency of 97.4 % at a wavelength of 550 nm, a carrier mobility of about 7,000 ㎠/V×s, and a sheet resistance of 98 W/□. Transfer-free, large-scale, high-quality monolayer graphene can be applied to flexible and stretchable electronic devices.

• Korean Journal of Materials Research
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• v.19 no.4
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• pp.224-227
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• 2009

Nanofabrication is an essential process throughout industry. Technologies that produce general nanofabrication, such as e-beam lithography, dip-pen lithography, DUV lithography, immersion lithography, and laser interference lithography, have drawbacks including complicated processes, low throughput, and high costs, whereas nano-transfer printing (nTP) is inexpensive, simple, and can produce patterns on non-plane substrates and multilayer structures. In general nTP, the coherency of gold-deposited stamps is strengthened by using SAM treatment on substrates, so the gold patterns are transferred from stamps to substrates. However, it is hard to apply to transfer other metallic materials, and the existing nTP process requires a complicated surface treatment. Therefore, it is necessary to simplify the nTP technology to obtain an easy and simple method for fabricating metal patterns. In this paper, asnTP process with poly vinyl alcohol (PVA) mold was proposed without any chemical treatment. At first, a PVA mold was duplicated from the master mold. Then, a Mo layer, with a thickness of 20 nm, was deposited on the PVA mold. The Mo deposited PVA mold was put on the Si wafer substrate, and nTP process progressed. After the nTP process, the PVA mold was removed using DI water, and transferred Mo nano patterns were characterized by a Scanning electron micrograph (SEM) and Energy Dispersive spectroscopy (EDS).

• Journal of the Microelectronics and Packaging Society
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• v.29 no.2
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• pp.121-127
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• 2022

Micro-LED is a light-emitting diode smaller than 100 ㎛ in size. It attracts much attention due to its superior performance, such as resolution, brightness, etc., and is considered for various applications like flexible display and VR/AR. Micro-LED display requires a mass transfer process to move micro-LED chips from a LED wafer to a target substrate. In this study, we proposed a vacuum chuck method as a mass transfer technique. The vacuum chuck was fabricated with MEMS technology and PDMS micro-mold process. The spin-coating approach using a dam structure successfully controlled the PDMS mold's thickness. The vacuum test using solder balls instead of micro-LED confirmed the vacuum chuck method as a mass transfer technique.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.27 no.9
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• pp.834-843
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• 2016

In this paper, the design of a PIN diode S-band transfer-type SP4T including its driver circuit is presented. Each path of the SP4T is composed of the cascade connection of series-shunt PIN diodes to improve the isolation performance. The SP4T is implemented using chip type PIN diodes and a 20 mil AIN substrate fabricated using thin film technology. The driver circuit for the SP4T is designed using a multiplexer and four NMOS-PMOS push-pull pair. From on-wafer measurement, the fabriacted SP4T shows a maximum insertion loss of 1.1 dB and a minimum isolation of 41 dB. The time performance of the driver circuit is evaluated using the packaged PIN diodes with the identical PIN diode chip, and the transition time for on-off and off-on are below 100 nsec. For an input power level of 150 W, the measured insertion loss and isolation are close to those of the on-wafer measurement taking into consideration of the coaxial package mismatch and insertion loss.

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.22 no.6
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• pp.996-1002
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• 2013

This study addresses the development of a full duplex robotic system for transferring flat-panel display glass. We propose to accomplish this using a bidirectional linear transfer mechanism in place of the conventional rotary transfer mechanism. The developed full duplex robot comprises a driving part that carries the glass panel laterally, vertical part that can be moved up and down by means of a ball screw and linear motion guide arrangement, and hand part that slides by the cylinder of the driving part along the guide rail with a V-guide bearing attached to the bottom of the support. In addition, an alignment part prevents the hand part from derailing and holds the hand part while the driving part moves horizontally. The full duplex robot lifts and drives a glass panel directly while transferring it to the buffer and does not require rotational motion. Therefore, both transferring and stacking are realized with a single device. This device can be used in existing industrial facilities as an alternative to existing industrial robots in current as well as future process lines. The proposed full duplex robot is expected to save considerable amounts of time and space, and increase product throughput.

• Proceedings of the Materials Research Society of Korea Conference
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• 2011.10a
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• pp.9-9
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• 2011

The transfer of nano-science accomplishments into technology is severely hindered by a lack of understanding of barriers to nanoscale manufacturing. The NSF Center for High-rate Nanomanufacturing (CHN) is developing tools and processes to conduct fast massive directed assembly of nanoscale elements by controlling the forces required to assemble, detach, and transfer nanoelements at high rates and over large areas. The center has developed templates with nanofeatures to direct the assembly of carbon nanotubes and nanoparticles (down to 10 nm) into nanoscale trenches in a short time (in seconds) and over a large area (measured in inches). The center has demonstrated that nanotemplates can be used to pattern conducting polymers and that the patterned polymer can be transferred onto a second polymer substrate. Recently, a fast and highly scalable process for fabricating interconnects from CMOS and other types of interconnects has been developed using metallic nanoparticles. The particles are precisely assembled into the vias from the suspension and then fused in a room temperature process creating nanoscale interconnect. The center has many applications where the technology has been demonstrated. For example, the nonvolatile memory switches using (SWNTs) or molecules assembled on a wafer level. A new biosensor chip (0.02 $mm^2$) capable of detecting multiple biomarkers simultaneously and can be in vitro and in vivo with a detection limit that's 200 times lower than current technology. The center has developed the fundamental science and engineering platform necessary to manufacture a wide array of applications ranging from electronics, energy, and materials to biotechnology.

• New & Renewable Energy
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• v.2 no.2 s.6
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• pp.86-93
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• 2006

유출지하수나 지표수를 열원으로 지열히트펌프의 지초자료로 활용하기 위하여 Pond Loop형 열교환기를 설계, 제작하여 유동이 없는 수조 내에서 수조의 온도가 변화함에 따라 일정한 열교환기 입구온도를 유지하면서 열전달량을 측정하였다. 그 결과 수조를 Heat Source로 사용하는 경우 $5,500{\sim}4,500kcal/h$의 열량이 전달되었고 수조를 Heat Sink로 사용할 경우 $5,200{\sim}3,500kcal/h$의 열량이 전달되었다. 또한 열교환기 관내 유속이 증가함에 따라 열전달량이 증가하는 경향성을 확인할 수 있었고 이는 동시에 열교환기 입출구의 차압을 증가시킴을 알 수 있었다. 열교환기의 설계단계에서 사용하였던 열전달관계식으로 구한 총괄열전달계수, U와 실험값을 통해 유추한 U값을 비교한 결과 실험에 의해 유추된 U값이 $24{\sim}27%$ 설계치보다 크게 나타났다. 본 연구를 통하여 유출지하수 뿐만 아니라 하수 및 하천수를 이용한 지열히트펌프의 기초자료를 확보할 수 있었다.