• 제목/요약/키워드: visible light transmittance

검색결과 233건 처리시간 0.031초

Characterization of F- and Al-codoped ZnO Transparent Conducting Thin Film prepared by Sol-Gel Spin Coating Method

  • Nam, Gil Mo;Kwon, Myoung Seok
    • 한국세라믹학회지
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    • 제53권3호
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    • pp.338-342
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    • 2016
  • ZnO thin film co-doped with F and Al was prepared on a glass substrate via simple non-alkoxide sol-gel spin coating. For a fixed F concentration, the addition of Al co-dopant was shown to reduce the resistivity mainly due to an increase in electrical carrier density compared with ZnO doped with F only, especially after the second post-heat-treatment in a reducing environment. There was no effective positive contribution to the reduction in resistivity due to the mobility enhancement by the addition of Al co-dopant. Optical transmittance of the ZnO thin film co-doped with F and Al in the visible light domain was shown to be higher than that of the ZnO thin film doped with F only.

Structure, Optical and Electrical Properties of AI-doped ZnO Thin Film Grown in Hydrogen-Incorporated Sputtering Gas

  • Kim, Kyoo-Ho;Wibowo, Rachmat Adhi;Munir, Badrul
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2005년도 춘계학술대회
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    • pp.154-159
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    • 2005
  • Low RF power density was used for preparing transparent conducting AI-doped ZnO (AZO) thin films by RF Magnetron Sputtering on Corning 1737 glass. The dependence of films' structural, optical and electrical properties on sputtering gas, film's thickness and substrate temperature were investigated. Low percent of incorporated H2 in Ar sputtering gas has proven to reduce film's resistivity and sheet resistance as low as $4.1\times10^{-3}{\Omega}.cm$. It also formed new preferred peaks orientation of (101) and (100) which indicated that the c-axis of AZO films was parallel to the substrate. From UN-VIS-NIR Spectrophotometer analysis, it further showed high optical transmittance at about $\~ 90\%$ at visible light spectra (400-700nm).

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Low-e용 산화물 다층박막 IGZO/Ag/IGZO의 구조적, 광학적 특성 분석 (Structural and Optical Properties of Multilayer Films of IGZO / Ag / IGZO for Low Emissivity Applications)

  • 왕홍래;김홍배;이상렬
    • 한국전기전자재료학회논문지
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    • 제26권4호
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    • pp.321-324
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    • 2013
  • In this study, The RF magnetron sputter and evaporator was on glass substrates 30 mm ${\times}$ 30 mm OMO multilayer thin film structure is applied to the low-e. Structural and optical properties, a thin film was produced, the variable was placed into a variable deposition time of the oxide layer. According to the XRD measurement results there is no peak that satisfies the Bragg's law ($2dsin{\theta}=n{\lambda}$) which confirmed that it is an amorphous structure. RMS value of the results of the AFM measurement, has a roughness of less than 2 nm. transmittance measurements results, visible light region an average 80%, IR region 40% showed.

태양전지용 ZnO:Al 박막의 wet etching 에 따른 특성 변화

  • 정유섭;김상모;김경환
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.235-236
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    • 2008
  • Wet etched ZnO:Al films for thin film solar cells were prepared by Facing Target sputtering(FTS) method. Wet etching has been used to produce a rough TCO surface that enables light trapping in the absorber. The ZnO:Al films for thin film solar cells were etched by HCl 0.5%. The etching performance of ZnO:Al films can be tuned by changing etching time. The etched ZnO:Al films compared to a smooth ZnO:Al thin film structure. From the results, the lowest resistivity of deposited films was $5.67\times10^{-4}$ [$\Omega$-cm] and the transmittance of all ZnO:Al thin films were over 80% in visible range.

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자기중성방전 스퍼터에 의한 DSCs용 ITiO 박막제작 (ITiO films prepared by magnetic null discharge sputtering for DSCs application)

  • 한덕우;;곽동주;성열문
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2008년도 제39회 하계학술대회
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    • pp.1150-1151
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    • 2008
  • Titanium-doped indium oxide (ITiO) films were prepared on soda-lime glass substrate using a magnetic null discharge (MND) sputter source. The ITiO thin films containing 10 wt.% Ti showed the minimum resistivity of ${\rho}=5.5{\times}10^{-3}{\Omega}cm$. The optical transmittance increases from 70% at 450 nm to 80% at 700 nm in visible spectrum. The surface roughness of the sample showed a change from 10 nm to 50 nm. The ITiO film used for TCO layer of DSCs exhibited an energy conversion efficiency of about 3.8 % at light intensity of 100 $mW/cm^2$.

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분말타겟의 dc 마그네트론 스퍼터에 의한 ITO박막의 특성 (Characteristics of ITO Films Deposited by dc Magnetron Sputter Using Powder Target)

  • 김현후;신성호;신재혁;박광자
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 하계학술대회 논문집
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    • pp.427-431
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    • 2000
  • ITO (indium tin oxide) thin films on PET (polyethylene terephthalate) and glass substrates have been deposited by a dc magnetron sputtering without heat treatments such as substrate heater and post heat treatment. Each sputtering parameter during the sputtering deposition is an important factor for the high quality of ITO thin films deposited on polymeric substrate. Particularly, the material, electrical and optical properties of as-deposited ITO oxide films are dominated by sputtering power, oxygen partial pressure and films thickness. As the experimental results, the XRD patters of ITO films are influenced by sputtering power and pressure. As the power and pressure are increased, (411) peak is grown suddenly. the electrical resistivity is also increased, as the sputteing power and pressure are increased. Transmittance of ITO thin films in visible light ranges is lowered with increasing the sputtering power and film thickness. Reflectance of ITO films in infia-red region is decreased, as the power and pressure is increased.

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RF 마그네트론 반응성 스퍼터링법으로 증착된 WO$_3$박막의 광특성 (The Optical Properties of WO$_3$Thin Films Deposited by RF Magnetron Reactive Sputtering)

  • 이동규;최영규;정귀상
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1997년도 추계학술대회 논문집
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    • pp.339-342
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    • 1997
  • The optical properties of WO$_3$thin films deposited by RF magnetron reactive sputtering were studied. The substrate was an ITO(indium-tin-oxide) glass(100$\Omega$/ ). The optical properties are examined by different deposition conditions. RF power, substrate temperature, $O_2$concentraction. Ar flow rate, working pressure and thickness are 40~60W, 25~30$0^{\circ}C$, 10%, 54~72sccm, 5~20m7orr and 1200~2400$\AA$, respectively. All these films were colorless, light yellow and found to be amorphous in structure by X-ray diffraction analysis. When RF power, substrate temperature, $O_2$concentraction, Ar flow rate, working pressure and thickness are 40W, $25^{\circ}C$, 10%, 72sccm, 20mTorr and 2400$\AA$, respectively the values of transmittance of the WO$_3$thin films in visible region are about 80%.

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전도성 고분자를 이용한 전자파 차폐효과 (The Electromagnetic Shielding Effectiveness Using Conducting Polymers)

  • 하남규;김종은;서광석
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 추계학술대회 논문집
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    • pp.306-309
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    • 2000
  • The conductive polymers, polyaniline (PANI) emeraldine base and 3, 4-polyethylene dioxythiophene (PEDOT) were synthesized and coated on the PET film primer-dealt with acryl type to find out the electromagnetic shielding effectiveness. When conductive polymer such as PANI and PEDOT is used, if the thickness of coating increases then the electromagnetic shielding effectiveness increases, too, but the visible light transmittance decreases. For PANI, when its conductivity increased, its electromagnetic shielding effectiveness increased, too. For PANI, if the surface resistance is about 140 $\Omega$/$\square$, the shielding effectiveness is about 11 dB in the far field, and about 13 dB in the near field at 1 GHz. For PEDOT, when the surface resistance is about 200 $\Omega$/$\square$, the shielding effectiveness is about 3 dB.

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상온에서 분말타겟의 스퍼터에 의해 증착된 ITO박막 (ITO Films Deposited by Sputter Method of Powder Target at Room Temperature.)

  • 김현후;이재형;신성호;신재혁;박광자
    • 한국표면공학회지
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    • 제33권5호
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    • pp.349-355
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    • 2000
  • Indium tin oxide (ITO) thin films have been deposited on PET (polyethylene terephthalate) and glass substrates by a do magnetron sputter method of powder target without heat treatments such as substrate heater and post heat treatment. During the sputtering deposition, sputtering parameters such as sputtering power, working pressure, oxygen gas mixture, film thickness and substrate-target distance are important factors for the high quality of ITO thin films. The structural, electrical and optical properties of as-deposited ITO oxide films are investigated by sputtering power, oxygen partial pressure and films thickness among the several sputtering conditions. XRD patterns of ITO films are affected by sputtering power and pressure. As the power and pressure are increased, (411) and (422) peaks of ITO films are grown strongly. Electrical resistivity is also increased, as the sputtering power and pressure are increased. Transmittance of ITO thin films in the visible light ranges is lowered with an increase of sputtering power and film thickness. Reflectance of ITO films in infra-red region is decreased, as the power and pressure is increased.

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Preparation of Carrageenan-based Antimicrobial Films Incorporated With Sulfur Nanoparticles

  • Saedi, Shahab;Shokri, Mastaneh;Rhim, Jong-Whan
    • 한국포장학회지
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    • 제26권3호
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    • pp.125-131
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    • 2020
  • Carrageenan-based functional films were prepared by adding two different types of sulfur nanoparticles (SNP) synthesized from sodium thiosulfate (SNPSTS) and elemental sulfur (SNPES). The films were characterized using Fourier transform infrared spectroscopy (FT-IR), X-ray diffraction spectroscopy (XRD), and thermal gravimetric analysis (TGA). Also, film properties such as UV-visible light transmittance, water contact angle (WCA), water vapor permeability (WVP), mechanical properties, and antibacterial activity were evaluated. SNPs were uniformly dispersed in the carrageenan matrix to form flexible films. The addition of SNP significantly increased the film properties such as water vapor barrier and surface hydrophobicity but did not affect the mechanical properties. The carrageenan/SNP composite film showed some antibacterial activity against foodborne pathogenic bacteria, L. monocytogenes and E. coli.