자기중성방전 스퍼터에 의한 DSCs용 ITiO 박막제작

ITiO films prepared by magnetic null discharge sputtering for DSCs application

  • 한덕우 (경성대학교 전기전자공학과) ;
  • ;
  • 곽동주 (경성대학교 전기전자공학과) ;
  • 성열문 (경성대학교 전기전자공학과)
  • Han, Deok-Woo (Department of Electrical and electronic Engineering, Kyungsung University) ;
  • Endrowednes, Kuantama (Department of Electrical and electronic Engineering, Kyungsung University) ;
  • Kwak, Dong-Joo (Department of Electrical and electronic Engineering, Kyungsung University) ;
  • Sung, Youl-Moon (Department of Electrical and electronic Engineering, Kyungsung University)
  • 발행 : 2008.07.16

초록

Titanium-doped indium oxide (ITiO) films were prepared on soda-lime glass substrate using a magnetic null discharge (MND) sputter source. The ITiO thin films containing 10 wt.% Ti showed the minimum resistivity of ${\rho}=5.5{\times}10^{-3}{\Omega}cm$. The optical transmittance increases from 70% at 450 nm to 80% at 700 nm in visible spectrum. The surface roughness of the sample showed a change from 10 nm to 50 nm. The ITiO film used for TCO layer of DSCs exhibited an energy conversion efficiency of about 3.8 % at light intensity of 100 $mW/cm^2$.

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