Park, Kyung-Ai;Lee, Seung-Bum;Kim, Hyung-Jin;Hong, In-Kwon
Elastomers and Composites
/
v.30
no.3
/
pp.229-234
/
1995
Membrane process has been applied widely to petroleum chemistry, fine chemistry, polymer, electronics, food, bioprocessing, and wastewater treatment process. Membrane process has advantage that there's no phase change through separation, energy consumption is smaller than other separation processes. And equipment investment and operation cost are inxpensive too. We prepared the silicone rubber membrane and then separated the heavy metal ion from wastewater. Silicone rubber membrane was prepared using a superitical fluid process and heavy metal ions were separated from the chromium nitrate, ferric sulfate, cupric sulfate, nickel sulfate aqueous solution. The pressure difference between top and bottom of separation apparatus was preserved by vacuum pump, and the removal amount of heavy metal at each separation step were analyzed by instrumental analysis, AAS. The surface and pore of silicone rubber membrane was investigated using SEM, and the capability of wastewater treatment using a silicone rubber membrane was proposed as calculated removal rate of heavy metal after comparing removal amount of heavy metal to amount of heavy metal in mother solution by AAS analysis.
An experimental device was developed for analysis of hydraulic oil characteristics with dielectric constant sensors. Online analysis is the most effective method of the three methods used for analyzing lubricant oils. This is because it can monitor the machine condition effectively using oil sensors in real time without requiring excellent analysis skill and eliminates human errors. Determining the oil quality usually requires complex laboratory equipment for measuring factors such as density, viscosity, base number, acid number, water content, additive, and wear debris. However, the electric constant is another indicator of oil quality that can be measured on-site. The electric constant is the ratio of the capacitance of a capacitor using that material as a dielectric, compared with a similar capacitor that has a vacuum as its dielectric. The electric constant affects the factors such as the base oil, additive, temperature, electric field frequency, water content, and contaminants. In this study, the tendency of the electric constant is investigated with a variation of temperature, water content, and dust weight. The experimental device can control working temperature and mix the contaminants with oil. A machine condition monitoring program developed to analyze hydraulic oil is described. This program provides graph and digital values with variation of time. Moreover, it includes an alarm system for when the oil condition is bad.
Kim, Woo Jae;Lee, Hwan Hee;Kwon, Hee Tae;Shin, Gi Won;Yang, Chang Sil;Kwon, Gi-Chung
Journal of the Semiconductor & Display Technology
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v.16
no.4
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pp.20-24
/
2017
Currently, techniques mainly used in semiconductor impurity diffusion processes include furnace thermal diffusion, ion implantation, and vacuum plasma doping. However, there is a disadvantage that the process equipment and the unit cost are expensive. In this study, boron diffusion process using relatively inexpensive atmospheric plasma was conducted to solve this problem. With controlling parameters of Boron diffusion process, the doping characteristics were analyzed by using secondary ion mass spectrometry. As a result, the influence of each variable in the doping process was analyzed and the feasibility of atmospheric plasma doping was confirmed.
Journal of the Korean Society of Manufacturing Process Engineers
/
v.20
no.7
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pp.1-7
/
2021
Restrictions on the emissions of nitrogen oxides, sulfur oxides, carbon dioxide, and particulate matter from marine engines are being tightened. Each of these emissions requires different reduction technologies, which are costly and require many pieces of equipment to meet the requirements. Liquefied natural gas (LNG) fuel has a great advantage in reducing harmful emissions emitted from ships. Therefore, the marine engine application of LNG fuel is significantly increasing in new ship buildings. Accordingly, this study analyzed the internal support structure, insulation type, and fuel supply piping system of a 35 m3 International Maritime Organization C type pressurized storage tank of an LNG-fueled ship. Analysis of the heat transfer characteristics revealed that A304L stainless steel has a lower heat flux than A553 nickel steel, but the effect is not significant. The heat flux of pearlite insulation is much lower than that of vacuum insulation. Moreover, the analysis results of the constraint method of the support ring showed no significant difference. A553 steel containing 9% nickel has a higher strength and lower coefficient of thermal expansion than A304L, making it a suitable material for cryogenic containers.
Sub-Kelvin cooling has been generally demanded for the fields of low temperature physics, such as physical property measurements, astronomical detection, and quantum computing. The refrigeration system with a small size can be appropriately introduced when the measurement system does not require a high cooling capacity at sub-Kelvin temperature. The dilution refrigerator which is a common method to reach sub-Kelvin, however, must possess a large 3He circulation equipment at room temperature. As alternatives, a sorption refrigerator and a magnetic refrigerator can be adopted for sub-Kelvin cooling. This paper describes those coolers which have been developed by various research groups. Furthermore, a cold-cycle dilution refrigerator of which the size of the 3He circulation system is minimized, is also introduced. Subsequently, a new concept of dilution refrigerator is proposed by our group. The suggested cooler can achieve sub-Kelvin temperature with a small size since it does not require any recuperator and turbo-molecular vacuum pump. Its architecture allows the compact configuration to reach sub-Kelvin temperature by integrating the sorption pump and the magnetic refrigerators. Therefore, it may be suitably utilized in the low temperature experiments requiring low cooling capacity.
Myoung Choul Choi;Ji Young Baek;Aram Hong;Jae Yeong Eo;Chang Min Choi
Mass Spectrometry Letters
/
v.14
no.4
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pp.147-152
/
2023
The increasing demand for two-dimensional imaging analysis using optical or electronic microscopic techniques has led to an increase in the use of simple one-dimensional and two-dimensional mass spectrometry imaging. Among these imaging methods, secondary-ion mass spectrometry (SIMS) has the best spatial resolution using a primary ion beam with a relatively insignificant beam diameter. Until recently, SIMS, which uses high-energy primary ion beams, has not been used to analyze molecules. However, owing to the development of cluster ion beams, it has been actively used to analyze various organic molecules from the surface. Researchers and commercial SIMS companies are developing cluster ion beams to analyze biological samples, including amino acids, peptides, and proteins. In this study, a water droplet ion beam for surface analysis was realized. Water droplets ions were generated via electrospraying in a vacuum without desolvation. The generated ions were accelerated at an energy of 10 keV and collided with the target sample, and secondary ion mass spectra were obtained for the generated ions using ToF-SIMS. Thus, the proposed water droplet ion-beam device showed potential applicability as a primary ion beam in SIMS.
Kim, Soo-In;Kim, Hyun-Woo;Noh, Seong-Cheol;Yoon, Duk-Jin;Chang, Hong-Jun;Lee, Jong-Rim;Lee, Chang-Woo
Journal of the Korean Vacuum Society
/
v.18
no.2
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pp.97-101
/
2009
In the modem semiconductor industry, the progress that consumes the most capital and labor is cleansing process. Cleansing process is to remove impurities that can affect the operation of the device and deteriorate its function. Especially, Photoresist (PR) progress that etches the device always requires cleansing at the end of the progress. Also, HDI-PR (High-Dose Ion-implanted Photoresist) created from PR progress is difficult to remove. Thus, in modem IC cleansing, many steps of cleansing are used, including dry and wet cleansing. In this paper, we suggested to combine existing dry-cleansing and wet-cleansing, each represented by plasma cleansing and stripper solution, as Plasma Liquid-Vapor Activation (PLVA). This PLVA method enhances the effect of existing cleansing solution, and decreases the amount of solution and time required to strip. We stripped HDI-PR by activated solution and measured surface hardness and Young's modulus by Nano-indenter. Nano-indenter is the equipment that determines the hardness and the modulus of elasticity by indenting nano-sized tip with specific shape into the surface and measuring weight and z-axis displacement. We measured the change of surface hardness and Young's modulus before and after the cleansing. As a result, we found out that the surface hardness of the sample sharply decreased after the cleansing by plasma-activated PR stripper solution. It can be considered that if physical surface-cleansing process is inserted after this, more effective elimination of HDI-PR is possible.
Proceedings of the Korean Vacuum Society Conference
/
2012.08a
/
pp.151-151
/
2012
A new plasma process, i.e., the combination of PIII&D and HIPIMS, was developed to implant non-gaseous ions into materials surface. HIPIMS is a special mode of operation of pulsed-DC magnetron sputtering, in which high pulsed DC power exceeding ~1 kW/$cm^2$ of its peak power density is applied to the magnetron sputtering target while the average power density remains manageable to the cooling capacity of the equipment by using a very small duty ratio of operation. Due to the high peak power density applied to the sputtering target, a large fraction of sputtered atoms is ionized. If the negative high voltage pulse applied to the sample stage in PIII&D system is synchronized with the pulsed plasma of sputtered target material by HIPIMS operation, the implantation of non-gaseous ions can be successfully accomplished. The new process has great advantage that thin film deposition and non-gaseous ion implantation along with in-situ film modification can be achieved in a single plasma chamber. Even broader application areas of PIII&D technology are believed to be envisaged by this newly developed process. In one application of non-gaseous plasma immersion ion implantation, Ge ions were implanted into SiO2 thin film at 60 keV to form Ge quantum dots embedded in SiO2 dielectric material. The crystalline Ge quantum dots were shown to be 5~10 nm in size and well dispersed in SiO2 matrix. In another application, Ag ions were implanted into SS-304 substrate to endow the anti-microbial property of the surface. Yet another bio-application was Mg ion implantation into Ti to improve its osteointegration property for bone implants. Catalyst is another promising application field of nongaseous plasma immersion ion implantation because ion implantation results in atomically dispersed catalytic agents with high surface to volume ratio. Pt ions were implanted into the surface of Al2O3 catalytic supporter and its H2 generation property was measured for DME reforming catalyst. In this talk, a newly developed, non-gaseous plasma immersion ion implantation technique and its applications would be shown and discussed.
An, Sehoon;Lee, Geun-Hyuk;Jang, Seong Woo;Hwang, Sehoon;Yoon, Jung Hyeon;Lim, Sang-Ho;Han, Seunghee
Proceedings of the Korean Vacuum Society Conference
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2016.02a
/
pp.129-129
/
2016
Graphene, as a single layer of $sp^2$-bonded carbon atoms packed into a 2D honeycomb crystal lattice, has attracted much attention due to its outstanding properties. In order to synthesize high quality graphene, transition metals, such as nickel and copper, have been widely employed as catalysts, which needs transfer to desired substrates for various applications. However, the transfer steps are not only complicated but also inevitably induce defects, impurities, wrinkles, and cracks of graphene. Furthermore, the direct synthesis of graphene on dielectric surfaces has still been a premature field for practical applications. Therefore, cost effective and concise methods for transfer-free graphene are essentially required for commercialization. Here, we report a facile transfer-free graphene synthesis method through nickel and carbon co-deposited layer. In order to fabricate 100 nm thick NiC layer on the top of $SiO_2/Si$ substrates, DC reactive magnetron sputtering was performed at a gas pressure of 2 mTorr with various Ar : $CH_4$ gas flow ratio and the 200 W DC input power was applied to a Ni target at room temperature. Then, the sample was annealed under 200 sccm Ar flow and pressure of 1 Torr at $1000^{\circ}C$ for 4 min employing a rapid thermal annealing (RTA) equipment. During the RTA process, the carbon atoms diffused through the NiC layer and deposited on both sides of the NiC layer to form graphene upon cooling. The remained NiC layer was removed by using a 0.5 M $FeCl_3$ aqueous solution, and graphene was then directly obtained on $SiO_2/Si$ without any transfer process. In order to confirm the quality of resulted graphene layer, Raman spectroscopy was implemented. Raman mapping revealed that the resulted graphene was at high quality with low degree of $sp^3$-type structural defects. Additionally, sheet resistance and transmittance of the produced graphene were analyzed by a four-point probe method and UV-vis spectroscopy, respectively. This facile non-transfer process would consequently facilitate the future graphene research and industrial applications.
Proceedings of the Korean Vacuum Society Conference
/
2014.02a
/
pp.150.1-150.1
/
2014
Showerhead is used as a main part in the semiconductor equipment. The face plate flatness should remain constant and the cleaning performance must be gained to keep the uniformity level of etching or deposition in chemical vapor deposition process. High operating temperature or long period of thermal loading could lead the showerhead to be deformed thermally. In some case, the thermal deformation appears very sensitive to showerhead performance. This paper describes the methods for robust design using computational fluid dynamics. To reveal the influence of the post distribution on flow pattern in the showerhead cavity, numerical simulation was performed for several post distributions. The flow structure appears similar to an impinging flow near a centered baffle in showerhead cavity. We took the structure as an index to estimate diffusion path. A robust design to reduce the thermal deformation of showerhead can be achieved using post number increase without ill effect on flow. To prevent the showerhead deformation by heat loading, its face plate thickness was determined additionally using numerical simulation. The face plate has thousands of impinging holes. The design key is to keep pressure drop distribution on the showerhead face plate with the holes. This study reads the methodology to apply to a showerhead hole design. A Hagen-Poiseuille equation gives the pressure drop in a fluid flowing through such hole. The assumptions of the equation are the fluid is viscous-incompressible and the flow is laminar fully developed in a through hole. An equation can be expressed with radius R and length L related to the volume flow rate Q from the Hagen-Poiseuille equation, $Q={\pi}R4{\Delta}p/8{\mu}L$, where ${\mu}$ is the viscosity and ${\Delta}p$ is the pressure drop. In present case, each hole has steps at both the inlet and the outlet, and the fluid appears compressible. So we simplify the equation as $Q=C(R,L){\Delta}p$. A series of performance curves for a through hole with geometric parameters were obtained using two-dimensional numerical simulation. We obtained a relation between the hole diameter and hole length from the test cases to determine hole diameter at fixed hole length. A numerical simulation has been performed as a tool for enhancing showerhead robust design from flow structure. Geometric parameters for the design were post distribution and face plate thickness. The reinforced showerhead has been installed and its effective deposition profile is being shown in factory.
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