Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2012.08a
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- Pages.151-151
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- 2012
Non-gaseous Plasma Immersion Ion Implantation and Its Applications
- Han, Seung-Hee (Photo-electronic Hybrids Research Center, National Agenda Research Division Korea Institute of Science and Technology) ;
- Kim, En-Kyeom (Photo-electronic Hybrids Research Center, National Agenda Research Division Korea Institute of Science and Technology) ;
- Park, Won-Woong (Photo-electronic Hybrids Research Center, National Agenda Research Division Korea Institute of Science and Technology) ;
- Moon, Sun-Woo (Photo-electronic Hybrids Research Center, National Agenda Research Division Korea Institute of Science and Technology) ;
- Kim, Kyung-Hun (Photo-electronic Hybrids Research Center, National Agenda Research Division Korea Institute of Science and Technology) ;
- Kim, Sung-Min (Photo-electronic Hybrids Research Center, National Agenda Research Division Korea Institute of Science and Technology)
- Published : 2012.08.20
Abstract
A new plasma process, i.e., the combination of PIII&D and HIPIMS, was developed to implant non-gaseous ions into materials surface. HIPIMS is a special mode of operation of pulsed-DC magnetron sputtering, in which high pulsed DC power exceeding ~1 kW/