Growth of $Ta_2O_5$ Thin Film by Dual Ion Beam Assisted Deposition and in-situ Surface Analysis

• 조용범;김경중;구경완;천희곤;문대원
• • Proceedings of the Korean Vacuum Society Conference
  • /
  • 1994.02a
  • /
  • pp.41-42
  • /
  • 1994
• PDF

Effect of the gas pphase reaction in the deposition of the low temperature SiO2 thin films by Remote-PECVD (원거리 플라즈마 화학증착법에 이한 저온 이산화규소박막의 증착에서 기상반응의 영향)

• 박영배;이시우;임인곤;박원규;김성철
• • Proceedings of the Korean Vacuum Society Conference
  • /
  • 1994.02a
  • /
  • pp.133-133
  • /
  • 1994
• PDF

Properties of Cu films on Glass Prepared by ICB Deposition Method (ICB(Ionized Cluster Beam)방법으로 제작된 Glass 기판위의 구리 박막의 특성)

• 윤영수;이지연;최원국;고석근;정형진;이규왕;박성진
• • Proceedings of the Korean Vacuum Society Conference
  • /
  • 1995.02a
  • /
  • pp.70-70
  • /
  • 1995
• PDF

A study on the growth of low temperature GaN buffer layer by remote pplasma enhanced metalorganic chemical vapor deposition (원격 플라즈마 금속 유기 화학 기상 증착법에 의한 저온 GaN 완충막 성장에 관한 연구)

• 이재형;손철수;윤의준
• • Proceedings of the Korean Vacuum Society Conference
  • /
  • 1996.06a
  • /
  • pp.32-33
  • /
  • 1996
• PDF

Ion Beam Assisted Deposition법에 의한 TiN 박막 제작 및 특성 연구

• 원정연;김종호;강희재;백창현;방상렬;홍주화;위병용
• • Proceedings of the Korean Vacuum Society Conference
  • /
  • 1997.07a
  • /
  • pp.113-113
  • /
  • 1997
• PDF

Effect of the working pressure on hydrogenated bonding and chemical structure during deposition of carbon nitride film by RF magnetron sputtering

• Roh, Ki-Min;Choi, Si-Kyung;You, Shin-Jae;Seong, Dae-Jin;Kim, Jung-Hyung
• • Proceedings of the Korean Vacuum Society Conference
  • /
  • 2009.02a
  • /
  • pp.283.2-283.2
  • /
  • 2009
• PDF

Cu growth on hydrogen plasma treated Cu by metal organic chemical vapor deposition

• Moon, Hock-Key;Lee, Nae-Eung
• • Proceedings of the Korean Vacuum Society Conference
  • /
  • 2009.02a
  • /
  • pp.177.1-177.1
  • /
  • 2009
• PDF

Controlled Growth of Cu Nanowires by using Electrochemical deposition with a Polycarbonate membranes

• Hwang Jae-Gwon;Gang Mun-Cheol;Seong Myeong-Mo
• • Proceedings of the Korean Vacuum Society Conference
  • /
  • 2006.02a
  • /
  • pp.206-206
  • /
  • 2006
• PDF

Controlled Wall Thickness of $Cu/Al_2O_3$ Nanocables by Using Atomic Layer Deposition and Electrodeposition

• Kang Moon-C.;Hwang Jae-K.;Sung Myung-M.
• • Proceedings of the Korean Vacuum Society Conference
  • /
  • 2006.02a
  • /
  • pp.207-207
  • /
  • 2006
• PDF

Characteristics of Oxide Films Deposited with Remote Plasma Enhanced Chemical Vapor Deposition at Low Temperatures From $SiH_4-N_2O$ (원거리 플라즈마 화학증착에 의한 실리콘 산화막의 물성)

• 강진규;박영배;이시우
• • Journal of the Korean Vacuum Society
  • /
  • v.3 no.4
  • /
  • pp.426-433
  • /
  • 1994
• PDF

---