• 제목/요약/키워드: trapping mechanism

검색결과 71건 처리시간 0.026초

Impact of carbon dioxide on the stability of the small-scale structures by trapping the material properties

  • Zhou, Yunlong;Wang, Jian
    • Advances in nano research
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    • 제13권1호
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    • pp.1-12
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    • 2022
  • The existence of active material in the environment causes the small-scale systems to be sensitive to the actual environment. Carbon dioxide is one of the active materials that exists a lot in the air conditions of the living environment. However, in some applications, the carbon dioxide-coated is used to improve the performance of systems against the destructive factors such as the corrosion; nevertheless, in the current research, the stability analysis of a carbon dioxide capture mechanism-coated beam is investigated according to the mathematical simulation of a rectangular composite beam utilizing the modified couple stress theory. The composite mechanism of carbon dioxide trapping is made of a polyacrylonitrile substrate that supports a cross-link polydimethylsiloxane gutter layer as the carbon dioxide mechanism trapping. Three novel types of carbon dioxide trapping mechanism involving methacrylate, poly (ethylene glycol) methyl ether methacrylate, and three pedant methacrylates are considered, which were introduced by Fu et al. (2016). Finally, according to introducing the methodology of carbon dioxide (CO2) trapping, the impact of various effective parameters on the stability of composite beams will be analyzed in detail.

Charge Trapping Mechanism in Amorphous Si-In-Zn-O Thin-Film Transistors During Positive Bias Stress

  • Lee, Sang Yeol
    • Transactions on Electrical and Electronic Materials
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    • 제17권6호
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    • pp.380-382
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    • 2016
  • The mechanism for instability under PBS (positive bias stress) in amorphous SIZO (Si-In-Zn-O) thin-film transistors was investigated by analyzing the charge trapping mechanism. It was found that the bulk traps in the SIZO channel layer and the channel/dielectric interfacial traps are not created during the PBS duration. This result suggests that charge trapping in gate dielectric, and/or in oxide semiconductor bulk, and/or at the channel/dielectric interface is a more dominant mechanism than the creation of defects in the SIZO-TFTs.

Dynamic analysis of the micropipes reinforced via the carbon dioxide adsorption mechanism based on the mathematical simulation

  • Liu, Yunye
    • Computers and Concrete
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    • 제30권3호
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    • pp.185-196
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    • 2022
  • In this paper, the dynamic characteristics of a composite cylindrical beam made of a mechanism of carbon dioxide absorption coated on the tube core are investigated based on the classical beam theory coupled with the modified couple stress theory. The composite tube structures are assumed to be uniform along the tube length, and the energy method regarding the Hamilton principle is utilized for generating the governing equations. A powerful numerical solution, the generalized differential quadrature method (GDQM), is employed to solve the differential equations. The carbon dioxide trapping mechanism is a composite consisting of a polyacrylonitrile substrate and a cross-link polydimethylsiloxane gutter layer. Methacrylate, poly (ethylene glycol), methyl ether methacrylate, and three pedant methacrylates are all taken into account as potential mechanisms for capturing carbon dioxide. The application of the present study is helpful in the design and production of microelectromechanical systems (MEMS) and the different valuable parameters, such as the length-scale parameter, rate of section change, aspect ratio, etc., are presented in detail.

복합 스트레스에 의한 비정질 실리콘 박막 트랜지스터에서의 가속열화 현상 연구 (A Study of the Acclerated Degradation Phenomena on th Amorphous Silicon Thin Film Transistors with Multiple Stress)

  • 이성규;오창호;김용상;박진석;한민구
    • 대한전기학회논문지
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    • 제43권7호
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    • pp.1121-1127
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    • 1994
  • The accelerated degradation phenomena in amorphous silicon thin film transistors due to both electrical stress and visible light illumination under the elevated temperature have been investigated systematically as a function of gate bias, light intensity, and stress time. It has been found that, in case of electrical stress, the thrshold voltage shifts of a-Si:H TFT's may be attributed to the defect creation process at the early stage, while the charge trapping phenomena may be dominant when the stressing periods exceed about 2 hours. It has been also observed that the degradation in the device characteristics of a-Si:H TFT's is accelerated due to multiple stress effects, where the defect creation mechanism may be more responsible for the degradation rather than the charge trapping mechanism.

Trapping of Methylglyoxal by Sieboldin from Malus baccata L. and Identification of Sieboldin-Methylglyoxal Adducts Forms

  • Kim, Ji Hoon;Zhang, Kaixuan;Lee, Juhee;Gao, En Mei;Lee, Yun Jung;Son, Rak Ho;Syed, Ahmed Shah;Kim, Chul Young
    • Natural Product Sciences
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    • 제27권4호
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    • pp.245-250
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    • 2021
  • The methylglyoxal (MGO) trapping constituents from Malus baccata L. were investigated using incubation of MGO and crude extract under physiological conditions followed by HPLC analysis. The peak areas of MGO trapping compounds decreased, and their chemical structures were identified by HPLC-ESI/MS. Sieboldin was identified as a major active molecule representing MGO-trapping activity of the crude extract. After reaction of sieboldin and MGO, remaining MGO was calculated by microplate assay method using imine (Schiff base) formation of 2,4-dinitrophenylhydrazine (DNPH) and aldehyde group. After 4 h incubation, sieboldin trapped over 43.8% MGO at a concentration of 0.33 mM and showed MGO scavenging activity with an RC50 value of 0.88 mM for the incubation of 30 min under physiological conditions. It was also confirmed that sieboldin inhibited the production of advanced glycation end products (AGE) produced by bovine serum albumins (BSA)/MGO. Additionally, MGO trapping mechanism of sieboldin was more specifically identified by 1H-, 13C-, 2D NMR and, confirm to be attached to the position of C-3' (or 5').

색소흡착산화아연에 대한 표면광기전력의 분광학적 연구 (Surface Photovoltage Spectroscopy on Dyed Zinc Oxide)

  • 김영순;성용길
    • 대한화학회지
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    • 제28권4호
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    • pp.251-258
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    • 1984
  • 색소를 흡착시킨 산화아연의 표면상태를 광기전력측정법을 이용하여 색소증감기구 및 바인더(binder)효과에 대한 연구를 수행하였다. 산화아연의 에너지트랩준위는 1.12eV이며, 색소흡착에 의해 0.99eV로 에너지준위가 낮아짐을 알았다. 바인더효과는 표면광기전력의 효율을 커지게 하나 에너지트랩준위에는 변화를 주지 않는다. 또한 색소증감기구로 흡착력이 강한 산형색소는 전자 이동(electron transfer)이며, 산화아연 고유흡수광에 減感작용이 있는 나트륨염형색소는 에너지이동(energy transfer)로써 추측된다. 근적외부인 1,100~1,350nm에 걸쳐 광기전력감도가 나타나므로 적외선에 의한 전자사진용 畵像材料로서 가능성을 제시하였다.

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Pe-Co-Ni 분말 소결 금속과 탄소강의 이종재료간 레이저 용접부의 결함형성기구 연구 (A Study on the Formation Mechanism of Discontinuities in $CO_2$ Laser Fusion Zone of Fe-Co-Ni Sintered Segment and Carbon Steel)

  • 신민효;김태웅;박희동;이창희
    • Journal of Welding and Joining
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    • 제21권3호
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    • pp.58-67
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    • 2003
  • In this study, the formation mechanism of discontinuities in the laser fusion zone of diamond saw blade was investigated. $CO_2$ laser weldings were conducted along the butt between Fe base sintered tip and carbon steel shank with sets of variable welding parameters. The effect of heat input on irregular humps, outer cavity, inner cavity and bond strengh was evaluated. The optimum heat input to have a proper humps was in the range of 10.4~$17.6kJm_{-1}$. With increasing heat input, both outer and inner cavities were reduced. The outer cavity was caused by insufficient refill of keyhole, while inner cavity was caused by trapping of bubble in molten metal. The bubble came from sintered tip and intensive vaporization at bottom tip of the keyhole. A gas formation and low melting point element vaporization were not occurred during welding. We could not find any relationship between bond strength and amount of discontinuities. Because the fracture were occurred in not only sintered tip but also carbon steel shank due to hardness distributions.

고전압 SiO2 절연층 nMOSFET n+ 및 p+ poly Si 게이트에서의 Positive Bias Temperature Instability 열화 메커니즘 분석 (Analysis of Positive Bias Temperature Instability Degradation Mechanism in n+ and p+ poly-Si Gates of High-Voltage SiO2 Dielectric nMOSFETs)

  • 윤여혁
    • 한국정보전자통신기술학회논문지
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    • 제16권4호
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    • pp.180-186
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    • 2023
  • 본 논문은 4세대 VNAND 공정으로 만들어진 고전압 SiO2 절연층 nMOSFET의 n+ 및 p+ poly-Si 게이트에서의 positive bias temperature instability(PBTI) 열화에 대해 비교하고 각각의 메커니즘에 대해 분석한다. 게이트 전극 물질의 차이로 인한 절연층의 전계 차이 때문에 n+/nMOSFET의 열화가 p+/nMOSFET의 열화보다 더 클 것이라는 예상과 다르게 오히려 p+/nMOSFET의 열화가 더 크게 측정되었다. 원인을 분석하기 위해 각각의 경우에 대해 interface state와 oxide charge를 각각 추출하였고, 캐리어 분리 기법으로 전하의 주입과 포획 메커니즘을 분석하였다. 그 결과, p+ poly-Si 게이트에 의한 정공 주입 및 포획이 p+/nMOSFET의 열화를 가속시킴을 확인하였다.

$Al-Al_2O_3-Si$(N형)의 MAS 구조에 있어서 고전계에 의한 Carrier 주인과 트?에 관한 연구 (A Study on Carrier Injection and Trapping by the High Field for MAS (Al-Al2O3-Si(n)) Structure)

  • 이영희;박성희
    • 대한전기학회논문지
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    • 제35권10호
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    • pp.465-472
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    • 1986
  • The present study was carried out to investigate the mechanism which control the voltage instability and the breakdown of CVD Al2O3 on Si substrates. Our sample were metal-Al2O3-Oi Capacitors with both Al and Au field plates. Electron injection and trapping, with resultant positive flatband voltage shift, occur at fields as low as 1-2[MV/cm.] We developed an approximate method for computing the location of the centroid of the trapped electrons. Our results indicate that the electrons are trapped near the injecting interface, at least for fields less than about 5[MV/cm ] Because of continued charging, a true steady state is probably never reached, and the only unique I-V curve is the one obtained initially, when the traps are empty. We measured this I-V curve for both polarities of applied voltage, using a fresh sample for each point. The observed current densities are much larger than those obtained in thermally grawn SiO2.

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SC PMOSFET의 수평 전개 모델과 노쇠화 메카니즘 (Lateral Electric Field Model and Degradation Mechanism of surface-Channel PMOSFET's)

  • 양광선;박종태;김봉렬
    • 전자공학회논문지A
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    • 제31A권1호
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    • pp.54-60
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    • 1994
  • In this paper, we present the analytical models for the change of the lateral electric field distribution and the velocity saturation region length with the electron trapping of stressed SC-PMOSFET in the saturation region. To derive the hot-electron-induced lateral electric field of stressed SC-PMOSFET. Ko's pseudo two dimensional box model in the saturation region which illustrates the analysis of the velocity saturation region is modified under the condition of electron trapping in the oxide near the drain region. From the results, we have the following lateral electric field in the y-direction, that is, E(y) ES1satT.cosh(y/l) qNS1tT.sinh(y/l)/lCox. It is shown that the trapped electrons influence the field in the drain region. decreasing the lateral electric field. Calculated velocity saturaion length increases with the trapped electrons. increasing the drain current of stressed SCPMOSFET. This results well explain the HEIP phenomenon of PMOSFET's.

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