• Title/Summary/Keyword: transparent optical films

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은 나노와이어 투명전극

  • Kim, Sang-Ho
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2012.05a
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    • pp.63.2-63.2
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    • 2012
  • One-dimensional nanowires (NW)/nanorods are under intense investigation in materials science due to their potential applications in many electronic devices. Since the properties required for these applications are greatly influenced by their microscopic structures, it is important to understand the relation between the microstructures with their optical and electric properties. In this study, Ag nanowires were synthesized in various dimensions and coated onto PET films to form transparent electrode. Their optical and electrical properties were studied in terms of their microstructures. Highly transparent (>90%), low haze transparent electrode films were successfully fabricated with surface resistance as low as (~50 ${\Omega}$/>).

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A Study on the Characteristics of NiInZnO/Ag/NiInZnO Multilayer Thin Films Deposited by RF/DC Magnetron Sputter According to the Thickness of Ag Insertion Layer (RF/DC 마그네트론 스퍼터로 제조한 NiInZnO/Ag/NiInZnO 다층박막의 Ag 금속 삽입층 두께 변화에 따른 특성 연구)

  • Kim, Nam-Ho;Kim, Eun-Mi;Heo, Gi-Seok;Yeo, In-Seon
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.65 no.12
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    • pp.2014-2018
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    • 2016
  • Transparent, conductive electrode films, showing the particular characteristics of good conductivity and high transparency, are of considerable research interest because of their potential for use in opto-electronic applications, such as smart window, photovoltaic cells and flat panel displays. Multilayer transparent electrodes, having a much lower electrical resistance than widely-used transparent conducting oxide electrodes, were prepared by using RF/DC magnetron sputtering system. The multilayer structure consisted of three layers, [NiInZnO(NIZO)/Ag/NIZO]. The optical and electrical properties of the multilayered NIZO/Ag/NIZO structure were investigated in relation to the thickness of each layer. The optical and electrical characteristics of multilayer structures have been investigated as a function of the Ag and NIZO film thickness. High-quality transparent conductive films have been obtained, with sheet resistance of $9.8{\Omega}/sq$ for Ag film thickness of 8 nm. Also the multilayer films of inserted Ag 8 nm thickness showed a high optical transmittance above 93% in the visible range. The electrical and optical properties of the new multilayer films were mainly dependent on the thickness of Ag insertion layer.

Transparent ZnO based thin film transistors fabricated at room temperature with high-k dielectric $Gd_2O_3$ gate insulators

  • Tsai, Jung-Ruey;Li, Chi-Shiau;Tsai, Shang-Yu;Chen, Jyun-Ning;Chien, Po-Hsiu;Feng, Wen-Sheng;Liu, Kou-Chen
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.374-377
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    • 2009
  • The characteristics of the deposited thin films of the zinc oxide (ZnO) at different oxygen pressures will be elucidated in this work. The resistivity of ZnO thin films were dominated by the carrier concentration under high oxygen pressure conditions while controlled by the carrier mobility at low oxygen ambiences. In addition, we will show the characteristics of the transparent ZnO based thin film transistor (TFT) fabricated at a full room temperature process with gate dielectric of gadolinium oxide ($Gd_2O_3$) thin films.

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A Study on the Optimization of the ITO/Ag/ITO Multilayer Transparent Electrode by Using In-line Magnetron Sputtering (인라인 마그네트론 스퍼티링에 의한 ITO/Ag/ITO 다층 구조 투명전극의 최적화에 관한 연구)

  • Lee, Seung Yong;Yoon, Yeo Tak;Cho, Eou Sik;Kwon, Sang Jik
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.3
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    • pp.162-169
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    • 2017
  • Indium tin oxide (ITO) thin films show a low sheet resistance and high transmittance in the visible range of the spectrum. Therefore, they play an important role as transparent electrodes for flat panel displays. However, their resistivity is rather high for use as a transparent electrode in large displays. One way to improve electrical and optical properties in large displays is to use ITO/Ag/ITO multilayer films. ITO/Ag/ITO multilayer films have lower sheet resistance than single layer ITO films with the same thickness. Prior to the ITO/Ag/ITO multilayer experiments, optimal condition for thickness change are necessary. Their thicknesses were deposited differently in order to analyze electrical and optical properties. However, when optimal single film characteristics are applied to ITO/Ag/ITO multilayer films, other phenomena appeared. After analyzing the electrical and optical properties by changing ITO and Ag film thickness, ITO/Ag/ITO multilayer films were optimized. By combining ITO film at $586\;{\AA}$ and Ag film at 10 nm, the ITO/Ag/ITO multilayer films showed optimized high optical transmittance of 87.65%, and the low sheet resistance of $5.5{\Omega}/sq$.

Improvement of Optical and Electrical Properties of ITO/Ag/ITO Thin Films for Transparent Conducting Electrode (투명 전극 ITO/Ag/ITO 박막의 광학적 및 전기적 특성 향상 연구)

  • Shin, Yeon Bae;Kang, Dong-Won;Kim, Jeha
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.11
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    • pp.740-744
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    • 2017
  • Herein we studied the electrical and optical properties of indium tin oxide ITO/Ag/ITO multilayer thin films for application in transparent conducting electrodes. The ITO and Ag thin films were deposited onto soda lime glass (SLG) using radiofrequency and DC-sputtering methods, respectively. The as-synthesized ITO/Ag/ITO multilayer thin films were analyzed using 4-point probe, UV-Visible spectroscopy, and Hall measurement. We observed a rapid increase in electron concentration with increasing Ag thickness. However, electron mobility decreased with increasing Ag thickness. Finally, ITO/Ag/ITO multilayer thin films showed a characteristic low sheet resistance of $18{\Omega}/sq$ and high optical transmittance value (80%) with variation of Ag thickness (5~10 nm).

Preparation of Transparent and Conducting Tin Oxide Films by the Ultrasonic Spray Pyrolysis (초음파분무열분해에 의한 투명전도성 산화주석막의 제조)

  • Kim, Sang-Kil;Yoon, Cheonho
    • Applied Chemistry for Engineering
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    • v.9 no.2
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    • pp.214-219
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    • 1998
  • The transparent conducting tin oxide films were deposited on g1ass substrates by the ultrasonic spray pyrolysis. Examined were effects of deposition parameters on the electrical resistance, optical transmittance, crystal structure, and thickness of tin oxide films. As both the deposition time and concentration of tin(IV) chloride increase, the deposited tin oxide films exhibited the decrease of electrical resistance and optical transmittance in the visible and near infrared region. With increasing heat-treatment temperature in air, the deposited tin oxide films showed the enhanced electrical resistance and optical transmittance. This study suggests that the ultrasonic spray pyrolysis may be a promising deposition technique effectively to prepare transparent conducting films of good quality in a single step.

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Effects of Deposition Thickness and Oxygen Introduction Flow Rate on Electrical and Optical Properties of IZO Films (증착두께 및 산소도입속도가 IZO 필름의 전기 및 광학적 특성에 미치는 영향)

  • Park, Sung-Hwan;Ha, KiRyong
    • Applied Chemistry for Engineering
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    • v.21 no.2
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    • pp.224-229
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    • 2010
  • Transparent conductive oxide films have been widely used in the field of flat panel display (FPD). Transparent conductive Indium Zinc Oxide (IZO) thin films with excellent chemical stability have attracted much attention as an alternative material for Indium Tin Oxide (ITO) films. In this study, using $In_2O_3$ and ZnO powder mixture with a ratio of 90 : 10 wt% as a target, IZO films are prepared on polynorbornene (PNB) substrates by electron beam evaporation. The effect of thickness and $O_2$ introduction flow rate on the optical, electrical, structural properties and surface composition of deposited IZO films were investigated by UV/Visible spectrophotometer, 4-point probe method, SEM, XRD and XPS.

The Properties of the Nitrocellulose/MWCNT Composites Fabricated on the 10 ${\mu}m$ Polyimide Film for the Flexible Transparent Conduction Film (10 ${\mu}m$ 폴리이미드 기판에 성막된 플렉시블 투명 전도막용 Nitrocellulose/MWCNT 복합체의 제작 및 특성)

  • Jang, Kyung-Uk
    • Journal of the Semiconductor & Display Technology
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    • v.9 no.2
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    • pp.117-121
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    • 2010
  • The composite films were fabricated by air-spray method under the 2 kgf/$cm^2$ pressure using the multi-walled CNTs solution and the nitrocellulose on a 10 ${\mu}m$ polyimide film substrates. We obtained the composite films which were sprayed with the MWCNT dispersion by varying the spray time from 20, 40 and 60sec. The electrical and the optical properties of the sandwiched-structure-composite thin films were investigated by an UV/VIS spectrometer and a Hall Effect equipment. As a result, the optical transmittance of all thin films in the visible range, as well as the electrical conductance shows an available value for the transparent electrode. The carrier concentration and the light transmittance rate for the fabricated sample are between $3.733{\times}10^{10}$ and $6.551{\times}10^{14}cm^{-3}$, around 35 to 95%, respectively.

The Application and Electrical, Optical Properties of $In_2O_3$: Sn Transparent Conducting Films (ITO투명도전막의 전기, 광학적 특성 및 그 응용)

  • Lee, Dong Hoon;Park, Ki Cheol;Park, Chang Bae;Kim, Ki Wan
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.23 no.4
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    • pp.498-505
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    • 1986
  • In2O3: Sn(ITO) transparent conducting films were fabricated by the electron beam evaporation method. The dependence of their electrical and optical properties on deposition conditions were examined. The optimum evaporation conditions were such that the deposition rate was 5-10\ulcornersec, oxygen partial pressure was 4x10**_4 torr, substate temperatudre was above 300\ulcorner, and SnO2 doping rate was 10 mol%. The values of sheet resistance and transmittance of the films in visible region fabricated under these optimum conditins were 12\ulcorner/ and 87-99%, respecively. And the energy conversion efficiency of the SIS solar cell fabricated using ITO was 9.16%. It is shown that the transparent conducting films can be applied to the TV camear pick-up tube and solar cell.

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Technical Trends of Flexible, Transparent Electromagnetic Interference Shielding Film (유연한 투명 전자기 간섭 차폐 필름의 기술개발 동향)

  • Lim, Hyun-Su;Oh, Jung-Min;Kim, Jong-Woong
    • Journal of the Microelectronics and Packaging Society
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    • v.28 no.1
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    • pp.21-29
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    • 2021
  • Recently, semiconductor chips and electronic components are increasingly being used in IT devices such as wearable watches, autonomous vehicles, and smart phones. As a result, there is a growing concern about device malfunctions that may occur due to electromagnetic interference being entangled with each other. In particular, electromagnetic wave emissions from wearable or flexible smart devices have detrimental effects on human health. Therefore, flexible and transparent electromagnetic interference (EMI) shielding materials and films with high optical transmittance and outstanding shielding effectiveness have been gaining more attention. The EMI shielding films for flexible and transparent electronic devices must exhibit high shielding effectiveness, high optical transmittance, high flexibility, ultrathin and excellent durability. Meanwhile, in order to prepare this EMI shielding films, many materials have been developed, and results regarding excellent EMI shielding performance of a new materials such as carbon nano tube (CNT), graphene, Ag nano wire and MXene have recently been reported. Thus, in this paper, we review the latest research results to EMI shielding films for flexible and transparent device using the new materials.