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Effects of Deposition Thickness and Oxygen Introduction Flow Rate on Electrical and Optical Properties of IZO Films  

Park, Sung-Hwan (Department of Chemical Engineering, Keimyung University)
Ha, KiRyong (Department of Chemical Engineering, Keimyung University)
Publication Information
Applied Chemistry for Engineering / v.21, no.2, 2010 , pp. 224-229 More about this Journal
Abstract
Transparent conductive oxide films have been widely used in the field of flat panel display (FPD). Transparent conductive Indium Zinc Oxide (IZO) thin films with excellent chemical stability have attracted much attention as an alternative material for Indium Tin Oxide (ITO) films. In this study, using $In_2O_3$ and ZnO powder mixture with a ratio of 90 : 10 wt% as a target, IZO films are prepared on polynorbornene (PNB) substrates by electron beam evaporation. The effect of thickness and $O_2$ introduction flow rate on the optical, electrical, structural properties and surface composition of deposited IZO films were investigated by UV/Visible spectrophotometer, 4-point probe method, SEM, XRD and XPS.
Keywords
indium zinc oxide (IZO); polynorbornene (PNB); E-beam deposition; transparent conductive oxide (TCO); flexible display;
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