• 제목/요약/키워드: titanium oxide film

검색결과 132건 처리시간 0.043초

습식 분무 열분해 방법으로 제조한 코발트 도핑된 티타늄 산화막의 표면 및 광학적 특성 (Surface and Optical Characteristics of Cobalt Dopped-titanium Oxide Film Fabricated by Water Spray Pyrolysis Technique)

  • 송호준;박영준
    • 한국재료학회지
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    • 제15권3호
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    • pp.209-215
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    • 2005
  • Titanium dioxide films $(TiO_2)$ doped cobalt transition metal were prepared on titanium metal by water spray pyrolysis technique. Micro-morphology, crystalline structure, chemical composition and binding state of sample groups were evaluated using field emission scanning microscope(FE-SEM), X-ray diffractometer(XRD), Raman spectrometer, X-ray photoelectron spectrometer(XPS). $TiO_2$ films of rutile structure were predominately formed on all sample groups and $Ti_2O_3$ oxide was coexisted on the surface of cobalt doped-sample groups. The optical absorption peaks measured by using UV-VIS-NIR spectrophotometer were observed at specific wavelength region in sample groups doped cobalt ion. This result could be analyzed by introducing crystal field theory.

R.F Magnetron Sputtering법으로 제조한 TiO2 박막의 특성 (Characteristics of TiO2 Thin Films Fabricated by R.E, Magnetron Sputtering)

  • 추용호;최대규
    • 한국재료학회지
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    • 제14권11호
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    • pp.821-827
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    • 2004
  • Titanium oxide thin films were prepared on Si(100) substrates by R.F. magnetron reactive sputtering at $30\sim200watt$ R.F power range, and annealed at $600^{\circ}C\sim800^{\circ}C$ for 1 hour. The properties of $TiO_2$ thin films were analyzed using x-ray, ${\alpha}-step$, ellipsometer, scanning electron microscopy, and FT-IR spectrometer. Upon in-situ depositions, the initial phase of $TiO_2$ thin film showed non-crystalline phase at R.F. power $30\sim100$ watt. The crosssection of $TiO_2$ thin films were sbserved to be the columnar structure. With the increasing R.F power and annealing temperature, the grain size, crystallinity, refractive index, and void size of titanium oxides showed a tended to increase. The FT-IR transmittance spectra of titanium oxide thin films have the obsorption band of Ti-O bond, Si-O bond, Si-O-Ti bond and O-H bond. With the increase of R.F. power and annealing temperature, these films have the stronger bond structures. It is considered that such a phenomena is due to phase transition and good crystallinity

Study on Mechanical and Thermal Properties of Tio2/Epoxy Resin Nanocomposites

  • Kim, Bu-Ahn;Moon, Chang-Kwon
    • International Journal of Ocean System Engineering
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    • 제3권2호
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    • pp.102-110
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    • 2013
  • The purpose of this study was to improve the properties of epoxy resin using titanium oxide nanoparticles. The effects of particle weight fraction, dispersion agent, and curing agents with different molecular weights on the thermal and mechanical properties of titanium-oxide-reinforced epoxy resin were investigated. In addition, the effect of the particle dispersion condition on the mechanical properties of nanocomposites was studied. As a result, it was found that the glass transition temperature of film-shaped nanocomposites decreased with an in-crease in the nanoparticle content. Because nanoparticles interrupted the cross linkage between the epoxy resin and the amine curing agent, the cross-link density of the epoxy became lower and led to a decrease in $T_g$ in the nanocompo-sites. The tensile strength and modulus in film-shaped nanocomposites also increased with the particles content. But in the case of dog-bone-shaped nanocomposites, the values were not similar to the trend for the film-shaped nanocompo-sites. This was probably a result of the different nanoparticles dispersions in the epoxy resins resulting from the respective-thicknesses of the film and dog-bone-shaped samples.

양극 산화에 의해 티타늄 표면에 형성된 산화 피막이 세포 부착 및 성장에 미치는 영향 (Influence of Anodic Oxidation Film Formed on Titanium onto Cell Attachment and Proliferation)

  • 노세라;이용렬;송호준;박영준
    • 한국재료학회지
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    • 제16권10호
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    • pp.606-613
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    • 2006
  • This study was purposed to evaluate the influence of anodically oxidized film on titanium (Ti) onto MG-63 osteoblast-like cell attachment and activity. Only scratch lines created by polishing were seen in ASR and ANO-1 groups. About $1.5{\mu}m$-thick homogeneous oxide film which has pores of about $0.5{\mu}m$ diameter were formed in ANO-12. The crystalline structure of the oxide films formed by anodization in phosphoric acid electrolyte was $TiP_2O_7$. The total protein amounts of ANO-1 and ANO-12 groups showed higher values of maximum protein amount than that of AS-R group. At 3 days of incubation, total protein amount showed higher value in ANO-2 when comparing to that of AS-R (p<0.05). Based on the results of ALPase activity test, the degree of MG-63 cell differentiation for initial mineralization matrix formation was similar. For all the test groups after 1 day of incubation, MG-63 cells grew healthily in mono-layer with dendritic extensions. After incubation for 3 days, the specimen surfaces were covered more densely by cells, and numerous micro filaments were extruding to the extracellular matrix.

Development and Application of Group IV Transition Metal Oxide Precursors

  • Kim, Da Hye;Park, Bo Keun;Jeone, Dong Ju;Kim, Chang Gyoun;Son, Seung Uk;Chung, Taek-Mo
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.303.2-303.2
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    • 2014
  • The oxides of group IV transition metals such as titanium, zirconium, hafnium have many important current and future application, including protective coatings, sensors and dielectric layers in thin film electroluminescent (TFEL) devices. Recently, group IV transition metal oxide films have been intensively investigated as replacements for SiO2. Due to high permittivities (k~14-25) compared with SiO2 (k~3.9), large band-gaps, large band offsets and high thermodynamic stability on silicon. Herein, we report the synthesis of new group IV transition metal complexes as useful precursors to deposit their oxide thin films using chemical vapor deposition technique. The complexes were characterized by FT-IR, 1H NMR, 13C NMR and thermogravimetric analysis (TGA). Newly synthesised compounds show high volatility and thermal stability, so we are trying to deposit metal oxide thin films using the complexes by Atomic Layer Deposition (ALD).

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Fabrication of Hybrid Films Using Titanium Chloride and 2,4-hexadiyne-1,6-diol by Molecular Layer Deposition

  • 윤관혁;성명모
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.418-418
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    • 2012
  • We fabricated a new type of hybrid film using molecular layer deposition (MLD). The MLD is a gas phase process analogous to atomic layer deposition (ALD) and also relies on a saturated surface reaction sequentially which results in the formation of a monolayer in each sequence. In the MLD process, polydiacetylene (PDA) layers were grown by repeated sequential surface reactions of titanium tetrachloride and 2,4-hexadiyne-1,6-diol with ultraviolet (UV) polymerization under a substrate temperature of $100^{\circ}C$. Ellipsometry analysis showed a self-limiting surface reaction process and linear growth of the hybrid films. Polymerization of the hybrid films was confirmed by infrared (IR) spectroscopy and UV-Vis spectroscopy. Composition of the films was confirmed by IR spectroscopy and X-ray photoelectron (XP) spectroscopy. The titanium oxide cross-linked polydiacetylene (TiOPDA) hybrid films exhibited good thermal and mechanical stabilities.

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H2O2 산화제가 W/Ti 박막의 전기화학적 분극특성 및 CMP 성능에 미치는 영향 (Electrochemical Polarization Characteristics and Effect of the CMP Performances of Tungsten and Titanium Film by H2O2 Oxidizer)

  • 나은영;서용진;이우선
    • 한국전기전자재료학회논문지
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    • 제18권6호
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    • pp.515-520
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    • 2005
  • CMP(chemical mechanical polishing) process has been attracted as an essential technology of multi-level interconnection. Also CMP process got into key process for global planarization in the chip manufacturing process. In this study, potentiodynamic polarization was carried out to investigate the influences of $H_2O_2$ concentration and metal oxide formation through the passivation on tungsten and titanium. Fortunately, the electrochemical behaviors of tungsten and titanium are similar, an one may expect. As an experimental result, electrochemical corrosion of the $5\;vol\%\;H_2O_2$ concentration of tungsten and titanium films was higher than the other concentrations. According to the analysis, the oxidation state and microstructure of surface layer were strongly influenced by different oxidizer concentration. Moreover, the oxidation kinetics and resulting chemical state of oxide layer played critical roles in determining the overall CMP performance. Therefore, we conclude that the CMP characteristics tungsten and titanium metal layer including surface roughness were strongly dependent on the amounts of hydrogen peroxide oxidizer.

티타늄 파우더가 금속의 열처리 시 결합강도에 미치는 영향 (Effect of titanium powder on the bond strength of metal heat treatment)

  • 김사학;김욱태
    • 구강회복응용과학지
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    • 제33권2호
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    • pp.71-79
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    • 2017
  • 목적: 본 연구는 베릴륨이 함유되지 않은 금속-도재용(Ni-Cr)합금 산화처리 시 도재로 안에 티타늄 파우더를 화학적 촉매로 이용하여 산화막을 억제하고, 금속 표면에 형성될 불순물을 제어하여 도재의 결합력을 증진시켜 줄 수 있는 가능성을 분석 하고자 하였다. 연구 재료 및 방법: 베릴륨이 함유되지 않은 금속-도재용(Ni-Cr)합금 산화처리 시 도재로 안에 티타늄을 화학적 촉매로 이용하였다. 티타늄 파우더를 화학적 촉매로 사용하지 않은 T1군을 대조군으로 하고, 10 g, 20 g 티타늄 파우더를 사용한 시편을 T2, T3군으로 분류하여 전단결합강도와 계면특성 관찰을 위하여 제작 하였다. 일원배치 분산분석(one-way ANOVA)은 그룹의 차이를 검사하기 위해서 시행하였고 사후 검정(Tukey Honestly Significant Difference test)은 그룹 간의 통계적 분석을 위하여 수행되었다. 결과: 티타늄 파우더를 화학적 촉매로 사용 한 T3군의 3점 굽힘 결합강도와 산화막 두께를 측정한 결과, $39.22{\pm}3.4MPa$$6.66{\mu}m$로 가장 높고, 얇게 나타났으며, T2군은 $34.65{\pm}1.39MPa$$13.22{\mu}m$, 티타늄 화학적 촉매로 사용하지 않은 대조군 T1군은 $32.37{\pm}1.91MPa$$22.22{\mu}m$ 순으로 나타났다. 결론: 시편들의 결합강도를 통계 분석한 결과, 티타늄 파우더를 화학적 촉매로 사용한 실험 T3, T2군의 결합력이 높게 나타났고, 산화막 두께 역시 대조군 T1군 보다 얇게 나타나 것으로 결합력 증진에 영향을 줄 수 있음이 관찰 되었다.