• Title/Summary/Keyword: thin film filter

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Thin Films for Environmental Application and Energy Devices

  • Kim, Young-Dok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.91-91
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    • 2012
  • We aim in synthesizing various functional thin films thinner than ~ 10 nm for environmental applications and photovoltaic devices. Atomic layer deposition is used for synthesizing inorganic thin films with a precise control of the film thickness. Several examples about application of our thin films for removing volatile organic compounds (VOC) will be highlighted, which are summarized in the below. 1) $TiO_2$ thin films prepared by ALD at low temperature ($<100^{\circ}C$) show high adsorption capacity for toluene. In combination with nanostructured templates, $TiO_2$ thin films can be used as building-block of high-performing VOC filter. 2) $TiO_2$ thin films on carbon fibers and nanodiamonds annealed at high temperatures are active for photocatalytic oxidation of VOCs, i.e. photocatalytic filter can be created by atomic layer deposition. 3) NiO can catalyze oxidation of toluene to $CO_2$ and $H_2O$ at $<300^{\circ}C$. $TiO_2$ thin films on NiO can reduce poisoning of NiO surfaces by reaction intermediates below $200^{\circ}C$. We also fabricated inverted organic solar cell based on ZnO electron collecting layers on ITO. $TiO_2$ thin films with a mean diameter less than 3 nm on ZnO can enhance photovoltaic performance by reducing electron-hole recombination on ZnO surfaces.

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Fabrication of a CNT Filter for a Microdialysis Chip

  • An, Yun-Ho;Song, Si-Mon
    • Molecular & Cellular Toxicology
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    • v.2 no.4
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    • pp.279-284
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    • 2006
  • This paper describes the fabrication methods of a carbon nanotube (CNT) filter and a microdialysis chip. A CNT filter can help perform dialysis on a microfluidic chip. In this study, a membrane type of a CNT filter is fabricated and located in a microfluidic chip. The filter plays a role of a dialysis membrane in a microfluidic chip. In the fabrication process of a CNT filter, individual CNTs are entangled each other by amide bonding that is catalyzed by 1-Ethyl-3-(3-dimethylaminopropyl)carbodiimide (EDC) and N-hydroxysuccinimide (NHS). The chemically treated CNTs are shaped to form a CNT filter using a PDMS film-mold and vacuum filtering. Then, the CNT filter is sandwiched between PDMS substrates, and they are bonded together using a thin layer of PDMS prepolymer as adhesive. The PDMS substrates are fabricated to have a microchannel by standard photo-lithography technique.

The effect on characteristic of ITO(glass) by polyimide thin film process (Polyimide 막 공정이 ITO Glass의 특성에 미치는 영향)

  • Kim, Ho-Soo;Kim, Han-Il;Jung, Soon-Won;Koo, Kyung-Wan;Han, Sang-Ok
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07b
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    • pp.857-860
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    • 2002
  • The material that is both conductive in electricity and transparent to the visible-ray is called transparent conducting thin film. It has many field of application such as solar cell, liquid crystal display, transparent electrical heater, selective optical filter, and a optical electric device. In this study, indium tin oxide (ITO ; Sn-doped $In_2O_3$) thin films were deposited on $SiO_2$/soda-lime glass plates by a dc magnetron sputtering technique. The crystallinity and electrical properties of the films were investigated by X-ray diffraction(XRD), atomic force microscopy (AFM) scanning and 4-point probe. The optical transmittance of ITO films in the range of 300-1000nm were measured with a spectrophotometer. As a result, we obtained polycrystalline structured ITO films with (222), (400), and (440) peak. Transmittance of all the films were higher than 90% in the visible range.

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Optimum deposition conditions of AlN thin film on the Si substrate for SAW application (SAW 소자 응용을 위한 실리콘 기판 위에 AlN 박막의 최적 증착 조건에 관한 연구)

  • Ko, Bong-Chul;Nam, Chang-Woo
    • Journal of Sensor Science and Technology
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    • v.16 no.4
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    • pp.301-306
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    • 2007
  • AlN thin film for SAW filter application was deposited on (100) silicon wafers by reactive magnetron sputtering method. The structural characteristics were dependent on the deposition conditions such as sputtering pressure, RF power, substrate temperature, and nitrogen partial pressure. Scanning Electron Microscope (SEM), X-ray Diffraction (XRD), Electron Probe MicroAnalyzer (EPMA) and Atomic Force Microscope (AFM) have been used to find out structural properties and preferred orientation of AlN thin films. Insertion loss of SAW devices was 28.51 dB and out of band rejection was about 24 dB.

The Natural Cooling Effects of Pre-heated Substrate during RF Magnetron Sputter Deposition of ZnO (ZnO 박막의 RF 마그네트론 스퍼터 증착 중 미리 가열된 기판의 자연냉각 효과)

  • Park, Sung-Hyun;Lee, Neung-Hun
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.56 no.5
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    • pp.905-909
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    • 2007
  • Crystalline and micro-structural characteristics of ZnO thin films which were deposited on p-Si(100) with cooling naturally down of pre-heated substrate during RF magnetron sputter deposition, were investigated by XRD and SEM in this paper. The film which was prepared on the substrate which was pre-heated to $400^{\circ}C$ before deposition and then cooled naturally down during deposition, showed the most outstanding c-axis preferred orientation. The ZnO thin film having the best crystalline result were applied to SMR type FBAR device and resonance properties of the device were investigated by network analyzer. It showed that resonance frequency was 2.05 GHz, return loss was -30.64 dB, quality factor was 3169 and electromechanical coupling factor was 0.4 %. This deposition method would be very useful for application of surface acoustic wave filter or film bulk acoustic wave resonator.

The Electric Breakdown Characteristic of High Density Polyethylene by Making Use of Solution-grown Thin Films (용액법에 의해 작성한 고밀도 폴리에틸렌 박막의 절연파괴(絶緣破壞)특성 연구)

  • Kim, S.K.;Lee, H.W.;Han, S.H.;Park, K.S.;Park, G.M.;Kim, J.S.
    • Proceedings of the KIEE Conference
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    • 1994.07b
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    • pp.1379-1381
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    • 1994
  • In order to investigate the effects of crystal structure in electrical breakdown of polyethylene film. Low molecular materials in polyethylene are removed by the method as follow. Polyethylene was dissolved in xylene and filtered through a glass fiber filter. And then, a polyethylene thin films of thickness $0.5 - 0.9{\mu}m$ are prepared with heat treatment from solution casting. To evaluate the performance of PE film, Electrical breakdown of PE film are measured on M( Al) - I (PE)-M(Al) system.

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Deposition process of Multi-layered Al-%Cu/Tungsten Nitride Thin Film (Magnetron sputtering 법으로 제조된 Al-1%Cu/Tungsten Nitride 다층 박막)

  • Lee, Gi-Seon;Kim, Jang-Hyeon;Seo, Su-Jeong;Kim, Nam-Cheol
    • Korean Journal of Materials Research
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    • v.10 no.9
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    • pp.624-628
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    • 2000
  • As a power durable-electrode in SAW filter, Al-1%Cu/tungsten nitride multi-layer thin film was fabricated by magnetron sputtering process. Tungsten nitride films had the amorphous phase at the nitrogen ratio, R, ranging from 10~40%. The amorphization could be controlled by nitrogen ratio, R= $N_2$/($N_2$+Ar) as a sputtering process parameter. Residual stress in tungsten nitride abruptly decreased with the formation of amorphous phase. Al-1%Cu thin film was deposited on the amorphous tungsten nitride. After the multi-layed thin film was annealed for 4 hours at 453K, the resistivity decreased as $3.6{\mu}{\Omega}-cm$, which was due to grain growth reduced crystal defects.

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Design and Fabrication of CDMA Base Station SAW Band Pass Filter (CDMA 기지국용 SAW BAND PASS FILTER 의 설계 및 제작)

  • 김재천;윤영섭
    • Proceedings of the IEEK Conference
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    • 1998.10a
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    • pp.31-34
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    • 1998
  • CDMA base station SAW filter has been designed and fabricated successfully. Through the computer simulation, SAW filter is designed to have center frequency of 69.99MHz, ripples lower than 0.7dB and rejection level lower than 50dB. To obtain low noise band pass SAW filter, Input electrode has a apodization type and output electrode has a withdrawal type. For the fabrication of the SAW filter, Al thin film is deposited to the quartz substrates. The fabricated SAW filter has center frequency of 70.5MHz, ripples of 1dB and rejection level of 45dB.

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Improving the Color Gamut of a Liquid-crystal Display by Using a Bandpass Filter

  • Sun, Yan;Zhang, Chi;Yang, Yanling;Ma, Hongmei;Sun, Yubao
    • Current Optics and Photonics
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    • v.3 no.6
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    • pp.590-596
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    • 2019
  • To improve the color gamut of a liquid-crystal display (LCD), we propose a bandpass filter that is added to the backlight unit to optimize the backlight spectrum. The bandpass filter can only transmit red, green and blue light in the visible range, while reflecting the unwanted light. We study the optical properties of the bandpass filter using the transfer-matrix method, and the effect of the bandpass filter on the color gamuts of LCDs is also investigated. When a bandpass filter based on a 5-layer configuration comprising low and high refractive indices ((HL)2H) is used in phosphor-converted white-light-emitting diode (pc-WLED), K2SiF6:Mn4+ (KSF-LED), and quantum-dot (QD) backlights, the color gamuts of the LCDs improve from 72% to 95.3% of NTSC, from 92% to 106.7% of NTSC, and from 104.3% to 112.2% of NTSC respectively. When the incident angle of light increases to 30°, the color gamuts of LCDs with pc-WLED and KSF-LED backlights decrease by 2.9% and 1% respectively. For the QD backlight, the color gamut almost does not change. When the (HL)2H structure is coated on the diffusion film, the color gamut can be improved to 92.6% of NTSC (pc-WLED), 105.6% of NTSC (KSF-LED), and 111.9% of NTSC (QD). The diffusion film has no obvious effect on the color gamut. The results have an important potential application in wide-color-gamut LCDs.

FBAR Device with Thin AlN Piezoelectric Film for 2 GHz RF Bandpass Filter Applications (2 GHz 대역 RF 대역통과 필터 응용을 위한 AlN 압전 박막을 이용한 FBAR 소자)

  • Giwan Yoon;Munhyuk Yim;Dongkyu Chai;Kim, Sanghee;Kim, Jongheon
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.7 no.2
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    • pp.250-254
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    • 2003
  • A film bulk acoustic resonator (FBAR) device for 2 GHz radio frequency (RF) bandpass filter application is presented. This FBAR device consists of an aluminum nitride (AlN) film sandwiched between top(Al) and bottom(Au) electrodes and an acoustic multilayer reflector of a silicon dioxide/tungsten (SiO2/W). The A/N film deposited using a RF sputtering was observed to have small columnar grains with a strongly preferred orientation towards c axis. In addition to a high quality factor (4300), a large return loss of 37.19 dB was obtained.