• Title/Summary/Keyword: thick films

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Improvement of Sensitivity to In-plane Strain/Deformation Measurement by Micro-ESPI Technique (마이크로 ESPI 기법에 의한 면내 변형 측정 민감도 향상)

  • Kim D.I.;Huh Y.H.;Kee C.D.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.06a
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    • pp.1442-1445
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    • 2005
  • Several test methods, including micro strain/deformation measurement techniques, have been studied to more reliably measure the micro properties in micro/nano materials. Therefore, in this study, the continuous measurement of in-plane tensile strain in micro-sized specimens of thin film materials was introduced using the micro-ESPI technique. TiN and Au thin films 1 and $0.47\;\mu{m}$ thick, respectively, were deposited on the silicon wafer and fabricated into the micro-sized tensile specimens using the electromachining process. The micro-tensile loading system and micro-ESPI system were developed to measure the tensile strain during micro-tensile test. The micro-tensile stress-strain for these materials was determined using the algorithm for continuous strain measurement. Furthermore, algorithm for enhancing the sensitivity to measurement of in-plane tensile strain was suggested. According to the algorithm for enhancement of sensitivity, micro-tensile strain data between interfringe were calculated. It is shown that the algorithm for enhancement of the sensitivity suggested in this study makes the sensitivity to the in-plane tensile strain increase.

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Microstructures and properties of $BaTiO_3$ and $BaTiO_3$-polymer composite thick films by aerosol deposition method

  • Jo, Seong-Hwan;Yun, Yeong-Jun;Kim, Hyeong-Jun;Kim, Hyo-Tae;Kim, Ji-Hun;Nam, Song-Min;Baek, Hong-Gu;Kim, Jong-Hui
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.11a
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    • pp.110-110
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    • 2009
  • Aerosol deposition method(ADM)는 상온에서 에어로졸화된 고상의 원료분말을 노즐을 통해 분사시켜 소결과정을 거치지 않고도 상온에서 고밀도 후막을 제조할 수 있는 공정으로서, 다양한 재료의 코팅이 가능하고, 코팅층의 조성 및 화학 양론비의 제어가 용이한 특징을 갖는다. 본 연구에서는 ADM을 이용하여 큰 유전상수, 압전계수, 초전계수, 탄성계수를 갖는 $BaTiO_3$ 분말을 원료로 하여 압전소자, 커패시터, 고전압용 유전체 등에 응용이 가능한 세라믹 층 형성에 관한 연구를 진행하였다. 또한 $BaTiO_3$ 같은 강유전체 세라믹을 이용하여 여러 가지 소자를 제조하는 경우 소자의 미세조직에 따라 물성이 영향을 받는 것으로 확인되어져 있다. 이에 본 연구에서는 세라믹 분말보다 상대적으로 탄성이 큰 polymer 분말을 첨가하여 후막 내부의 결정립의 크기가 20 nm 의 평균 결정립을 갖는 세라믹 후막에 비해 최대 10 배 정도까지 증가하는 것을 확인할 수 있었으며, 이에 따라 후막에서의 유전율 및 유전손실율의 전기적 특성 변화를 확인할 수 있었고, 이러한 물성변화에 대한 원인 고찰을 위하여 후막의 미세구조 및 화학조성 등에 대한 다양한 분석이 이루어 졌으며, 상온에서 성막되는 후막의 세라믹 층의 응용을 위한 최적의 공정조건을 제시하고자 한다.

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Fabrication of Nanostructures by Dry Etching Using Dewetted Pt Islands as Etch-masks (Dewetting된 Pt Islands를 Etch Mask로 사용한 GaN 나노구조 제작)

  • Kim, Taek-Seung;Lee, Ji-Myon
    • Korean Journal of Materials Research
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    • v.16 no.3
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    • pp.151-156
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    • 2006
  • A method for fabrication of nano-scale GaN structure by inductively coupled plasma etching is proposed, exploiting a thermal dewetting of Pt thin film as an etch mask. The nano-scale Pt metal islands were formed by the dewetting of 2-dimensional film on $SiO_2$ dielectric materials during rapid thermal annealing process. For the case of 30 nm thick Pt films, pattern formation and dewetting was initiated at temperatures greater $600^{\circ}C$. Controlling the annealing temperature and time as well as the thickness of the Pt metal film affected the size and density of Pt islands. The activation energy for the formation of Pt metal island was calculated to be 23.2 KJ/mole. The islands show good resistance to dry etching by a $CF_4$ based plasma for dielectric etching indicating that the metal islands produced by dewetting are suitable for use as an etch mask in the fabrication of nano-scale structures.

The Fabrication of Gas Sensors using MWCNTs (다중벽 카본 나노 튜브를 이용한 가스센서의 제작)

  • Jang, Kyung-Uk;Kim, Myung-Ho
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.12
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    • pp.1089-1094
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    • 2009
  • Carbon nanotubes (CNTs) have excellent electrical, chemical stability, mechanical and thermal properties. In this paper, networks of Multi-walled carbon nanotube (MWCNT) materials were investigated as resistive gas sensors for ethanol ($C_2H_5OH$) detection. Sensor films were fabricated by air spray method for the multi-walled CNTs solution on glass substrates. Sensors were characterized by resistance measurements in the sensing system, in order to find the optimum detection properties for the ethanol gas molecular. The film that was sprayed with the MWCNT dispersion for 60 see, was 300 nm thick. And the electric resistivity is $2{\times}10^{-2}\;{\Omega\cdot}cm$. Also, the sensitivity and the linearity of MWVNT sensor for ethanol gas are 0.389 %/sec and 17.541 %/FS, respectively. The MWCNT film was excellent in the response for the ethanol gas molecules and its reaction speed was very fast, which could be using as ethanol gas sensor. The conductance of the fabricated sensors decreases when the sensors are exposed to ethanol gas.

Effect of KF Treatment of Cu(In,Ga)Se2 Thin Films on the Photovoltaic Properties of CIGS Solar Cells (Cu(In,Ga)Se2 박막의 KF 처리가 CIGS태양전지에 미치는 영향)

  • Jeong, Gwang Sun;Cha, Eun Seok;Moon, Sun Hong;Ahn, Byung Tae
    • Current Photovoltaic Research
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    • v.3 no.2
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    • pp.65-70
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    • 2015
  • We applied KF on CIGS film to modify CIGS surface with a wider-bandgap surface layer. With the KF deposition the surface of CIGS film had fine particle on the CIGS surface at 350 and $300^{\circ}C$. No fine particle was detected at 500 and $250^{\circ}C$. With the KF treatment, the Ga and O content increased at the surface, while the In and Cu content decreased. The valence band maximum was lowered with KF treatment. The composition profile and band structure were positive side of applying KF on the CIGS surface. However, the efficiency decreased with the KF treatment due to high series resistance, probably due to too thick surface layer. A smaller amount of KF should be supplied and more systematic analysis is necessary to obtain a reproducible higher efficiency CIGS solar cells.

Quench Characteristics of Resistive Superconducting Fault Current Limiters (저항형 초전도 한류소자의 퀜치 특성)

  • Kim, Hye-Rim;Hyun, Ok-Bae;Choi, Hyo-Sang;Hwang, Si-Dole;Kim, Sang-Joon
    • 한국초전도학회:학술대회논문집
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    • v.9
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    • pp.214-217
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    • 1999
  • We investigated the quench characteristics of meander line type resistive superconducting fault current limiters based on YBCO thin films grown on 2" diameter LaAlO$_3$ substrates. A gold layer was deposited onto the 0.4 ${\mu}$ m thick YBCO film to disperse the heat generated at hot spots, prior to patterning into 1 mm wide meander lines by photolithography. The limiters were tested with simulated fault currents of various amplitudes. The quench started at 10 A and was completed within 1 msec at the fault current of 65 A$_{peak}$. The dynamic quench characteristics were explained based on the heat conduction within the film and the heat transfer between the film and the surrounding liquid nitrogen. The heat transfer coefficient per unit area was estimated to be 3.0 W/cm$^2$K.

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Template-directed Atomic Layer Deposition-grown $TiO_2$ Nanotubular Photoanode-based Dye-sensitized Solar Cells

  • Yu, Hyeon-Jun;Panda, Sovan Kumar;Kim, Hyeon-Cheol;Kim, Myeong-Jun;Yang, Yun-Jeong;Lee, Seon-Hui;Sin, Hyeon-Jeong
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.05a
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    • pp.239.1-239.1
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    • 2011
  • Dye sensitized solar cells (DSC) are promising devices for inexpensive, nontoxic, transparent, and large-scale solar energy conversion. Generally thick $TiO_2$ nanoporous films act as efficient photoanodes with their large surface area for absorbing light. However, electron transport through nanoparticle networks causes the slowdown and the loss of electron transport because of a number of interparticle boundaries inside the conduction path. We have studied DSCs with precisely dimension-controlled $TiO_2$ nanotubes array as photoanode. $TiO_2$ nanotubes array is prepared by template-directed fabrication method with atomic layer deposition. Well-ordered nanotubes array provides not only large surface area for light absorbing but also direct pathway for electrons with minimalized grain boundaries. Large enlongated anatase grains in the nanotubes could enhance the conductivity of electrons, but also suppress the recombination with holes through defect sites during diffusion into the electrode. To study the effect of grain boundaries, we fabricated two kinds of nanotubes which have different grain sizes by controlling deposition conditions. And we studied electron conduction through two kinds of nanotubes with different grain structures. The solar cell performance was studied as a function of thickness and grain structures. And overall solar-to-electric energy conversion efficiencies of up to 7% were obtained.

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Electrical and interface characteristics of BST thin films grown by RF magnetron reactive sputtering (RF magnetron reactive sputtering 법으로 제작한 BST 박막의 전기적 및 계면 특성에 관한 연구)

  • 강성준;장동훈;유영섭
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.35D no.5
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    • pp.33-39
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    • 1998
  • The BST (Ba$_{1-x}$ Sr$_{x}$TiO$_{3}$)(50/50) thin film has been grown by RF magnetron reactive sputtering and its characteristics such as crystallization, surface roughness, and electrical properties have been investigated with varying the film thickness. The crystallization and surface roughness of BST thin film are investigated by using XRD and AFM, respectively The BST thin film anealed at 800.deg. C for 2 min has pure perovskite structure and good surface roughness of 16.1.angs.. We estimate that the thickness and dielectric constant of interface layer between BST film and electrode are 3nm and 18.9, respectively, by measuring the capacitance with various film thickness. As the film thickness increases form 80nm to 240nm, the dielectric constant at 10kHz increases from 199 to 265 and the leakage current density at 200kV/cm decreases from 0.682.mu.A/cm$^{2}$ to 0.181 .mu.A/cm$^{2}$. In the case of 240nm-thick BST thin film, the charge storage density and leakage current density at 5V are 50.5fC/.mu.m$^{2}$ and 0.182.mu.A/cm$^{2}$, respectively. The values indicate that the BST thin film is a very useful dielectric material for the DRAM capacitor.or.

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GROWTH OF THE SUBSTRATE CRYSTALS FOR $La_{2-x}Sr_xCuO_4$ THICK FILMS

  • Watauchi, Satoshi;Tanabe, Hideyoshi;Tanaka, Isao;Kojima, Hironao
    • Proceedings of the Korea Association of Crystal Growth Conference
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    • 1999.06a
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    • pp.389-402
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    • 1999
  • Single crystal of Li2Cu1-xMxO4 (M=Ni, Zn) are promising as a substrate to realize superconducting electronic devices. The distribution coefficients of Ni and Zn to the Cu site in La2CuO4 (LCO) were estimated by the zone melting technique to grow high quality single crystals of La2Cu1-xMxO4(M=Ni, Zn). The distribution coefficient value of Ni was estimated to be 4.2 and that of Zn was estimated to be 0.66, respectively. Suitable solvent compositions were determined using these values to grow single crystals by he traveling floating zone (TSFZ) method. Single crystal of LCO, La2Cu1-xMxO4(M=Ni(x=0.01, 0.02, 0.03, 0.04), Zn(x=0.01, 0.02, 0.03) of high homogeneity were grown. The behaviors of the magnetization of these as-grown crystals do not indicate superconductivity except LCO. Ni or Zn substitution can make LCO non superconductor. This fact suggest that single crystals substituted by Ni or Zn are useful as substrate crystals.

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50nm thick as-deposited poly silicon as an active layer of TFT for driving AM-OLEDs prepared at low temperature $(<200^{\circ}C)$ using Cat-CVD

  • Cho, Chul-Lae;Lee, Sung-Hyun;Lee, Chang-Hoon;Lee, Dea-Hyun;Lee, Sang-Yoon;Kwon, Jang-Yeon;Park, Kyung-Bae;Kim, Jong-Man;Jung, Ji-Sim;Hong, Wan-Shick
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.495-498
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    • 2006
  • The influence of various process parameters for the as-deposited poly silicon was investigated. The polycrystalline silicon films were successfully deposited on glass substrates at a low-temperature $(<200^{\circ}C)$ using the catalytic chemical vapor deposition (Cat-CVD). We achieved a low hydrogen content $({\sim}0.9%)$ and a high deposition rate $({\sim}35{\AA}/sec)$. The film is applicable to thin film transistors on plastic substrates.

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