• Title/Summary/Keyword: thermal insulator

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Silicon Surface Micro-machining by Anhydrous HF Gas-phase Etching with Methanol (무수 불화수소와 메탄올의 기상식각에 의한 실리콘 표면 미세 가공)

  • Jang, W.I.;Choi, C.A.;Lee, C.S.;Hong, Y.S.;Lee, J.H.;Baek, J.T.;Kim, B.W.
    • Journal of Sensor Science and Technology
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    • v.7 no.1
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    • pp.73-82
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    • 1998
  • In silicon surface micro-machining, the newly developed GPE(gas-phase etching) process was verified as a very effective method for the release of highly compliant micro-structures. The developed GPE system with anhydrous HF gas and $CH_{3}OH$ vapor was characterized and the selective etching properties of sacrificial layers to release silicon micro-structures were discussed. P-doped polysilicon and SOI(silicon on insulator) substrate were used as a structural layer and TEOS(tetraethyorthdsilicate) oxide, thermal oxide and LTO(low temperature oxide) as a sacrificial layer. Compared with conventional wet-release, we successfully fabricated micro-structures with virtually no process-induced striction and residual product.

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Estimation of the Asbestos Handling History of Workers in the Automobile Manufacturing Industry in Korea (자동차 제조 사업장 근로자들의 석면 취급 이력 추정)

  • Choi, Sangjun;Kim, Shinbum;Choi, Youngeun
    • Journal of Korean Society of Occupational and Environmental Hygiene
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    • v.27 no.4
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    • pp.423-432
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    • 2017
  • Objectives: This study was conducted to evaluate asbestos handling history of workers at automobile manufacturing plants in Korea. Methods: National regulations on asbestos and Korea Occupational Safety and Health Agency(KOSHA) database on the information of asbestos containing products were reviewed. We investigated asbestos related materials from one automobile manufacturing plant. Material safety data sheets(MSDS) collected in 2010, work environment monitoring results reported from 2000 to 2013, trade union reports and asbestos survey reports were reviewed. We also interviewed workers with long career and did walk-through survey. Results: The Ministry of Labor in Korea has permitted asbestos manufacturing since 1990. In 1997, the use of crocidolite and amosite asbestos were banned. In 2007, the Korean government announced a total ban on the manufacturing, importation and use of all kinds of asbestos, which took full effect in 2009. A total of 174 asbestos products information from KOSHA database was analyzed. Extruded cement panel for building, special brake for crane farm machinery, gasket, joint sheet and thermal insulator were produced until 2007. From automobile manufacturing plant survey, we confirmed that asbestos containing materials(ACM) such as gasket, heating induction materials have been used until 2011. Asbestos containing building materials(ACBM) such as bamlites, slate and ceiling tex were reported at 122 asbestos dismantling projects in 2014. Conclusion: Although the use of all kinds of asbestos were banned from 2009, ACMs and ACBMs installed before 2009 were still found at automobile manufacturing plant until 2011 and 2014 respectively. In particular, asbestos slates should be managed because most of slates had not been removed until 2014.

열처리에 따른 SiO2/ZrO2 적층 감지막을 이용한 EIS소자의 pH 감지 특성 평가

  • Gu, Ja-Gyeong;Jang, Hyeon-Jun;Jeong, Hong-Bae;Lee, Yeong-Hui;Jo, Won-Ju
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.239-239
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    • 2011
  • 최근에 감지막의 pH 감지특성을 평가하기 위해 electrolyte insulator semiconductor (EIS) 구조가 유용하게 이용되고 있다. EIS는 CMOS공정과 호환이 가능하고 구조가 간단하며 pH 변화에 반응속도가 빠르다는 장점을 가지고 있다. EIS 구조를 갖는 pH 센서의 동작 메커니즘은 pH 용액의 수소이온이 감지막의 표면에서 표면전위를 변화시키는 것에 기인한다. pH 감지막으로는 높은 유전율과 안정성이 뛰어난 high-k 물질이 많이 연구되고 있다. 그 중 high-k 물질인 ZrO2은 낮은 열전도도, 산성에서 알칼리성 영역까지의 넓은 화학안정성을 가지며 낮은 열 팽창성, 높은 유전상수 등 우수한 특성을 가지고 있다. 본 실험은 SiO2/ZrO2를 적층한 EIS 소자를 제작하여 열처리에 따른 전기적 특성과 pH 감지 특성을 평가해 보았다. EIS 적층막으로 사용된 SiO2는 실리콘과 high-k 감지막 사이의 계면상태를 양호하게 유지시키기 위한 완충막으로 성장되었다. 후속열처리는 rapid thermal annealing (RTA) 시스템을 이용하여 750$^{\circ}C$, 850$^{\circ}C$, 950$^{\circ}C$로 H2/N2 분위기에서 30초 동안 실시하였다. RTA 열처리 온도가 증가할수록 높은 pH 감지특성이 보였으며 hysteresis 현상과 drift 효과와 같은 non ideal 효과에 강한 immunity가 있는 것을 확인하였다. 결론적으로 SiO2/ZrO2 적층구조를 갖는 EIS는 RTA 950$^{\circ}C$ 열처리를 실시하였을 때 우수한 EIS pH 센서를 제작할 수 있을 것으로 기대된다.

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Solution-Processed Inorganic Thin Film Transistors Fabricated from Butylamine-Capped Indium-Doped Zinc Oxide Nanocrystals

  • Pham, Hien Thu;Jeong, Hyun-Dam
    • Bulletin of the Korean Chemical Society
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    • v.35 no.2
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    • pp.494-500
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    • 2014
  • Indium-doped zinc oxide nanocrystals (IZO NCs), capped with stearic acid (SA) of different sizes, were synthesized using a hot injection method in a noncoordinating solvent 1-octadecene (ODE). The ligand exchange process was employed to modify the surface of IZO NCs by replacing the longer-chain ligand of stearic acid with the shorter-chain ligand of butylamine (BA). It should be noted that the ligand-exchange percentage was observed to be 75%. The change of particle size, morphology, and crystal structures were obtained using a field emission scanning electron microscope (FE-SEM) and X-ray diffraction pattern results. In our study, the 5 nm and 10 nm IZO NCs capped with stearic acid (SA-IZO) were ligand-exchanged with butylamine (BA), and were then spin-coated on a thermal oxide ($SiO_2$) gate insulator to fabricate a thin film transistor (TFT) device. The films were then annealed at various temperatures: $350^{\circ}C$, $400^{\circ}C$, $500^{\circ}C$, and $600^{\circ}C$. All samples showed semiconducting behavior and exhibited n-channel TFT. Curing temperature dependent on mobility was observed. Interestingly, mobility decreases with the increasing size of NCs from 5 to 10 nm. Miller-Abrahams hopping formalism was employed to explain the hopping mechanism insight our IZO NC films. By focusing on the effect of size, different curing temperatures, electron coupling, tunneling rate, and inter-NC separation, we found that the decrease in electron mobility for larger NCs was due to smaller electronic coupling.

Controlled Synthesis of Hexagonal Boron Nitride on Cu Foil Using Chemical Vapor Deposition

  • Han, Jaehyun;Lee, Jun-Young;Kwon, Heemin;Yeo, Jong-Souk
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.630-630
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    • 2013
  • Recently, atomically smooth hexagonal boron nitride(h-BN) known as a white graphene has drawn great attention since the discovery of graphene. h-BN is a III-V compound and has a honeycomb structure very similar to graphene with smaller lattice mismatch. Because of strong covalent sp2bonds like graphene, h-BN provides a high thermal conductivity and mechanical strength as well as chemical stability of h-BN superior to graphene. While graphene has a high electrical conductivity, h-BN has a highly dielectric property as an insulator with optical band gap up to 6eV. Similar to the graphene, h-BN can be applied to a variety of field, such as gate dielectric layers/substrate, ultraviolet emitter, transparent membrane, and protective coatings. However, up until recently, obtaining and controlling good quality monolayer h-BN layers have been too difficult and challenging. In this work, we investigate the controlled synthesis of h-BN layers according to the growth condition, time, temperature, and gas partial pressure. h-BN is obtained by using chemical vapor deposition on Cu foil with ammonia borane (BH3NH3) as a source for h-BN. Scanning Transmission Electron Microscopy (STEM, JEOL-JEM-ARM200F) is used for imaging and structural analysis of h-BN layer. Sample's surface morphology is characterized by Field emission scanning electron microscopy (SEM, JEOL JSM-7100F). h-BN is analyzed by Raman spectroscopy (HORIBA, ARAMIS) and its topographic variations by Atomic force microscopy (AFM, Park Systems XE-100).

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Low-temperature crystallization of high-dielectric (Ba,Sr)$TiO_3$ thin films for embedded capacitors

  • Cho, Kwang-Hwan;Kang, Min-Gyu;Kang, Chong-Yun;Yoon, Seok-Jin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.03a
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    • pp.21-21
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    • 2010
  • (Ba,Sr)$TiO_3$ (BST) thin film with a perovskite structure has potential for the practical application in various functional devices such as nonvolatile-memory components, capacitor, gate insulator of thin-film transistors, and electro-optic devices for display. Normally, the BST thin films derived from sol-gel and sputtering are amorphous or partially crystalline when processed below $600^{\circ}C$. For the purpose of integrating BST thin film directly into a Si-based read-out integrated circuit (ROIC), it is necessary to process the BST film below $400^{\circ}C$. The microstructural and electrical properties of low-temperature crystallized BST film were studied. The BST thin films have been fabricated at $350^{\circ}C$ by UV-assisted rapidly thermal annealing (RTA). The BST films are in a single perovskite phase and have well-defined electrical properties such as high dielectric constant, low dielectric loss, low leakage current density, and high breakdown voltage. Photoexcitation of the organics contained in the sol-gel-derived films by high-intensity UV irradiation facilitates elimination of the organics and formation of the single-crystalline phase films at low temperatures. The amorphous BST thin film was transformed to a highly (h00)-oriented perovskite structure by high oxygen pressure processing (HOPP) at as low as $350^{\circ}C$. The dielectric properties of BST film were comparable to (or even better than) those of the conventionally processed BST films prepared by sputtering or post-annealing at temperature above $600^{\circ}C$. When external pressure was applied to the well-known contractive BST system during annealing, the nucleation energy barrier was reduced; correspondingly, the crystallization temperature decreased. The UV-assisted RTA and HOPP, as compatible with existing MOS technology, let the BST films be integrated into radio-frequency circuit and mixed-signal integrated circuit below the critical temperature of $400^{\circ}C$.

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Experimental Research Application to each Types of Insulation Materials in Rural Houses (농촌주택의 단열 재료별 현장 적용을 위한 실험 연구)

  • Kwon, Soon-Chan;Kim, Eun-Ja
    • Journal of the Korean Institute of Rural Architecture
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    • v.19 no.4
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    • pp.57-65
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    • 2017
  • Life quality in farming areas is declining these days on account of decrease in population with the outflow of young generations, advent of aging society, and also lack of social and physical infrastructure. To reverse this, the central and local governments have been devising policies in many ways; however, the vulnerable class in farming area suffering from financial difficulty is not supported with that properly. The results of applying insulation materials applicable to rural houses, EPS, e-board, and glass wool, actually to rural houses are summed as follows. EPS is the most inexpensive among the three installations in terms of material cost and expenses. The indoor and outdoor temperature difference increased from $0.9^{\circ}C$ to $2.5^{\circ}C$, and the temperature change reduced as $0.04^{\circ}C$. With e-board, the indoor and outdoor temperature difference increased from $3.3^{\circ}C$ to $7.5^{\circ}C$; however, the temperature change increased as $0.09^{\circ}C$. Unlike the other two methods, glass wool requires the additional installation of wooden frames. The material cost is highest, and the indoor and outdoor temperature difference increased from $1.1^{\circ}C$ to $8.0^{\circ}C$, and the temperature change reduced as $0.01^{\circ}C$. According to the results of measuring temperature, glass wool's temperature difference is measured to be the highest, but temperature change is found to be the most effective in EPS. Among the three insulation methods, EPS is the most economically advantageous as the material supply is easy and the cost is low. The material is easily processible, so ordinary town residents can install it easily, and it is effective at improving insulation performance, too. But this method cannot be applied when the house has walls that are not even. Also, as the insulator is thick, after the installation, the living space may be narrower as a result.

Effect of Ti Concentration on the Microstructure of Al and the Tunnel Magnetoresistance Behaviors of the Magnetic Tunnel Junction with a Ti-alloyed Al-oxide Barrier (Ti 첨가에 따른 Al 미세구조 변화 효과와 산화 TiAl 절연층을 갖는 자기터널접합의 자기저항 특성)

  • Song, Jin-Oh;Lee, Seong-Rae
    • Journal of the Korean Magnetics Society
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    • v.15 no.6
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    • pp.311-314
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    • 2005
  • We investigated the composition dependence of the tunneling magnetoresistance (TMR) behavior and the stability of the magnetic tunnel junctions (MTJs) with TiAlOx barrier and the microstructural evolution of TiAl alloy films. The TMR ratio increased up to $49\%$ at $5.33\;at\%$ Ti. In addition, a significant tunneling magnetoresistance (TMR) value of $20\%$ was maintained after annealing at $450^{\circ}C$, and the breakdown voltage ($V_B$) of and 1.35 V were obtained in the MTJ with $5.33\;at\%$ Ti-alloyed AlOx barrier. These results were closely related to the enhanced quality of the barrier material microstructure in the pre-oxidation state. Ti alloying enhanced the barrier/electrode interface uniformity and reduced microstructural defects. These structural improvements enhanced not only the TMR effect but also the thermal and electrical stability of the MTJs.

Development of a PTC Heater for Supplementary Heating in a Diesel Vehicle (디젤 차량의 보조 난방을 위한 PTC 히터 개발)

  • Shin, Yoon Hyuk;Kim, Sung Chul
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.15 no.2
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    • pp.666-671
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    • 2014
  • Using positive temperature coefficient (PTC) heater as supplementary heating for diesel engine vehicles with low heat source is a good method to enhance the heating performance during cold start. In this study, the PTC elements were made by using screen printing process for forming ohmic contact layer, and prototype of PTC heater was designed and made for a diesel engine vehicle. In process of designing the PTC heater, the thermal flow analysis of PTC element modules was conducted for verifying the effect of the shapes of contact surface between each of the components (cooling fin, insulator, ceramic element). We also investigated the performance characteristic (heating capacity, energy efficiency, pressure drop) of the PTC heater through the experiments. Therefore, the experimental results indicated that prototype of PTC heater had satisfactory performance. This study will be basis for improving the manufacturing process and increasing the performance of the PTC element and heater.

원자층증착법을 이용한 Y2O3 박막 형성 및 저항 스위칭 특성

  • Jeong, Yong-Chan;Seong, Se-Jong;Lee, Myeong-Wan;Park, In-Seong;An, Jin-Ho;Rao, Venkateswara P.;Dussarrat, Christian;Noh, Wontae
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.229.2-229.2
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    • 2013
  • Yttrium oxide (Y2O3)는 band gap이 5.5 eV 정도로 상대적으로 넓고, 굴절상수가 1.8, 유전율이 10~15, Silicon 과의 격자 불일치가 작은 특성을 가지고 있다. 또한 녹는점이 높아 열적으로 안정하기 때문에 전자소자 및 광학소자에 다양하게 응용되는 물질이다. Y2O3 박막은 다양한 방법으로 증착할 수 있는데, 그 방법에는 e-beam evaporation, laser ablation, sputtering, thermal oxidation, metal-organic chemical vapor deposition, and atomic layer deposition (ALD) 등이 있다. ALD는 기판 표면에 흡착된 원자들의 자기 제한적 반응에 의하여 박막이 증착되기 때문에 박막 두께조절이 용이하고 step coverage와 uniformity 측면에서 큰 장점이 있다. 이전에는 Y(thd)3 and Y(CH3Cp)3 와 같은 금속 전구체를 이용하여 ALD를 진행하여, 증착 속도가 낮고 defect이 많아 non-stoichiometric한 조성의 박막이 증착되는 문제점이 있었다. 이번 연구에서는, (iPrCp)2Y(iPr-amd)와 탈이온수를 사용하여 Y2O3 박막을 증착하였다. Y2O3 박막 증착에 사용한 Y 전구체는 상온에서 액체이고 $192^{\circ}C$ 에서 1 Torr의 높은 증기압을 갖는다. Y2O3 박막 증착을 위하여 Y 전구체는 $150^{\circ}C$ 로 가열하여 N2 gas를 이용하여 bubbling 방식으로 공정 챔버 내로 공급하였다. Y2O3 박막의 ALD window는 $250{\sim}350^{\circ}C$ 였으며, Y 전구체의 공급시간이 5초에 다다르자 더 이상 증착 두께가 증가하지 않는 자기 제한적 반응을 확인할 수 있었다. 그리고 증착된 Y2O3 박막의 특성 분석을 위해 Atomic force microscopy (AFM)과 X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES) 를 진행하였다. 박막의 Surface morphology 는 매끄럽고 uniform 하였으며, 특히 고체 금속 전구체를 사용했을 때와 비교하여 수산화물이 거의 없는 박막을 얻을 수 있었다. 그리고 조성 분석을 통해 증착된 Y2O3 박막이 stoichiometric하다는 것을 알수 있었다. 또한 metal-insulator-metal (MIM) 구조 (Ru/Y2O3/Ru) 의 resistor 소자를 형성하여 저항 스위칭 특성을 확인하였다.

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