• Journal of the Korean Ceramic Society
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• v.39 no.9
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• pp.896-901
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• 2002

Since many process parameters of FHD(Flame Hydrolysis Deposition) are involved in forming multi-component amorphous silica film ($SiO_2-B_2O_3-P_2O_5-GeO_2$), it has not been easy to predict the optical, mechanical and thermal properties of deposited film from the simple process parameters, such as source flow rate. Furthermore, the prediction of final composition of film becomes even more difficult after sintering at high temperature due to the evaporation of volatile dopants. The motivation of the study was to clarify the quantitative relationship between simple process parameters such as the flow rate of source gases and resulting chemical composition of sintered film. Hence, the compositional analysis of silica soot by FTIR(Fourier Transformation Infrared Spectroscopy) and ICP-AES(Inductively Coupled Plasma-Atomic Emission Spectrometry) under the control of the amount of dopant was carried out to obtain the quantitative composition. By measuring spectrum of absorbance from FTIR, the compositional change of B-O, Si-O, OH($H_2O$) in silica film was measured. The concentrations of these dopants were also measured by ICP-AES, which were compared with the FTIR result. The final quantitative relationship between simple process parameters and composition was deduced from the comparison between two results.

• Korean Journal of Poultry Science
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• v.20 no.3
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• pp.141-149
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• 1993

In order to develop a poultry manure dryer, a pilot dryer was designed and drying experiments were conducted to investigate the drying characteristics of poultry manure. According to the results, the pilot dryer could be operated without any air pollution problems. When poultry manure was dried from 79.2%(w.b. basis) moisture content, the final moisture content ranged from 38.7% to 57.9% depending upon the drying conditions. The drying results showed that drying rate was 189.8~198.0 kg/h and moisture evaporation rate was 124.0~125.4kg-$H_2$O/L. For this drying, electricity requirement was 9.5~19.3 Wh/kg and fuel consumption rate was 6.9~9.3 kg-$H_2$O/L with 50.2~65.1% thermal efficiency.

• Proceedings of the Korean Vacuum Society Conference
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• 2000.02a
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• pp.73-73
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• 2000

안티퓨즈 소자는 프로그램 가능한 절연층의 상하 각각에 금속층이나 다결정 실리콘 등의 전도 가능한 전극으로 구성된다. 프로그램은 상하 전극간에 임계전압을 가했을 때 일어나게 되며 이때 절연층이 파괴되므로 비가역적이어서 재사용은 불가능하게 된다. 안티퓨즈 소자는 이러한 프로그램 특성으로 인하여 메모리 소자를 이용한 스위치 보다 속도나 집적도 면에서 우수하다. FPGAsdp 사용되는 안티퓨즈 소자는 집적도의 향상과 적정 절열파괴전압 구현을 위해 절연막의 두께를 감소시키는 것이 바람직하다. 그러나 두께나 감소될 경우 바닥전극의 hillock에 큰 영향을 받게 되며, 그로 인해 절연막의 두께를 감소시키는 것는 한계가 있는 것으로 보고되어 있다. 본 논문에서는 낮은 구동 전압에서 동작하고 안정된 on/pff 상태를 갖는 Al/TiO2-SiO2/Mo 형태의 안티퓨즈 소자를 제안하였다. 만들어진 antifuse cell은 0.6cm2 크기로 약 300개의 샘플을 제작하여 측정하였다. 비저항이 6-9 $\Omega$-cm인 P형의 실리콘 웨이퍼에 RF 마그네트론 스퍼터링(RF magnetron sputtering) 방법으로 하부전극인 Mo를 3000 증착하였다. SiO2는 안티퓨즈에서 완충막의 역할을 하며 구조적으로 antifuse cell을 완전히 감싸고 있는 형태로 제작되었다. 완충막 구조를 만들기 dln해 일반적인 포토리소그라피(Photo-lithography)작업을 거처 형성하였다. 형성된 hole의 크기는 5$mu extrm{m}$$\times$5$\mu\textrm{m}$ 이었다. 완충막이 형성된 기판위에 안티퓨즈 절연체인 SiO2를 PECVD 방식으로 100 증착하였다. 그 후 이중 절연막을 형성시키기 위해 LPCVD를 이용하여 TiO2를 150 증착시켰다. 상부 전극은 thermal evaporation 방식으로 Al을 250nm 증착하여Tejk. 하부전극으로 사용된 Mo 금속은 표면상태가 부드럽고 녹는점이 높은 매우 안정된 금속으로, 표면위에 제조된 SiO2의 특성을 매우 안정되게 유지시켰다. 제안된 안티푸즈는 이중절연막을 증착함으로서 전체적인 절연막의 두께를 증가시켜 바닥전극의 hillock의 영향을 적게 받아 안정성을 유지할 수 있도록 하였다. 또한, 두 절연막 사이의 계면 반응에 의해 SiO2 막을 약화시켜 절연막의 두께가 두꺼워졌음에도 기존의 SiO2 절연막의 절연 파괴 전압 및 누설 전류오 비교되는 특성을 가졌다. 이중막을 구성하고 있는 안티퓨즈의 ON-저항이 단일막과 비교해 비슷한 것을 볼 수 잇는데, 그 이유는 TiO2에 포함된 Ti가 필라멘트에 포함되어 있어 필라멘트의 저항을 감소시켰기 때문으로 사료된다. 결국 이중막을 구성시 ON-저항 증가에 의한 속도 저하 요인은 없다고 할 수 있다. 5V의 절연파괴 시간을 측정한느 TDDB 테스트 결과 1.1$\times$103 year로 기대수치인 수십 년보다 높아 제안된 안티퓨즈의 신뢰성을 확보 할 수 있었다. 제안된 안티퓨즈의 이중 절연막의 두께는 250 이고 프로그래밍 전압은 9.0V이고, 약 65$\Omega$의 on 저항을 얻을수 있었다.

• Journal of Bio-Environment Control
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• v.10 no.1
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• pp.10-14
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• 2001

The cooling effect of a fog cooling system has a close relationship to air flow and relative humidity in the greenhouse. From the VETH chart for cooling design, a cooling efficiency can be improved by means of increasing the air exchange rate and the amount of sprayed water. In the no shading experimental greenhouse by time control, when average air exchange rate was 0.77 times.min$^{-1}$ and spray water amount was 2,009g, inside temperature of the greenhouse was 31$^{\circ}C$ that was almost close to outside temperature and cooling efficiency was 82%. When average air exchange rate was close to temperature of the greenhouse that was no cooling and 70% shading greenhouse environment. When average air exchange rate was 2.59times.min$^{-1}$ , spray water amount was 2,009g and shading rate was 70%, inside relative humidity of the greenhouse was increased was 2,009 g and shading rate was 70%, inside relative humidity of the greenhouse was increased, but temperature was not decreased. When average air exchange rate was 2.33 times.min$^{-1}$ and spray water amount was 2,009g, inside temperature was 31.4 and at that time maximum wind speed at the air inlet of greenhouse was 1.9m.s$^{-1}$ . Since time controller sprayed amount of constant water at a given interval, some of sprayed water remained not to be evaporated, which increased relative humidity and decreased cooling efficiency. Because the shading screen prevented air flow in the greenhouse, it also caused the evaporation efficiency to be decreased. In order to increase cooling efficiency, it was necessary to study on controling by relative humidity and air circulation in the greenhouse.

• Korean Journal of Fisheries and Aquatic Sciences
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• v.26 no.3
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• pp.230-234
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• 1993

In order to obtain the fundamental factors influencing on gelation of Alaska pollack meat paste during processing, the states of water in gel from meat paste were studied using differential scanning calorimetry(DSC) and thermogravimetry(TG). In the differential scanning calorimetry, the calorimetric curves of gels were characterized by single peak through the evaporation of water. Each curve was divided into two divisions below and above $105^{\circ}C(Q_1\;and\;Q_2)$, and a quotient, $R_{105}[={Q_2/(Q_1+Q_2)}+100]$ was adopted to represent the amount of immobilized water in the total water of gels. There was a good correlationships between gel strength values and those quotients($R_{105}$), the correlation coefficient was 0.93. Three types of water(A, B, C) differentiated by evaporating velocity were regarded as free water and it was abundant among the three types of water. The type C water was regarded as the water in so-called mono-molecular layer region. The ratio of the content C versus total water content showed good correlationships with the gel strength and its correlation coefficient was 0.99.

• Applied Chemistry for Engineering
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• v.32 no.5
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• pp.509-515
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• 2021

In this study, poly lactic-co-glycolic acid (PLGA) nanoparticles (PNP) were prepared through double (w/o/w) emlusion and emulsifying solvent-evaporation technique using PLGA, which has biocompatibility and biodegradability. To maximize stability and bioavailability of the particles, chitosan-coated PLGA nanoparticles (CPNP) were prepared by charge interaction between PNP and chitosan. We demonstrated that CPNP can be utilized as a drug carrier of oral administration. The chemical structure of CPNP was analyzed by ¹H-NMR and FT-IR, and all characteristic peaks appeared, confirming that it was successfully prepared. In addition, particle size and zeta potential of CPNP were analyzed using dynamic light scattering (DLS) while morphological images were obtained using transmission electron microscope (TEM). Thermal decomposition behavior of CPNP was observed through thermogravimetric analysis (TGA). In addition, the cytotoxicity of CPNP was confirmed by MTT assay at HEK293 and L929 cell lines, and it was proved that there is no toxicity confirmed by the cell viability of above 70% at all concentrations. These results suggest that the CPNP developed in this study may be used as an oral drug delivery carrier.

• Tunnel and Underground Space
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• v.31 no.4
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• pp.221-242
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• 2021

A numerical study of the performance assesment of coupled thermo-hydro-mechanical (THM) processes in improved Korean reference disposal system (KRS⁺) for high-level radioactive waste is conducted using TOUGH2-MP/FLAC3D simulator. Decay heat from high-level radioactive waste increases the temperature of the repository, and it decreases as decay heat is reduced. The maximum temperature of the repository is below a maximum temperature criterion of 100℃. Saturation of bentonite buffer adjacent to the canister is initially reduced due to pore water evaporation induced by temperature increase. Bentonite buffer is saturated 250 years after the disposal of high-level radioactive waste by inflow of groundwater from the surrounding rock mass. Initial saturation of rock mass decreases as groundwater in rock mass is moved to bentnonite buffer by suction, but rock mass is saturated after inflow of groundwater from the far-field area. Stress changes at rock mass are compared to the Mohr-Coulomb failure criterion and the spalling strength in order to investigate the potential rock failure by thermal stress and swelling pressure. Additional simulations are conducted with the reduced spacing of deposition holes. The maximum temperature of bentonite buffer exceeds 100℃ as deposition hole spacing is smaller than 5.5 m. However, temperature of about 56.1% volume of bentonite buffer is below 90℃. The methodology of numerical modeling used in this study can be applied to the performance assessment of coupled THM processes for high-level radioactive waste repositories with various input parameters and geological conditions such as site-specific stress models and geothermal gradients.

• Korean Journal of Metals and Materials
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• v.46 no.11
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• pp.762-769
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• 2008

Hydrogenated amorphous silicon(a-Si : H) layers, 120 nm and 50 nm in thickness, were deposited on 200 $nm-SiO_2$/single-Si substrates by inductively coupled plasma chemical vapor deposition(ICP-CVD). Subsequently, 30 nm-Ni layers were deposited by E-beam evaporation. Finally, 30 nm-Ni/120 nm a-Si : H/200 $nm-SiO_2$/single-Si and 30 nm-Ni/50 nm a-Si:H/200 $nm-SiO_2$/single-Si were prepared. The prepared samples were annealed by rapid thermal annealing(RTA) from $200^{\circ}C$ to $500^{\circ}C$ in $50^{\circ}C$ increments for 30 minute. A four-point tester, high resolution X-ray diffraction(HRXRD), field emission scanning electron microscopy (FE-SEM), transmission electron microscopy (TEM), and scanning probe microscopy(SPM) were used to examine the sheet resistance, phase transformation, in-plane microstructure, cross-sectional microstructure, and surface roughness, respectively. The nickel silicide on the 120 nm a-Si:H substrate showed high sheet resistance($470{\Omega}/{\Box}$) at T(temperature) < $450^{\circ}C$ and low sheet resistance ($70{\Omega}/{\Box}$) at T > $450^{\circ}C$. The high and low resistive regions contained ${\zeta}-Ni_2Si$ and NiSi, respectively. In case of microstructure showed mixed phase of nickel silicide and a-Si:H on the residual a-Si:H layer at T < $450^{\circ}C$ but no mixed phase and a residual a-Si:H layer at T > $450^{\circ}C$. The surface roughness matched the phase transformation according to the silicidation temperature. The nickel silicide on the 50 nm a-Si:H substrate had high sheet resistance(${\sim}1k{\Omega}/{\Box}$) at T < $400^{\circ}C$ and low sheet resistance ($100{\Omega}/{\Box}$) at T > $400^{\circ}C$. This was attributed to the formation of ${\delta}-Ni_2Si$ at T > $400^{\circ}C$ regardless of the siliciation temperature. An examination of the microstructure showed a region of nickel silicide at T < $400^{\circ}C$ that consisted of a mixed phase of nickel silicide and a-Si:H without a residual a-Si:H layer. The region at T > $400^{\circ}C$ showed crystalline nickel silicide without a mixed phase. The surface roughness remained constant regardless of the silicidation temperature. Our results suggest that a 50 nm a-Si:H nickel silicide layer is advantageous of the active layer of a thin film transistor(TFT) when applying a nano-thick layer with a constant sheet resistance, surface roughness, and ${\delta}-Ni_2Si$ temperatures > $400^{\circ}C$.

• Korean Journal of Metals and Materials
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• v.47 no.5
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• pp.322-329
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• 2009

60 nm- and 20 nm-thick hydrogenated amorphous silicon (a-Si:H) layers were deposited on 200 nm $SiO_2/Si$ substrates using ICP-CVD (inductively coupled plasma chemical vapor deposition). A 10 nm-Ni layer was then deposited by e-beam evaporation. Finally, 10 nm-Ni/60 nm a-Si:H/200 nm-$SiO_2/Si$ and 10 nm-Ni/20 nm a-Si:H/200 nm-$SiO_2/Si$ structures were prepared. The samples were annealed by rapid thermal annealing for 40 seconds at $200{\sim}500^{\circ}C$ to produce $NiSi_x$. The resulting changes in sheet resistance, microstructure, phase, chemical composition and surface roughness were examined. The nickel silicide on a 60 nm a-Si:H substrate showed a low sheet resistance at T (temperatures) >$450^{\circ}C$. The nickel silicide on the 20 nm a-Si:H substrate showed a low sheet resistance at T > $300^{\circ}C$. HRXRD analysis revealed a phase transformation of the nickel silicide on a 60 nm a-Si:H substrate (${\delta}-Ni_2Si{\rightarrow}{\zeta}-Ni_2Si{\rightarrow}(NiSi+{\zeta}-Ni_2Si)$) at annealing temperatures of $300^{\circ}C{\rightarrow}400^{\circ}C{\rightarrow}500^{\circ}C$. The nickel silicide on the 20 nm a-Si:H substrate had a composition of ${\delta}-Ni_2Si$ with no secondary phases. Through FE-SEM and TEM analysis, the nickel silicide layer on the 60 nm a-Si:H substrate showed a 60 nm-thick silicide layer with a columnar shape, which contained both residual a-Si:H and $Ni_2Si$ layers, regardless of annealing temperatures. The nickel silicide on the 20 nm a-Si:H substrate had a uniform thickness of 40 nm with a columnar shape and no residual silicon. SPM analysis shows that the surface roughness was < 1.8 nm regardless of the a-Si:H-thickness. It was confirmed that the low temperature silicide process using a 20 nm a-Si:H substrate is more suitable for thin film transistor (TFT) active layer applications.

• Journal of Korean Society of Environmental Engineers
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• v.35 no.6
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• pp.422-429
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• 2013

It is generally known that the increase of the Earth surface temperature due to the global warming together with the land desertification by rapid urban development has caused severe climate and weather change. In desert or desertification land, it is observed that there are always severe flooding phenomena, even if desert sand has the high porosity, which could be believed as the favorable condition of rain water infiltration into ground water. The high runoff feature causes possibly another heavy rain by quick evaporation with the depletion of underground water due to the lack of infiltration. The basic physics of desert flooding is reasonably assumed due to the thermal buoyancy of the higher temperature of the soil temperature than that of the rain drop. Considering the importance of this topic associated with water resource management and climate disaster prevention, no systematic investigation has, however, been reported in literature. In this study, therefore, a laboratory scale experiment together with the effort of numerical calculation have been performed to evaluate quantitatively the basic hypothesis of run-off mechanism caused by the increase of soil temperature. To this end, first, of all, a series of experiment has been made repeatedly with the change of soil temperature with well-sorted coarse sand having porosity of 35% and particle diameter, 2.0 mm. In specific, in case 1, the ground surface temperature was kept at $15^{\circ}C$, while in case 2 that was high enough at $70^{\circ}C$. The temperature of $70^{\circ}C$ was tested as this try since the informal measured surface temperature of black sand in California's Coachella Valley up to at 191 deg. $^{\circ}F$ ($88^{\circ}C$). Based on the experimental study, it is observed that the amount of runoff at $70^{\circ}C$ was higher more than 5% compared to that at $15^{\circ}C$. Further, the relative amount of infiltration by the decrease of the surface temperature from 70 to $15^{\circ}C$ is about more than 30%. The result of numerical calculation performed was well agreed with the experimental data, that is, the increase of runoff in calculation as 4.6%. Doing this successfully, a basic but important research could be made in the near future for the more complex and advanced topic for this topic.