• Title/Summary/Keyword: surface film

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Characteristic of ITO thin film with plasma surface treatment (플라즈마 표면 처리에 의한 ITO 박막 제작 특성)

  • Kim, Sang-Mo;Son, In-Hwan;Park, Sang-Joon;Kim, Kyung-Hwan
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.404-405
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    • 2007
  • Tin-doped indium thin film is outstanding material among transparent Conductive Oxide (TCO) materials. ITO thin films show a low electrical resistance(<$10^{-4}\;[{\Omega}{\cdot}m]$) and high transmittance(>80%) in the visible range. ITO thin films usually have been deposited on the glass substrate. In order to apply flexible display, the substrate should have the ability to bend and be deposited without substrate heat. Also properties of ITO thin film depend on what kind of substrate. In this study, we prepared ITO thin film on the polycarbonate (PC) substrate by using Facing Target Sputtering (FTS) system. Before deposition of ITO thin film, PC substrate took plasma surface treatment. The electrical and surface properties of as-deposited thin films were investigated by Hall Effect measurement, UV/VIS spectrometer and the surface property of substrate is investigated by Contact angle measurement.

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Epitaxial Growth of Polyurea Film by Molecular Layer Deposition

  • Choe, Seong-Eun;Gang, Eun-Ji;Lee, Jin-Seok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.264.2-264.2
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    • 2013
  • Molecular layer deposition (MLD) is sequential, self-limiting surface reaction to form conformal and ultrathin polymer film. This technique generally uses bifunctional precursors for stepwise sequential surface reaction and entirely organic polymer films. Also, in comparison with solution-based technique, because MLD is vapor-phase deposition based on ALD, it allows epitaxial growth of molecular layer on substrate and is especially good for surface reaction or coating of nanostructure such as nanopore, nanochannel, nanwire array and so on. In this study, polyurea film that consisted of phenylenediisocyanate and phenylenediamine was formed by MLD technique. In situ Fourier Transform Infrared (FTIR) measurement on high surface area SiO2 substrate was used to monitor the growth of polyurethane and polyurea film. Also, to investigate orientation of chemical bonding formed polymer film, plan-polarized grazing angle FTIR spectroscopy was used and it showed epitaxial growth and uniform orientation of chemical bones of polyurea films.

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Effect of HF and Plasma Treated Glass Surface on Vapor Phase-Polymerized Poly(3,4-ethylenedioxythiophene) Thin Film : Part I

  • Lee, Joonwoo;Kim, Sungsoo
    • Journal of Integrative Natural Science
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    • v.6 no.4
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    • pp.211-214
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    • 2013
  • In this study, in order to investigate how consecutive treatments of glass surface with HF acid and water vapor/Ar plasma affect the quality of 3-aminopropyltriethoxysilane self-assembled monolayer (APS-SAM), poly(3,4-ethylenedioxythiophene) (PEDOT) thin films were vapor phase-polymerized immediately after spin coating of FeCl3 and poly-urethane diol-mixed oxidant solution on the monolayer surfaces prepared at various treatment conditions. For the film characterization, various poweful tools were used, e.g., FE-SEM, an optical microscope, four point probe, and a contact angle analyzer. The characterization revealed that HF treatment is not desirable for the synthesis of a high quality PEDOT thin film via vapor phase polymerization method. Rather, sole treatment with plasma noticeably improved the quality of APS-SAM on glass surface. As a result, a highly dense and smooth PEDOT thin film was grown on uniform oxidant film-coated APS monolayer surface.

Electro-Optical Characteristics of TN Cell using UV Alignment Method on the a-C:H Thin Film (a-C:H 박막표면에 UV 배향법을 이용한 TN 셀의 전기광학특성)

  • Park, Chang-Joon;Hwang, Jeoung-Yeon;Kim, Jong-Hwan;Seo, Dae-Shik;Ahn, Han-Jin;Baik, Hong-Koo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.07b
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    • pp.1043-1046
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    • 2003
  • We investigated the EO performances of the UV aligned twisted nematic liquid crystal display (TN-LCD) with the UV exposure on a-C:H thin film surface. LC alignment using UV exposure on the a-C:H thin film surface was achieved. Monodomain alignment of the UV aligned TN-LCD can be observed. An good EO characteristics of the UV aligned TN-LCD was observed with oblique ion beam exposure on the a-C:H thin film surface. Therefore, the EO property of the UV-aligned TN-LCD with UV exposure on the a-C:H thin film surface is almost the same as that of the rubbing-aligned TN-LCD on a polyimide (PI) surface.

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Cleaning Effects by NH4OH Solution on Surface of Cu Film for Semiconductor Devices (NH4OH용액이 반도체 소자용 구리 박막 표면에 미치는 영향)

  • Lee, Youn-Seoung;Noh, Sang-Soo;Rha, Sa-Kyun
    • Korean Journal of Materials Research
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    • v.22 no.9
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    • pp.459-464
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    • 2012
  • We investigated cleaning effects using $NH_4OH$ solution on the surface of Cu film. A 20 nm Cu film was deposited on Ti / p-Si (100) by sputter deposition and was exposed to air for growth of the native Cu oxide. In order to remove the Cu native oxide, an $NH_4OH$ cleaning process with and without TS-40A pre-treatment was carried out. After the $NH_4OH$ cleaning without TS-40A pretreatment, the sheet resistance Rs of the Cu film and the surface morphology changed slightly(${\Delta}Rs:{\sim}10m{\Omega}/sq.$). On the other hand, after $NH_4OH$ cleaning with TS-40A pretreatment, the Rs of the Cu film changed abruptly (${\Delta}Rs:till{\sim}700m{\Omega}/sq.$); in addition, cracks showed on the surface of the Cu film. According to XPS results, Si ingredient was detected on the surface of all Cu films pretreated with TS-40A. This Si ingredient(a kind of silicate) may result from the TS-40A solution, because sodium metasilicate is included in TS-40A as an alkaline degreasing agent. Finally, we found that the $NH_4OH$ cleaning process without pretreatment using an alkaline cleanser containing a silicate ingredient is more useful at removing Cu oxides on Cu film. In addition, we found that in the $NH_4OH$ cleaning process, an alkaline cleanser like Metex TS-40A, containing sodium metasilicate, can cause cracks on the surface of Cu film.

An analysis on the surface roughness and residual stress of SUS-304 using abrasive film polishing (Abrasive Film Polishing을 이용한 SUS-304의 표면거칠기·잔류응력 분석)

  • Shin, Bong-Cheol;Kim, Byung-Chan;Lim, Dong-Wook;Min, Kyung-Ho
    • Design & Manufacturing
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    • v.12 no.2
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    • pp.16-21
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    • 2018
  • Recently, as the demand for high-precision parts increases due to industrial development, a machine tool system for ultra-precision machining and polishing has been actively developed. As a result, there is an increasing demand for ultra-precision surface roughness along with dimensional processing. However, due to the increase in processing time due to the demand for ultra-precise surfaces and enormous facility investment, it is difficult to secure competitiveness. The polishing process using the abrasive film in super precision machining has been applied to machines, electronic devices, aerospace, and medical fields. Super finishing using the abrasive film which is applied in the industrial field recently can achieve high surface roughness in a short time. Super finishing using the abrasive film which is applied in the industrial field recently can achieve high surface roughness in a short time. Also, application of industrial field is increasing due to advantages such as low noise and low dust. Recently, researches on stainless steel having strong resistance to corrosion, heat resistance, heat resistance, toughness and weldability have been actively conducted with respect to the nuclear energy industry or marine development. Therefore, in this study, surface roughness and residual stress were measured after SUS304 polishing using dynamic analysis of film polishing apparatus and polishing film.

Temperature dependence of Heteroeptaxial $Y_2O_3$ films grown on Si by ionized cluster beam deposition

  • Cho, M.-H.;Ko, D.-H.;Whangbo, S.W.;Kim, H.B.;Jeong, K.H.;Whang, C.N.;Choi, S.C.;Cho, S.J.
    • Journal of the Korean Vacuum Society
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    • v.7 no.s1
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    • pp.57-77
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    • 1998
  • Heteroepitaxial $Y_2O_3$ films were grown on a Si(111) substrate by ionized cluster beam deposition(ICBD) in ultra high vacuum, and its qualities such as crystllitnity, film stress, and morphological characteristics were investigated using the various measurement methods. The crystallinity was investigated by x-ray diffraction (XRD) and reflection high energy electron diffraction (RHEED). Interface crystallinity was also examined by Rutherford backscattering spectroscopy(RBS) channeling, transmission electron microscopy(TEM). The stress of the films was measured by RBS channeling and XRD. Surface and interface morphological characteristics were investigated by atomic force microscopy (AFM) and x-ray scattering method. Comparing the interface with the surface characteristics, we can conclude that many defects at the interface region were generated by interface reaction between the yttrium metal and SiO2 layer and by ion beam characteristic such as shallow implantation, so that they influenced the film qualities. The film quality was dominantly depended on the characteristic temperature range. In the temperature range from $500^{\circ}C$ to $600^{\circ}C$, the crystallinity was mainly improved and the surface roughness was drastically decreased. On the other hand, in the temperature range from $600^{\circ}C$ to $700^{\circ}C$, the compressive stress and film density were dominantly increased, and the island size was more decreased. Also the surface morphological shape was transformed from elliptical shape to triangular. The film stress existed dominantly at the interface region due to the defects generation.

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Electrochemical Properties of Air-Formed Oxide Film-Covered AZ31 Mg Alloy in Aqueous Solutions Containing Various Anions

  • Fazal, Basit Raza;Moon, Sungmo
    • Journal of the Korean institute of surface engineering
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    • v.50 no.3
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    • pp.147-154
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    • 2017
  • This research was conducted to investigate the electrochemical properties of the thin air-formed oxide film-covered AZ31 Mg alloy. Native air-formed oxide films on AZ31 Mg alloy samples were prepared by knife-abrading method and the changes in the electrochemical properties of the air-formed oxide film were investigated in seven different electrolytes containing the following anions $Cl^-$, $F^-$, $SO{_4}^{2-}$, $NO_3{^-}$, $CH_3COO^-$, $CO{_3}^{2-}$, and $PO{_4}^{3-}$. It was observed from open circuit potential (OCP) transients that the potential initially decreased before gradually increasing again in the solutions containing only $CO{_3}^{2-}$ or $PO{_4}^{3-}$ ions, indicating the dissolution or transformation of the native air-formed oxide film into new more protective surface films. The Nyquist plots obtained from electrochemical impedance spectroscopy (EIS) showed that there was growth of new surface films with immersion time on the air-formed oxide film-covered specimens in all the electrolyte. The least resistive surface films were formed in fluoride and sulphate baths whereas the most protective film was formed in phosphate bath. The potentiodynamic polarization curves illustrated that passive behaviour of AZ31 Mg alloy under anodic polarization appears only in $CO{_3}^{2-}$, or $PO{_4}^{3-}$ ions containing solutions and at more than $-0.4V_{Ag/AgCl}$ in $F^-$ ion containing solution.

Effect of Ozone Treatment on Dyeability of Polyethylene Film (오존 처리가 폴리에틸렌 필름의 염색성에 미치는 영향)

  • 박수진;신준식;김학용;이덕래
    • Polymer(Korea)
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    • v.27 no.2
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    • pp.98-105
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    • 2003
  • The surface energy and the effect of functional groups on the surface of the ozone-treated low-density polyethylene (LDPE) film were studied. Treatment conditions were treatment time, total amount of transferred ozone, and ozone concentration. The introduction of polar groups on the surface of LDPE film after ozone treatment was confirmed by FTIR-ATR and XPS analyses. Surface fee energy of the LDPE film was examined by a contact angle method. The ozone treated-LDPE film showed a decreased water contact angles about 15$^{\circ}$ mainly due to the increased concentration of oxygen-containing functional groups, which was attributed to the increased surface free energy or $O_{IS}/C_{IS}$Also, the concentrations of the oxygen-containing functional groups on the surface of LDPE film increased with ozone treatment time and concentration, whereas no significant effects were found for the total amount of transferred ozone. From the dyeability test using Kubelka-Munk equation, it was found that the ozone treatment plays an important role in the growth of oxygen-containing functional groups of LDPE film, resulting in the improvement of dyeability for basic dyeing agent.

Formation of Polypropylene Thin Films with Superhydrophobic Surface (초소수성 표면특성을 갖는 폴리프로필렌 박막형성)

  • Park, Jae Nam;Shin, Young Sik;Lee, Won Gyu
    • Applied Chemistry for Engineering
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    • v.25 no.6
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    • pp.598-601
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    • 2014
  • The effects of process parameters for the formation of polypropylene film such as the polypropylene concentration in the solution, drying temperature for coating film, and variation of nano-silica content on the surface structure and property of polypropylene film have been studied. A super-hydrophobic polypropylene film with a maximum contact angle of $154^{\circ}$ was obtained at the condition of a polypropylene concentration of 30 mg/mL, a drying temperature of $30^{\circ}C$, a drying pressure of 93 mtorr for 90 min. The increase of a drying temperature reduced the contact angle by enhancing the surface smoothness of the film. The increase of nano-silica content in the composite film composed of polypropylene and silica changed the surface shape from microporous to microglobular, which led to increasing the contact angle and showed the super-hydrophobic surface property.