• Title/Summary/Keyword: substrates temperature

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Sn58Bi Solder Interconnection for Low-Temperature Flex-on-Flex Bonding

  • Lee, Haksun;Choi, Kwang-Seong;Eom, Yong-Sung;Bae, Hyun-Cheol;Lee, Jin Ho
    • ETRI Journal
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    • v.38 no.6
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    • pp.1163-1171
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    • 2016
  • Integration technologies involving flexible substrates are receiving significant attention owing the appearance of new products regarding wearable and Internet of Things technologies. There has been a continuous demand from the industry for a reliable bonding method applicable to a low-temperature process and flexible substrates. Up to now, however, an anisotropic conductive film (ACF) has been predominantly used in applications involving flexible substrates; we therefore suggest low-temperature lead-free soldering and bonding processes as a possible alternative for flex-on-flex applications. Test vehicles were designed on polyimide flexible substrates (FPCBs) to measure the contact resistances. Solder bumping was carried out using a solder-on-pad process with Solder Bump Maker based on Sn58Bi for low-temperature applications. In addition, thermocompression bonding of FPCBs was successfully demonstrated within the temperature of $150^{\circ}C$ using a newly developed fluxing underfill material with fluxing and curing capabilities at low temperature. The same FPCBs were bonded using commercially available ACFs in order to compare the joint properties with those of a joint formed using solder and an underfill. Both of the interconnections formed with Sn58Bi and ACF were examined through a contact resistance measurement, an $85^{\circ}C$ and 85% reliability test, and an SEM cross-sectional analysis.

Development of 2-inch Plastic Film STN LCD

  • Park, Sung-Kyu;Han, Jeong-In;Kim, Won-Keun;Kwak, Min-Gi
    • Journal of Information Display
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    • v.1 no.1
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    • pp.14-19
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    • 2000
  • Due to distinct properties of plastic substrates such as poor thermal resistance, non-rigidness and high thermal expansion, it is difficult to fabricate plastic film LCDs by conventional LCD processes. Poor thermal resistance and high thermal expansion of substrates induced deformation of substrates surface, mismatch of thermal expansion between ITO electrodes and substrates resulted in defects in the ITO electrodes during the high temperature process. Defects of ITO electrodes and non-uniform cell gap caused by non-rigid and flexible properties were also observed in the pressuring process. Based on in these observations, we used a newly developed material and fabrication process to prevent deformation of substrates, defects of electrodes and to maintain uniform cell gap. The maximum temperature of the process is limited up to $110^{\circ}C$ and pressure loaded during the process is five times less than conventional one. With these invented processes and materials, we obtained highly reliable Plastic Film STN LCDs whose electro-optical characteristics are better than or equivalent to those of typical glass LCDs.

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Wetting Behavior of Low Temperature Molten Frits on Various Ceramic Substrates (세라믹 기판에 대한 저온 용융프릿트의 침윤 거동)

  • 노태준;오근호;이종근;김대웅
    • Journal of the Korean Ceramic Society
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    • v.20 no.3
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    • pp.199-204
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    • 1983
  • An attempt was made to study wetting behavior of various low temperature molten frist on ceramic substrates including high alumina silicon carbide and porous fired clay plates by Sessile-drop method. The cosine values of contact angles between substrates and molten frist were linear as a function of temperature unless chemical reactions between substrate and molten frit occured. Addition of BaO to frit composition indicated that cosine of values of contact angles were gradually increased with increasing temperature but in the frist contained $Li_2O$ consine values were abruptly increased with increasing temperature after reached a certain temperature. The contact angle increased with increasing roughness of the substrate surface in case of alumina substrate plate.

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Electron Tunneling Characteristics of PtSi-nSi Junctions according to Temperature Variations (온도변화에 따른 백금 실리사이드-엔 실리콘 접합의 전자 터널링 특성)

  • 장창덕;이정석;이광우;이용재
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1998.06a
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    • pp.87-91
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    • 1998
  • In this paper, We analyzed the current-voltage characteristics with n-type silicon substrates concentration and temperature variations (Room temperature, 50$^{\circ}C$, 75$^{\circ}C$) in platinum silicide and silicon junction. The electrical parameters of measurement are turn-on voltage, saturation current, ideality factor, barrier height, dynamic resistance in forward bias and reverse breakdown voltage according to variations of junction concentration of substrates and measurement temperature variations. As a result, the forward turn-on voltage, reverse breakdown voltage, barrier height and dynamic resistance were decreased but saturation currents and ideality factor were increased by substrates increased concentration variations in platinum silicide and n-silicon junction. In increased measurement temperature (RT, 50$^{\circ}C$, 75$^{\circ}C$), the extracted electrical parameter values of characteristics were rises by increased temperature variations according to the forward and reverse bias.

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Use of 1.7 kV and 3.3 kV SiC Diodes in Si-IGBT/ SiC Hybrid Technology

  • Sharma, Y.K.;Coulbeck, L.;Mumby-Croft, P.;Wang, Y.;Deviny, I.
    • Journal of the Korean Physical Society
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    • v.73 no.9
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    • pp.1356-1361
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    • 2018
  • Replacing conventional Si diodes with SiC diodes in Si insulated gate bipolar transistor (IGBT) modules is advantageous as it can reduce power losses significantly. Also, the fast switching nature of the SiC diode will allow Si IGBTs to operate at their full high-switching-speed potential, which at present conventional Si diodes cannot do. In this work, the electrical test results for Si-IGBT/4HSiC-Schottky hybrid substrates (hybrid SiC substrates) are presented. These substrates are built for two voltage ratings, 1.7 kV and 3.3 kV. Comparisons of the 1.7 kV and the 3.3 kV Si-IGBT/Si-diode substrates (Si substrates) at room temperature ($20^{\circ}C$, RT) and high temperature ($H125^{\circ}C$, HT) have shown that the switching losses in hybrid SiC substrates are miniscule as compared to those in Si substrates but necessary steps are required to mitigate the ringing observed in the current waveforms. Also, the effect of design variations on the electrical performance of 1.7 kV, 50 A diodes is reported here. These variations are made in the active and termination regions of the device.

Development of Sealing Technology for Far-Infrared Multispectral ZnS Using Chalcogenide Glass Material

  • Soyoung Kim;Jung-Hwan In;Karam Han;Yoon Hee Nam;Seon Hoon Kim;Ju Hyeon Choi
    • Korean Journal of Materials Research
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    • v.32 no.12
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    • pp.515-521
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    • 2022
  • Various types of optical materials and devices used in special environments must satisfy durability and optical properties. In order to improve the durability of zinc sulfide multispectral (MS ZnS) substrates with transmission wavelengths from visible to infrared, Ge-Sb-Se-based chalcogenide glass was used as a sealing material to bond the MS ZnS substrates. Wetting tests of the Ge-Sb-Se-based chalcogenide glass were conducted to analyze flowability as a function of temperature, by considering the glass transition temperature (Tg) and softening temperature (Ts). In the wetting test, the viscous flow of the chalcogenide glass sample was analyzed according to the temperature. After placing the chalcogenide glass disk between MS ZnS substrates (20 × 30 mm), the sealing test was performed at a temperature of 485 ℃ for 60 min. Notably, it was found that the Ge-Sb-Se-based chalcogenide glass sealed the MS ZnS substrates well. After the MS ZnS substrates were sealed with chalcogenide glass, they showed a transmission of 55 % over 3~12 ㎛. The tensile strength of the sealed MS ZnS substrates with Ge-Sb-Se-based chalcogenide glass was analyzed by applying a maximum load of about 240 N, confirming its suitability as a sealing material in the far infrared range.

A Brief Review on Low-temperature Techniques for Flexible-Dye Sensitized Photovoltaics (유연 염료감응형 광전지 저온공정법 연구개발 동향)

  • Jun Hwan Jang;Kicheon Yoo;Hyeong Cheol Kang;Jae-Joon Lee
    • Current Photovoltaic Research
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    • v.11 no.1
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    • pp.1-7
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    • 2023
  • Flexible dye sensitized photovoltaics (f-DSPVs) based on plastic substrates have attracted significant interest due to their light-weight, flexibility, and compatibility with roll-to-roll processing, as well as their potential application to ubiquitous power sources. However, f-DSPVs exhibit inferior power conversion efficiencies (PCE) compared to conventional DSPVs since the fabrication process must be conducted at a low-temperature (≤ 150℃) to prevent thermal damage of the plastic substrates, which generally results in poor interconnection between the TiO2 nanoparticles. Numerous novel low-temperature manufacturing approaches for flexible photoanode and counter electrode have been developed. In this review, current progress on low temperature strategies for f-DSPVs technology are discussed.

Barix Thin Film Encapsulation of OLED's on Flexible and Rigid Glass substrates; high temperature performance and manufacturing aspects.

  • Chu, X.;Moro, L.;Rutherford, N.;Visser, R.J.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08b
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    • pp.1699-1702
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    • 2007
  • We will discuss encapsulation of OLEDs on both flexible and rigid glass substrates. Accelerated testing at 6CC/90RH and 85C/85RH is compared and acceleration factors for OLED and Calcium test samples are discussed.We have tested the stability and performance of our barrier coating to much higher temperatures: up to 140 C. Water Vapor Transmission rates at temperatures from 60 to 140 C are presented. Rates and methods for low cost manufacturing on a large scale are analysed

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Development of a Low Temperature Doping Technique for Applications in Poly-Si TFT on Plastic Substrates

  • Hong, Wan-Shick;Kim, Jong-Man
    • Journal of Information Display
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    • v.4 no.3
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    • pp.17-21
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    • 2003
  • A low temperature doping technique to be applied in poly-Si TFTs on plastic substrates was investigated. Heavily-doped amorphous silicon layers were deposited on poly-Si and the dopant atoms were driven in by subsequent excimer laser annealing. The entire process was carried out under a substrate temperature of 120 $^{\circ}C$, and a sheet resistance of as low as 300 ${\Omega}$/sq. was obtained.

Development of a Low Temperature Doping Technique for Application in Poly-Si TFT on Plastic Substrates

  • Hong, Wan-Shick;Kim, Jong-Man
    • 한국정보디스플레이학회:학술대회논문집
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    • 2003.07a
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    • pp.1131-1134
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    • 2003
  • A low temperature doping technique has been studied for application in poly-Si TFT's on plastic substrates. Heavily-doped amorphous silicon layers were deposited on poly-Si and the dopant atoms were driven in by subsequent excimer laser annealing. The entire process was carried out under a substrate temperature of $120^{\circ}C$, and a sheet resistance as low as $300 {\Omega}/sq$. was obtained.

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