• 제목/요약/키워드: substrate thickness

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Electric Fuel Sender Apparatus for the Vehicles Using CPW Transmission Line (CPW 전송선을 이용한 전자식 자동차용 연료 센더 장치)

  • Son Tae-Ho
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.17 no.4 s.107
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    • pp.380-386
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    • 2006
  • Electric fuel sender fur the vehicle fuel gauge system was designed and fabricated based on the CPW(Co-Planer Waveguide) transmission line theory. It is applied on this system that characteristic impedance of RF transmission line can be varied by the surrounded material of the line. By the characteristic impedance owing the level of gasoline or diesel fuel in vehicle fuel tank, CPW line has corresponding reflected signal as much as changed impedance. Detected signal is amplified, and delivered to fuel indicator into cluster unit on dash board. Conventional floating mechanical buoy level gauge has several defects as low reliability and high break down rate by mechanical operation, and has not good linearity for the fuel level difference. CPW line with electric circuits are constructed on 1.6 mm thickness epoxy substrate, and measurement shows that this system has more accurate level and better linearity than conventional mechanical system. New electric fuel sender which has good productivity with long lifetime and low-in-cost by the SMT chip assembling could be replaced this system with conventional floating buoy system.

Linear Tapered Slot Rectifying Antenna for Portable UHF-Band RFID System (휴대용 UHF대역 RFID 시스템을 위한 선형 테이퍼드 슬롯 정류 안테나)

  • Pyo, Seongmin
    • Journal of IKEEE
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    • v.24 no.1
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    • pp.368-371
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    • 2020
  • In this paper, we propose a linear tapered slot rectifying antenna for a portable UHF-band RFID system. Since the proposed rectifying antenna does not use a dielectric substrate, the planar antenna is implemented with a thin metal thickness. The rectifier circuit converts input RF power into output DC voltage using a voltage doubler circuit based on two anti-parallel schottky diodes. The rectifying antenna is integrated by the voltage doubler circuit into a linear tapered slot antenna. For conjugate impedance matching of the rectifying circuit and the linear tapered slot antenna, the source-pull method was utilized by adjusting the angle of the tapered slot and the length of the antenna feed line. The proposed antenna prototype has been verified with the electrical and radiation characteristics through RF-DC conversion and far-field radiation test in open space measurement environment. Finally, the proposed antenna is realized to 0.23-wavelength (75 mm) and 0.18-wavelength (60 mm) at 915 MHz center frequency.

Ultra-wideband Antipodal Vivaldi Antenna with H-shaped Parasitic Patches (에이치(H)자 형태의 기생패치를 가진 초광대역 안티포달 비발디 안테나)

  • Jung, Dongkeun
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.21 no.9
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    • pp.1642-1648
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    • 2017
  • Ultra-wideband antennas are desired for several applications including satellite communications, radars, remote sensing system, telescopes, and microwave imaging systems. There are many types of wideband antenna structures, but the tapered slot Vivaldi antenna is advantageous in terms of cost, weight, scan angle capabilities, end-fire radiation, and ease of feeding and system integration. In this paper, a modified antipodal Vivaldi antenna is presented. A novel AVA with H-shaped parasitic patches has the capacity to improve the radiation characteristics in the whole operation frequencies. A prototype of the modified antenna with RT/duroid 5880 substrate of a relative dielectric constant (${\epsilon}_r$) of 2.2, and a thickness of 31mil is fabricated and experimentally studied as well. It measures a ${\mid}S_{11}{\mid}$ of less than -10dB and gain of 9-12dBi over 7.8-52.5GHz which shows reasonable agreement with the simulated one.

Etch characteristics of TiN thin film adding $Cl_2$ in $BCl_3$/Ar Plasma ($BCl_3$/Ar 플라즈마에서 $Cl_2$ 첨가에 따른 TiN 박막의 식각 특성)

  • Um, Doo-Seung;Kang, Chan-Min;Yang, Xue;Kim, Dong-Pyo;Kim, Chang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.168-168
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    • 2008
  • Dimension of a transistor has rapidly shrunk to increase the speed of device and to reduce the power consumption. However, it is accompanied with several problems like direct tunneling through the gate dioxide layer and low conductivity characteristic of poly-Si gate in nano-region. To cover these faults, study of new materials is urgently needed. Recently, high dielectric materials like $Al_2O_3$, $ZrO_2$, and $HfO_2$ are being studied for equivalent oxide thickness (EOT). However, poly-Si gate is not compatible with high-k materials for gate-insulator. Poly Si gate with high-k material has some problems such as gate depletion and dopant penetration problems. Therefore, new gate structure or materials that are compatible with high-k materials are also needed. TiN for metal/high-k gate stack is conductive enough to allow a good electrical connection and compatible with high-k materials. According to this trend, the study on dry etching of TiN for metal/high-k gate stack is needed. In this study, the investigations of the TiN etching characteristics were carried out using the inductively coupled $BCl_3$-based plasma system and adding $Cl_2$ gas. Dry etching of the TiN was studied by varying the etching parameters including $BCl_3$/Ar gas mixing ratio, RF power, DC-bias voltage to substrate, and $Cl_2$ gas addition. The plasmas were characterized by optical emission spectroscopy analysis. Scanning electron microscopy was used to investigate the etching profile.

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Growth of ZnO Thin films Depending on the Substrates by RF Sputtering and Analysis of Their Microstructures (기판의 결정구조에 따른 RF 스퍼터링 ZnO 박막의 성장과 미세구조 분석)

  • Yoo In-Sung;So Soon-Jin;Park Choon-Bae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.5
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    • pp.461-466
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    • 2006
  • To investigate the ZnO thin films which are interested in the next generation of short wavelength LEDs and Lasers, the ZnO thin films were deposited by RF sputtering system. At sputtering process of ZnO thin films, substrate temperature, work pressure respectively is $100^{\circ}C$ and 15 mTorr, and the purity of target is ZnO 5 N. The ZnO thin films were in-situ annealed at $600^{\circ}C$ in $O_2$ atmosphere. The thickness of ZnO thin films has implemented about $1.6{\mu}m$ at SEM analysis after in-situ annealing process. We have investigated the crystal structure of substrates, and so structural properties of ZnO thin films has estimate by using XRD, FWHM, FE-SEM and AFM. XRD and FE-SEM showed that ZnO thin films grown on substrates had a c-axis preferential orientation in the [0001] crystal direction. XPS spectra showed that ZnO thin film was showed a peak positions corresponding to the O1s and the Zn2p. As form above XPS, we showed that the atom ratio of Zn:O related 1:1.1504 on ZnO thin film, so we could obtained useful information for p-type ZnO thin film.

Electrical and Optical Study of PLED & OLEDS Structures

  • Mohammed, BOUANATI Sidi;SARI, N. E. CHABANE;Selma, MOSTEFA KARA
    • Transactions on Electrical and Electronic Materials
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    • v.16 no.3
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    • pp.124-129
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    • 2015
  • Organic electronics are the domain in which the components and circuits are made of organic materials. This new electronics help to realize electronic and optoelectronic devices on flexible substrates. In recent years, organic materials have replaced conventional semiconductors in many electronic components such as, organic light-emitting diodes (OLEDs), organic field-effect transistors (OFETs) and organic photovoltaic (OPVs). It is well known that organic light emitting diodes (OLEDs) have many advantages in comparison with inorganic light-emitting diodes LEDs. These advantages include the low price of manufacturing, large area of electroluminescent display, uniform emission and lower the requirement for power. The aim of this paper is to model polymer LEDs and OLEDs made with small molecules for studying the electrical and optical characteristics. The purpose of this modeling process is, to obtain information about the running of OLEDs, as well as, the injection and charge transport mechanisms. The first simulation structure used in this paper is a mono layer device; typically consisting of the poly (2-methoxy-5(2'-ethyl) hexoxy-phenylenevinylene) (MEH-PPV) polymer sandwiched between an anode with a high work function, usually an indium tin oxide (ITO) substrate, and a cathode with a relatively low work function, such as Al. Electrons will then be injected from the cathode and recombine with electron holes injected from the anode, emitting light. In the second structure, we replaced MEH-PPV by tris (8-hydroxyquinolinato) aluminum (Alq3). This simulation uses, the Poole-Frenkel -like mobility model and the Langevin bimolecular recombination model as the transport and recombination mechanism. These models are enabled in ATLAS- SILVACO. To optimize OLED performance, we propose to change some parameters in this device, such as doping concentration, thickness and electrode materials.

Properties of BiSbTe3 Thin Film Prepared by MOCVD and Fabrication of Thermoelectric Devices (MOCVD를 이용한 BiSbTe3 박막성장 및 열전소자 제작)

  • Kwon, Sung-Do;Yoon, Seok-Jin;Ju, Byeong-Kwon;Kim, Jin-Sang
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.5
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    • pp.443-447
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    • 2009
  • Bismuth-antimony-telluride based thermoelectric thin film materials were prepared by metal organic vapor phase deposition using trimethylbismuth, triethylantimony and diisopropyltelluride as metal organic sources. A planar type thermoelectric device has been fabricated using p-type $Bi_{0.4}Sb_{1.6}Te_3$ and n-type $Bi_{2}Te_{3}$ thin films. Firstly, the p-type thermoelectric element was patterned after growth of $5{\mu}m$ thickness of $Bi_{0.4}Sb_{1.6}Te_3$ layer. Again n-type $Bi_{2}Te_{3}$ film was grown onto the patterned p-type thermoelectric film and n-type strips are formed by using selective chemical etchant for $Bi_{2}Te_{3}$. The top electrical connector was formed by thermally deposited metal film. The generator consists of 20 pairs of p- and n-type legs. We demonstrate complex structures of different conduction types of thermoelectric element on same substrate by two separate runs of MOCVD with etch-stop layer and selective etchant for n-type thermoelectric material. Device performance was evaluated on a number of thermoelectric devices. To demonstrate power generation, one side of the device was heated by heating block and the voltage output was measured. The highest estimated power of 1.3 ${\mu}m$ is obtained at the temperature difference of 45 K.

Study on Basic Characteristics of Hollow Piezoelectric Actuator for Driving Nanoscale Stamp (나노스템프 구동용 중공형 압전액추에이터 기본특성에 관한 연구)

  • Park, Jung-Ho;Lee, Hu-Seung;Lee, Jae-Jong;Yun, So-Nam;Ham, Young-Bog;Jang, Sung-Cheol
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.35 no.9
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    • pp.1015-1020
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    • 2011
  • Nanoimprint lithography has been actively investigated. This method can replicate a nanopatterned master stamp onto a thin polymer film on a silicon substrate and so on. In this study, a square-shaped hollow piezoelectric actuator is presented, which is newly developed. This actuator is used for driving a nanoscale stamp in nanoimprint lithography instead of a conventional electric motor. The fabricated prototype actuator has 95 layers and side lengths of 23 mm and 18 mm for the outer and inner squares, respectively. By adopting a novel process instead of the conventional forming process for fabricating a one-layer actuator, the one-layer is composed of four rectangular segments produced by sawing a ceramic film with a thickness of 0.3 mm. The basic characteristics on displacement and generation force of the fabricated prototype actuator are experimentally investigated. Furthermore, the displacement characteristics obtained by using a PI controller are tested and discussed.

Micro Sensor Away and its Application to Recognizing Explosive Gases (마이크로 센서 어레이 제작 및 폭발성 가스 인식으로의 응용)

  • 이대식;이덕동
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.40 no.1
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    • pp.11-19
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    • 2003
  • A micro sensor array with 4 discrete sensors integrated on a microhotplate was developed for identifying the kinds and quantities of explosive gases. The sensor array consisited of four tin oxide-based thin films with the high and broad sensitivity to the tested explosive gases and uniform thermal distribution on the plate. The microhotplate, using silicon substrate with N/O/N membrane, dangling in air by Al bonding wires, and controlling the thickness by chemical mechanical process (CMP), has been designed and fabricated. By employing the sensitivity signal of the sensor array at 40$0^{\circ}C$, we could reliably classily the kinds and quantities of the explosive gases like butan, propane, LPG, and carbon monoxide within the range of threshold limit values (TLVs), employing principal component analysis (PCA).

Effects of Oxygen on Preparation of TiO2 Thin Films by MOCVD (MOCVD법에 의한 TiO2 박막의 제조에 미치는 산소의 영향)

  • Yu, Seong-Uk;Park, Byeong-Ok;Jo, Sang-Hui
    • Korean Journal of Crystallography
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    • v.6 no.2
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    • pp.111-117
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    • 1995
  • TiO2 thin films were prepared on a (100)silicon wafer using a chemical vapor deposition(CVD) method. The deposition experiments were performed using the TTIP in the deposition temperature ransing from 200 content. The deposition rate of TiO2 was increased with the substrate temperature and the oxygen content. The thickness of the deposited thin film and the compositional analysis of this thin films with theoxygen content were measured using Ellipsometry, SEM and ESCA, respectively. The deposited thin film was composed of a bilayer, external TiO2 and internal Ti. Carbon as a residual impurity was found to remain when zero sccm O2 was purged into a reaction chamber and the composition of the deposited thin film was found to change Ti into TiO in a deeper layer. However, when 600sccm O2 was supplied to a reaction chamber, it has been found to reside less carbon content than without O2. Finally, in the condition of 1200sccm O2, no impurity level of carbon was observed and a deeper layer consisted of the Ti composite, even though the deposited surface was composed of TiO2.

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