• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.35 no.6
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• pp.603-609
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• 2022

Passivation quality is mainly governed by epitaxial growth of crystalline silicon wafer surface. Void-rich intrinsic a-Si:H interfacial layer could offer higher resistivity of the c-Si surface and hence a better device efficiency as well. To reduce the resistivity of the contact area, a modification of void-rich intrinsic layer of a-Si:H towards more ordered state with a higher density is adopted by adapting its thickness and reducing its series resistance significantly, but it slightly decreases passivation quality. Higher resistance is not dominated by asymmetric effects like different band offsets for electrons or holes. In this study, multilayer of intrinsic a-Si:H layers were used. The first one with a void-rich was a-Si:H(I₁) and the next one a-SiO_x:H(I₂) were used, where a-SiO_x:H(I₂) had relatively larger band gap of ~2.07 eV than that of a-Si:H (I₁). Using a-SiO_x:H as I₂ layer was expected to increase transparency, which could lead to an easy carrier transport. Also, higher implied voltage than the conventional structure was expected. This means that the a-SiO_x:H could be a promising material for a high-quality passivation of c-Si. In addition, the i-a-SiO_x:H microstructure can help the carrier transportation through tunneling and thermal emission.

• Transactions on Electrical and Electronic Materials
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• v.14 no.5
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• pp.250-253
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• 2013

In this paper, we fabricated 3D pillar type silicon-oxide-nitride-oxide-silicon (SONOS) devices for high density flash applications. To solve the limitation between erase speed and data retention of the conventional SONOS devices, bandgap-engineered (BE) tunneling oxide of oxide-nitride-oxide configuration is integrated with the 3D structure. In addition, the tunneling oxide is modulated by another method of $N_2$ ion implantation ($N_2$ I/I). The measured data shows that the BE-SONOS device has better electrical characteristics, such as a lower threshold voltage ($V_{\tau}$) of 0.13 V, and a higher $g_{m.max}$ of 18.6 ${\mu}A/V$ and mobility of 27.02 $cm^2/Vs$ than the conventional and $N_2$ I/I SONOS devices. Memory characteristics show that the modulated tunneling oxide devices have fast erase speed. Among the devices, the BE-SONOS device has faster program/erase (P/E) speed, and more stable endurance characteristics, than conventional and $N_2$ I/I devices. From the flicker noise analysis, however, the BE-SONOS device seems to have more interface traps between the tunneling oxide and silicon substrate, which should be considered in designing the process conditions. Finally, 3D structures, such as the pillar type BE-SONOS device, are more suitable for next generation memory devices than other modulated tunneling oxide devices.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.375-375
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• 2014

Layered semiconductor materials can be a promising candidate for large-area thin film transistors (TFTs) due to their relatively high mobility, low-power switching, mechanically flexibility, optically transparency, and amenability to a low-cost, large-area growth technique like thermal chemical vapor deposition (CVD). Unlike 2D graphene, series of transition metal dichalcogenides (TMDCs), $MX_2$ (M=Ta, Mo, W, X=S, Se, Te), have a finite bandgap (1~2 eV), which makes them highly attractive for electronics switching devices. Recently, 2D $MoS_2$ materials can be expected as next generation high-mobility thin-film transistors for OLED and LCD backplane. In this paper, we investigate in detail the electrical characteristics of 2D layered $MoS_2$ local bottom-gated transistor with the same device structure of the conventional thin film transistor, and expect the feasibility of display application.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.466.1-466.1
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• 2014

$TiO_2$는 저렴한 가격, 적절한 bandgap, 열적, 화학적, 생물학적 안정성 등으로 촉망받는 광촉매 물질이다. $TiO_2$는 rutile (tetragonal, space group: P42/mnm), anatse (tetragonal, space group: I41/amd), and brookite (orthorhombic, space group: Pbca )의 3가지 대표적인 결정구조를 가지고 있다. Rutile과 anatase는 1972년 Fujishima와 Honda가 $TiO_2$의 광촉매 특성을 발견 한 후로 아주 많은 연구가 되어왔다. 반면 brookite의 경우는 자연에 거의 존재하지 않으며, 합성방법도 어려워서 rutile과 anatase에 비해 많은 연구가 되지 않았다. 본 연구에서는 brookite를 포함한 다양한 $TiO_2$ 나노구조를 간단한 수열합성법으로 티타늄 호일 위에 합성하였다. 합성된 $TiO_2$는 반응 온도와 시간, additive의 농도에 따라서 sheet, tube, wire, pyramidal 의 4가지 morphologies를 가졌다. 이 다양한 morphologies은 SEM과 TEM으로 분석되었으며, 각 물질의 결정 구조는 XRD분석과 TEM의 SAED pattern 분석으로 sheet, tube, wire은 anatase, pyramidal 구조는 brookite라는 것이 확인 되었다. 위의 방법으로 합성된 각각의 $TiO_2$ 물질들을 working 전극으로, Pt와 Ag/AgCl을 reference와 counter 전극으로 만들어서 photoelectrochemical 특성을 측정해서 비교를 해보았을 때, brookite 물질이 anatase보다 더 좋은 photoelectrochemical 특성을 나타내는 것을 확인하였다.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2017.05a
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• pp.145-145
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• 2017

음극재에 사용되는 타이타니아 나노튜브($TiO_2$ nanotubes)는 높은 종횡비를 가지고 있으며, 기계적인 강도가 우수하고 화학적인 안정성이 높다. 그러나 낮은 전기전도도와 상대적으로 넓은 밴드갭(bandgap)은 다양한 활용 분야에 이 물질이 활용되는 것을 제한하고 있는 상황이다. 전기 화학적 분야에서 광화학 반응 또는 과전압에서 밴드갭을 줄이기 위한 타이타니아 나노튜브의 나노 구조 변형에 대한 많은 연구가 있어왔다. 본 연구에서는 산화 몰리브덴(Molybdenum oxide)을 촉매로 사용하여 타이타니아 나노튜브에 전기충격법을 이용하여 도핑했다. 생성된 타이타니아 나노튜브를 $450^{\circ}C$에서 1시간 30분 동안 가열하여 타이타니아 나노구조를 아나타제(anatase) 구조로 변형켰다. 타이타니아 나노튜브의 구조적인 변화를 scanning electron microscopy(SEM), energy-dispersive X-ray spectroscopy(EDS) 등을 통해 측정했고 UV-Visiblespectroscopy를 통해 도핑된 타이타니아 나노튜브의 밴드갭을 측정하였다. 몰리브덴이 도핑된 타이타니아 나노튜브는 기존의 타이타니아 나노튜브가 가지는 밴드갭인 3.0 ~ 3.2eV 범위보다 더 낮아진 2.6 ~ 2.8eV의 범위를 가지는 것을 확인하였다. 몰리브덴이 도핑된 타이타니아 나노튜브는 다양한 광촉매 분야에 적용될 수 있을 것으로 예상된다.

• Proceeding of EDISON Challenge
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• 2016.03a
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• pp.288-291
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• 2016

Recently, there has been a lot of researches related to two-dimensional (2D) materials due to their new properties and applications emerging upon 2D confinement. A new type of graphene like two-dimensional layer material, nitrogenated holey two-dimensional structure C2N-h2D, that is possession of evenly distributed holes and nitrogen atoms with proper bandgap has been synthesized. Previous calculation studies already have shown that the variance of the orbital interaction, band structure of few-layer C2N-h2D suggests that interlayer coupling does play an important role in its electronic properties. In this point, using first-principles density functional theory calculation, we here explore the effect of porous embedded iron atom and iron substrate on encapsulated few layer C2N-h2D. We show the atomic structures and the corresponding electronic structures of Fe@C2N to elucidate the effect of iron. Finally, this study demonstrates that embedded iron C2N has AA-stacking as most favorable stacked structure in contrast to pure C2N. In addition, iron substrate modifies its encapsulated C2N from semi-metallic states to metallic state.

• Applied Science and Convergence Technology
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• v.26 no.6
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• pp.208-213
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• 2017

Flexible opto-electronic devices are developed on the insulating layer deposited stainless steel (STS) substrates. The silicon dioxide ($SiO_2$) material as the diffusion barrier of Fe and Cr atoms in addition to the electrical insulation between the electronic device and STS is processed using the plasma enhanced chemical vapor deposition method. Noble silver (Ag) films of approximately 100 nm thickness have been formed on $SiO_2$ deposited STS substrates by E-beam evaporation technique. The films then were annealed at $650^{\circ}C$ for 20 min using the rapid thermal annealing (RTA) technique. It was investigated the variation of the surface morphology due to the interaction between Ag films and $SiO_2$ layers after the RTA treatment. The results showed the movement of Si atoms in silver film from $SiO_2$. In addition, the structural investigation of Ag annealed at $650^{\circ}C$ indicated that the Ag film has the material property of p-type semiconductor and the bandgap of approximately 1 eV. Also, the films annealed at $650^{\circ}C$ showed reflection with sinusoidal oscillations due to optical interference of multiple reflections originated from films and substrate surfaces. Such changes can be attributed to both formation of $SiO_2$ on Ag film surface and agglomeration of silver film between particles due to annealing.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1997.11a
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• pp.34-38
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• 1997

The linear dichroism in obliquely deposited amorphous As$_{40}$ /Ge$_{10}$/Se$_{15}$ /S$_{35}$ thin films has been studied using a sub-bandgap exposure by He-Ne laser. As increasing the deposition angle, the magnitude of 야chroism in as-deposited thin films was enhanced to about 10%, while that of the films annealed abode T$_{g}$ before illumination was nut enhanced at all.l.l.l.l.

• Journal of Sensor Science and Technology
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• v.17 no.5
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• pp.346-349
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• 2008

A metal-semiconductor-metal (MSM) ultraviolet (UV) photodetector (PD) is proposed as an effective UV sensing device for integration with a GaN n-channel MISFET on auto-doped p-type GaN grown on a silicon substrate. Due to the high hole barrier of the metal-p-GaN contact, the dark current density of the fabricated MSM PD was less than $3\;nA/cm^2$ at a bias of up to 5 V. Meanwhile, the UV/visible rejection ratio was 400 and the cutoff wavelength of the spectral responsivity was 365 nm. However, the UV/visible ratio was limited by the sub-bandgap response, which was attributed to defectrelated deep traps in the p-GaN layer of the MSM PD. In conclusion, an MSM PD has a high process compatibility with the n-channel GaN Schottky barrier MISFET fabrication process and epitaxy on a silicon substrate.

• Bulletin of the Korean Chemical Society
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• v.35 no.3
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• pp.913-918
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• 2014

Five mol % tungsten-doped tin oxide ($W_{0.05}Sn_{0.95}O_2$, TTO5) was prepared by co-precipitation of $SnCl_4{\cdot}5H_2O$ and $WCl_4$, followed by calcination at $1000^{\circ}C$. The as-prepared TTO5 was in the pure cassiterite phase with a particle size of ~50 nm and optical bandgap of 2.51 eV. Herein it was applied for the formation of TTO5/$TiO_2$ heterojunctions by covering the TTO5 surface with $TiO_2$ by sol-gel method. Under visible-light irradiation (${\lambda}{\geq}420$ nm), TTO5/$TiO_2$ showed a significantly high photocatalytic activity in removing gaseous 2-propanol (IP) and evolving $CO_2$. It is deduced that its high visible-light activity is caused by inter-semiconductor holetransfer between the valence band (VB) of TTO5 and $TiO_2$, since the TTO5 nanoparticle (NP) exhibits the absorption edge at ~450 nm and its VB level is located more positive side than that of $TiO_2$. The evidence for the hole-transport mechanism between TTO5 and $TiO_2$ was also investigated by monitoring the holescavenging reaction with 1,4-terephthalic acid (TA).