• 한국방송∙미디어공학회:학술대회논문집
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• 한국방송공학회 2009년도 IWAIT
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• pp.790-793
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• 2009

In the case of projection type display, it needs to use the screen in order to project the image clearly and wide viewing angle. We have been developing the step in type display system using the smoke screen. However, the image with smoke screen was flickered by gravity and air flow. Then we considered to reduce the flicker of the image and we found that flicker can be reduced and viewing angle becomes more large. This time we report the large viewing angle step in type display system using screen made up with very small particle size smoke and flow controlled nozzle. Hence, at first we considered the most suitable particle for the screen and then the shape of screen and then we constructed the array of flow controlled smoke screen. By the results of experiment we could get considerably high contrast flicker-less image and get the viewing angle more than $60^{\circ}$ by this flow controlled nozzle attached new type smoke screen and make clear the efficiency of this method.

• 한국광학회:학술대회논문집
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• 한국광학회 2008년도 하계학술발표회 논문집
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• pp.119-120
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• 2008

A HMD type multi-focus 3D display system is developed and proof about satisfaction of eye accommodation is tested. Four LEDs(Light Emitting Diode) and a DMD are used to generate four parallax images at single eye and any mechanical part is not included in this system. The multi-focus means the ability of monocular depth cue to various depth levels. By achieving multi-focus function, we developed a 3D display system for only one eye, which can satisfy the accommodation to displayed virtual objects within defined depth. We could achieve a result that focus adjustment is possible at 5 step depths in sequence within 2m depth for only one eye. Additionally, the change level of burring depending on the focusing depth is tested by captured photos and moving pictures of video camera and several subjects. And the HMD type multi-focus 3D display can be applied to a monocular 3D display and monocular AR 3D display.

• 반도체디스플레이기술학회지
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• 제8권4호
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• pp.89-94
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• 2009

The influence on a stability of thermal plasma has been investigated in an electrode structure of non-transferred plasma torch. The variations of dynamic characteristic of the arc voltage was analyzed and compared in terms of voltage character and nozzle types for both the step-shaped nozzles and magnetic-approved cylindrical nozzle. From the experimental results, an electrode gap, flow rate of arc gas, and currents are considered as major operational parameters. As conclusion, it was assured that a torch with step-shaped nozzles of magnetic-approved type produce the stable plasma jet.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.1625-1628
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• 2006

Two different negative-type photosensitive polyimides were synthesized and characterized for an application as an interdielectric layer in TFTLCD array. In the case of photocurable polyimides, the photosensitive moiety, 2-HHSP, was synthesized through 3 step reaction, and then was incorporated into side chains of polyimide precursor by post reaction. Optimum compositions of negative-type photocurable polyimde were also formulated. For photopolymerizable polyimides, two novel UV monomers containing imide linkages were prepared. An aqueous alkaline developable polymer matrix was synthesized by free radical copolymerization. A negative photoresist formulation was developed utilizing synthesized UV monomers containing imide linkage, photoinitiator, UV oligomer, and alkali developable polymer matrix. It was found that viaholes with good resolution, high transmittance and thermal resistance could be obtained by photolithographic process utilizing the negative-type photoresist formulations.

• 반도체디스플레이기술학회지
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• 제16권4호
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• pp.25-29
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• 2017

In this paper, we have studied the deformation problem of the scaffold caused by the FDM type 3D printer. The Practical TRIZ technique was used to solve the deformation problem of the scaffold generated from the adhesion surface between the scaffold and the bed. The Practical TRIZ methodology was used to derive the solution and the experiment was conducted on the derived solution. As a result of evaluating the experimental results obtained for the solution, it was found that the deformation of the scaffold was much improved to the satisfactory level.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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• pp.706-709
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• 2003

We made an optimization effort on driving waveforms for the Quantized Memory Addressing (QMA) in selective write mode of operation. It was necessary to add long ramp type erase pulses after the total write pulse and the sustain period to obtain stable intermediate luminance discharges. Furthermore, fast rising ramp type total write as well as two step addressing scheme were adopted for better discharge stability.

• 한국세라믹학회지
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• 제48권4호
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• pp.263-268
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• 2011

ZnO hexagonal rods grown in aqueous solution can be changed into a tubular shape by two-step aging in the course of the growing process. In the first step, hexagonal ZnO rods is grown by aging at $90^{\circ}C$ under a highly supersaturated aqueous solution giving rise to a fast precipitation rate. Meanwhile, during the second step aging at $60^{\circ}C$ in the same aqueous solution, the hexagonal polar face (001) having higher surface energy than (010) side planes dissolves to minimize surface energy. Hence the flat (001) face changes to a craterlike face and the hexagonal rod length of ZnO decreases at an initial-stage of this step aging. The formation of the (101) wedge-type faces is ascribed to the resultant of competitive reactions between the dissolution of polar face minimizing the surface energy which is a dominant reaction at the initial stage and the precipitation reaction dissipating supersaturation. At a later stage of the second-step the reaction rates of these two processes in the aqueous solution become similar and the overall reaction is terminated.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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• pp.585-588
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• 2003

We have studied how rubbing direction affects generation of disclination line in transmissive microdisplay for $90^{\circ}$ twisted nematic (TN) mode with pixel size of $22.2{\mu}m$. The rubbing direction of bottom substrate is changed from $0^{\circ}$ to $-135^{\circ}$ with a decrease step of $45^{\circ}$, and the results show that the generation regions of the disclination line are of a smallest size in $-135^{\circ}$ direction. The results were the same although the pixel size decreased. Consequently, the use of proper rubbing direction of liquid crystal can help overcome the problems of low aperture ratio and low contrast ratio in transmissive-type microdisplays. In addition, the pretilt angle of initial liquid crystal is found to make an important contribution to generation of the disclination line.

• 반도체디스플레이기술학회지
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• 제18권2호
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• pp.98-102
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• 2019

Direct plasma-enhanced atomic layer deposition (PEALD) are widely used for $SiO_2$ and SiON thin film process in current semiconductor industry. However, this exhibits poor step coverage for three-dimensional device structure due directionality of plasma species as well as plasma damage on the substrate. In this study, to overcome this issue, low temperature (< $300^{\circ}C$) $SiO_2$ and SiON thin film processes were studied using inductively coupled plasma (ICP) type remote PEALD with various reactant gases such as $O_2$, $H_2O$, $N_2$ and $NH_3$. It was confirmed that the interfacial properties such as fixed charge density and charge trapping behavior of thin films were considerably improved by hydrogen species in $H_2O$ and $NH_3$ plasma compared to the films grown with $O_2$ and $N_2$ plasma. Furthermore, the leakage current density of the thin films was suppressed for same reason.

• Journal of Information Display
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• 제2권4호
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• pp.1-7
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• 2001

This paper investigates the characteristics of a newly developed high density hollow cathode plasma(HCP) system and its application for the etching of silicon wafers. We used $SF_6$ and $O_2$ gases in the HCP dry etch process. This paper demonstrates very high plasma density of $2{\times}10^{12}cm^{-3}$ at a discharge current of 20 rna, Silicon etch rate of 1.3 ${\mu}m$/min was achieved with $SF_6/O_2$ plasma conditions of total gas pressure of 50 mTorr, gas flow rate of 40 seem, and RF power of200W. This paper presents surface etching characteristics on a crystalline silicon wafer and large area cast type multicrystlline silicon wafer. We obtained field emitter tips size of less than 0.1 ${\mu}m$ without any photomask step as well as with a conventional photolithography. Our experimental results can be applied to various display systems such as thin film growth and etching for TFT-LCDs, emitter tip formations for FEDs, and bright plasma discharge for PDP applications. In this research, we studied silicon etching properties by using the hollow cathode plasma system.