Journal of Information Display
- Volume 2 Issue 4
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- Pages.1-7
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- 2001
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- 1598-0316(pISSN)
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- 2158-1606(eISSN)
High-Density Hollow Cathode Plasma Etching for Field Emission Display Applications
- Lee, Joon-Hoi (School of Electrical and Computer Engineering, Sungkyunkwan University) ;
- Lee, Wook-Jae (School of Electrical and Computer Engineering, Sungkyunkwan University) ;
- Choi, Man-Sub (Photon Semiconductor and Energy Co.) ;
- Yi, Joon-Sin (School of Electrical and Computer Engineering, Sungkyunkwan University)
- Published : 2001.12.21
Abstract
This paper investigates the characteristics of a newly developed high density hollow cathode plasma(HCP) system and its application for the etching of silicon wafers. We used