• Title/Summary/Keyword: solution plasma process

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Nanoparticles Synthesis and Modification using Solution Plasma Process

  • Mun, Mu Kyeom;Lee, Won Oh;Park, Jin Woo;Kim, Doo San;Yeom, Geun Young;Kim, Dong Woo
    • Applied Science and Convergence Technology
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    • v.26 no.6
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    • pp.164-173
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    • 2017
  • Across the most industry, the demand for nanoparticles is increasing. Therefore, many studies have been carried out to synthesize nanoparticles using various methods. The aim of this paper is to introduce an industry-applicable as well as financially and environmentally effective solution plasma process. The solution plasma process involves fewer chemicals than the traditional kit, and can be used to replace many of the chemical agents employed in previous synthesis of nanoparticles into plasma. In this study, this process is compared to the wet-reaction process that has thus far been widely used in the most industry. Furthermore, the solution plasma process has been classified into four different types (in-solution, out of solution, direct type, and remote type), according to its plasma occurrence position and plasma types. Thus, the source of radicals, nanoparticle synthesis, and modification methods are explained for each design. Lastly, unlike nanoparticles with hydrophilic functional groups that are made inside the solution, a nanoparticle synthesis and modification method to create a hydrophobic functional group is also proposed.

Dissolution Characteristics of Copper Oxide in Gas-liquid Hybrid Atmospheric Pressure Plasma Reactor Using Organic Acid Solution

  • Kwon, Heoung Su;Lee, Won Gyu
    • Applied Chemistry for Engineering
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    • v.33 no.2
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    • pp.229-233
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    • 2022
  • In this study, a gas-liquid hybrid atmospheric pressure plasma reactor of the dielectric barrier discharge method was fabricated and characterized. The solubility of copper oxide in the organic acid solution was increased when argon having a larger atomic weight than helium was used during plasma discharge. There was no significant effect of mixing organic acid solutions under plasma discharge treatment on the variation of copper oxide's solubility. As the applied voltage for plasma discharge and the concentration of the organic acid solution increased, the dissolution and removal power of the copper oxide layer increased. Solubility of copper oxide was more affected by the concentration in organic acid solution rather than the variation of plasma applied voltage. The usefulness of hybrid plasma reactor for the surface cleaning process was confirmed.

Degradation of synthetic dye in water by solution plasma process

  • Panomsuwan, Gasidit;Morishita, Tetsunori;Kang, Jun;Rujiravanit, Ratana;Ueno, Tomonaga;Saito, Nagahiro
    • Journal of Advanced Marine Engineering and Technology
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    • v.40 no.10
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    • pp.888-893
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    • 2016
  • In this study, the solution plasma process was utilized with the aim of degrading synthetic dyes in water at atmospheric pressure. The experiments were conducted in a batch-type reactor consisting of a symmetric wire-wire electrode configuration with rhodamine B (RhB) as the target synthetic dye. The effects of the plasma treatment time and initial dye concentration on the RhB degradation were investigated by monitoring the change in absorbance of RhB solutions. The RhB solutions turned lighter in color and finally colorless with prolonged plasma treatment time, indicating the destruction of dye molecules. The RhB solutions were found to have degraded, following the first-order kinetic process. However, for high initial RhB concentrations, another kinetic process or factor seems to play a dominant role at the initial degradation stage. The fitted first-order rate constant decreased as the initial concentration increased. This result suggests that the degradation behavior and kinetic process of the RhB solution strongly depends on its initial concentration. The RhB degradation is considered to be due to a combination of factors, including the formation of chemically oxidative species, as well as the emission of intense UV radiation and high-energy electrons from the plasma. We believe that the solution plasma process may prove to be an effective and environment-friendly method for the degradation or remediation of synthetic dye in wastewater.

Green Synthesis of Colloidal and Nanostructured MnO2 by Solution Plasma Process (용액 플라즈마를 이용한 콜로이드 및 나노 구조 MnO2의 친환경 합성)

  • Hyemin Kim
    • Korean Journal of Materials Research
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    • v.33 no.7
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    • pp.315-322
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    • 2023
  • In the present work, we address the new route for the green synthesis of manganese dioxide (MnO2) by an innovative method named the solution plasma process (SPP). The reaction mechanism of both colloidal and nanostructured MnO2 was investigated. Firstly, colloidal MnO2 was synthesized by plasma discharging in KMnO4 aqueous solution without any additives such as reducing agents, acids, or base chemicals. As a function of the discharge time, the purple color solution of MnO4- (oxidation state +7) was changed to the brown color of MnO2 (oxidation state +4) and then light yellow of Mn2+ (oxidation state +2). Based on the UV-vis analysis we found the optimal discharging time for the synthesis of stable colloidal MnO2 and also reaction mechanism was verified by optical emission spectroscopy (OES) analysis. Secondly, MnO2 nanoparticles were synthesized by SPP with a small amount of reducing sugar. The precipitation of brown color was observed after 8 min of plasma discharge and then completely separated into colorless solution and precipitation. It was confirmed layered type of nanoporous birnessite-MnO2 by X-ray powder diffraction (XRD), fourier-transform infrared spectroscopy (FT-IR), and electron microscopes. The most important merits of this approach are environmentally friendly process within a short time compared to the conventional method. Moreover, the morphology and the microstructure could be controllable by discharge conditions for the appropriate potential applications, such as secondary batteries, supercapacitors, adsorbents, and catalysts.

Preparation of Composite Membranes for Recovery of Unreacted Olefin Monomers (미반응 올레핀계 모노머 회수를 위한 복합막의 제조)

  • Kim, Hyun-Gi;Kim, Sang-Yong;Kim, Sung-Soo
    • Membrane Journal
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    • v.20 no.4
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    • pp.297-303
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    • 2010
  • Composite membranes were prepared for membrane/cold condensation process for recovery of unreacted olefin monomer from the polyolefin polymerization process by solution coating and plasma polymerization processes. Poly(dimethylsiloxane) (PDMS) solution was coated on polysulfone (PSF) support and increase of prepolymer content in solution made more dense membrane structure to result in the increase of separation factor while absolute flux decreased. Permeation of organic materials through the composite membranes follows the sorption and diffusion mechanism, which brought about the results that separation factor increased with critical temperature of the organic materials, and that flux increased with the increase of the molar volume. Crosslinking period affected the permeation characteristics. Other types of composite membranes were fabricated by plasma polymerization of siloxane materials on polypropylene (PP) and PSF supports. PP was tested as a support for composite membranes, which had not been used so far in solution coating process, and plasma polymerization made the composite membranes equivalent performances to those of membranes prepared by solution coating process.

Experimental Study on the Corrosion Behavior of Al Coatings Applied by Plasma Thermal Arc Spray under Simulated Environmental Conditions (모사 부식 환경에서 플라즈마 아크용사에 의한 Al 코팅의 부식특성에 관한 실험적 연구)

  • Jeong, Hwa-Rang
    • Journal of the Korea Institute of Building Construction
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    • v.23 no.5
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    • pp.559-570
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    • 2023
  • The corrosion of structural steel used in the construction industry is increasing due to the industrialization where many aggressive ions released in the atmosphere. Therefore, in the present study Al coating was deposited by arc and plasma arc thermal spray process and compared their effectiveness in simulated weathering condition i.e. Society of Automotive Engineers(SAE) J2334 solution which mostly contain Cl- and CO32- ions. Different analytical techniques have been used to characterize the coating and draw the corrosion mechanism. The Al coating deposited by plasma arc thermal spray process exhibited uniform, dense and layer by layer deposition resulting higher bond adhesion values. The open circuit potential(OCP) of Al coating deposited this process is exhibited more electropositive values than arc thermal spray process in SAE J2334 solution with immersion periods. The total impedance of plasma arc thermal spray process exhibited higher than arc thermal spray process. The corrosion rate of the plasma arc thermal sprayed Al coating is reduced by 20% compared to arc thermal spray process after 23 days of immersion in SAE J2334 solution.

Characterization of Ceramic Oxide Layer Produced on Commercial Al Alloy by Plasma Electrolytic Oxidation in Various KOH Concentrations

  • Lee, Jung-Hyung;Kim, Seong-Jong
    • Journal of the Korean institute of surface engineering
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    • v.49 no.2
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    • pp.119-124
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    • 2016
  • Plasma electrolytic oxidation (PEO) is a promising coating process to produce ceramic oxide on valve metals such as Al, Mg and Ti. The PEO coating is carried out with a dilute alkaline electrolyte solution using a similar technique to conventional anodizing. The coating process involves multiple process parameters which can influence the surface properties of the resultant coating, including power mode, electrolyte solution, substrate, and process time. In this study, ceramic oxide coatings were prepared on commercial Al alloy in electrolytes with different KOH concentrations (0.5 ~ 4 g/L) by plasma electrolytic oxidation. Microstructural and electrochemical characterization were conducted to investigate the effects of electrolyte concentration on the microstructure and electrochemical characteristics of PEO coating. It was revealed that KOH concentration exert a great influence not only on voltage-time responses during PEO process but also on surface morphology of the coating. In the voltage-time response, the dielectric breakdown voltage tended to decrease with increasing KOH concentration, possibly due to difference in solution conductivity. The surface morphology was pancake-like with lower KOH concentration, while a mixed form of reticulate and pancake structures was observed for higher KOH concentration. The KOH concentration was found to have little effect on the electrochemical characteristics of coating, although PEO treatment improved the corrosion resistance of the substrate material significantly.

Study on Corrosion Resistance Performance of Zn Coating Applied by Arc Thermal and Plasma Arc Spray Process in Artificial Ocean Water (인공해양환경에서 Arc Thermal and Plasma Arc Spray 공법이 적용된 Zn 코팅 강재의 내식성능 평가에 관한 연구)

  • Jannat, Adnin Raihana;Lee, Han-Seung
    • Proceedings of the Korean Institute of Building Construction Conference
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    • 2020.06a
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    • pp.83-84
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    • 2020
  • In present study, we have deposited the Zinc coating using arc thermal spray and plasma arc spray processes onto the steel substrate and durability of the deposited coating was evaluated. The bond adhesion result shows that plasma arc sprayed Zn coating exhibited higher in its value compared to arc thermal spray. SEM shows that Zn coating deposited by plasma arc process is more compact, less porous and adherent compare to arc spray process. The corrosion resistance properties are evaluated in artificial ocean water solution with exposure periods. EIS results show that total impedance at 0.01 Hz of plasma arc sprayed coating is higher than arc thermal spray owing to the compact and less porous morphology. It is concluded that plasma arc sprayed Zn coating is better than arc thermal spray process.

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Activation of Stripper Solution by Plasma and Hardness/Modulus of Elasticity Change of the Surface (Plasma를 이용한 세정액의 활성화와 시료 표면의 탄성계수 및 강도 변화에 대한 연구)

  • Kim, Soo-In;Kim, Hyun-Woo;Noh, Seong-Cheol;Yoon, Duk-Jin;Chang, Hong-Jun;Lee, Jong-Rim;Lee, Chang-Woo
    • Journal of the Korean Vacuum Society
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    • v.18 no.2
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    • pp.97-101
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    • 2009
  • In the modem semiconductor industry, the progress that consumes the most capital and labor is cleansing process. Cleansing process is to remove impurities that can affect the operation of the device and deteriorate its function. Especially, Photoresist (PR) progress that etches the device always requires cleansing at the end of the progress. Also, HDI-PR (High-Dose Ion-implanted Photoresist) created from PR progress is difficult to remove. Thus, in modem IC cleansing, many steps of cleansing are used, including dry and wet cleansing. In this paper, we suggested to combine existing dry-cleansing and wet-cleansing, each represented by plasma cleansing and stripper solution, as Plasma Liquid-Vapor Activation (PLVA). This PLVA method enhances the effect of existing cleansing solution, and decreases the amount of solution and time required to strip. We stripped HDI-PR by activated solution and measured surface hardness and Young's modulus by Nano-indenter. Nano-indenter is the equipment that determines the hardness and the modulus of elasticity by indenting nano-sized tip with specific shape into the surface and measuring weight and z-axis displacement. We measured the change of surface hardness and Young's modulus before and after the cleansing. As a result, we found out that the surface hardness of the sample sharply decreased after the cleansing by plasma-activated PR stripper solution. It can be considered that if physical surface-cleansing process is inserted after this, more effective elimination of HDI-PR is possible.

The Study of Improvement in the Characteristics of Oxide Thin Film Transistor by using Atmospheric Pressure Plasma (대기압 플라즈마를 이용한 산화물 박막 트랜지스터 표면처리에 관한 연구)

  • Kim, Ga Young;Kim, Kyong Nam;Yeom, Geun Young
    • Journal of the Korean institute of surface engineering
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    • v.48 no.1
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    • pp.7-10
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    • 2015
  • Recently, oxide TFTs has attracted a lot of interests due to their outstanding properties such as excellent environmental stability, high mobility, wide-band gap energy and high transparency, and investigated through the method using vacuum system and wet solution. In the case of the method using wet solution, process is very simple, however, annealing process should be included. In this study, to overcome the problem of annealing process, atmospheric pressure plasma was used for annealing, and the electrical characteristics such as on/off ration and mobility of device were investigated.