• Title/Summary/Keyword: sidewall

검색결과 349건 처리시간 0.021초

충격파가 초음속 수소-공기 화염의 안정한계에 미치는 영향 (Measured Effect of Shock Wave on the Stability Limits of Supersonic Hydrogen-Air Flames)

  • Hwanil Huh
    • 한국추진공학회지
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    • 제3권1호
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    • pp.86-94
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    • 1999
  • 충격파가 초음속 수소-공기 제트화염의 화염 안정한계에 미치는 영향을 충격파의 강도와 위치를 변화시키면서 연구하였다. 이러한 목적으로 마하수 2.5의 초음속 연소기 벽면에 쐐기를 부착시켜 경사 충격파를 발생시켰다. 본 실험은 충격파가 초음속 화염에 미치는 영향을 연구한 최초의 실험연구이다. 쉬릴렌 가시화 사진과 벽면 정압, 화염 안정 한계를 측정하였으며 충격파가 없는 경우와 비교하였다. 보염 재순환 영역에 충격파를 적절히 간섭시킴으로써 화염 안정 한계가 대폭 개선되었다. 화염 안정한계가 대폭 향상된 이유는 충격파에 의해 발생한 역압력구배로 화염안정화에 중요한 아음속 재순환 영역의 크기가 증대된 때문으로 여겨진다.

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Impacts of Trapezoidal Fin of 20-nm Double-Gate FinFET on the Electrical Characteristics of Circuits

  • Ryu, Myunghwan;Kim, Youngmin
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제15권4호
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    • pp.462-470
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    • 2015
  • In this study, we analyze the impacts of the trapezoidal fin shape of a double-gate FinFET on the electrical characteristics of circuits. The trapezoidal nature of a fin body is generated by varying the angle of the sidewall of the FinFET. A technology computer-aided-design (TCAD) simulation shows that the on-state current increases, and the capacitance becomes larger, as the bottom fin width increases. Several circuit performance metrics for both digital and analog circuits, such as the fan-out 4 (FO4) delay, ring oscillator (RO) frequency, and cut-off frequency, are evaluated with mixed-mode simulations using the 3D TCAD tool. The trapezoidal nature of the FinFET results in different effects on the driving current and gate capacitance. As a result, the propagation delay of an inverter decreases as the angle increases because of the higher on-current, and the FO4 speed and RO frequency increase as the angle increases but decrease for wider angles because of the higher impact on the capacitance rather than the driving strength. Finally, the simulation reveals that the trapezoidal angle range from $10^{\circ}$ to $20^{\circ}$ is a good tradeoff between larger on-current and higher capacitance for an optimum trapezoidal FinFET shape.

지반과 숏크리트 라이닝의 인터페이스 특성에 관한 실험적 연구 (Experiments on Interfacial Properties Between Ground and Shotcrete Lining)

  • 장수호;이석원;배규진;최순욱;박해균;김재권
    • 한국지반공학회:학술대회논문집
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    • 한국지반공학회 2004년도 춘계학술발표회
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    • pp.407-414
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    • 2004
  • Interfacial properties between rock mass and shotcrete play a significant role in the transmission of loads from the ground to shotcrete. These properties have a major effect on the behaviours of rock mass and shotcrete. They, however, have merely been assumed in most of numerical analyses, and little care has been taken in identifying them. This paper aimed to identify interfacial properties including cohesion, tension, friction angle, shear stiffness, and normal stiffness, through direct shear tests as well as interface normal compression tests for shotcrete/rock cores obtained from a tunnel sidewall. Mechanical properties such as compression strength and elastic modulus were also measured to compare them with the time-dependent variation of interfacial properties. Based on experiments, interfacial properties between rock and shotcrete showed a significant time-dependent variation similar to those of its mechanical properties. In addition, the time-dependent behaviours of interfacial properties can be well regressed through exponential and logarithmic functions of time.

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유도 결합 플라즈마를 이용한 백금 박막의 건식 식각시 가스 첨가 효과 (Effects of $O_2$ Gas Addition to Dry Etching of Platinum. Thin Film by Inductively Coupled Plasma)

  • 김남훈;김창일;권광호;장의구
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제48권6호
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    • pp.451-455
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    • 1999
  • The highest etch rate of Pt film was obtained at 10% $Cl_2$/90% Ar gas mixing ratio in our previous investigation. However, the problems such as the etch residues(fence) remained on the pattern sidewall, low selectivity to oxide as mask and low etch slope were presented. In this paper, the etching by additive $O_2$ gas to 10% $Cl_2$/90% Ar gas base was examined. As a result, the fence-free pattern and higher etch slope as about 60$^{\circ}$was observed and the selectivity to oxide increased to 2.4 without decreasing of the etch rate $1500{\AA}$/min. XPS surface analysis proved that a only little $O_2$ gas removes the Pt-CI compounds as residues on the etched surface.

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Cl2/HBr/CF4 반응성 이온 실리콘 식각 후 감광막 마스크 제거 (Removal of Photoresist Mask after the Cl2/HBr/CF4 Reactive Ion Silicon Etching)

  • 하태경;우종창;김관하;김창일
    • 한국전기전자재료학회논문지
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    • 제23권5호
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    • pp.353-357
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    • 2010
  • Recently, silicon etching have received much attention for display industry, nano imprint technology, silicon photonics, and MEMS application. After the etching process, removing of etch mask and residue of sidewall is very important. The investigation of the etched mask removing was carried out by using the ashing, HF dipping and acid cleaning process. Experiment shows that oxygen component of reactive gas and photoresist react with silicon and converting them into the mask fence. It is very difficult to remove by using ashing or acid cleaning process because mask fence consisted of Si and O compounds. However, dilute HF dipping is very effective process for SiOx layer removing. Finally, we found optimized condition for etched mask removing.

SiCl$_4$와 Cl$_2$가스에 의한 InP, InGaAs 및 InAIAs의 반응성 이온 식각: 가스유량, rf 전력, 공정압력, Ar 첨가의 영향 (Reactive Ion Etching of InP, InGaAs and InAIAs by SiCl$_4$ and Cl$_2$ Gases: Effects of Gas Flow Rate, rf Power, Process Pressure and Ar Addition)

  • 유재수;송진동;배성주;정지훈;이용탁
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2001년도 하계종합학술대회 논문집(2)
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    • pp.25-28
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    • 2001
  • In this paper, we have investigated the effects of gas flow rate, rf power, process pressure and Ar addition on reactive ion etching of InP, InGaAs and InAlAs using Sic14 and Cl$_2$ gases. The etch rates were measured by using a surface profiler. The etched profiles, sidewall roughness, and surface morphology were observed by scanning electron microscopy and by atomic force microscopy. The selective etching of InGaAs to InP and InAlAs was studied by varying the etching parameters. It was found that Cl$_2$ gas is more efficient for the selective etching of InGaAs to InAlAs than SiCl$_4$ gas. The etch selectivity of InGaAs to InAlAs is strongly dependent on the rf power and the process pressure.

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Time-resolved PIV와 POD기법을 이용한 유량에 따른 단일노즐 버블링 유동 특성에 관한 연구 (Characteristics of Bubble-driven Flow with Varying Flow Rates by Using Time-resolved PIV and POD Technique)

  • 이승재;김종욱;김현동;김경천
    • 한국가시화정보학회지
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    • 제6권2호
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    • pp.14-19
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    • 2008
  • In this paper, the recirculation flow motion and mixing characteristics driven by air bubble flow in a rectangular water tank is studied. The Time-resolved PIV technique is adopted for the quantitative visualization and analysis. 532 nm Diode CW laser is used for illumination and orange fluorescent particle images are acquired by a PCO 10bit high-speed camera. To obtain clean particle images, 545 nm long pass optical filter and an image intensifier are employed and the flow rates of compressed air is changed from 2 l/min to 4 l/min at 0.5 MPa. The recirculation and mixing flow field is further investigated by the POD analysis technique. It is observed that the large scale counterclockwise rotation and main vortex is generated in the upper half depth from the free surface and one quarter width from the sidewall. When the flow rates are increased, the main vortex core is moved to the side and bottom wall direction.

PDP 격벽용 금형의 마이크로 홈 연삭 특성 (Characteristics of Micro Groove grinding for the Mold of PDP Barrier Ribs)

  • 조인호;정상철;박준민;정해도
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2000년도 춘계학술대회 논문집
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    • pp.963-966
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    • 2000
  • Plasma display panel (PDP) is a type of flat panel display utilizing the light emission that is produced by gas discharge. Barrier Ribs of PDP separating each sub-pixel prevents optical and electrical crosstalk from adjacent sub-pixels. Mold for forming barrier ribs has been newly researched to overcome the disadvantages of conventional manufacturing process such as screen printing, sand-blasting and photosensitive glass methods. Mold for PDP barrier ribs have stripes of micro grooves transferring stripes of glass-material wall. In this paper. Stripes of grooves of which width 48 um, depth 124um, pitch 274um was acquired by machining the material of WC with dicing saw blade. Maximum roughness of the bottom and sidewall of the grooves was respectively 120 nm, 287 nm. Maximum tilt angle caused by difference between upper-most width and lower-most width was 2$^{\circ}$. Maximum Radius of curvature of bottom was 7.75 ${\mu}{\textrm}{m}$. This results meets the specification for barrier ribs of 50 inch XGA PDP. Forming the glass paste will be followed by using mold in the near future.

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EDM을 이용한 가스터빈 회전익의 냉각공기 유로내벽 표면균열 제거 (Surface Crack Removal by EDM for Inside Cooling Hole of Gas Turbine Blade)

  • 강신호;김대은
    • 한국정밀공학회지
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    • 제20권8호
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    • pp.54-61
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    • 2003
  • The first stage rotating blade of industrial gas turbine is one of the components that is normally run in exposed state at the highest temperature of the combustion gas stream. For this reason superior materials and advanced cooling technology are required to allow higher heat resisting characteristics of the component. The 1st stage blade of a selected commercial gas turbine blade made of directionally solidified Ni-based superalloy has a row of cooling holes on its trailing edge. In most cases, minor cracks have been found at some of the root cooling holes after one cycle operation (24,000 hrs) or even shorter operation time because of the high temperature gradient and the frequently alternating thermal stress. In the repair process, unfortunately, it is usually very difficult to get rid of the damage due to the fact that cracks are initiated at the root cooling hole and propagated deep into the hole. In this study, the feasibility of removing the sidewall cracks in the hole by utilizing EDM drilling has been investigated. Also the criteria of surface integrity for EDM drilling were established to achieve high quality repair as well as machining accuracy.

Numerical Study on Wave Run-up of a Circular Cylinder with Various Diffraction Parameters and Body Drafts

  • Jeong, Ho-Jin;Koo, Weoncheol;Kim, Sung-Jae
    • 한국해양공학회지
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    • 제34권4호
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    • pp.245-252
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    • 2020
  • Wave run-up is an important phenomenon that should be considered in ocean structure design. In this study, the wave run-up of a surface-piercing circular cylinder was calculated in the time domain using the three-dimensional linear and fully nonlinear numerical wave tank (NWT) techniques. The NWT was based on the boundary element method and the mixed Eulerian and Lagrangian method. Stokes second-order waves were applied to evaluate the effect of the nonlinear waves on wave run-up, and an artificial damping zone was adopted to reduce the amount of reflected and re-reflected waves from the sidewall of the NWT. Parametric studies were conducted to determine the effect of wavelength, wave steepness, and the draft of the cylinder on the wave run-up of the cylinder. The maximum wave run-up value occurred at 0°, which was in front of the cylinder, and the minimum value occurred near the circumferential angle of 135°. As the diffraction parameter increased, the wave run-up increased up to 1.7 times the wave height. Furthermore, the wave run-up was 4% higher than the linear wave when the wave steepness was 1/35. In particular, the crest height of the wave run-up increased by 8%.