• Proceedings of the KIEE Conference
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• 1994.07b
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• pp.1469-1471
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• 1994

This paper describes the structure and electrical characteristics of a shorted anode p-i-n switch. The device showed a significant improvement in the threshold voltage-to-holding voltage ratio, which is due to the suppression of the hole injection from the anode and to the gold gettering at the anode side. The shorted anode devices with a $100{\mu}m$ channel length have a threshold voltage of 300 volts and a holding voltage of 5.5 volts.

• The Transactions of the Korean Institute of Electrical Engineers
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• v.45 no.4
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• pp.562-567
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• 1996

A new lateral MOS controlled thyristor, named Shorted Anode LMCT(SA-LMCT), is proposed and analyzed by a two-dimensional device simulation. The device structure employs the implanted n+ layer which shorts the p+ anode together by a common metal electrode and provides a electron conduction path during turn-off period. The turn-off is achieved by not only diverting the hole current through the p+ cathode short but also providing the electron conduction path from the n-base into the n+ anode electrode. In addition, the modified shorted anode LMCT, which has an n+ short junction located inside the p+ anode junction, is also presented. It is shown that the modified SA-LMCT enjoys the advantage of no snap-back behavior in the forward characteristics with little sacrificing of the forward voltage drop. The simulation result shows that the turn-off times of SA-LMCT can be reduced by one-forth and the maximum controllable current density may be increased by 45 times at the expense of 0.34 V forward voltage drop as compared with conventional LMCT. (author). 11 refs., 6 figs., 1 tab.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.51 no.5
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• pp.196-198
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• 2002

A trench shorted anode LIGBT (TSA-LIGBT) which decreases the device area and the forward voltage drop has been proposed and verified by 2D device simulations. The trench located in the shorted anode would form the shorted anode. The simulation results show that TSA-LIGBT decrease the device area by about 20% and the forward voltage drop by over 75% compared with the conventional ones. Also the troublesome negative differential resistance (NDR) regime has been eliminated successfully in the TSA-LIGBT.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.32A no.7
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• pp.69-76
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• 1995

A new device structure has been developed for p-i-n switches. In this structure, the phosphorus-diffused n$^{+}$ layter adjacent to the boron-doped anode is used to short the p$^{+}$ anode-channel(i-region). This change in the anode electrode structure results in a significant improvement in the threshold voltage-to-holding voltage($V_{Th}/V_{h}$) ratio, which is due to the suppression of the hold injection from the anode by the n$^{+}$ layer. The shorted anode p-i-n devices of a 100 .mu.m channel length show an extremely high threshold voltage in the 250~300 V range and a low holding voltage in the 5~9 V range. These features of the device are expected to acdelerate their practical application to power switching circuits.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.49 no.2
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• pp.73-77
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• 2000

A dual-gate SOI SA-LIGBT (shorted-anode lateral insulated gate bipolar transistor) which eliminates the snapback effectively is proposed and verified by numerical simulation. The elimination of the snapback in I-V characteristics is obtained by initiating the hole injection at low anode voltage by employing a dual gate and a floating electrode in the proposed device. For the proposed device, the snapback phenomenon is completely eliminate, while snapback of conventional SA-LIGBT occurs at anode voltage of 11 V. Also, the drive signals of two gates have same polarity by employing the floating electrode, thereby requiring no additional power supply.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.48 no.3
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• pp.161-166
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• 1999

We investigate the device characteristics of the separated shorted-anode LIGBT (SSA-LIGBT), which suppresses effectively the negative differential resistance regime, by 2-dimensional numerical simulation. The SSA-LIGBT increases the pinch resistance by employing the highly resistive n-drift region as an electron conduction path instead of the lowly resistive n buffer region of the conventional SA-LIGBT. The negative differential resistance regime of the SSA-LIGBT is significantly suppressed as compared with that of the conventional SA-LIGBT. The SSA-LIGBT shows the lower forward voltage drop than that of the conventional SA-LIGBT.

• Proceedings of the KIEE Conference
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• 2001.11a
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• pp.81-83
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• 2001

새로이 제안한 이중 애노드 LIGBT(Dual Anode LIGBT)는 빠른 스위칭을 위한 기존의 단락 애노드 구조를 캐소드의 양쪽에 위치시킴으로써 단락 애노드 구조가 갖는 부성저항영역을 효과적으로 제거했다. 뿐만 아니라 순방향전압강하 또한 기존의 분리된 단락 애노드 LIGBT (Seperate Shorted Anode LIGBT)에 비해 30%의 개선 효과를 갖는다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.07a
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• pp.288-291
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• 2004

Due to the charge compensation effect, SOI(Silicon-On-Insulator) LIGBT with dual-epi layer have been found to exhibit both low forward voltage drop and high static breakdown voltage. In this paper, electrical characteristics of the SOI LIGBT with dual-epi structure is presented. Trenched anode structure is employed to obtain uniform current flowlines and shorted anode structure also employed to prevent the fast latch-up. Latching current density of the proposed LIGBT with $T_1=T_2=2.5{\mu}m,\;N_1=7{\times}10^{15}/cm^3,\;N_2=3{\times}10^{15}/cm^3$ is $800A/cm^2$ and breakdown voltage is 125V while latching current density and breakdown voltage of the conventional LIGBT is $700A/cm^2$ and 55V.

• Proceedings of the KIEE Conference
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• 2001.07c
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• pp.1343-1345
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• 2001

본 논문은 스냅백을 효과적으로 제거하고 순방향 전압 강하를 줄이는 새로운 구조의 분리된 이중 게이트 SOI SA-LIGBT를 제안하였다. 제안된 소자는 분리된 단락 애노드와 플로팅 오믹 접합의 적용을 통해 스냅백이 성공적으로 제거되었고, 순방향전압강하는 전류밀도가 100A/$cm^2$일 때 기존의 SA-LIGBT에 비교해서 2V 감소된다. 또한 턴-오프 특성도 분리된 단락 애노드를 적용하였기 때문에 SA-LIGBT보다 개선되었다.