• 제목/요약/키워드: semiconductor equipment industry

검색결과 95건 처리시간 0.023초

Laser Thermal Processing System for Creation of Low Temperature Polycrystalline Silicon using High Power DPSS Laser and Excimer Laser

  • Kim, Doh-Hoon;Kim, Dae-Jin
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.647-650
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    • 2006
  • Low temperature polycrystalline silicon (LTPS) technology using a high power laser have been widely applied to thin film transistors (TFTs) for liquid crystal, organic light emitting diode (OLED) display, driver circuit for system on glass (SOG) and static random access memory (SRAM). Recently, the semiconductor industry is continuing its quest to create even more powerful CPU and memory chips. This requires increasing of individual device speed through the continual reduction of the minimum size of device features and increasing of device density on the chip. Moreover, the flat panel display industry also need to be brighter, with richer more vivid color, wider viewing angle, have faster video capability and be more durable at lower cost. Kornic Systems Co., Ltd. developed the $KORONA^{TM}$ LTP/GLTP series - an innovative production tool for fabricating flat panel displays and semiconductor devices - to meet these growing market demands and advance the volume production capabilities of flat panel displays and semiconductor industry. The $KORONA^{TM}\;LTP/GLTP$ series using DPSS laser and XeCl excimer laser is designed for the new generation of the wafer & FPD glass annealing processing equipment combining advanced low temperature poly-silicon (LTPS) crystallization technology and object-oriented software architecture with a semistandard graphical user interface (GUI). These leading edge systems show the superior annealing ability to the conventional other method. The $KORONA^{TM}\;LTP/GLTP$ series provides technical and economical benefits of advanced annealing solution to semiconductor and FPD production performance with an exceptional level of productivity. High throughput, low cost of ownership and optimized system efficiency brings the highest yield and lowest cost per wafer/glass on the annealing market.

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교대근무자의 피로와 수행영향인자 간의 상관관계 분석 (반도체 산업을 중심으로) (Correlation Analysis between Fatigue and Performance Shaping Factor for Alternation Worker's (Focused on the Semiconductor industry))

  • 윤용구;박범
    • 대한안전경영과학회:학술대회논문집
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    • 대한안전경영과학회 2008년도 추계학술대회
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    • pp.303-316
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    • 2008
  • For the past 25 years, Korean semiconductor has experienced enormous growth to be the highest production country in the world. Semiconductor industry is very time sensitive and driven by technology and process, and requires 24-hour full operation. The environment includes many different types of equipment, utilities, different gases and toxic chemicals as well as high voltage electricity. We have performed a survey with 3-shift engineers and workers in one line. The content of the questionnaire was about the correlation between fatigue and performance shaping factor (work type and work ability), and as a result we were able to deduce the correlation, p-value and the pattern of scatter plot. The shape of the model was made of 4 blocks for fatigue, 5 blocks for work type and 5 blocks for work ability, i. e. 14 blocks in total. As a conclusion to this findings, there was a correlation between fatigue and work type and work ability specifically in semiconductor industry, and we need some effort to reduce this.

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AHP 및 Fuzzy 의사결정 모형을 활용한 반도체 장치라인의 CTP 선정 방법론 개발 (Development of CTP Selection Methodology of Semiconductor Equipment Line Using AHP and Fuzzy Decision Model)

  • 정재환;김정섭;김여진;이종환
    • 반도체디스플레이기술학회지
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    • 제20권2호
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    • pp.6-13
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    • 2021
  • Cases and studies on the selection method of CTQ are relatively active, but there are few cases or studies on the selection method of CTP which is important in the device industry. In fact, many companies simply select and manage CTP from the point of contact based on their experience and intuition. The purpose of this study is to present an evaluation model and a mathematical decision model for rational and systematic CTP selection to improve the process quality of semiconductor equipment lines. In the evaluation model, AHP (Analytic Hierarchy Process) analysis technique was applied to show objective and quantitative figures, and Fuzzy decision-making model was used to solve the ambiguity and uncertainty in the decision-making process. Decision Value (DV) was presented. The subjects were 22 process factors managed in the Plating Process that the representative equipment line can do. As a result, the evaluation model proposed in this study can support more efficient and effective decision-making for process quality improvement by more objectively measuring the problem of subjective CTP selection in manufacturing sites.

Vitual Laboratory for Electronics Instrumentation Training via the Internet

  • Seong Ju, Choe;Jae Hyeop, Lee
    • 한국반도체및디스플레이장비학회:학술대회논문집
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    • 한국반도체및디스플레이장비학회 2003년도 추계학술대회 발표 논문집
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    • pp.169-176
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    • 2003
  • Telematic and new programming technologies support the increasing demand of education and training leading to the delivery of computer based learining systems open to distance and continuing education. Using LabVIEW, we designed and implemented an interactive learning environment for practice on electronics measurement methodologies. The environment provides remote access to real and simulated instrumentation and guided experiments on basic circuits. The environment is applied to the education and training on electronics for engineers in the field of semiconductor industry.

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반도체 산업에서의 재해 예방 모델 개발 (A Model Development of Injury Prevention for Application in the Semiconductor Industry)

  • 윤용구;홍성만;박범
    • 대한안전경영과학회지
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    • 제4권3호
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    • pp.1-11
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    • 2002
  • It has been Management for stabilize Enterprise-Management for Economic demand for to Productivity, Automation, customer satisfaction, Especially Semiconductor-Industry has been, potential-risk in working to factory to machine equipment, all kinds of utility, gas, chemical, electronic, Fire. This study of basic-purpose has Research Different From as Follow to analysis and Solution For semiconductor product Factory of a actual point Data and specific-gravity to Relation for company-Injury. 1. It has been try to Injury-Tendency and cause-Analysis for our County-Manufacture-Occupation. 2, Semiconductor Injury of Actual-condition in Enforcement for problem and Analysis that Injury Problem has occupated it Submitted to Solution for ordinary Injury theory View to point Solve at for New Model has applicated to that nilem for processed to Solution.

검출력 향상된 자기상관 공정용 관리도의 강건 설계 : 반도체 공정설비 센서데이터 응용 (Power Enhanced Design of Robust Control Charts for Autocorrelated Processes : Application on Sensor Data in Semiconductor Manufacturing)

  • 이현철
    • 산업경영시스템학회지
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    • 제34권4호
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    • pp.57-65
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    • 2011
  • Monitoring auto correlated processes is prevalent in recent manufacturing environments. As a proactive control for manufacturing processes is emphasized especially in the semiconductor industry, it is natural to monitor real-time status of equipment through sensor rather than resultant output status of the processes. Equipment's sensor data show various forms of correlation features. Among them, considerable amount of sensor data, statistically autocorrelated, is well represented by Box-Jenkins autoregressive moving average (ARMA) model. In this paper, we present a design method of statistical process control (SPC) used for monitoring processes represented by the ARMA model. The proposed method shows benefits in the power of detecting process changes, and considers robustness to ARMA modeling errors simultaneously. We prove benefits through Monte carlo simulation-based investigations.

리소그라피 장비 마스크 홀더부의 경량화를 위한 최적 설계

  • 정준영;이우영;강흥석
    • 한국반도체및디스플레이장비학회:학술대회논문집
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    • 한국반도체및디스플레이장비학회 2007년도 춘계학술대회
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    • pp.139-143
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    • 2007
  • The need for technological developments of lithography equipment is urgent for the stable production in response to the rapid growth of the recent display industry. As an example, the products currently in the market face alteration problems resulting from excessive weight of the mask holder part. This is one of obstacle for the automation of the equipment. In response, the mask holder part problem has been minimized through FEM and design of experiments in order to optimize the situation with minimized Deflection and reduced mass for satisfactory replacement of the mask holder part.

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반도체·FPD 제조설비와 클린룸의 RISK 최소화를 위한 폭발위험장소 설정 모델링에 관한 연구 (A Study of Explosion Hazard Proof Modeling for Risk Minimization to Semiconductor & FPD Manufature Equipment and Clean Room)

  • 노현석;우인성;황명환;우정환
    • 한국가스학회지
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    • 제22권1호
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    • pp.78-85
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    • 2018
  • 본 연구를 통하여 반도체 FPD 제조설비 및 클린룸에 관련한 설비의 위험성분석과 그에 대한 근원적인 안전대책을 연구하고, 설비 및 환경의 특수성을 고려한 방폭 설계 모델링화를 검토하여 관련 설비의 설계 및 제작에 기술적인 기준과 근거로 활용하고자 하며, 아래와 같은 성과로서 향후 반도체 FPD 산업의 기술적 기준 수립 및 관련 산업에 기여할 것으로 생각한다. 1) 관련 국제 기술규격과 법령, 설비의 특성을 반영한 FAB 장비의 최적화된 폭발위험장소의 모델링 도출 2) FAB 장비 및 클린 룸의 특성을 고려한 위험설비의 안전성 확보 (Fool-Proof와 Fail Safe)를 위한 안전시스템 구축방안과 안전기준 및 대책 도출 3) 향후 FAB 장비의 방폭 설계에 대한 가장 효율적인 기준 적용을 통한 신규 FAB 장비의 방폭 성능의 유연성 확보하고 수립된 안전기준을 통한 설비와 안전시스템의 신뢰성 검증 절차 운영을 위한 "안전인증제도"의 자율적 향상화.

유한요소해석을 이용한 백그라인딩 장비의 구조안정성 연구 (A study on structural stability of Backgrinding equipment using finite element analysis)

  • 위은찬;고민성;김현정;김성철;이주형;백승엽
    • Design & Manufacturing
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    • 제14권4호
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    • pp.58-64
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    • 2020
  • Lately, the development of the semiconductor industry has led to the miniaturization of electronic devices. Therefore, semiconductor wafers of very thin thickness that can be used in Multi-Chip Packages are required. There is active research on the backgrinding process to reduce the thickness of the wafer. The backgrinding process polishes the backside of the wafer, reducing the thickness of the wafer to tens of ㎛. The equipment that performs the backgrinding process requires ultra-precision. Currently, there is no full auto backgrinding equipment in Korea. Therefore, in this study, ultra-precision backgrinding equipment was designed. In addition, finite element analysis was conducted to verify the equipment design validity. The deflection and structural stability of the backgrinding equipment were analyzed using finite element analysis.

반도체 공정 칠러 장비의 히터 접속부 전기배선에 대한 열적 특성 분석 (Analysis of Thermal Characteristic for Wiring at Heater Connector of Semiconductor Chiller Equipment)

  • 김규빈;김두현;김성철
    • 한국안전학회지
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    • 제38권3호
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    • pp.27-34
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    • 2023
  • With the technological development of the semiconductor industry, the roles of electrical and thermal energy supply and control of semiconductor equipment in ultrafine processes have become very important. However, instances of electrical fires in the chiller heater, which is used for cooling in the semiconductor manufacturing process, are increasing. A fire occurs in combustibles due to high heat at the connection part of the chiller heater, that is, when the number of electrical wires in the connection part is reduced or when the wires are completely disconnected. In this study, the temperature characteristics were compared and analyzed through experiments and 3D simulations. The number of electrical wires, which is the connection part of the chiller heater, was reduced by 90%, 50%, 30%, 10%, and 5%, and the wires were completely disconnected. When the number of electrical wires was reduced by 5%, heat of up to 80℃ was generated, which is a relatively high temperature but insufficient to cause a fire in combustibles. Complete disconnection occurred due to the vibration of the motor and other components, and sparks and arcs were generated, resulting in a rapid increase in temperature to up to 680℃. When completely disconnected, the temperature increase was sufficient to cause a fire in the combustibles covering the terminal block. Therefore, in this study, the causes of electrical fires in chiller heaters were investigated and preventive measures were proposed by analyzing abnormal signals and thermal characteristics caused by the electrical wiring being reduced and completely disconnected.