• Title/Summary/Keyword: scratch

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Development and Application of STEAM based Education Program Using Scratch - Focus on 6th Graders' Science in Elementary School - (스크래치를 활용한 STEAM 기반 교육 프로그램 개발 및 적용 - 초등학교 6학년 과학교과를 중심으로 -)

  • Oh, Jung-Cheol;Lee, Ji-Hwon;Kim, Jung-A;Kim, Jong-Hoon
    • The Journal of Korean Association of Computer Education
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    • v.15 no.3
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    • pp.11-23
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    • 2012
  • For this study, we reviewed theoretical background of STEAM education and domestic and international case studies in STEAM education. By doing so, we developed and applied the STEAM Education Program through the use of Scratch. This program is designed for the 3rd and 4th lesson of 6th graders' science in elementary school. As a result, the creativity index and positive attitude about science of the students who went through the researched program increased with meaningful difference compared to that of the sample population. The result of this study shows that the STEAM Education Program, using Scratch, can improve creativity. And it is sure that it brings positive changes for the science-related affective domains.

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Characteristics of Slurry Filter for Reduction of CMP Slurry-induced Micro-scratch (CMP 공정에서 마이크로 스크래치 감소를 위한 슬러리 필터의 특성)

  • 김철복;김상용;서용진
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.14 no.7
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    • pp.557-561
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    • 2001
  • Chemical mechanical polishing (CMP) process has been widely used to planarize dielectric layers, which can be applied to the integraded circuits for sub-micron technology. Despite the increased use of CMP process, it is difficult to accomplish the global planarization of in the defect-free inter-level dielectrics (ILD). Especially, defects such as micro-scratch lead to severe circuit failure which affect yield. CMP slurries can contain particles exceeding 1㎛ in size, which could cause micro-scratch on the wafer surface. The large particles in these slurries may be caused by particles agglomeration in slurry supply line. To reduce these defects, slurry filtration method has been recommended in oxide CMP. In this work, we have studied the effects of filtration and the defect trend as a function of polished wafer count using various filters in inter-metal dielectrics(IMD)-CMP process. The filter installation in CMP polisher could reduce defects after IMD-CMP process. As a result of micro-scratch formation, it is shown that slurry filter plays an important role in determining consumable pad lifetime. The filter lifetime is dominated by the defects. We have concluded that slurry filter lifetime is fixed by the degree of generating defects.

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Development and implementation of STEAM Program based on Scratch Programming (스크래치 프로그래밍 중심의 STEAM 교육 프로그램 개발 및 적용)

  • Kim, Tae-Hun;Kim, JongHoon
    • The Journal of Korean Association of Computer Education
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    • v.17 no.6
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    • pp.49-57
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    • 2014
  • As growing more and more interested in programming education, we need to concerned how to teach programming in school. We are presented the STEAM program based on scratch programming as a way of programming education for elementary students. We were developed STEAM program that do digital storytelling using scratch about selected science topic in order to raise interests about science and educate programming. In order to verify the effectiveness of the educational program, we analyzed the results of pre- and post-test about GALT, TTCT of experimental group and comparison group is comprised of 6th grade elementary students. In the analysis results, the education program we developed affected positive impacts on creativity, logical thinking of elementary school students.

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Correlation Analysis on Scratch-based Instructional Effectiveness and Learning Style of Elementary School Students (초등학생들의 학습 스타일과 스크래치 언어 활용 교육의 상관성 분석)

  • Han, Seon-Kwan;Han, Hee-Seop
    • Journal of The Korean Association of Information Education
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    • v.13 no.3
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    • pp.351-358
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    • 2009
  • This study shows how to impact on programming learning using Scratch by the learning style. Firstly, students were classified by learning styles test using the VARK questionnaire. After one semester of programming education, correlation with learning styles and various instructional factors was analyzed. Scratch-based programming education improves the cognitive effectiveness and learning satisfaction for elementary school students. Especially students with visual preference performed better on programming education based on Scratch statistically. As a result, the process of programming must be mainly considered in programming education.

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Effect of Coating Layer Hardness on Frictional Characteristics of Diesel Engine Piston Ring (디젤엔진 피스톤 링 코팅 층의 경도에 따른 마찰특성)

  • Jang, J.H.;Joo, B.D.;Lee, H.J.;Kim, E.H.;Moon, Y.H.
    • Transactions of Materials Processing
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    • v.18 no.6
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    • pp.465-470
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    • 2009
  • The frictional behaviors of Cermets/Cr-Ceramics and Cu-Al coatings of piston ring were investigated. Friction tests were carried out by pin-on-disk test and materials properties of coating layer were analyzed by nano indentation tester. The effect of surface roughness of cylinder liner on the friction coefficient was analyzed. This study provided tribological data of hard and soft piston ring coatings against cylinder liner. The surface roughness does exert an influence on the average friction coefficient, with smoother surfaces generally yielding lower friction coefficients. In case of hard-coating, the scratch depth, width and pile-up height had close relationship with hardness. So the scratch width, depth and pile-up height increases with decreasing friction coefficient. But in case of soft-coating, the friction coefficients are strongly dependent on the morphological characteristics such as, scratch depth, width, pile-up height and elastic modulus.

Effects of Amorphous Phase Fraction on the Scratch Response of NiTiZrSiSn Bulk Meatllic Glass in the Kinetic Spraying Process (저온분사공정을 통한 NiTiZrSiSn 벌크 비정질 코팅의 비정질 분율에 따른 스크래치 반응)

  • Yoon, Sang-Hoon;Kim, Soo-Ki;Lee, Chang-Hee
    • Journal of Welding and Joining
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    • v.25 no.3
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    • pp.28-36
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    • 2007
  • A bulk amorphous NiTiZrSiSn powder produced using an inert gas atomization was sprayed by kinetic spraying process that is basically a solid-state deposition process onto a mild steel substrate. They were successfully overlaid onto the mild steel substrate. In order to evaluate the tribological behavior of the kinetic sprayed NiTiZrSiSn BMG (Bulk Metallic Glass) coatings, a partially crystallized coating and a fully crystallized coating were prepared by the isothermal heat treatments. Tribological behaviors were investigated in view of friction coefficient, hardness and amorphous phase fraction of coating layer. Surface morphologies and depth in the wear tracks were observed and measured by scanning electron microscope and alpha-step. From the examination of the scratch wear track microstructure, transition from the ductile like deformation (micro cutting) to the brittle deformation (micro fracturing) in the scratch groove was observed with the increase of the crystallinity.

Maskless Pattern Fabrication on Si (100) Surface by Using Nano Indenter with KOH Wet Etching (나노인덴터와 KOH 습식 식각 기술을 병용한 Si(100) 표면의 마스크리스 패턴 제작 기술)

  • 윤성원;신용래;강충길
    • Transactions of Materials Processing
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    • v.12 no.7
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    • pp.640-646
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    • 2003
  • The nanoprobe based on lithography, mainly represented by SPM based technologies, has been recognized as potential application to fabricate the surface nanostructures because of its operational versatility and simplicity. The objective of the work is to suggest new mastless pattern fabrication technique using the combination of machining by nanoindenter and KOH wet etching. The scratch option of the nanoindenter is a very promising method for obtaining nanometer scale features on a large size specimen because it has a very wide working area and load range. Sample line patterns were machined on a silicon surface, which has a native oxide on it, by constant load scratch (CLS) of the Nanoindenter with a Berkovich diamond tip, and they were etched in KOH solutions to investigate chemical characteristics of the machined silicon surface. After the etching process, the convex structure was made because of masking effect of the affected layer generated by nano-scratch. On the basis of this fact, some line patterns with convex structures were fabricated. Achieved patterns can be used as a mold that will be used for mass production processes such as nanoimprint or PDMS molding process. All morphological data of scratch traces were scanned using atomic force microscope (AFM).

Cleavage Fracture Phenomenon in Silicon Chips with Wafer Grinding-Induced Scratch Marks (웨이퍼 그라인딩 공정으로 생성된 스크래치 마크를 갖는 실리콘 칩들에서의 벽개 파괴현상)

  • Lee, Dong-Ki;Lee, Tea-Gyu;Lee, Seong-Min
    • Korean Journal of Metals and Materials
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    • v.49 no.9
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    • pp.726-731
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    • 2011
  • The present work shows how the flexural displacement-induced fracture strength of silicon devices, whose back surfaces have wafer grinding-induced scratch marks, depends on the crystallographic orientation. Experimental results indicate that silicon devices with scratch marks parallel to their lateral direction (i.e. reference axis in this work) are very susceptible to flexural fracture, as compared to devices with marks which deviated from the direction. The 3-point bending test shows that the fracture strength of silicon devices having marks which are oriented away from the reference axis is 2.6 times higher than that of devices with marks parallel to the axis. It was particularly interesting to see that silicon devices with identical preferred marks even reveal different fracture strengths, depending on whether the marks are involved in specific crystal planes such as {111} or {011}, called cleavage planes. This work demonstrates that silicon devices with the reference axis-aligned scratch marks not existing on such cleavage planes can have higher fracture strength approximately 20% higher than those existing on the planes.

Low-area DNN Core using data reuse technique (데이터 재사용 기법을 이용한 저 면적 DNN Core)

  • Jo, Cheol-Won;Lee, Kwang-Yeob;Kim, Chi-Yong
    • Journal of IKEEE
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    • v.25 no.1
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    • pp.229-233
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    • 2021
  • NPU in an embedded environment performs deep learning algorithms with few hardware resources. By using a technique that reuses data, deep learning algorithms can be efficiently computed with fewer resources. In previous studies, data is reused using a shifter in ScratchPad for data reuse. However, as the ScratchPad's bandwidth increases, the shifter also consumes a lot of resources. Therefore, we present a data reuse technique using the Buffer Round Robin method. By using the Buffer Round Robin method presented in this paper, the chip area could be reduced by about 4.7% compared to the conventional method.

Design and Implementation of Game for Learning Game Production Principles: Centering on Scratch Language (게임 제작 원리 학습을 위한 게임의 설계 및 구현 : 스크래치 언어를 중심으로)

  • Lee, Hong-Sub;Jeong, Hyung-Won;Kim, Young-Kyo
    • Journal of Digital Convergence
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    • v.14 no.5
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    • pp.403-410
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    • 2016
  • Computer game is a result of integration of various academic areas, and the production of computer game requires knowledge and experience from various areas. This study demonstrates a game production process using Scratch. The intent was to experience the game development process and the production principle through actually building the core functions of a game using Scratch. As such, the computer game production principle was understood and it was made possible to learn more easily and more enjoyably the functions of multimedia and programming necessary for the production process. As the result, the learning of game production principles using Scratch was found to enhance the interest of the learner, and help with the understanding of game structure and learning software/programming language.