• Journal of the Korean Ceramic Society
• /
• v.53 no.5
• /
• pp.563-567
• /
• 2016

The structural properties of $HfO_2$ films could be improved by thermal treatment owing to their crystallization. We deposited $HfO_2$ films on sapphire by radio frequency (RF) magnetron sputtering, whose base vacuum pressure was lower than $4.5{\times}10^{-6}$ Pa, RF power was 100 W, working temperature was $200^{\circ}C$, working pressure was 3 mTorr, and the density of the active gas (Argon) was 20 sccm. After depositing the $HfO_2$ films, the samples were thermally treated by rapid thermal annealing (RTA) in $O_2$ ambient at different temperatures. Subsequently, the measured physical properties (structural, morphological, and optical) indicated that the crystallite size, refractive index at a wavelength of 632 nm, and packing density increased with rising temperatures. In particular, an $HfO_2$ film thermally treated at $800^{\circ}C$ in $O_2$ ambient had the highest refractive index of 2.0237 and packing density of 0.9638. The relation between optical and structural properties was also analyzed.

• Journal of the Korean Ceramic Society
• /
• v.53 no.5
• /
• pp.511-520
• /
• 2016

Electrolyte-supported symmetric Ni-YSZ cermet electrodes of ca. $23{\mu}m$ were prepared by screenprinting and the impedance was measured as a function of humidity from 2% to 90% balanced in $H_2$ at a total flow rate of 50 sccm. The Ni felt current collector of 1 mm thickness exhibited a Gerischer-like gas concentration impedance in the low frequency range, which was similarly observed in the cermet-supported solid oxide cells, while the Pt paste collector exhibited only electrochemical polarization. The electrochemical polarization of both samples was modeled by a non-ideal diffusion-reaction transmission line model including CPEs with ${\alpha}$= 0.5. In the case of the Pt paste collector, all the Bisquert parameters exhibited humidity dependence to the -1/2 power, supporting a non-faradaic chemical reaction mechanism at three phase boundaries. Consequently, the surface diffusivity and reaction rate increased linearly with humidity. Less pronounced humidity dependence and somewhat lower utilization length with an Ni felt collector can be attributed to the diffusion-limited gas flow through the collector.

• The Transactions of The Korean Institute of Electrical Engineers
• /
• v.60 no.11
• /
• pp.2076-2082
• /
• 2011

The goal of this paper is to find an operating conditions of the single direct ethanol fuel cell such as the cell temperature, and flow rates of ethanol and oxygen. To investigate the output characteristics, the electrical current increased from 0[A] with interval of 0.001[A] every 2[s], and the cell voltage was increased until the voltage became 0.05[V]. Related to the effect of the cell temperature, the output characteristics both voltage and power were increased upto 80[$^{\circ}C$] according to the increase of the current density, but those were decreased over that temperature. In addition, the optimal flow rate of ethanol in anode was identified as of 2[mL/min] due to the dependence of generation rate such as the hydrogen ion and electron. And the flow rate of oxygen in cathode was desirable to about 300[sccm/min], it might be affected by the chemical reaction rate of the water formation among hydrogen ion, electron, and oxygen. Consequently, the fundamental conditions were identified in this work, and it will be carried out to find the best conditions of membrane by the effect of the plasma surface treatment, and the effect of other catalysts except for a platinum.

• Proceedings of the Korean Institute of IIIuminating and Electrical Installation Engineers Conference
• /
• 1997.10a
• /
• pp.52-54
• /
• 1997

고주파 유도결합 플라즈마(RFICP)에서 루우프법에 의해 자기장특성을 계측하였다. 자기장 계측은 플라즈마의 거시적 변화를 시간적으로 접근하며, 반도체 프로세스의 관건인 균일하고, 고집적인 분포를 얼마나 교란, 응집하는가를 검증하고, 밀도와의 관계를 비교, 분석하여 방적의 최적화를 규명할 수 있을 것이다. 작은 루우프 안테나($\Phi$:외경 7.5mm)는 RF 자기장의 크기와 방향을 결정하기 위해 방전속에 삽입된다. 자기장의 세기는 전형적으로 입력파워 50 - 500 [W]에 대해 0.1에서 2.5 G 사이로 변화하였다. 사용가스는 아르곤가스(99.9% 고순도)를 사용하였으며, 동작압력은 20 [mTorr] 에서 15 [sccm]까지하였다. 반경방향의 공간분포에서는 아스펙트비(aspect ratio : R/L)를 2로 하여 자기장 분포를 계측하였다. 자기장은 입력파워의존성에 대해서 200 [W]까지 상승하고, 300[W]에서 안정성을 지속한다. 압력에 대한 의존성은 300[W]에서 60 [mTorr]이상 일 때는 플라즈마의 균질한 압력상태를 벗어남을 보인다. 아르곤 가스유량에 대해서는 무거운 중성기체입자가 자기장의 영향을 거의 받지 않기 때문에 일정한 경향이 나타났다. 반경방향의 공간분포 측정에서는 자기장은 RFICP의 대구경 특성에 맞게 전체적으로 일정한 분포를 이루고 있음을 확인하였다. 이러한 결과로부터 고주파유도결합 플라즈마에서의 동작생성, 유지기구등의 파악에 도움이 될 것이다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2001.11a
• /
• pp.533-536
• /
• 2001

Single crystal cubic silicon carbide(3C-SiC) thin film were deposited on Si(100) substrate up to a thickness of 4.3 $\mu\textrm{m}$ by APCVD(atmospheric pressure chemical vapor deposition) method using hexamethyildisilane(HMDS) at 1350$^{\circ}C$. The HMDS flow rate was 0.5 sccm and the carrier gas flow rate was 2.5 slm. The HMDS flow rate was important to get a mirror-like. The growth rate of the 3C-SiC films was 4.3 $\mu\textrm{m}$/hr. The 3C-SiC epitaxical layers on Si(100) were characterized by XRD(X-ray diffraction), raman scattering and RHEED(reflection high-energy electron diffraction), respectively The 3C-SiC distinct phonons of TO(transverse optical) near 796 cm$\^$-1/ and LO(longitudinal optical) near 974${\pm}$1 cm$\^$-1/ were recorded by raman scattering measurement. The deposition films were identified as the single crystal 3C-SiC phase by XRD spectra(2$\theta$=41.5$^{\circ}$). Also, with increase of films thickness, RHEED patterns gradually changed from a spot pattern to a streak pattern

• Proceedings of the KIEE Conference
• /
• 1999.07g
• /
• pp.3319-3321
• /
• 1999

Pt-RTD and Micro Heater was fabricated by using MgO as medium layer in order to improve adhesion of Pt thin-films to $SiO_2$ layer, MgO layer improved adhesion of Pt thin-films to $SiO_2$ layer without any chemical reactions to Pt thin-films under high annealing temperatures, In the analysis of properties of Pt-RTD, TCR value had 3927 $ppm/^{\circ}C$ and liner in the temperature range of $25-400^{\circ}C$. The temperature of Pt micro-heater had up to $400^{\circ}C$ with 1.5watts of the heating power. In investigating output characteristics of flow sensors output voltages increased as gas flow rate and its conductivity increased due to increase of heat-loss from sensor to external. Output voltage was 82 mV at $N_2$ flow rate of 2000sccm, heating power of 1.2W.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2002.05a
• /
• pp.30-34
• /
• 2002

Single crystal 3C-SiC(cubic silicon carbide) thin-films were deposited on Si(100) wafers up to a thickness of 4.3 ${\mu}m$ by APCVD method using HMDS(hexamethyldisilane) at $1350^{\circ}C$. The HMDS flow rate was 0.5 sccm and the carrier gas flow rate was 2.5 slm. The HMDS flow rate was important to get a mirror-like crystal surface. The growth rate of the 3C-SiC films was 4.3 ${\mu}m$/hr. The 3C-SiC epitaxial films grown on Si(100) were characterized by XRD, AFM, RHEED, XPS and raman scattering, respectively. The 3C-SiC distinct phonons of TO(transverse optical) near 796 $cm^{-1}$ and LO(longitudinal optical) near $974{\pm}1cm^{-1}$ were recorded by raman scattering measurement. The heteroepitaxially grown films were identified as the single crystal 3C-SiC phase by XRD spectra($2{\theta}=41.5^{\circ}$).

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2003.05c
• /
• pp.49-52
• /
• 2003

The role of gas ratio with the crystallization behavior and electrical properties in $Bi_{3.25}La_{0.75}Ti_3O_{12}$(BLT) thin films by rf magnetron sputtering method has not been precisely defined. In this work, the ferroelectric properties of these films with gas variation was investigated. BLT thin films were deposited on the Pt/Ti bottom electrode by rf magnetron sputtering method and then they were crystallized by rapid thermal annealing (RTA). The experiment showed that all BLT films indicated perovskite polycrystalline structure with preferred orientation (020) and (0012). And no pyrochlore phase was observed. The fabricated film annealed with $O_2$ of 15 sccm showed that value of leakage current was $9.67{\times}10^{-7}A/cm^2$ at 50kV /em, and the value of remanent polarization (2Pr=Pr+-Pr-) was $11.8{\mu}C/cm^2$. Therefore we induce access to memory device application by rf-magnetron sputtering method in this report.

• Transactions on Electrical and Electronic Materials
• /
• v.15 no.1
• /
• pp.32-36
• /
• 2014

In this study, the etching characteristics of titanium dioxide ($TiO_2$) thin films were investigated with the addition of $N_2$ to CF4/Ar plasma. The crystal structure of the $TiO_2$ was amorphous. A maximum etch rate of 111.7 nm/min and selectivity of 0.37 were obtained in an $N_2/CF_4/Ar$ (= 6:16:4 sccm) gas mixture. The RF power was maintained at 700 W, the DC-bias voltage was - 150 V, and the process pressure was 2 Pa. In addition, the etch rate was measured as functions of the etching parameters, such as the gas mixture, RF power, DC-bias voltage, and process pressure. We used X-ray photoelectron spectroscopy to investigate the chemical state on the surface of the etched $TiO_2$ thin films. To determine the re-deposition and reorganization of residues on the surface, atomic force microscopy was used to examine the surface morphology and roughness of $TiO_2$ thin films.

• Transactions on Electrical and Electronic Materials
• /
• v.15 no.1
• /
• pp.49-54
• /
• 2014

In this study, we carried out an investigation of the etch characteristics of silicon (Si) film, and the selectivity of Si to $SiO_2$ in $SF_6/O_2$ plasma. The etch rate of the Si film was decreased on adding $O_2$ gas, and the selectivity of Si to $SiO_2$ was increased, on adding $O_2$ gas to the $SF_6$ plasma. The optical condition of the Si film with this work was 1,350 nm/min, at a gas mixing ratio of $SF_6/O_2$ (=130:30 sccm). At the same time, the etch rate was measured as functions of the various etching parameters. The X-ray photoelectron spectroscopy analysis showed the efficient destruction of oxide bonds by ion bombardment, as well as the accumulation of high volatile reaction products on the etched surface. Field emission auger electron spectroscopy analysis was used to examine the efficiency of the ion-stimulated desorption of the reaction products.