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http://dx.doi.org/10.4191/kcers.2016.53.5.563

Structural and Optical Properties of HfO2 Films on Sapphire Annealed in O2 Ambient  

Park, Jong-Chan (Department of Electronic Engineering, Inha University)
Yoon, Yung-Sup (Department of Electronic Engineering, Inha University)
Kang, Seong-Jun (Department of Electrical and Semiconductor Engineering, Chonnam National University)
Publication Information
Journal of the Korean Ceramic Society / v.53, no.5, 2016 , pp. 563-567 More about this Journal
Abstract
The structural properties of $HfO_2$ films could be improved by thermal treatment owing to their crystallization. We deposited $HfO_2$ films on sapphire by radio frequency (RF) magnetron sputtering, whose base vacuum pressure was lower than $4.5{\times}10^{-6}$ Pa, RF power was 100 W, working temperature was $200^{\circ}C$, working pressure was 3 mTorr, and the density of the active gas (Argon) was 20 sccm. After depositing the $HfO_2$ films, the samples were thermally treated by rapid thermal annealing (RTA) in $O_2$ ambient at different temperatures. Subsequently, the measured physical properties (structural, morphological, and optical) indicated that the crystallite size, refractive index at a wavelength of 632 nm, and packing density increased with rising temperatures. In particular, an $HfO_2$ film thermally treated at $800^{\circ}C$ in $O_2$ ambient had the highest refractive index of 2.0237 and packing density of 0.9638. The relation between optical and structural properties was also analyzed.
Keywords
$HfO_2$; Thin film; High-k; Passivation; Sputtering;
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1 C. Y. Ma, W. J. Wang, C. Y. Miao, S. L. Li, and Q. Y. Zhang, "Structural, Morphological, Optical and Photoluminescence Properties of $HfO_2$ Thin Films," Thin Solid Films, 545 279-84 (2013).   DOI
2 M. Alcisi, S. Scaglione, S. Martelli, A. Rizzo, and L. Vasanelli, "Structural and Optical Modification in Hafnium Oxide Thin Films Related to the Momentum Parameter Transferred by Ion Beam Assistance," Thin Solid Films, 354 19-23 (1999).   DOI
3 M. Fadel, O. A. Azim M., O. A. Omer, and R. R. Basily, "A Study of Some Optical Properties of Hafnium Dioxide ($HfO_2$) Thin Films and Their Applications," Appl. Phys. A, 66 [3] 335-43 (1998).   DOI
4 F. L. Martinez, M. Toledano-Luque, J. J. Gandia, J. Carabe, W. Bohne, J. Rohrich, E. Strub, and I. Martil, "Optical Properties and Structure of HfO2 Thin Films Grown by High Pressure Reactive Sputtering", J. Phys. D: Appl. Phys., 40 [17] 5256-65 (2007).   DOI
5 K. Kamala Bharathi, N. R. Kalidindi, and C. V. Ramana, "Grain Size and Strain Effects on the Optical and Electrical Properties of Hafnium Oxide Nanocrystalline Thin Films," J. Appl. Phys., 108 [8] 083529-1-5 (2010).   DOI
6 J. M. Khoshman, A. Khan, and M. E. Kordesch, "Amorphous Hafnium Oxide Thin Films for Antireflection Optical Coatings," Surf. Coat. Technol., 202 [11] 2500-2 (2008).   DOI
7 G. Dai, Y. Chen, J. Lu, Z. Shen, and X. Ni, "Analysis of Laser Induced Thermal Mechanical Relationship of $HfO_2/SiO_2$ High Reflective Optical Thin Film at 1064 nm," Chin. Opt. Lett., 7 [7] 601-4 (2009).   DOI
8 W. Liu, Z. Liu, F. Yan, T. Tan, and H. Tian, "Influence of $O_2/Ar$ Flow Ratio on the Structure and Optical Properties of Sputtered Hafnium Dioxide Thin Films," Surf. Coat. Technol., 205 [7] 2120-25 (2010).   DOI
9 M. F. Al-Kuhaili, "Optical Properties of Hafnium Oxide Thin Films and Their Application in Energy-Efficient Windows," Opt. Mater., 27 [3] 383-87 (2004).   DOI
10 J. Ni, Q. Zhou, Z. Li, and Z. Zhang, "Oxygen Defect Induced Photoluminescence of $HfO_2$ Thin Films," Appl. Phys. Lett., 93 [1] 011905-1-3 (2008).   DOI
11 H. Gruger, C. Kunath, E. Kurth, S. Sorge, W. Pufe, and T. Pechstein, "High Quality r.f. Sputtered Metal Oxides ($Ta_2O_5$, $HfO_2$) and their Properties after Annealing," Thin Solid Films, 447 509-15 (2004).
12 R. Puthenkovilakam, Y.-S. Lin, J. Choi, J. Lu, H.-O. Blom, P. Pianetta, D. Devine, M. Sendler, and J. P. Chang, "Effects of Post-Deposition Annealing on the Material Characteristics of Ultrathin $HfO_2$ Films on Silicon," J. Appl. Phys., 97 [2] 023704-1-7 (2005).   DOI
13 J. W. Park, D. K. Lee, D. Lim, H. Lee, and S. H. Choi, "Optical Properties of Thermally Annealed Hafnium Oxide and Their Correlation with Structural Change," J. Appl. Phys., 104 [3] 033521-1-5 (2008).   DOI
14 C. T. Kuo, R. Kwor, and K. M. Jones, "Study of Sputtered $HfO_2$ Thin Films on Silicon," Thin Solid Films, 213 257-64 (1992).   DOI
15 T. Tan, Z. Liu, H. Lu, W. Liu, and H. Tian, "Structure and Optical Properties of $HfO_2$ Thin Films on Silicon after Rapid Thermal Annealing," Opt. Mater., 32 [3] 432-35 (2010).   DOI
16 M. Modreanu, J. Sancho-Parramon, D. O'Connell, J. Justice, O. Durand, and B. Servet, "Solid Phase Crystallisation of $HfO_2$ Thin Films," Mater. Sci. Eng. B, 118 [1-3] 127-31 (2005).   DOI
17 W. L. Bragg and A. B. Pippard, "The Form Birefringence of Macromolecules," Acta. Cryst., 6 [11-12] 865-67 (1953).   DOI
18 S. Ben Amor, B. Rogier, G. Baud, M. Jacquet, and M. Nardin, "Characterization of Zirconia Films Deposited by r.f. Magnetron Sputtering," Mater. Sci. Eng. B, 57 [1] 28-39 (1998).   DOI