The Dry Etching Characteristics of TiO2 Thin Films in N2/CF4/Ar Plasma |
Choi, Kyung-Rok
(Department of Electrical and Electronics Engineering, Chung-Ang University)
Woo, Jong-Chang (Department of Electrical and Electronics Engineering, Chung-Ang University) Joo, Young-Hee (Department of Electrical and Electronics Engineering, Chung-Ang University) Chun, Yoon-Soo (Department of Electrical and Electronics Engineering, Chung-Ang University) Kim, Chang-Il (Department of Electrical and Electronics Engineering, Chung-Ang University) |
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