• Title/Summary/Keyword: scanning electronic microscope (SEM)

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Nondestructive measurement of sheet resistance of indium tin oxide(ITO) thin films by using a near-field scanning microwave microscope (근접장 마이크로파 현미경을 이용한 ITO 박막 면저항의 비파괴 관측 특성 연구)

  • Yun, Soon-Il;Na, Sung-Wuk;Yun, Young-Wun;You, Hyun-Jun;Lee, Yeong-Joo;Kim, Hyun-Jung;Lee, Kie-Jin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.11a
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    • pp.522-525
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    • 2004
  • ITO thin films $({\sim}150\;nm)$ are deposited on glass substrates by different deposition condition. The sheet resistance of ITO thin films measured by using a four probe station. The microstructure of these films is determined using a X-ray diffractometer (XRD) and a scanning electron microscope (SEM) and a atomic force microscope (AFM). The sheet resistance of ITO thin films compared $s_{11}$ values by using a near field scanning microwave microscope.

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Nondestructive measurement of sheet resistance of indium tin oxide(ITO) thin films by using a near-field scanning microwave microscope (근접장 마이크로파 현미경을 이용한 ITO 박막 면저항의 비파괴 관측 특성 연구)

  • Yun, Soon-Il;Na, Sung-Wuk;You, Hyun-Jun;Lee, Yeong-Joo;Kim, Hyun-Jung;Lee, Kie-Jin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07b
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    • pp.1042-1045
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    • 2004
  • ITO thin films ($\sim150nm$) are deposited on glass substrates by different deposition condition. The sheet resistance of ITO thin films measured by using a four probe station. The microstructure of these films is determined using a X-ray diffractometer (XRD) and a scanning electron microscope (SEM) and a atomic force microscope (AEM). The sheet resistance of ITO thin films compared $s_11$ values by using a near field scanning microwave microscope.

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Conductivity of copper(II)-phthalocyanine thin films due to a grain growth (결정 성장 조건에 따른 copper(II)-phthalocyanine 박막의 전기전도도 특성)

  • Park, Mie-Hwa;Yoo, Hyun-Jun;Lee, Kie-Jin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.05a
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    • pp.132-136
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    • 2004
  • 열 증착 방법을 이용하여 copper(II)-phthalocyanine(CuPc) 박막을 glass 기판 위에 제작하였다. 열처리 조건은 $150^{\circ}C$에서 후열(annealing) 처리 하는 방식과 예열하는 두 가지 방식으로 달리하였다. 제작된 박막의 전기전도도를 평가하기 위해 마이크로웨이브 근접장 효과를 이용한 근접장 현미경(near-field scanning microwave microscope)을 이용하여 비파괴적인 방식으로 CuPc 박막의 반사계수(reflection coefficient)를 측정하였다. CuPc 박막의 전기전도도 특성을 UV 흡수도를 통한 에너지 밴드갭의 shift 현상과 관련지어 설명하고 또한 x-ray diffraction(XRD) data를 통해 박막의 결정 특성과 비교하였다. 박막 표면 특성은 SEM(scanning microscope microscopy)을 통해 관측하였다. 열처리 조건에 따른 CuPc 박막의 전기전도도 특성은 후열 처리한 박막의 경우 예열 처리한 박막보다 전기 전도 특성이 향상되었음을 관측할 수 있었다.

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Images of deposited layers of organic light-emitting diodes observed by scanning-electron microscope (주사 전자 현미경으로 관찰한 유기 발광 소자의 누적층 모양)

  • Lee, Eun-Hye;Yoon, Hee-Myoung;Han, Wone-Keun;Kim, Tae-Wan;Lee, Won-Jae;Jang, Kyung-Uk;Ahn, Joon-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.298-299
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    • 2008
  • Images of deposited layers of organic light-emitting diodes were observed by scanning-electron microscope (SEM). We were able to see a clear cross-sectional view of deposited layers. The SEM is a type of electron microscope that images the sample surface by scanning it with a high-energy beam of electrons in a raster scan pattern. A thickness of deposited layer measured by thickness monitor is close to a real value measured by a-step surface profiler within 5%. We were able to see a formation of domains of size about 50-100nm from a surface morphology of Al, and pin holes of size about 50nm.

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Characterization of Surface at Ti Oxide Films Converted by Anodic Spark Discharge (양극산화 불꽃 방전에 의한 Ti 산화피막의 표면특성)

  • Song, Jae-Joo;Han, Byung-Sung
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.06a
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    • pp.545-546
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    • 2006
  • This study was performed to investigate the surface properties of electrochemically oxidized pure titanium by anodic spark discharging method. Commercially pure titanium plates of $10{\times}20{\times}1[mm]$ in dimensions were polished sequentially emery paper. Anodizing was performed at current density of $76.2\;[mA/cm^2]$, application voltage of 290, 350, 400 [V] using a regulated DC power supply, which allowed automatic transition constant current when a preset maximum voltage has been reached. The Ti surface oxided films was characterized by scanning electron microscope(SEM). The precipitation of HA(Hydroxyapatite) crystals on anodized surface was greatly accelerated by hydrothermal treatment. The concentrations of DL-$\alpha$-Glycerolphosphate Magnesiurn(DL-$\alpha$-GP-Mg) salt and Ca acetate in an electrolyte was highly affected the precipitation of HA crystals converted by Ti Anodized oxide films by Shape of Impulse Voltage.

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Conductivity changes of copper(II)-phthalocyanie thin films due to annealing time of grain growing measuring microwave reflection coefficients (마이크로파 반사계수 측정을 통한 Copper(II)-phthalocyanine 박말의 결정 성장 시간에 따른 전기전도도 특성 변화 연구)

  • Park, Mie-Hwa;Yoo, Hyun-Jun;Lim, Eun-Ju;Na, Seung-Wook;Lee, Kie-Jin;Cha, Deok-Joon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07b
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    • pp.1074-1078
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    • 2004
  • 열 중착 방법을 이용하여 copper(II)-phthalocyanine(CuPc) 박막을 glass 기판 위에 제작하였다. 박막은 열처리를 하지 않은 경우와 열처리 조건을 $150^{\circ}C$ 로 후열(annealing) 처리 하는 방식으로 하였으며 후열 처리한 경우 $150^{\circ}C$에서의 열처리 지속 시간을 각각 2시간, 3시간, 4시간으로 달리하였다. 제작된 박막의 전기전도도를 평가하기 위해 마이크로파의 근접장 효과를 이용한 근접장 현미경(near-field scanning microwave microscope)을 이용하여 비파괴적인 방식으로 CuPc 박막의 반사계수(reflection coefficient)를 측정하였다. CuPc 박막의 전기전도도 특성을 UV 흡수도를 통한 HOMO(highest occupied molecular orbital), LUMO(lowest unoccupied molecular orbital) 준위의 밴드갭의 shift 현상과 관련지어 설명하였다. 박막 표면 특성은 SEM(scanning microscope microscopy)을 통해 관측하였다. 열처리 지속 시간에 따른 CuPc 박막의 전기전도도 특성은 2시간으로 지속한 경우의 박막의 경우 가장 좋았으며 그 보다 더 오랜 시간 동안 열처리를 지속한 경우에는 전기 전도 특성이 오히려 나빠짐을 알 수 있었다.

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Nondestructive measurement of surface resistance of indium tin oxide(ITO) films by using a near-field scanning microwave microscope (근접장 마이크로파 현미경을 이용한 ITO 박막의 표면저항의 비파괴 관측 특성 연구)

  • Yun, Soon-Il;Na, Sung-Wuk;You, Hyun-Jun;Lee, Yeong-Joo;Kim, Hyun-Jung;Lee, Kie-Jin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.05a
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    • pp.137-141
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    • 2004
  • 저항특성이 다른 ITO박막의 구조특성과 표면특성을 XRD와 AFM(atomic force microscopy), SEM(scanning electron microscopy)을 이용하여 관측하였다. 접촉방식인 4단자 법을 사용하여 ITO박막의 표면전기저항을 측정하였다. 관측된 구조 및 표면특성을 바탕으로 비파괴 비접촉방식을 이용한 근접장 마이크로파 현미경을 이용하여 얻은 ITO박막의 표면저항특성과 비교 연구하였다.

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Annealing effects of CdS thin films grown by Chemical bath deposition(CBD) (Chemical bath deposition(CBD)에 의해 성장된 CdS 박막의 annealing 효과)

  • Kim, Mi-Joung;Jung, Won-Ho;Oh, Dong-Hoon;Chae, Young-An;Cha, Deok-Joon;Cho, Seung-Gon;Jung, Yang-June;Babajanyan, Arsen;Lee, Kie-Jin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.358-360
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    • 2007
  • For large scaled solar cells and photosensors CdS thin films of $2{\mu}m$ thickness have deposited on ITO glass substrate by chemical bath deposition methode in $300^{\circ}C$ electric furnace. The surface roughness and resistance of cadmium sulphide(CdS) thin films with different microstructures and morphologies was investigated by using a x-ray diffraction (XRD), a scanning electron microscope (SEM), an atomic force microscope (AFM), and a near-field scanning microwave microscope (NFMM). As the different substrate heat temperatures, the microwave reflection coefficient $S_{11}$ and intensity of the (002) diffraction peak was changed, and the surface morphology also has shown differently.

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Statistical Analysis of Characteristics of Scanning Electron Microscope (주사전자현미경 특성의 통계적 해석)

  • Kim, T.S.;Kim, W.;Kim, D.H.;Kim, B.
    • Journal of the Korean institute of surface engineering
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    • v.40 no.4
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    • pp.185-189
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    • 2007
  • A scanning electron microscope (SEM) is a complex system, consisting of many sophisticated components. For a systematic characterization, a $2^4$ full factorial experiment was conducted. The SEM components examined include condenser lens 1 and 2 (denoted as A and B, respectively), and Objective lens (coarse and fine-denoted as C and D respectively). A statistical analysis was conduced to investigate factor effects and variations In response surfaces. Among four factors, main effect analysis revealed that A and D were Identified as the dominant factor. Moreover, B showed conflicting effect against C. The $R^2$ of statistical regression model constructed was about 69.6%. The model generated 3D response surface plots facilitated understanding of complex tactor effects.

Physical Properties of Elastic Epoxies for High Voltage

  • Lee, Kwan-Woo;Park, Yong-Sung;Park, Dae-Hee
    • KIEE International Transactions on Electrophysics and Applications
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    • v.4C no.2
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    • pp.51-54
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    • 2004
  • In this paper, the thermal and mechanical properties of elastic epoxy for the application of high voltage products were investigated. Glass transition temperature (Tg) of elastic epoxies cannot be found from room temperature to 20$0^{\circ}C$ by DSC (Differential Scanning Calorimetry). Weight reduction occurred at 285$^{\circ}C$ and 451$^{\circ}C$ according to a thermogravimeter. The first temperature was affected by addictives and the second by epoxies characteristic. Maximum tensile strain showed 28.3kgf/$\textrm{cm}^2$/$\textrm{cm}^2$ at 20% of mechanical stress in addictives 35 (phr). The SEM (Scanning electron microscope) micrograph of the fracture surface observed void and tearing of elastic epoxy at addictives 35 (phr). On the other side, the SEM micrograph of the rigid epoxy showed a broken trace.