• 제목/요약/키워드: rf magnetron sputter

검색결과 278건 처리시간 0.029초

ZnO 박막의 RF 마그네트론 스퍼터 증착 중 미리 가열된 기판의 자연냉각 효과 (The Natural Cooling Effects of Pre-heated Substrate during RF Magnetron Sputter Deposition of ZnO)

  • 박성현;이능헌
    • 전기학회논문지
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    • 제56권5호
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    • pp.905-909
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    • 2007
  • Crystalline and micro-structural characteristics of ZnO thin films which were deposited on p-Si(100) with cooling naturally down of pre-heated substrate during RF magnetron sputter deposition, were investigated by XRD and SEM in this paper. The film which was prepared on the substrate which was pre-heated to $400^{\circ}C$ before deposition and then cooled naturally down during deposition, showed the most outstanding c-axis preferred orientation. The ZnO thin film having the best crystalline result were applied to SMR type FBAR device and resonance properties of the device were investigated by network analyzer. It showed that resonance frequency was 2.05 GHz, return loss was -30.64 dB, quality factor was 3169 and electromechanical coupling factor was 0.4 %. This deposition method would be very useful for application of surface acoustic wave filter or film bulk acoustic wave resonator.

RF sputter를 이용한 실리카 증착 고 내구성 반사 방지막 제조 (High Durable Anti-Reflective Polymer with Silica Nanoparticle Array Fabricated by RF Magnetron Sputter)

  • 전성권;정은욱;나종주;권정대
    • 한국표면공학회지
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    • 제52권2호
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    • pp.84-89
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    • 2019
  • We fabricated durable anti-reflective(AR) layer with silica globular coating on polymer by two steps. Firstly, nano-protrusions of polymer were formed by plasma etching known as R.I.E(reactive ion etching) process. Secondly, silica globular coating was deposited on polymer nano-protrusions for mechanically protective and optically enhancing AR layers by RF magnetron sputter. And then durable antireflective polymers were synthesized adjusting plasma power and time, working pressures of RIE and RF sputtering processes. Consequently, we acquired the average transmission (94.10%) in the visible spectral range 400-800 nm and the durability of AR layer was verified to sustain its transmission until 5,000 numbers by rubber test at a load of 500 gf.

기판온도 및 스퍼터가스에 따른 ZnO 박막의 우선배향성, 화학조성, 물리적특성 변화 (Effects of Substrate Temperature and Sputter Gas on the Physical Characteristics, Chemical Composition and Preferred Orientation of ZnO Thin Films)

  • 김병진;조남희
    • 한국세라믹학회지
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    • 제34권12호
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    • pp.1227-1234
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    • 1997
  • ZnO thin films were prepared by rf-magnetron sputter at various conditions. Crystallinity, microstructure, chemical composition, and optical composition, and optical properties of the films were investigated as functions of substrate temperature (R. T.-50$0^{\circ}C$) an sputter gas (O2/Ar=0-50%). ZnO thin films grown at 50$0^{\circ}C$ with sputter gas of pure argon as well as at R. T. with sputter gas of a mixture of argon & oxygen(O2/Ar=2%) exhibit a strong tendency of (002) preferred orientation, compared with a considerable random orientation at the other conditions. The thin films with (002) preferred orientation has a chemical stoichiometry of Zn/O-1.01, a band gap of 3.3eV, and a packing density of 98% respectively.

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RF 마그네트론 스퍼터링에 의한 SAW 필터용 ZnO 압전 박막에 관한 연구 (A Study on the ZnO Piezoelectric Thin Films for SAW Filter by RF Magnetron Sputtering)

  • 최형욱;김경환;김상종;강종윤;안병국;윤석진
    • 한국전기전자재료학회논문지
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    • 제15권9호
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    • pp.798-807
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    • 2002
  • ZnO thin films on Si wafer were deposited by RF magnetron reactive sputter with various RF power, chamber pressure, argon/oxygen gas ratios ana substrate temperatures. Crystallinities, surface morphologies, and electrical properties of the films were investigated by XRD, AFM, RBS, and electrometer(keithley 617). ZnO films showed a strong c-axis preferred orientation. Surface roughness and resistivity were changed by the argon/oxygen gas ratio. The minimum surface roughness of 12${\AA}$ and maximum resistivity of $10^8\Omega cm$ were achieved at Ar/O$O_2$=0/100.

RF 마그네트론 스퍼터링에 의한 ZnO 박막 SAW 필터에 관한 연구 (A Study on the ZnO Thin Film SAW Filter by RF Sputter)

  • 박용욱;신형용;박정흠;강종윤;심성훈;최지원;윤석진;김현재;김경환
    • 한국전기전자재료학회논문지
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    • 제14권6호
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    • pp.481-486
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    • 2001
  • ZnO thin films on glass substrate were depostied by RF magnetron reactive sputter with various argon/oxygen gas ratios and substrate temperatures. Crystallinities, surface morphologies, chemical compositions, and electrical properties of the films were investigated by XRD, SEM, XPS and electrometer(keithley 617). All films showed a strong preferred orientation along the c-axis on glass substrate, and the chemical stoichiometry was obtained at Ar/O$_2$.=50/50. The propagation velocity of ZnO SAW filter was about 2,590 m/sec and insertion loss was a minimum value of abut -21dB.

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RF 마그네트론 스퍼터링에 의한 ZnO 박막 SAW 필터에 관한 연구 (A Study on the ZnG Thin Film SAW filter by RF Sputter)

  • 박용욱;이동윤;백동수;윤석진;김현재;박창엽
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 추계학술대회 논문집
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    • pp.151-154
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    • 1999
  • ZnO thin films on glass substrate were deposited by RF magnetron reactive sputter with various argodoxygen gas ratios and substrate temperatures. Crystallinities, surface morphologies, chemical compositions, and electrical properties of the films were investigated by XRD, SEM, XPS and electrometer(keith1ey 617). All films showed a strong prefered orientation along the c-axis on glass substrate, and the chemical stoichiometry was obtained at Ar/$O_2$=50/50. The propagation velocity of ZnO SAW filter was about 2, 590 dsec and insertion loss was a minimum value of about -21dB.

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RF 스퍼터를 이용하여 ZnO 증착 시 기판의 냉각율이 박막의 c-축 배향성에 미치는 영향 (Effects of Cooling Rate of Pre-heated Substrate on C-Axis Orientation of ZnO Prepared by RF Sputter Deposition)

  • 박성현;이능헌
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제55권12호
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    • pp.560-564
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    • 2006
  • ZnO thin films were prepared by RF magnetron sputter deposition on p-Si(100) wafer with various cooling rates of substrate temperature such as the substrates were pre-heated to $400^{\circ}C$ before the deposition and then cooled down naturally or slowly to $300^{\circ}C,\;200^{\circ}C,\;100^{\circ}C$, and R.T. by the temperature controller during the deposition. Crystalline and micro-structural characteristics of the films were investigated by XRD and SEM. ZnO films which cooled down naturally or slowly by the temperature controller during the deposition, especially the film were deposited with cooling down from $400^{\circ}C\;to\;200^{\circ}C$ slowly. showed the most outstanding c-axis preferred orientation.

플라스틱 기판에 증착한 ZnO:Al 박막의 특성에 미치는 스퍼터 압력 효과 (Effects of Sputter Pressure on the Properties of Sputtered ZnO:Al Films Deposited on Plastic Substrate)

  • 이재형
    • 한국전기전자재료학회논문지
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    • 제22권3호
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    • pp.277-283
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    • 2009
  • In this paper, aluminum doped zinc oxide (ZnO:Al) thin films on plastic substrate such as poly carbonate (PC), polyethylene terephthalate (PET) were prepared by RF magnetron sputtering method for flexible solar cell applications. Effects of the sputter pressure on the structural, electrical and optical properties were investigated. The crystallinity and the degree of the (002) orientation were deteriorated with increasing the sputter pressure. When the sputter pressure was higher, the conductivity of ZnO:Al films was improved because of the high carrier concentration and the Hall mobility. High quality ZnO:Al films with resistivity as low as $1.9{\times}10^{-3}{\Omega}-cm$ and the optical transmittance over 80 % in the visible region have been obtained on PC substrate at 2 mTorr.