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Effects of Cooling Rate of Pre-heated Substrate on C-Axis Orientation of ZnO Prepared by RF Sputter Deposition  

Park, Sung-Hyun (경원대 공대 전기전자공학과)
Lee, Neung-Hun (경원대 공대 전기전자공학과)
Publication Information
The Transactions of the Korean Institute of Electrical Engineers C / v.55, no.12, 2006 , pp. 560-564 More about this Journal
Abstract
ZnO thin films were prepared by RF magnetron sputter deposition on p-Si(100) wafer with various cooling rates of substrate temperature such as the substrates were pre-heated to $400^{\circ}C$ before the deposition and then cooled down naturally or slowly to $300^{\circ}C,\;200^{\circ}C,\;100^{\circ}C$, and R.T. by the temperature controller during the deposition. Crystalline and micro-structural characteristics of the films were investigated by XRD and SEM. ZnO films which cooled down naturally or slowly by the temperature controller during the deposition, especially the film were deposited with cooling down from $400^{\circ}C\;to\;200^{\circ}C$ slowly. showed the most outstanding c-axis preferred orientation.
Keywords
ZnO; c-axis orientation; RF magnetron sputter; cooling rate; substrate temperature;
Citations & Related Records
Times Cited By KSCI : 3  (Citation Analysis)
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