Effects of Cooling Rate of Pre-heated Substrate on C-Axis Orientation of ZnO Prepared by RF Sputter Deposition

RF 스퍼터를 이용하여 ZnO 증착 시 기판의 냉각율이 박막의 c-축 배향성에 미치는 영향

  • 박성현 (경원대 공대 전기전자공학과) ;
  • 이능헌 (경원대 공대 전기전자공학과)
  • Published : 2006.12.01

Abstract

ZnO thin films were prepared by RF magnetron sputter deposition on p-Si(100) wafer with various cooling rates of substrate temperature such as the substrates were pre-heated to $400^{\circ}C$ before the deposition and then cooled down naturally or slowly to $300^{\circ}C,\;200^{\circ}C,\;100^{\circ}C$, and R.T. by the temperature controller during the deposition. Crystalline and micro-structural characteristics of the films were investigated by XRD and SEM. ZnO films which cooled down naturally or slowly by the temperature controller during the deposition, especially the film were deposited with cooling down from $400^{\circ}C\;to\;200^{\circ}C$ slowly. showed the most outstanding c-axis preferred orientation.

Keywords

References

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