• 제목/요약/키워드: remote plasma

검색결과 144건 처리시간 0.021초

RPCVD system을 이용한 ${\mu}c$-Si:H의 저온 직접 성장 연구 (The study of direct ${\mu}c$-Si:H film growth using RPCVD system in low temperature)

  • 안병재;김도영;임동건;이준신
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1999년도 하계학술대회 논문집 D
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    • pp.1818-1820
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    • 1999
  • This paper presents direct ${\mu}c$-Si:H thin film growth on the glass substrates using RPCVD system (remote plasma chemical vapor deposition) in low temperature. Hydrogenated micro-crystalline silicon deposited by RPCVD system in low temperature is very useful material for photovoltaic devices, sensor applications, and TFTs (thin film transistors). Varying the deposition conditions such as substrate temperature, gas flow rate, reactive gas ratio $(SiH_4/H_2)$, total chamber pressure, and rf power, we deposited ${\mu}c$-Si:H thin films on the glass substrates (Corning glass 1737). And then we measured the structural and electrical properties of the films.

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전처리가 TiN 기판위의 Cu막의 특성에 미치는 효과 (The Effects of Various Pretreatents on Cu Films Deposited on the TiN Substrate)

  • 권영재;이종무
    • 한국재료학회지
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    • 제6권1호
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    • pp.124-129
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    • 1996
  • TiN 기판상에 CVD와 무전해 도금을 이용하여 구리막을 성장시킬 때 여러 가지 전처리에 따른 증착 양상의 변화에 관하여 조사하였다. Cu(hfac)2를 선재(precursor)로 사용하여 CVD 증착을 실시할 때 각 전처리에 따른 TiN상의 구리막의 덮힘성(coverage)향상은 Pd-HF 활성화 처리>>HF dip> RF remote plasma의 순이었다. 특히 Pd-HF 활성화 처리를 해줄 경우 거의 완전한 연속막을 얻을수 있었으며 scotch tape peel test 결과 매우 양호한 부착특성을 보였으나, 이에 비해 전처리를 해주지 않은 경우에는 오랜 시간이 경과되어도 연속막으로 성장하지 못하고 섬모양의 큰 결정립을 이룰 뿐이었다. 이러한 차이는 Pd-HF 활성화 처리에 의해 표면에 미세하게 형성된 Pd층이 구리의 핵생성과 부착특성을 크게 향상시켰기 때문인 것으로 사료되며 이러한 효과는 무전해 도금의 경우에도 마찬가지였다. 그리고 기판과 증착온도에 따른 선택성을 보면 35$0^{\circ}C$이하에서는 pd-HF 활성화 처리에 의해서 SiO2에 대하여 TiN으로의 선택성을 가지나 그 이상의 온도에서는 선택성이 상실되었다.

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System Integration for the Operation of Unmanned Audio Center based on AoIP

  • Lee, Jaeho;Hamacher, Alaric;Kwon, Soonchul;Lee, Seunghyun
    • International journal of advanced smart convergence
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    • 제6권2호
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    • pp.1-8
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    • 2017
  • Recently, the development of the information communication industry has made many changes in the industrial acoustic industry. Especially, it has a great influence on the change of system and equipment of acoustic system. Analog equipment is changing to digital equipment, and integrated control equipment makes it easier to operate and manage the sound system. However, the integrated control system currently on the market is only controllable for some devices. In this paper, we propose a new AoIP - based system configuration method, which enables the operation status monitoring, unmanned operation and self - diagnosis of equipment. As a result of the study, it is confirmed that the proposed system can be operated, monitored, and self - diagnosed at remote sites. It is expected that an AoIP- based sound system will be the industry standard in the future.

15kW 급 RPG용 부하병렬 공진형 컨버터의 공진네트워크 설계 (Design of Resonant Network of Parallel Loaded Resonant Converter for 15kW RPG System)

  • 채훈규;성원용;구근완;이병국
    • 전력전자학회:학술대회논문집
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    • 전력전자학회 2016년도 전력전자학술대회 논문집
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    • pp.221-222
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    • 2016
  • 본 논문에서는 급변하는 특징을 갖는 부하를 제어하기 위한 병렬부하 공진컨버터의 공진 네트워크를 설계한다. RPG(Remote Plasma Generator)는 플라스마를 생성하기 위한 장치로써 플라스마 발생 전, 후의 부하 조건이 급격하게 달라지는 특징을 갖는다. 이때 플라스마를 발생시키기 위해서는 고전압이 필요하며, 플라스마를 유지하기 위해서는 높은 스위칭 주파수와 일정 크기의 정현파 전류가 필요하다. 이러한 특성을 고려하여 공진 네트워크를 설계하고, 시뮬레이션을 통해 과정의 타당성을 입증한다.

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원격 플라스마 발생장치용 리액터의 전기적 특성을 고려한 시뮬레이션 모델 설계 (Design of Simulation Model Considering Electrical Characteristics of Reactor for Remote Plasma Generator)

  • 구근완;성원용;채훈규;이병국
    • 전력전자학회:학술대회논문집
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    • 전력전자학회 2016년도 전력전자학술대회 논문집
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    • pp.177-178
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    • 2016
  • 본 논문에서는 원격 플라스마 발생 장치용 리액터를 포함한 플라스마 부하의 등가 모델을 제안한다. 모델링을 위해 챔버 안에 존재하는 플라스마 부하의 특성을 고려하여, 플라스마 발생장치용 리액터를 포함한 전압, 전류의 정보를 통해 등가모델의 파라미터를 추출한다. 추출한 파라미터를 기반으로 플라스마 부하에 대한 전기적 등가회로를 구성하고, 플라스마 부하의 변화에 중요한 영향을 주는 플라스마 기체의 압력 정보를 등가 모델에 반영하여 이를 바탕으로 시뮬레이션을 진행해 모델링의 타당성을 검증한다.

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Flyback Converter를 병렬운전한 1kW급 직류전원 (1kW class DC power supply by parallel operation of the flyback converter)

  • 김성철;이기선;노준택;고인수
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1997년도 하계학술대회 논문집 F
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    • pp.2252-2254
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    • 1997
  • There are increasing demands on high accruacy DC power supplies for varous basic science reseach, such as accelerators and plasma applications, in Korea. In this paper, we present a study on 1kW class DC power supply using the parell operation method of the flyback converters. This DC power supply is equipped with a remote controller for computer interface. A Serial Communication Controller(SCC) is also developed for large scale scientific facilities which is capable of handling upto 32 power supplies simultaneously with one serial port in the host computer.

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Recent Progress in Understanding Solar Magnetic Reconnection

  • Lee, Jeongwoo
    • Journal of Astronomy and Space Sciences
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    • 제32권2호
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    • pp.101-112
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    • 2015
  • Magnetic reconnection is a fundamental process occurring in a wide range of astrophysical, heliospheric and laboratory plasmas. This process alters magnetic topology and triggers rapid conversion of magnetic energy into thermal heating and nonthermal particle acceleration. Efforts to understand the physics of magnetic reconnection have been made across multiple disciplines using remote observations of solar flares and in-situ measurements of geomagnetic storms and substorms as well as laboratory and numerical experiments. This review focuses on the progress achieved with solar flare observations in which most reconnection-related signatures could be resolved in both space and time. The emphasis is on various observable emission features in the low solar atmosphere which manifest the coronal magnetic reconnection because these two regions are magnetically connected to each other. The research and application perspectives of solar magnetic reconnection are briefly discussed and compared with those in other plasma environments.

a-C:H 박막의 물성 변화에 따른 액정 배향 특성에 관한 연구 (A study on liquid crystal alignment characteristics by the properties of hydrogenated amorphous carbon thin films)

  • 이대규;노순준;백홍구;황정연;조용민;서대식
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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    • pp.839-844
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    • 2002
  • This letter focuses on the liquid crystal alignment characteristics according to the properties of hydrogenated amorphous carbon(a-C:H) thin film deposited by RPECVD(Remote Plasma Enhanced Chemical Vapor Deposition) method using $C_2H_2$ and He gases. The properties of the deposited thin films were controlled by the ion beam irradiation time and ion beam energy. The results show that not ion beam energy but ion beam irradiation time plays an important role in the properties of a-G:H thin films. As the ion beam irradiation time increases, not only the sp2 concentration in a-G:H thin films but also liquid crystal pretilt angle was varied.

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Electroforming을 이용한 PDP용 EMI 메시 개발 (EMI Mesh Development for the PDP using Electroforming)

  • 권혁홍;범민욱;임성룡;황춘섭;박동식;이태환
    • 한국생산제조학회지
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    • 제20권1호
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    • pp.108-113
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    • 2011
  • There are a lot of PDP TV for a plasma discharge pulse voltage generated by the use of electromagnetic waves. EMI mesh film is near Infrared ray caused by malfunction of the remote control intended to prevent this phenomenon. In this study, the formation of fine pattern by making the mold is imprinted on the film sheet. EMI mesh film has been granted by filling in the conductive material region imprinted with electroforming in the manufacture of resistance. The fine patterns fabricated with electroforming facility thickness of homogenization process technology were established to optimize the working conditions.

레이저 플라즈마 분광분석법을 이용한 표면처리 된 마그네슘 합금 표면의 경도 분석 (Hardness Analysis of Surface Treated Magnesium Alloy using Laser Induced Breakdown Spectroscopy)

  • 강동찬;김주한
    • 한국생산제조학회지
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    • 제24권6호
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    • pp.625-631
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    • 2015
  • The hardness of surface treated magnesium alloy was evaluated using laser induced breakdown spectroscopy. The surface of the specimen was hardened mechanically, and the hardness profiles were measured using a traditional measurement technique. A laser beam was irradiated to generate a plasma, and the peaks of the components of the specimen were analyzed. A wavelength of 333.66 nm and 293.65 nm were selected as the atomic and ionic peaks, respectively. The ratios of the ionic peak to the atomic peak were obtained so as to compare the hardness profile. As the depth increased, the ratio decreased. These results are in good agreement with the previous hardness measurement results. It can be considered that this technique could be applied for remote and time-efficient hardness measurement.