• 제목/요약/키워드: reduction cleaning

검색결과 229건 처리시간 0.023초

기판의 왕복 운동을 이용한 인라인 식각세정장치 내 ITO 식각특성 (ITO Wet Etch Properties in an In-line Wet Etch/Cleaning System by using an Alternating Movement of Substrate)

  • 홍성재;권상직;조의식
    • 한국전기전자재료학회논문지
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    • 제21권8호
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    • pp.715-718
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    • 2008
  • An in-line wet etch/cleaning system was established for the research and development in wet etch process. The system was equipped with a reverse moving system for the reduction in the size of the in-line wet etch/cleaning system and it was possible for the glass substrate to be moved back and forth and alternated in a wet etch bath. For the comparison of the effect of the normal motion and that of the alternating motion on the in-line wet etch process, indium tin oxide(ITO) pattern was obtained through both wet etch process conditions. The results showed that the alternating motion is not inferior to the normal motion in etch rate and in etch uniformity. It is concluded that the alternating motion is possible to be applied to the in-line etch process.

분산염료/산성염료에 의한 PTT(polytrimethylene terephthalate)/견 교직물의 염색에 관한 연구 (A Study on the Dyeing of PTT(polytrimethylene terephthalate)/Silk Mixture Fabrics with Disperse Dyes/Acid Dyes)

  • 성우경
    • 한국의류산업학회지
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    • 제12권1호
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    • pp.94-102
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    • 2010
  • The dyeing of poly(trimethylene terephthalate)(PTT)/silk mixture fabrics can be accomplished by a two bath dyeing method with separate application of the disperse dyes on the PTT, reduction cleaning of the stained silk and then dyeing the silk with the acid dyes, or by one bath dyeing method with mixed dye ranges, possibly followed by a cleaning treatment. The two bath dyeing method has the advantage of better results with respect to dry cleaning fastness properties thanks to the possibility of an intermediate reduction clear. On the other hand, as compared with the two bath dyeing method, one bath dyeing method with a mixed dye range permits rapid and more reproducible dyeing, without the risk of great difference with respect to the shade of the strike on both substrates as well as savings of time, energy and water usage. This study was carried out to investigate dyeing characteristics of PTT/silk mixture fabrics with disperse dyes/acid dyes by one bath dyeing method in comparison with two bath dyeing method in the interests for rationalization of the dyeing process.

환경친화적인 실리콘 웨이퍼 세정 연구 (A Study on environmental-friendly Cleaning for Si-wafers)

  • 윤호섭;류근걸
    • 청정기술
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    • 제6권1호
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    • pp.79-84
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    • 2000
  • 반도체 세정공정에서 사용되는 화학약품의 소모량을 줄이기 위하여 소량의 전해질 혹은 초순수만을 전기분해 시켜 생성되는 전리수를 이용하여 금속 불순물들이 오염된 실리콘 웨이퍼를 습식세정을 하였다. 전리수는 다양한 범위의 pH 및 산화환원전위(oxidation-reduction potential, ORP)를 형성할 수 있으며, 전리수의 양극수는 pH 및 산화환원전위를 각각 4.7 및 +1000mV의 산화성 수용액을, 전리수의 음극수는 pH 및 산화환원전위가 각각 6.3 및 -550mV를 40분 이상 유지하고 있었다. 실리콘 웨이퍼 세정 전과 후의 금속 불순물 측정은 ICP-MS(Inductively coupled plasma spectroscopy)를 사용하였다. 전리수 가운데 양극수는 구리 불순물 제거에, 음극수는 철 불순물 제거에 효과적임을 확인하였다.

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Electrolyzed water cleaning for semiconductor manufacturing

  • Ryoo, Kun-Kul;Kim, Woo-Huk
    • 한국반도체및디스플레이장비학회:학술대회논문집
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    • 한국반도체및디스플레이장비학회 2002년도 추계학술대회 발표 논문집
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    • pp.117-119
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    • 2002
  • A semiconductor cleaning technology has been based upon RCA cleaning which consumes vast amounts of chemicals and ultra pure water. This technology hence gives rise to many environmental issues, and some alternatives such as electrolyzed water are being studied. In this work, intentionally contaminated Si wafers were cleaned using the electrolyzed water. The electrolyzed waters were obtained in anode and cathode with oxidation reduction potentials and pH of -1050mV and 4.8, and -750mV and 10.0, respectively. The electrolyzed water deterioration was correlated with $CO_2$ concentration changes dissolved from air. Overflowing of electrolyzed water during cleaning particles resulted in the same cleanness as could be obtained with RCA clean. The roughness of patterned wafer surfaces after EW clean maintained that of as-received wafers. RCA clean consumed about $9\ell$ chemicals, while electrolyzed water clean did only $400m\ell$ HCl or $600m\ell$ $NH_4$Cl to clean 8" wafers in this study. It was hence concluded that electrolyzed water cleaning technology would be very effective for releasing environment, safety, and health(ESH) issues in the next generation semiconductor manufacturing.ring.

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반도체·디스플레이 탄소중립을 위한 PECVD 챔버세정용 NF3대체가스 개발연구 (Research Progress on NF3 Substitute Gas of PECVD Chamber Cleaning Process for Carbon Neutrality)

  • 조세윤;홍상진
    • 반도체디스플레이기술학회지
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    • 제22권4호
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    • pp.72-75
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    • 2023
  • Carbon neutrality has been emerged as important mission for all the manufacturing industry to reduce energy usage and carbon emission equivalent. Korean semiconductor and display manufacturing industries are also in huge interest by minimize the energy usage as well as to find a less global warming product gases in both etch and cleaning. In addition, Korean government is also investing long term research and development plan for the safe environment in various ways. In this paper, we revisit previous research activities on carbon emission equivalent and current research activities performed in semiconductor process diagnosis research center at Myongji University with respect to the reduction of NF3 usage for the PECVD chamber cleaning, and we present the analytical result of the exhaust gas with residual gas analysis in both 6 inches and 12 inches PECVD equipment. The presented result can be a reference study of the development of new substitution gas in near future to compare the cleaning rate of the silicon oxide deposition chamber.

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나노 버블과 메가소닉 초음파를 이용한 반도체 웨이퍼 세정장치 개발 (Development of Wafer Cleaning Equipment Using Nano Bubble and Megasonic Ultrasound)

  • 김노유;이상훈;윤상;정용래
    • 반도체디스플레이기술학회지
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    • 제22권4호
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    • pp.66-71
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    • 2023
  • This paper describes a hybrid cleaning method of silicon wafer combining nano-bubble and ultrasound to remove sub-micron particles and contaminants with minimal damage to the wafer surface. In the megasonic cleaning process of semiconductor manufacturing, the cavitation induced by ultrasound can oscillate and collapse violently often with re-entrant jet formation leading to surface damage. The smaller size of cavitation bubbles leads to more stable oscillations with more thermal and viscous damping, thus to less erosive surface cleaning. In this study, ultrasonic energy was applied to the wafer surface in the DI water to excite nano-bubbles at resonance to remove contaminant particles from the surface. A patented nano-bubble generator was developed for the generation of nano-bubbles with concentration of 1×109 bubbles/ml and nominal nano-bubble diameter of 150 nm. Ultrasonic nano-bubble technology improved a contaminant removal efficiency more than 97% for artificial nano-sized particles of alumina and Latex with significant reduction in cleaning time without damage to the wafer surface.

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Microscopical and chemical surface characterization of CAD/CAM zircona abutments after different cleaning procedures. A qualitative analysis

  • Gehrke, Peter;Tabellion, Astrid;Fischer, Carsten
    • The Journal of Advanced Prosthodontics
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    • 제7권2호
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    • pp.151-159
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    • 2015
  • PURPOSE. To describe and characterize the surface topography and cleanliness of CAD/CAM manufactured zirconia abutments after steaming and ultrasonic cleaning. MATERIALS AND METHODS. A total of 12 ceramic CAD/CAM implant abutments of various manufacturers were produced and randomly divided into two groups of six samples each (control and test group). Four two-piece hybrid abutments and two one-piece abutments made of zirconium-dioxide were assessed per each group. In the control group, cleaning by steam was performed. The test group underwent an ultrasonic cleaning procedure with acetone, ethyl alcohol and antibacterial solution. Groups were subjected to scanning electron microscope (SEM) analysis and Energy-dispersive X-ray spectroscopy (EDX) to verify and characterize contaminant chemical characterization non- quantitatively. RESULTS. All zirconia CAD/CAM abutments in the present study displayed production-induced wear particles, debris as well as organic and inorganic contaminants. The abutments of the test group showed reduction of surface contamination after undergoing an ultrasonic cleaning procedure. However, an absolute removal of pollutants could not be achieved. CONCLUSION. The presence of debris on the transmucosal surface of CAD/CAM zirconia abutments of various manufacturers was confirmed. Within the limits of the study design, the results suggest that a defined ultrasonic cleaning process can be advantageously employed to reduce such debris, thus, supposedly enhancing soft tissue healing. Although the adverse long-term influence of abutment contamination on the biological stability of peri-implant tissues has been evidenced, a standardized and validated polishing and cleaning protocol still has to be implemented.

상어 표피 모사 리블렛 구조의 젖음성 평가 (Wettability of Biomimetic Riblet Surface like Sharkskin)

  • 공유식;김태완
    • Tribology and Lubricants
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    • 제29권5호
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    • pp.304-309
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    • 2013
  • Shark skin has functionalities such as self-cleaning and antifouling; it also exhibits excellent drag reduction owing to a hierarchical structure of microgrooves and nanometer-long chain mucus drag reduction interfaces around the shark body. In this study, the wettability of a shark skin surface and its replicas are evaluated. First, a shark skin template is taken from a real shark. Then, shark skin replicas are produced directly from a shark skin template, using a micromolding technique. The quantitative replication precision of the shark skin replicas is evaluated by comparing the geometry of the shark skin template to the replica using 2D surface profiles. Contact angles at the solid-air-water interfaces are evaluated for the shark skin template and its replicas under two conditions: with and without hydrophobic coating. The results show that the microriblets on shark skin improve the hydrophobic feature and play a critical role in self-cleaning.

배기가스 제거 및 자기정화용 광촉매 콘크리트 개발 연구 (A Study on the Development for Photocatalytic Concrete with Waste Gas Reduction and Self-cleaning)

  • 이원암;양진;유재상;이종열
    • 한국콘크리트학회:학술대회논문집
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    • 한국콘크리트학회 2001년도 가을 학술발표회 논문집
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    • pp.265-270
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    • 2001
  • Nowadays, like any other areas we have asked that the concrete would get more and more properties to increase there performance. So, in this research we are intended to develop the Photocatalytic Concrete which is one of the High Performance Concrete with waste gas reduction and self-cleaning. The fundamental phenomena of the Photocatalytic Concrete were observed by the residue water-weight, SEM, flow and surface hardness(Pencil tester). As a result of this study, the Photocatalytic Concrete used Photocatalytic powder, OPC admixture and other materials can obtain its properties, also photocatalytic efficiency. Last of all, we are convinced of the Photocatalytic Concrete possibility and make an effort to develop its properties added a various study.

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연도가스 열회수용 순환유동층 열교환기의 오염저감특성 (Fouling Reduction Characteristics of a Fluidized Bed Heat Exchanger for Flue Gas Heat Recovery)

  • 이금배;전용두
    • 설비공학논문집
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    • 제16권8호
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    • pp.770-777
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    • 2004
  • Fouling and cleaning tests are performed for a uniquely designed 7,000 ㎉/hr fluidized bed heat exchanger for exhaust gas heat recovery. Fuel rich condition is maintained in the combustor for a limited time period to generate soot that is to be deposited on the heat transfer surfaces (fouling) and 600 Um glass beads are circulated inside the heat exchanger system for cleaning and enhancing the heat transfer performance. According to the present experimental study, performance degradation mode could be monitored and the effect of particle circulation on the heat transfer improvement could be identified. Through the present study, it is demonstrated that circulating particles contribute not only to the fouling reduction in gas side, but also to the heat transfer enhancement of the unit, while other possible aging factors including water side corrosion seemed to contribute to the accumulated performance deterioration.