• 대한수학회보
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• 제33권1호
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• pp.107-110
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• 1996

Usng the Pochhammer symbol $(\lambda)_n$ given by $$ (1.1) (\lambda)_n = {1, if n = 0 {\lambda(\lambda + 1) \cdots (\lambda + n - 1), if n \in N = {1, 2, 3, \ldots}, $$ we define a general double hypergeometric series by [3, pp.27] $$ (1.2) F_{q:s;\upsilon}^{p:r;u} [\alpha_1, \ldots, \alpha_p : \gamma_1, \ldots, \gamma_r; \lambda_1, \ldots, \lambda_u;_{x,y}][\beta_1, \ldots, \beta_q : \delta_1, \ldots, \delta_s; \mu_1, \ldots, \mu_v; ] = \sum_{l,m = 0}^{\infty} \frac {\prod_{j=1}^{q} (\beta_j)_{l+m} \prod_{j=1}^{s} (\delta_j)_l \prod_{j=1}^{v} (\mu_j)_m)}{\prod_{j=1}^{p} (\alpha_j)_{l+m} \prod_{j=1}^{r} (\gamma_j)_l \prod_{j=1}^{u} (\lambda_j)_m} \frac{l!}{x^l} \frac{m!}{y^m} $$ provided that the double series converges.

• Journal of Power Electronics
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• 제3권1호
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• pp.55-61
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• 2003

This paper presents parameter measurement for permanent magnet synchronous motors based on the P-Q circle diagram. Three electrical parameters of permanent magnet synchronous motors, i.e., the equivalent iron loss resistance, armature inductance, and electrical motive force (emf) coefficient are simultaneously measured. The advantages of this method are that it can be implemented under constant excitation and it dispenses with the generating test for the emf coefficient. The proposed method is applied to a 160w permanent magnet synchronous motor, and then the measurement results are analyzed.

• 한국진공학회:학술대회논문집
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• 한국진공학회 1999년도 제17회 학술발표회 논문개요집
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• pp.78-78
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• 1999

Experimental studies of laser micromachining on Mo metal using piezo Q-switched Nd:YAG laser have been performed. Miniaturized microcolumn electron gun arrays as a potential electron beam lithography or portable mini-scanning electron microscope application have recently extensively examined. For these purpose, the electro-static electron lens and deflector system called microcolumn has to be assembled. The conventional microcolumn fabrication technique would gave a limitation on the minimization of aberration. The current technique of a 1 $\mu$m misalignment would lead to ~1.3 nm coma. In order to reduce aberration, assembling the microcolumn component followed by laser drilling should be very beneficial. In this report, we will address the preliminary report of laser micromachining on Mo substrate using piezo Q-switched Nd:YAG laser. The geometrical figures, such as the diameter and the depth of the frilled aperture are dependent upon the total energy of the laser pulse train, laser pulsewidth, and the diameter of laser beam in addition to the materials-dependent parameters.

• 전력전자학회:학술대회논문집
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• 전력전자학회 2015년도 전력전자학술대회 논문집
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• pp.407-408
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• 2015

The existing (q)Z-source PWM AC-AC converters have limited voltage gain because of the equivalent series resistance in the Z-source inductor. In order to obtain higher voltage gain than (q)Z-source AC-AC converters, a coupled inductor (or transformer) based Z-source AC-AC converter is proposed in this paper. By increasing turns ratio of the coupled inductor more than 1, the proposed converter can obtain higher output voltage than (q)Z-source converters with the same duty ratio. A 120 W prototype AC-AC converter is built and tested to verify performances of the proposed converter.

• 대한수학회지
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• 제53권6호
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• pp.1211-1223
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• 2016

Let M be an n-dimensional $K{\ddot{a}}hler$ manifold with positive holomorphic bisectional curvature and let ${\Omega}{\Subset}M$ be a pseudoconvex domain of order $n-q$, $1{\leq}q{\leq}n$, with $C^2$ smooth boundary. Then, we study the (weighted) $\bar{\partial}$-equation with support conditions in ${\Omega}$ and the closed range property of ${\bar{\partial}}$ on ${\Omega}$. Applications to the ${\bar{\partial}}$-closed extensions from the boundary are given. In particular, for q = 1, we prove that there exists a number ${\ell}_0$ > 0 such that the ${\bar{\partial}}$-Neumann problem and the Bergman projection are regular in the Sobolev space $W^{\ell}({\Omega})$ for ${\ell}$ < ${\ell}_0$.

• 대한수학회지
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• 제33권2호
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• pp.367-379
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• 1996

Let $V = {(z, y) : f(z, y) = z^n + Ay^\alpha z^p + y^\beta z^q + y^k = 0}$ and $W = {(z, y) : g(z, y) = z^n + By^\gamma z^s + y^\delta z^t + y^k = 0}$ be germs of analytic irreducible subvarieties of a polydisc near the origin in $C^2$ with n < k and (n, k) = 1 where A and B are complex numbers. Assume that V and W are topologically equivalent near the origin.

• 대한수학회보
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• 제44권4호
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• pp.807-816
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• 2007

For the stochastic differential inclusion on infinite dimensional space of the form $dX_t{\in}\sigma(X_t)dW_t+b(X_t)dt$, where ${\sigma}$, b are set-valued maps, W is an infinite dimensional Hilbert space valued Q-Wiener process, we prove the boundedness and continuity of solutions under the assumption that ${\sigma}$ and b are closed convex set-valued satisfying the Lipschitz property using approximation.

• Korean Journal of Mathematics
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• 제14권2호
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• pp.137-160
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• 2006

We describe the weight functions for which Hardy's inequality of nonincreasing functions is satisfied. Further we characterize the pairs of weight functions $(w,v)$ for which the Laplace transform $\mathcal{L}f(x)={\int}^{\infty}_0e^{-xy}f(y)dy$, with monotone function $f$, is bounded from the weighted Lebesgue space $L^p(w)$ to $L^q(v)$.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.1649-1652
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• 2006

2.22-inch qVGA $(240{\times}320)$ amorphous silicon thin film transistor liquid active matrix crystal display (${\alpha}$- Si TFT-AMLCD) panel has been successfully demonstrated employing a 2.5 um fine-patterning technology by a wet etch process. Higher resolution 2.22-inch qVGA LCD panel with an aperture ratio of 58% can be fabricated because the 2.5 um fine pattern formation technique is combined with high thermal photo-resist (PR) development. In addition, a novel concept of unique ${\alpha}$-Si TFT process architecture, which is advantageous in terms of reliability, was proposed in the fabrication of 2.22-inch qVGA LCD panel. Overall results show that the 2.5 um finepatterning is a considerably significant technology to obtain higher aperture ratio for higher resolution ${\alpha}$-Si TFT-LCD panel realization.

• 대한화학회지
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• 제22권2호
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• pp.78-85
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• 1978

이 論文에서는 著者들이 앞서 發展시킨 多分子層物理吸着理論을 修正하여 새로운 吸着理論을 提案하였다. 이 새로운 理論을 여러가지 adsorbent-adsorbate 系에 適用시켜 본 결과 Type Ⅱ와 Type Ⅲ 吸着의 경우에는 理論置와 實驗置가 잘 一致하였다. 뿐만 아니라 이미 발표한 理論으로써는 설명할 수 없었던 Type Ⅰ 吸着等溫式도 새로운 理論으로는 說明할 수 있었다. 이 理論에 包含되어 있는 두 parameter q/q1과 a는 吸着熱과 어떤 關聯性이 있는 것으로 推測된다.