• 정보저장시스템학회논문집
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• 제4권1호
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• pp.13-18
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• 2008

Scratches are observed on a polymer cover-layer of near-field recording (NFR) media after a servo test with rotating disc. The scratches are formed by the collision of a solid immersion lens (SIL)-media. One of the possible ways to avoid the scratch problem is to coat a dielectric protective film on the polymer cover-layer which enhances the hardness of the surface. The surface with hard characteristics in the surface reduces the scratch problem in the cover-layer. Not only the mechanical properties but also the optical properties should be controlled. Specifically, the refractive index of the dielectric protective film should be matched with the polymer cover-layer not to lose light at the interface due to the difference of the refractive index. The refractive index of the dielectric film can be tailored by controlling process parameters during sputtering and matched with that of the polymer cover-layer.

• 한국건축시공학회:학술대회논문집
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• 한국건축시공학회 2013년도 춘계 학술논문 발표대회
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• pp.27-28
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• 2013

This study investigates the effect of a protective layer on the level of carbonation resistance of concrete. For the protective layer, a PE film, bubble sheets, double layered bubble sheets and styroform were placed in a mold before placing the concrete. In addition, PE film was retrofitted by attaching on the surface of the substrate concrete with a glue. Results showed that the carbonation depths of the control concrete were 4.6 mm and 5.2 mm at one week and two weeks exposure in an accelerated carbonation chamber, whereas the concrete with all types of protective layer except PE flim did not allow the ingress of carbon dioxide during the same period.

• 한국전기전자재료학회논문지
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• 제28권3호
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• pp.180-184
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• 2015

Stainless steel (SS) mesh was used to fabricate photoelectrode for flexible dye-seisitzed solar cells (DSSCs) in order to evaluate them as replacements for more expensive transparent conductive oxide(TCO). We fabricated the DSSCs with new type of photoelectrode, which consisted of flexible SS mesh coated with 100 nm thickness titanium (Ti) protective layer deposited using electron-beam deposition system. SS mesh DSSCs with protective layer showed higher efficiency than those without a protective layer. The best cell property in the present study showed the open circuit voltage (Voc) of 0.608 V, short-circuit current density (Jsc) of $5.73mA\;cm^{-2}$, fill factor (FF) of 65.13%, and efficiency (${\eta}$) of 2.44%. Compared with SS mesh based on DSSCs (1.66%), solar conversion of SS mesh based on DSSCs with protective layer improved about 47%.

• 한국건축시공학회:학술대회논문집
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• 한국건축시공학회 2007년도 춘계학술논문 발표대회
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• pp.141-145
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• 2007

The part in the structure that is most affected by changes of external temperature is the protective concrete layer that protects a waterproofing layer. Also, the waterproofing layer that is situated under or on the back of such a protective concrete layer is affected by temperature and the behavior of the protective concrete layer under the condition of consolidation or close adhesion. In particular, in many cases, the damage is serious mainly around the projection (such as a parapet), crack, and joint (expansion joint). However, there is no proper way of examining again the non-exposed waterproofing layer once it has been constructed. Therefore, there is an assessment only on the physical property of materials and the capability of the layer in construction, and there is no actual assessment in consideration of its environmental condition or the condition of the use of buildings after construction. Therefore, in order to create more pleasant buildings and to enhance the durability of structures, this study conducts research into the change of capability of non-exposed waterproofing material after the application of a static load and moving load on the waterproofing layer situated under or on the back of protective concrete.

• 한국전기전자재료학회논문지
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• 제22권9호
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• pp.760-765
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• 2009

The effects of $Fe_2O_3$ addition on optical and electrical properties of MgO films as a protective layer for AC plasma display panels were investigated. Doped MgO films prepared by the e-beam evaporation have a higher ${\gamma}$ (secondary electron emission coefficient) than pure MgO protective layer. Roughness increased with amount of $Fe_2O_3$ up to 100 ppm and then decreased further addition. These results showed that discharge properties and optical properties of MgO protective layers seemed to be closely related with microstructure factors such as roughness. Good optical and electrical properties of ${\gamma}$ of 0.120, surface roughness of 14.1 nm and optical transmittance of 94.55% were obtained for the MgO + 100 ppm $Fe_2O_3$ protective layer sintered at $1700^{\circ}C$ for 5 hrs.

• 한국전기전자재료학회논문지
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• 제20권7호
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• pp.620-625
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• 2007

The effects of $Gd_2O_3$ addition and sintering condition on optical and electrical properties of MgO films as a protective layer for AC plasma display panels were investigated. Doped MgO films prepared by the e-beam evaporation have a higher ${\Upsilon}$ (secondary electron emission coefficient) than pure MgO protective layer. Relative density and grain size increased with amount of $Gd_2O_3$ up to 100 ppm and then decreased further addition. These results showed that discharge properties and optical properties of MgO protective layers seemed to be closely related with microstructure factors such as relative density and grain size. Good optical and electrical properties of ${\Upsilon}$ of 0.138, surface roughness of 5.77 nm and optical transmittance of 95.76 % were obtained for the MgO+100 ppm $Gd_2O_3$ protective layer sintered at $1700^{\circ}C$ for 5 hrs.

• 한국광학회지
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• 제34권5호
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• pp.185-191
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• 2023

유연 스텔스 소재의 실용성 향상을 위해 보호층을 입힌 뒤의 경도, 유연성, 보호층과 스텔스 소재의 접착력을 평가하였다. 우선 ISO 15184 연필 시험법을 통해 경도를 측정하였으며, 보호층을 입히기 전과 비교하여 경도가 HB에서 3H로 3등급 올라가는 것을 확인할 수 있었다. 유연성은 ASTM D522 시험법에 따라 소재를 특정 직경의 원기둥에 대고 구부린 뒤 균열 생성 여부를 확인하며 평가하였고, 그 결과 균열이 생성되지 않는 최소 직경이 0.125인치임을 확인하였다. 접착력은 ASTM D3359 시험법에 따라 접착 띠를 보호층에 붙였다 떼어내면서 보호층이 박리되는 비율로 평가하였다. 이를 통해 보호층을 입혔을 시 군용 접착력 한계 조건인 4B보다 높은 결과(5B)를 얻었다.

• 융복합기술연구소 논문집
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• 제2권2호
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• pp.25-29
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• 2012

Micro machining technologies have been required to satisfy various conditions in a high-technology industry. Micro electrochemical process is one of the most precision machining methods. Micro electrochemical process has been divided into electrochemical etching through protective layer and electrochemical machining using ultrashort voltage pulses. Micro shaft can be fabricated by electrochemical etching. The various protective layers such as photo-resist, oxide layer and oxidized recast layer have been used to protect metal surface during electrochemical etching. Micro patterning on metal surface can be machined by electrochemical etching through protective layer. Micro hole, groove and structures can be easily machined by electrochemical machining using ultrashort voltage pulses. Recently, the groove with subnanometer was machined using AFM.

• 한국재료학회지
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• 제18권8호
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• pp.422-426
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• 2008

The effects of an addition of $ZrO_2$ on the microstructure and electrical properties of MgO films as a protective layer for AC plasma display panels were investigated. MgO + a 200 ppm $ZrO_2$ protective layer prepared by e-beam evaporation exhibited a secondary electron emission coefficient ($\gamma$) that was improved by 21% compared to that of a pure MgO protective layer. The relative density and Vickers hardness increased with a further addition of $ZrO_2$. These results suggest that the discharge properties and optical properties of MgO protective layers are closely related to the relative density and Vickers hardness. The good optical and electrical properties of $\gamma$, at 0.080, a grain size of $19\;{\mu}m$ and an optical transmittance of 91.93 % were obtained for the MgO + 200 ppm $ZrO_2$ protective layer sintered at $1700^{\circ}C$ for 5 hrs.

• 한국재료학회지
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• 제11권3호
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• pp.197-202
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• 2001

교류구동형 플라즈마 표시소자의 보호막으로 사용되는 MgO의 특성향상을 위하여 기존의 MgO에 양이온이 등전적으로 치환될 수 있는 ZnO를 소량 첨가하여 고주파 마그네트론 스퍼터링 방법으로 $Mg_{1-x}$Z $n_{x}$O박막을 성장시키고 박막의 전기적, 광학적 특성을 조사하였다. ZnO농도가 0.5 at%, 1at%인 $Mg_{1-x}$Z $n_{x}$O 박막을 보호막으로 갖는 PDP 테스트 판넬을 제작하고 ZnO의 첨가가 소자의 방전전압과 메모리 이득에 미치는 영향을 살펴보았다. ZnO농도가 0at%, 0.5 at%, 1at%인 $Mg_{1-x}$Z $n_{x}$O 박막의 광투과율은 ZnO 첨가에 따라 변화를 보이지 않으나 유전상수는 다소 증가하는 경향을 보였다. ZnO의 농도가 0.5 at%인 $Mg_{1-x}$Z $n_{x}$O 박막을 보호막으로 갖는 PDP 소자의 방전개시전압과 방전유지 전압이 MgO 박막을 보호막으로 갖는 소자에 비해 20V까지 낮아졌고, 결과적으로 메모리계수는 다소 증가하였다. ZnO농도가 0.5 at%, 1at%인 $Mg_{1-x}$Z $n_{x}$O 박막을 보호막으로 갖는 소자에서 ZHO의 첨가에 비례하여 방전세기 (플라즈마 밀도)가 증가하였다.도)가 증가하였다.도)가 증가하였다.