• Journal of Trauma and Injury
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• 제36권4호
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• pp.354-361
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• 2023

Purpose: Ketamine has historically been contraindicated in traumatic brain injury (TBI) due to concern for raising intracranial pressure. However, it is increasingly being used in TBI due to the favorable respiratory and hemodynamic properties. To date, no studies have evaluated whether ketamine administered in subjects with TBI is associated with patient survival or disability. Methods: We performed a retrospective analysis of data from the multicenter Prehospital Tranexamic Acid Use for Traumatic Brain Injury trial, comparing ketamine-exposed and ketamine-unexposed TBI subjects to determine whether an association exists between ketamine administration and mortality, as well as secondary outcome measures. Results: We analyzed 841 eligible subjects from the original study, of which 131 (15.5%) received ketamine. Ketamine-exposed subjects were younger (37.3±16.9 years vs. 42.0±18.6 years, P=0.037), had a worse initial Glasgow Coma Scale score (7±3 vs. 8±4, P=0.003), and were more likely to be intubated than ketamine-unexposed subjects (88.5% vs. 44.2%, P<0.001). Overall, there was no difference in mortality (12.2% vs. 15.5%, P=0.391) or disability measures between groups. Ketamine-exposed subjects had significantly fewer instances of elevated intracranial pressure (ICP) compared to ketamine-unexposed subjects (56.3% vs. 82.3%, P=0.048). In the very rare outcomes of cardiac events and seizure activity, seizure activity was statistically more likely in ketamine-exposed subjects (3.1% vs. 1.0%, P=0.010). In the intracranial hemorrhage subgroup, cardiac events were more likely in ketamine-exposed subjects (2.3% vs. 0.2%, P=0.025). Ketamine exposure was associated with a smaller increase in TBI protein biomarker concentrations. Conclusions: Ketamine administration was not associated with worse survival or disability despite being administered to more severely injured subjects. Ketamine exposure was associated with reduced elevations of ICP, more instances of seizure activity, and lower concentrations of TBI protein biomarkers.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.179-179
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• 2016

A radio-frequency (RF) Inductively Coupled Plasma (ICP) torch system was used for boron-nitride nano-tube (BNNT) synthesis. Because of electrodeless plasma generation, no electrode pollution and effective heating transfer during nano-material synthesis can be realized. For stable plasma generation, argon and nitrogen gases were injected with 60 kW grid power in the difference pressure from 200 Torr to 630 Torr. Varying hydrogen gas flow rate from 0 to 20 slpm, the electrical and optical plasma properties were investigated. Through the spectroscopic analysis of atomic argon line, hydrogen line and nitrogen molecular band, we investigated the plasma electron excitation temperature, gas temperature and electron density. Based on the plasma characterization, we performed the synthesis of BNNT by inserting 0.5~1 um hexagonal-boron nitride (h-BN) powder into the plasma. We analysis the structure characterization of BNNT by SEM (Scanning Electron Microscopy) and TEM (Transmission Electron Microscopy), also grasp the ingredient of BNNT by EELS (Electron Energy Loss Spectroscopy) and Raman spectroscopy. We treated bundles of BNNT with the atmospheric pressure plasma, so that we grow the surface morphology in the water attachment of BNNT. We reduce the advancing contact angle to purity bundles of BNNT.

• 대한화학회지
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• 제38권6호
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• pp.411-417
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• 1994

난용성 신소재 중의 하나인 파인 세라믹의 분석을 위하여, 알칼리 용융법과 고압 산분해법 등의 시료 전처리법을 유도결합원자발광분석기(ICP-AES)를 이용하여 연구하였다. Al2O3 분말을 분석하여 본 결과, 고압 산분해법이 알칼리 용융법보다 재현성 있는 측정치를 얻을 수 있었다. SiC분말의 경우에서는 고압산분해법으로 처리한 후 Si매트릭스를 Si-F형태로 증발시켜서 분석하여 본 결과 분말 중의 ppm 농도 범위의 불순물들이 매트릭스에 의한 간섭없이 분석되었다. 일본 인증기준물인 JCRM022, JCRM023 초미립 분말을 고압 산분해법으로 분석하여 본 결과, 좋은 재현성과 높은 정확성을 나타내었다.

• Journal of Korean Neurosurgical Society
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• 제30권sup2호
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• pp.309-315
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• 2001

틈새뇌실증후군은 수두증으로 션트술을 시행받은 환아에서 CT나 MRI소견상 틈새처럼 좁은 뇌실을 가지고 있으면서 간헐적으로 두통, 구토 또는 의식장애등이 동반되는 질환이다. 1986년부터 1996년까지 총 821명의 환자가 수두증으로 션트술을 시행받았다. 이 환자들의 수두증의 원인은 뇌종양(140명), 출혈(62명), 정상압수두증(64명), 뇌수막염(58명), 외상(54명), 선천성(48명), 뇌낭미충증(31명), 그리고 이유를 알 수 없었던 경우가 364명으로 나타났다. 평균 추적 관찰 기간은 68개월이었으며 총 232명에서 재수술을 시행하였으며 1인당 1.28회의 재수술율을 보였다. 이들중 틈새뇌실 증후군은 6예로 0.7%였다. 틈새뇌실증후군 대부분의 환자는 영아기에 수술을 시행받았다. 처음 수술로부터 틈새뇌실증후군이 발생하기까지의 기간은 4~8년으로 평균 6년후 틈새뇌실증후군이 발생하였다. 동위원소 검사상 6예에서 션트의 기능은 모두 정상이었다. 증상이 경미한 2명의 환자에서는 보존적 치료를 시행하였는데 치료후 증상의 호전을 보였다. 이 환자들은 뇌압측정을 시행하지 않았다. 6명중 1명은 뇌압 측정시 높게 나타나 기존과 같은 압력밸브를 이용하여 재수술을 시행하였다. 3명의 환자는 낮은 뇌압을 보여 안티사이펀밸브나 기존보다 높은 압력의 밸브를 이용하여 재수술을 시행하였다. 틈새뇌실증후군의 치료는 첫째, 증후군의 양상을 정확하게 판단하여, 둘째, 증상을 완화시킬 수 있는 방향으로 치료방침을 설정해야 할 것으로 생각되었다.

• Bulletin of the Korean Chemical Society
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• 제27권3호
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• pp.373-375
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• 2006

$CF_4$ gas is one of the most common chemicals used for dry etching in semiconductor manufacturing processes. For application to the etching process and environmental control, the low-pressure inductively coupled plasma (LP-ICP) was employed to obtain the spectrum of $CF_4$ gas. In terms of the analysis of the spectra, trace CF radical by A-X and B-X transitions was detected. The other $CF_x$ radicals, such as $CF_2$ and $CF_3$, were not seen in this experiment whereas strong C and $C_2$ emissions, dissociation products of $CF_4$ gas, were observed.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 춘계학술대회 논문집 유기절연재료 방전 플라즈마연구회
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• pp.92-95
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• 2003

In this paper, the emission properties of electrodeless fluorescent lamp were discussed using the inductively coupled plasma. To transmit the electromagnetic energy into the chamber, a RF power of 13.56MHz was applied to the antenna and considering the Ar gas pressure and the RF electric power change, the emission spectrum, Ar-I line, luminance were investigated. At this time the input parameter for ICP RF plasma, Ar gas pressure and RF power were applied in the range of 10~60m Torr, 10~300W respectively.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제53권1호
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• pp.20-23
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• 2004

In this paper, the emission properties of electrodeless fluorescent lamp were discussed using the inductively coupled plasma. To transmit the electromagnetic energy into the chamber, a RF power of 13.56 [MHz] was applied to the antenna and considering the Ar gas pressure and the RF electric power change, the emission spectrum, Ar I line, luminance were investigated. At this time, the input parameter for ICP RF plasma, Ar gas pressure and RF power were applied in the range of 10∼60 [mTorr], 10∼300 [W], respectively. From emission intensity and lumnance intensity results, the mode transition from E-mode to H-mode was observed. This implies that this method can be used to find an optimal RF power for efficient light illumination in an electrodeless fluorescent lamp.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2003년도 하계학술대회 논문집 C
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• pp.1695-1697
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• 2003

In this paper the emission properties of electrodeless fluorescent lamp were discussed using the inductively coupled plasma. To transmit the electromagnetic energy into the chamber a RF power of 13.56MHz was appied to the antenna and considering the Ar gas pressure and the RF electric power change, the emission spectrum, Ar-I line, luminance were investigated. At this time the input parameter for ICP RF plasma, Ar gas pressure and RF power were applied in the range of 10${\sim}$60m Torr, 10${\sim}$300W respectively.

• 한국추진공학회:학술대회논문집
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• 한국추진공학회 2012년도 제38회 춘계학술대회논문집
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• pp.157-162
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• 2012

미크론 크기의 알루미늄 분말과 물 혼합물의 기초 연소 특성 연구를 진행하였다. 대기압 환경에서 연소속도에 영향을 미치는 당량비와 혼합물 밀도를 변화시켜 알루미늄-물 혼합물의 연소 특성 연구를 진행하였다. 이를 바탕으로 고압 환경하에서의 알루미늄 분말과 물 혼합물에 대한 연소 특성을 연구하기 위한 장치를 설계하였다. 고압 환경에서 2~50기압 범위에서는 압력에 따른 연소속도의 영향은 나노 분말의 연소 특성과 동일하였으나, 50~70기압 범위에서는 급격한 연소속도 증가 현상이 관찰되었다. 당량비에 따른 실험에서는 산화제 과잉(eq=1.5) 조건에서는 50기압 이상에서는 연소가 진행되지 않았다.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 1998년도 하계종합학술대회논문집
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• pp.339-342
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• 1998

Plasma etching of photoresist needs high etch rate, good uniformity and rae, good uniformity and low damage in low cost. ICP asher is expected to satisfy these requriement for next eneration semiconductor devices. ICPsimulator has been used to design the ashing chamber to redcue the development time and cost, and its results have been verified by QMS, OES and langmuir probe measurments. Plasma characteristics are monitored in terms of RF power and chamber pressure.