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http://dx.doi.org/10.5012/bkcs.2006.27.3.373

Molecular Emission of CF4 Gas in Low-pressure Inductively Coupled Plasma  

Jung, T.Y. (Department of Chemistry, Dankook University)
Kim, D.H. (Department of Chemistry, Dankook University)
Lim, H.B. (Department of Chemistry, Dankook University)
Publication Information
Bulletin of the Korean Chemical Society / v.27, no.3, 2006 , pp. 373-375 More about this Journal
Abstract
$CF_4$ gas is one of the most common chemicals used for dry etching in semiconductor manufacturing processes. For application to the etching process and environmental control, the low-pressure inductively coupled plasma (LP-ICP) was employed to obtain the spectrum of $CF_4$ gas. In terms of the analysis of the spectra, trace CF radical by A-X and B-X transitions was detected. The other $CF_x$ radicals, such as $CF_2$ and $CF_3$, were not seen in this experiment whereas strong C and $C_2$ emissions, dissociation products of $CF_4$ gas, were observed.
Keywords
Fluorinated carbon; CF radical; Low-pressure plasma; Inductively coupled plasma;
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