• Title/Summary/Keyword: porous polysilicon

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Property analysis of polysilane precursors and applications for polysilicon (폴리실란으로부터 생성한 폴리실리콘의 물성 분석과 응용)

  • Lee, Gyu-Hwan
    • Analytical Science and Technology
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    • v.25 no.6
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    • pp.345-349
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    • 2012
  • Polysilane black powders were synthesized by sonochemical methods from silicon tetrachloride with sodium metal with 37.0% yield. Those black powder materials were found to have fibrous or irregular shapes with round surface. It was found that thermal behaviors of those polysilane black powders were similar to that of hydropolysilanes which was reported earlier. After thermal treatment, black polysilicon was obtained with 57.1% residue yield, and those fibrous or irregular shapes with round surface were intact but lots of small cavities were formed indicating porous structure, and found to be an amorphous state from XRD analysis.

A unit pixel drive and field emission characteristics of oxidized porous polysilicon field emission display (산화된 다공질 폴리실리콘 전계방출 소자의 픽셀별 구동 및 특성)

  • You, Sung-Won;Kim, Jin-Eui;Choi, Sie-Young
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.44 no.8
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    • pp.8-15
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    • 2007
  • In this paper, we fabricated the field emitter display using oxidized porous polysilicon(OPPS). Their field emission characteristics and the brightness were investigated for each pixel. The OPPS emitter was operated to each pixel using passive matrix for application of large panel display. We set up the proper thickness and width of upper electrode. The fine structure of OPPS was analyzed and the field emission characteristics of each pixel were investigated. As a result of field emission characteristics of different upper electrode thickness and width, we confirmed that the most efficient thickness was 2nm/7nm and increased the emission efficiency over the width of 2.5 mm. Even if field emission characteristics of each pixel was a little different but we confirmed the same leakage current and emission current, emission efficiency at each pixel. The leakage current and emission current was decreased according to the time increases but all of each pixel were uniformly decreased. We confirmed that the brightness of each pixel was not different and the brightness of OPPS field emitter was 700 cd/m2 at the Vps=20 V. Accordingly, the patterned OPPS field emitter can be applied to high quality field emission display devices.

다공질 실리콘을 이용한 전계 방출 소자

  • 주병권
    • Proceedings of the International Microelectronics And Packaging Society Conference
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    • 2002.05a
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    • pp.92-97
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    • 2002
  • We establish a visible light emission from porous polycrystalline silicon nano structure(PPNS). The PPNS layer are formed on heavily doped n-type Si substrate. 2um thickness of undoped polycrystalline silicon deposited using LPCVD (Low Pressure Chemical Vapor Deposition) anodized in a HF: ethanol(=1:1) as functions of anodizing conditions. And then a PPNS layer thermally oxidized for 1 hr at $900 ^{\circ}C$. Subsequently, thin metal Au as a top electrode deposited onto the PPNS surface by E-beam evaporator and, in order to establish ohmic contact, an thermally evaporated Al was deposited on the back side of a Si-substrate. When the top electrode biased at +6V, the electron emission observed in a PPNS which caused by field-induces electron emission through the top metal. Among the PPNSs as functions of anodization conditions, the PPNS anodized at a current density of $10mA/cm^2$ for 20 sec has a lower turn-on voltage and a higher emission current. Furthermore, the behavior of electron emission is uniformly maintained.

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Field Emission properties of Porous Polycrystalline silicon Nano-Structure (다결정 다공질 실리콘 나노구조의 전계 방출 특성)

  • Lee, Joo-Won;Kim, Hoon;Park, Jong-Won;Lee, Yun-Hi;Jang, Jin;Ju, Byeong-Kwon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.04b
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    • pp.69-72
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    • 2002
  • We establish a visible light emission from porous polycrystalline silicon nano structure(PPNS). The PPNS layer are formed on heavily doped n-type Si substrate. 2um thickness of undoped polycrystalline silicon deposited using LPCVD (Low Pressure Chemical Vapor Deposition) anodized in a HF: ethanol(=1:1) as functions of anodizing conditions. And then a PPNS layer thermally oxidized for 1 hr at $900^{\circ}C$. Subsequently, thin metal Au as a top electrode deposited onto the PPNS surface by E-beam evaporator and, in order to establish ohmic contact, an thermally evaporated Al was deposited on the back side of a Si-substrate. When the top electrode biased at +6V, the electron emission observed in a PPNS which caused by field-induces electron emission through the top metal. Among the PPNSs as functions of anodization conditions, the PPNS anodized at a current density of $10mA/cm^{2}$ for 20 sec has a lower turn-on voltage and a higher emission current. Furthermore, the behavior of electron emission is uniformly maintained.

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The field emission characteristics of an oxidized porous polysilicon field emitter using Pt/Ti emitter-electrode (Pt/Ti 전극을 사용한 산하된 다공질 폴리 실리콘 전계방출소자의 특성)

  • Han Sang-Kug;Park Keun-Yong;Choi Sie-Young
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.42 no.6 s.336
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    • pp.23-30
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    • 2005
  • In this paper, OPPS(oxidized porous poly-silicon) field emitters were fabricated by using various emitter-electrode metal and these electron emission characteristics were investigated for different thermal annealing effects. The addressed OPPS field emitter with Pt/Ti emitter electrode annealed at $300^{\circ}C$-1hr showed the efficiency of $2.98\%$ at $V_{ps}$=12 V and one annealed at $350^{\circ}C$-1hr showed the highest efficiency of $3.37\%$at $V_{ps}$=16V. They are resulted from the improvement of interfacial contact characteristics of thin emitter metal to an oxidized porous poly-silicon and the decrease of electrical resistance of emitter metal. The brightness of the OPPS field emitter increases linearly in $V_{ps}$ and after oxidation process for $900^{\circ}C$-50min, the brightness of the OPPS field emitter with the as-deposited Pt/Ti emitter electrode was 3600 cd/$m^2$ at the $V_{ps}$=15 V, 6260 cd/$m^2$ at the $V_{ps}$=20 V. Thermal treatment improved the adhesion between the Ti buffer layer and the oxidized porous poly-silicon and also played an important role in the uniform distribution of electric field to the emitter electrode.