• Elastomers and Composites
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• 제29권5호
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• pp.444-452
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• 1994

Emulsion graft copolymerizations of vinyl monomers, butyl acrylate(BA), methyl methacrylate(MMA), 2-ethylhexyl acrylate (EHA), glycidyl methacrylate (GMA), 2-hydroxyethyl methacrylate(HEMA), methacrylonitrile(MAN), dimethylaminoethyl methacrylate(DAMA) or 2-vinyl pyridine(VP), onto carboxyl-terminated SBR latex were carried out under different experimental conditions. In case of synthesizing SBR-g-poly(butyl acrylate), the degree of grafting was increased with increasing the amount of emulsifier, polymerization temperature and the amount of initiator. Pull-out strength of resorcinol-formaldehyde-latex(RFL) adhesives formulated with modified latexes was very higher than that of RFL adhesive formulated with ungrafted latex. When the modified latexes with GMA, HEMA, MAN, DAMA or VP were used, the break occurred at cords. Peel strength of RFL adhesives formulated with SBR-g-poly(GMA), SBR-g-poly(HEMA) or SBR-g-poly(VP) was higher by about 1.3 times than that of RFL adhesives formulated with unmodified SBR against nylon cord and was higher by about 2.0 times against polyester cord.

• Elastomers and Composites
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• 제43권3호
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• pp.157-165
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• 2008

현탁중합법을 이용하여 카본블랙을 함유하는 폴리뷰틸메타크릴레이트 복합체 입자를 합성하였다. 물을 반응매체로 선택하고 소수성실리카를 안정제로 azobisisobutyronitrile (AIBN)을 개시제로 선택하였다. 안정제의 농도는 물에 대하여 0.67 중량%에서 2.55 중량%까지 변화시켰으며, 개시제는 단량체에 대하여 0.25 중량%에서 3.00 중량%까지 변화시키면서 반응역학에 미치는 영향을 조사하였다. 모든 반응은 75$^{\circ}C$에서 진행하였다. 안정제의 농도는 반응속도에 무관하였으나, 개시제의 증가는 반응속도를 증가시켰다. 카본블랙을 단량체에 대하여 1, 3 및 5 중량% 유입하는 경우 반응전환율은 단계적으로 감소하였다. 폴리뷰틸메타크릴레이트 복합체 입자의 입경은 5-30 ${\mu}m$로 관찰되었다. 유리전이온도는 카본블랙의 유입 및 개시제, 안정제의 농도에 무관하게 23.8-24.7$^{\circ}C$로 측정되었다.

• 멤브레인
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• 제20권3호
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• pp.203-209
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• 2010

원자전달 라디칼 중합을 이용하여 poly(epichlorohydrine) (PECH)를 주사슬로 한 양친성 가지형 공중합체를 합성하였다. PECH로부터 poly(methyl methacrylate)(PMMA) 및 poly(butyl methacrylate)(PBMA)의 가지형 중합이 성공적임을 $^1H$ NMR과 FT-IR분석을 통해 확인하였다. 합성한 가지형 공중합체에 KI나 LiI 염을 도입하였을 때, ether 신축진동 피크가 낮은 wavenumber영역으로 이동하였으며, 이는 배위결합 상호작용 때문이다. PECH-g-PBMA 복합체의 이온 전도도는 PECH-g-PMMA 복합체에 비해 항상 높게 나타났는데, 이는 고무상인 PBMA 사슬의 높은 이동성으로부터 기인한 것으로 확인되었다. 최고 이온전도도 값은 질량비 10 wt%의 KI가 도입된 PECH-g-PBMA 전해질체에서 $2.7{\times}10^{-5}\;S/cm$로 나타났다.

• Korean Membrane Journal
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• 제9권1호
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• pp.57-63
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• 2007

Amphiphilic graft copolymer from poly(vinylidene fluoride) (PVDF) was synthesized using atom transfer radical polymerization (ATRP) for composite nanofiltration membranes. Direct initiation of the secondary fluorinated site of PVDF facilitates grafting of tert-butyl methacrylate (tBMA). Amphiphilic PVDF-g-PMAA graft copolymer with a 51:49 wt ratio was obtained by hydrolyzing poly(tert-butyl methacrylate) (PtBMA) to poly(methacrylic acid) (PMAA). Wide angle X-ray scattering (WAXS) and differential scanning calorimetry (DSC) confirmed the decrease of crystallinity of PVDF upon graft copolymerization. Composite nanofiltration membranes were prepared from PVDF-g-PMAA as a top layer coated onto PVDF ultrafiltration (UF) support membrane. The morphology and hydrophilicity of membranes were characterized using scanning electron microscopy (SEM) and contact angle measurement. The rejections of composite membranes were 80.2% for $Na_2SO_4$ and 28.4% for NaCl, and the solution flux were 9.5 and $14.5\;L/m^2\;h$ at 1.0 MPa pressure.

• 한국전기전자재료학회논문지
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• 제17권8호
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• pp.806-811
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• 2004

1-Hydroxy-4-(2-naphthalenesulfonyloxy) cyclohexane(1), 1,4-di-(2-naphthalenesulfonyloxy) cyclohexane(2), 1-hydroxy-4-(2-thiophenesulfonyloxy) cyclohexane(3), 1,4-di-(2-thiophenesulfonyloxy) cyclohexane(4) were synthesized and evaluated for their performance as novel acid amplifiers for 193 nm photoresists. These acid amplifiers(1-4) showed reasonable thermal stability at the usual resist-processing temperature, 9$0^{\circ}C$-12$0^{\circ}C$. And estimated by the sensitivity curve, (1)-(4) enhanced the sensitivity of poly(tert-butyl methacrylate) film by 1.2-1.4 times, compared to poly(tert-butyl methacrylate) film whithout acid amplifiers, in the presence of a photoacid generator.

• 공업화학
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• 제16권2호
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• pp.262-266
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• 2005

대표적인 지방족 산증식제인 4-hydroxy-4'-p-tosyloxy isopropylidene dicyclohexane을 산에 민감한 고분자인 poly[tert-butyl methacrylate] (pTBMA), poly[tetrahydropyranylmethacrylate] (pTHPMA) 및 poly[tert-butoxycarbonyloxystyrene] (pTBOCST) 수지에 첨가하여 열적 안정성과 감도 증진의 관점에서 산증식제의 효과를 비교하였다. 산증식제는 pTBMA 또는 pTBOCST 필름에서는 $120^{\circ}C$에서 20 min까지 안정하였으며, pTHPMA 필름에서는 5 min까지 안정하였다. 산증식제를 첨가한 레지스트의 감도 증진효과는 pTBMA는 4배, pTHPMA는 2배 정도 증진되었지만, pTBOCST의 경우는 감도 증진효과가 미미하였다. 이를 통하여 산증식제의 감도 증진효과와 열적 안정성은 수지의 종류에 따라 다르게 나타나는 것을 알 수 있었다.

• 한국인쇄학회지
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• 제20권2호
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• pp.131-140
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• 2002

Chemically amplified deep UV(CA-DUV) resists are typically based on a combination of an acid labile polymer and a photoacid generator(PAG) but acid amplification type photoresist is formulated by addition of the acid amplifiers to chemically amplified resist system(CAPs). We developed acid amplifiers base on cyclohexanediol such as 1-methacryloyloxy-4-tosyloxy cyclohexane(MTC) and poly(MTC$_{10}$-co-tBMA$_{90}$)(P-1) to enhance photosensitivity. P-1 is a copolymer of tert-butyl methacrylate and MTC as a positive working photoresist based on polymeric acid amplifier in order to enhance photosensitivity and simplify the process of fomulating a photoresist. P-1 exhibited 2X higher photosensitivity compared with PtBMA. The acid amplifiers showed reasonable thermal stability for resist processing temperature and higher photosensitivity compared with chemically amplified resist.

• 한국응용과학기술학회지
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• 제19권2호
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• pp.131-136
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• 2002

As model waterborne acrylic coatings, mono-dispersed poly(butyl acrylate-methyl methacrylate) copolymer latexes of random copolymer and core/shell type graft copolymer were prepared by seeded multi-staged emulsion polymerization with particle size of $180{\sim}200$ nm using semi-batch type process. Sodium lauryl sulfate and potassium persulfate were used as an emulsifier and an initiator, respectively. The effect of particle texture including core/shell phase ratio, glass transition temperature and crosslinking density, and film forming temperature on the film formation and final properties of film was investigated using SEM, AFM, and UV in this study. The film formation behavior of model latex was traced simultaneously by the weight loss measurement and by the change of tensile properties and UV transmittance during the entire course of film formation. It was found that the increased glass transition temperature and higher crosslinking degree of latex resulted in the delay of the onset of coalescence of particles by interdiffusion during film forming process. This can be explained qualitatively in terms of diffusion rate of polymer chains. However, the change of weight loss during film formation was insensitive to discern each film forming stages-I, II and III.

• Elastomers and Composites
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• 제28권3호
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• pp.191-197
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• 1993

The graft copolymerization of methyl methacrylate(MMA) onto natural rubber latex(NRL) initiated by t-butyl hydroperoxide(t-BHPO) was investigated in aquous medium. The grafting percentage, grafting efficiency and total conversion were observed in various reaction conditions such as monomer, initiator and emulsifier concentration, reaction temperature, reaction time and agitation speed. The optimum conditions for the graft copolymerization onto natural rubber latex were as follows ; At given monomer concentration of $3{\times}10^{-2}mole/l$, the maximum grafting percentage was appeared in the case of grading in initiator concentration of $4{\times}10^{-2}mo1e/l$ and emulsifier concentration of 0.2wt.% at $40^{\circ}C$ for 5hrs.

• 대한화학회지
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• 제48권1호
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• pp.39-45
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• 2004

산에 민감한 작용기를 갖는 tert-butyl methacrylate(tBMA)와 산 증식 기능을 갖는 4-hydroxy-4''p-styrenesulfonyloxyisopropylidene dicyclohexane(HSI)과 4-p-styrenesulfonyloxy-4''-tosyloxyisopropylidene dicyclohexane (STI)를 둘 다 함께 갖고 있는 공중합체를 새로운 고분자 산증식형 포토레지스트로 합성하였다. 산증식형 공중합체인 Poly(HSI-co-tBMA) film과 Poly(STI-co-tBMA) film은 산의 부재 시에는 레지스트 공정 온도에 대하여 충분한 열적 안정성을 나타내었다. Poly(STI-co-tBMA) film의 감도는 tBMA homopolymer에 비교하여 2배 정도 증진되었지만, Poly(HSI-co-tBMA) film은 오히려 2배 정도 감도가 저하되는 결과를 나타내었다. 고분자에 도입한 이러한 산증식 기능을 갖는 그룹의 구조에 따라 광감도 증진 효과가 다르게 나타남을 확인하였다.